| 高功率脉冲电子束溅射法制备钴-钛多层膜 |
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| 引用本文： | 江兴流,王天民,高金城,韩丽君,李秉清.高功率脉冲电子束溅射法制备钴-钛多层膜[J].核技术,1990(8). |
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| 作者姓名： | 江兴流 王天民 高金城 韩丽君 李秉清 |
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| 作者单位： | 兰州大学
(江兴流，王天民，高金城，韩丽君)，兰州大学(李秉清) |
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| 摘 要： | 本文介绍一种利用高功率脉冲电子束溅射法制备金属多层膜的新方法。强脉冲电子束轰击金属靶将产生瞬态高温等离子体,从这种等离子体中飞出的金属离子沉积在附近的衬底上,从而制得Co/Ti系和其他多种金属多层膜。本文报道了对多层膜进行的TEM和AES研究的结果。
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| 关 键 词： | 多层膜 等离子体 气相沉积 脉冲电子束 |
Preparation of Co/Ti multilayer films by sputter deposition with intense pulsed e-beams |
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| Jiang Xingliu Wang Tianmin Gao Jincheng Han Lijun Li Bingqing.Preparation of Co/Ti multilayer films by sputter deposition with intense pulsed e-beams[J].Nuclear Techniques,1990(8). |
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| Authors: | Jiang Xingliu Wang Tianmin Gao Jincheng Han Lijun Li Bingqing |
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| Affiliation: | Lanzhou University |
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| Abstract: | A new approach of preparation for thin multilayer films is described. A powerful pulsed e-beam is used to irradiate a metal target, leading to the formation of transient hot plasma. The energetic metal ions ejected from such plasma are deposited on the surface of the near-by substrate. The multilayer films of Co/Ti system and other metals have been prepared. The TEM and AES investigations for such films are reported. |
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| Keywords: | Multilayer film Plasma Vapor deposition Pulsed electron beam |
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