| 磁流变抛光去除模型及驻留时间算法研究 |
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| 引用本文： | 孙希威,张飞虎,董申,康桂文.磁流变抛光去除模型及驻留时间算法研究[J].新技术新工艺,2006(2):73-75. |
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| 作者姓名： | 孙希威 张飞虎 董申 康桂文 |
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| 作者单位： | 哈尔滨工业大学,150001 |
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| 摘 要： | 建立了磁流变抛光球形光学元件的去除模型，分析了影响磁流变抛光的因素，提出了驻留时间算法，用其仿真加工球形工件，结果表明该算法是收敛的，并用磁流变抛光加工了R41.3mm、口径20mm的K9光学玻璃球面工件，获得了Rms8．441nm、PV57．911nm的面形精度。
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| 关 键 词： | 磁流变抛光 去除模型 驻留时间 |
Research on Remove Moedl and Algorithm of Resident Time for Magnetorheological Finishing |
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| Sun XiWei;Zhang FeiHu;Dong Shen;Kang GuiWen.Research on Remove Moedl and Algorithm of Resident Time for Magnetorheological Finishing[J].New Technology & New Process,2006(2):73-75. |
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| Authors: | Sun XiWei;Zhang FeiHu;Dong Shen;Kang GuiWen |
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| Abstract: | In this paper the removing model for magnetorheological finishing globular shape optical element was established and the influence factors were analysed. The resident time algorithm was presented and proved to be convergent by the simulation machining experiment. After K9 globular shape optical glass with R 41. 3ram was magnetorheological finishinged, the surface accuracy of Rms8. 441nm and PVS7, g11nm was achieved. |
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| Keywords: | magnetorheological finishing remove model resident time |
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