Pd/γ-Al_2O_3对超薄金属钯复合膜表面缺陷修复的研究

通过对化学镀制备的超薄金属钯复合膜的表面缺陷填充Pd/γ-Al2O3粒子并提供钯核,进而通过化学镀制备了致密超薄金属钯复合膜。结果表明,首次化学镀制备的金属钯膜的厚度约为1.22μm,而以Pd/γ-Al2O3粒子对其缺陷进行填充并进一步化学镀制备的钯膜厚度仅增大到1.32μm,说明第二次化学镀金属钯主要沉积在经Pd/γ-Al2O3粒子填充的缺陷位上。在400℃,100kPa压力下,氢气渗透速率为0.8378mol·m-2·s-1,为初镀钯膜的81%,而H2/N2理想分离因子从初镀膜的370增大到13700。可见,该方法实现了超薄金属钯复合膜缺陷的局部修复,在基本不增加膜厚的前提下,有效地消除了钯复合膜的表面针孔。

Surface modification of thin Pd/ceramic composite membrane with Pd/γ-Al2O3

The surface defects of thin Pd/ceramic membrane tubes were repaired with Pd/γ-Al2O3. The membrane thickness increased from 1.22μm to 1.32 μm after being modified by Pd/γ-Al2O3, which indicated that Pd mainly deposited on the modified surface defects during the secondary electroless plating procedures. At 400℃, 100kPa, it exhibited a hydrogen flux of 0.8378 mol·m-2·s-1 and a H2/N2 ideal separation factor of 13700 for the modified Pd membrane, and they were 1.0343 mol·m-2·s-1 and 370, respectively, for the unmodified Pd membrane. The modification could efficiently repair the defects and pinholes on the surface of initial plating Pd membrane with little increase of membrane thickness.