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脉冲多弧离子镀制备类金刚石薄膜的力学特性
引用本文:喻志农,沈思宽,等.脉冲多弧离子镀制备类金刚石薄膜的力学特性[J].机械科学与技术(西安),2001,20(1):100-101,105.
作者姓名:喻志农  沈思宽
作者单位:西安交通大学电子物理与器件研究所!西安710049
摘    要:利用脉冲多弧离子镀技术在硅基底上沉积类金刚石薄膜。分析了类金刚石薄膜的硬度和工艺参数的关系 ,讨论了薄膜的耐磨性和化学稳定性。

关 键 词:脉冲多弧离子镀  类金刚石薄膜  薄膜性能
文章编号:1003-8728(2001)01-0100-02

Mechanical Properties of Diamond-like Carbon(DLC) Films Prepared by Pulse-arc Plasma Deposition
YU Zhi-nong,SHEN Si-kuang,SUN Jian.Mechanical Properties of Diamond-like Carbon(DLC) Films Prepared by Pulse-arc Plasma Deposition[J].Mechanical Science and Technology,2001,20(1):100-101,105.
Authors:YU Zhi-nong  SHEN Si-kuang  SUN Jian
Abstract:DLC films were prepared on silicon by pulse-arc plasma deposition. The relationship between hardness of the deposited films and deposition parameters were analysed in detail. Wear resistance and chemical inertness of the deposited films are also studied.
Keywords:Pulse-arc plasma deposition  DLC film  properties of films
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