| Development of Dual-light Path Monitoring System of Optical Thin-film Thickness |
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| 作者姓名： | 许世军 |
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| 作者单位： | DepartmentofMathandPhysics,Xi＇anInstituteofTechnology,Xi＇an,Shaanxi710032,China |
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| 摘 要： | The accurate monitoring of optical thin-film thickness is a key technique for depositing optical thin-film. For existing coating equipments, which are low precision and automation level on monitoring thin-film thickness, a new photoelectric control and analysis system has been developed. In the new system, main techniques include a photoelectric system with dual-light path, a dual-lock-phase circuit system and a comprehensive digital processing-control-analysis system. The test results of new system show that the static and dynamic stabilities and the control precision of thin-fihn thickness are extremely increased. The standard deviation of thin-film thickness, which indicates the duplication of thin-film thick-ness monitoring, is equal to or less than 0.72%. The display resolution limit on reflectivity is 0.02%. In the system, the linearity of drift is very high, and the static drift ratio approaches zero.
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| 关 键 词： | 光学机械 薄膜厚度监控 稳定性 等光路径 生长工艺 |
Development of Dual-light Path Monitoring System of Optical Thin-film Thickness |
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| XU Shi-jun.Development of Dual-light Path Monitoring System of Optical Thin-film Thickness[J].Journal of China Ordnance,2005,1(1):77-82. |
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| Authors: | XU Shi-jun |
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| Abstract: | The accurate monitoring of optical thin-film thickness is a key technique for depositing optical thin-film. For existing coating equipments, which are low precision and automation level on monitoring thin-film thickness, a new photoelectric control and analysis system has been developed. In the new system, main techniques include a photoelectric system with dual-light path, a dual-lock-phase circuit system and a comprehensive digital processing-control-analysis system.The test results of new system show that the static and dynamic stabilities and the control precision of thin-film thickness are extremely increased. The standard deviation of thin-film thickness, which indicates the duplication of thin-film thickness monitoring, is equal to or less than 0.72%. The display resolution limit on reflectivity is 0.02 %. In the system, the linearity of drift is very high, and the static drift ratio approaches zero. |
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| Keywords: | optical engineering monitoring thin-film thickness dual-light path dual-lock-phase circuit stability precision Thickness Optical Monitoring System Path ratio zero linearity drift high display resolution reflectivity duplication standard deviation test results show static dynamic stabilities control precision |
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