Low-pressure-RF plasma modification of UiO-66 and its application in methylene blue adsorption |
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作者姓名: | 周甜 杨斗豪 王一骏 程久珊 陈强 刘博文 刘忠伟 |
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作者单位: | Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication |
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基金项目: | financially supported by National Natural Science Foundation of China (Nos. 12075032 and 12105021);;the Natural Science Foundation of Beijing Municipality (Nos. KZ202010015022 and 8222055); |
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摘 要: | Defect engineering of metal-organic frameworks has attracted increasing attention in recent years for potential applications in gas storage and catalysis. In this study, defective UiO-66 is obtained by Ar and H2 plasma treatments. Compared with the pristine UiO-66, a new aperture with a size of ~4 nm appears for a sample with the plasma modification, indicating the formation of mesopores within UiO-66 framework. Characterization results demonstrate that the pore volume,surface area an...
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