| A Study on Optical Emission of CF4＋CH4 Plasma and Deposition Mechanisms of a-C ： F, H Films |
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| 引用本文： | 黄松,辛煜,宁兆元.A Study on Optical Emission of CF4＋CH4 Plasma and Deposition Mechanisms of a-C ： F, H Films[J].等离子体科学和技术,2005,7(1):2669-2672. |
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| 作者姓名： | 黄松 辛煜 宁兆元 |
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| 作者单位： | DepartmentofPhysics,SuzhouUniversity,215006Suzhou,China |
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| 基金项目： | TheprojectsupportedbytheFoundationofKeyLabortoryofThinFilm,JiangsuProvince |
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| 摘 要： | Fluorinated amorphous carbon (a-C : F, H) films were deposited by inductively coupled plasma using CH4 and CF4 gases. Actinometrical optical emission spectroscopy (AOES) was used to determine the relative concentrations of various radicals, CF, CF2 CH, C2, H and F, in the plasma as a function of gas flow ratio R, R=CH4]/(CH4] CF4]). The structural evolution of the films were characterized by Fourier transform infrared transmission (FTIR) spectroscopy. The relationship between the film deposition and the precursor radicals in the plasma was discussed. It was shown that CH radical, as well as CF, CF2, C2 radicals are of the precursors, contributing to a-C : F, H film growth.
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| 关 键 词： | 发射光谱学 氟化碳膜 FTIR 感应耦合等离子体 |
A Study on Optical Emission of CF4+CH4 Plasma and Deposition Mechanisms of a-C:F,H Films |
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| Huang Song,Xin Yu,Ning Zhaoyuan.A Study on Optical Emission of CF4+CH4 Plasma and Deposition Mechanisms of a-C:F,H Films[J].Plasma Science & Technology,2005,7(1):2669-2672. |
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| Authors: | Huang Song Xin Yu Ning Zhaoyuan |
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| Affiliation: | Department of Physics, Suzhou University, 215006 Suzhou, China;Department of Physics, Suzhou University, 215006 Suzhou, China;Department of Physics, Suzhou University, 215006 Suzhou, China |
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| Abstract: | Fluorinated amorphous carbon (a-C: F, H) films were deposited by inductively coupled plasma using CH4 and CF4 gases. Actinometrical optical emission spectroscopy (AOES) was used to determine the relative concentrations of various radicals, CF, CF2 CH, C2, H and F, in the plasma as a function of gas flow ratio R, R = CH4]/(CH4] CF4]). The structural evolution of the films were characterized by Fourier transform infrared transmission (FTIR) spectroscopy. The relationship between the film deposition and the precursor radicals in the plasma was discussed.It was shown that CH radical, as well as CF, CF2, C2 radicals are of the precursors, contributing to a-C: F, H film growth. |
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| Keywords: | optical emission spectroscopy fluorinated carbon film FTIR |
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