| 基于脉冲激光单粒子效应的二次光斑研究 |
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| 引用本文： | 姜昱光,封国强,朱翔,马英起,上官士鹏,余永涛,韩建伟.基于脉冲激光单粒子效应的二次光斑研究[J].原子能科学技术,2013,47(12):2361-2364. |
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| 作者姓名： | 姜昱光 封国强 朱翔 马英起 上官士鹏 余永涛 韩建伟 |
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| 作者单位： | 1.中国科学院 空间科学与应用研究中心，北京100190；2.中国科学院大学，北京100049 |
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| 摘 要： | 脉冲激光可有效模拟重离子触发芯片的单粒子效应。本工作在应用背部激光试验方法辐照芯片时观察到了二次光斑现象，通过Si衬底和Si晶圆片研究了芯片单粒子效应实验中二次光斑的成因。实验结果表明，二次光斑主要是由于激光在芯片有源区附近的金属布线层反射形成的。通过测量芯片的Si衬底厚度以及激光触发芯片单粒子效应时的聚焦深度，实验验证了二次光斑是在金属布线层区域形成的。
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| 关 键 词： | 二次光斑 脉冲激光 硅衬底 单粒子效应 |
Secondary Spot for Pulsed Laser SEE Testing |
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| JIANG Yu-guang,FENG Guo-qiang,ZHU Xiang,MA Ying-qi,SHANGGUAN Shi-peng,YU Yong-tao,HAN Jian-wei.Secondary Spot for Pulsed Laser SEE Testing[J].Atomic Energy Science and Technology,2013,47(12):2361-2364. |
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| Authors: | JIANG Yu-guang FENG Guo-qiang ZHU Xiang MA Ying-qi SHANGGUAN Shi-peng YU Yong-tao HAN Jian-wei |
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| Affiliation: | 1.Center for Space Science and Applied Research, Chinese Academy of Sciences, Beijing 100190, China;2.University of Chinese Academy of Sciences, Beijing 100049, China |
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| Abstract: | The pulsed laser is an effective method to simulate single event effect (SEE) induced by heavy ions. When the laser focused on the chip surface using the backside approach, the laser spot was observed. The experiment data of Si substrate and Si wafer show that the secondary spot is formed due to the reflection of metal layer, and it is verified by the thickness of Si substrate and the depth of laser focusing. |
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| Keywords: | secondary spot pulsed laser Si substrate single event effect |
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