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Low-pressure-RF plasma modification of UiO-66 and its application in methylene blue adsorption
作者姓名:周甜  杨斗豪  王一骏  程久珊  陈强  刘博文  刘忠伟
作者单位:Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication
基金项目:financially supported by National Natural Science Foundation of China (Nos. 12075032 and 12105021);;the Natural Science Foundation of Beijing Municipality (Nos. KZ202010015022 and 8222055);
摘    要:Defect engineering of metal-organic frameworks has attracted increasing attention in recent years for potential applications in gas storage and catalysis. In this study, defective UiO-66 is obtained by Ar and H2 plasma treatments. Compared with the pristine UiO-66, a new aperture with a size of ~4 nm appears for a sample with the plasma modification, indicating the formation of mesopores within UiO-66 framework. Characterization results demonstrate that the pore volume,surface area an...

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