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大尺寸光学元件在位动态干涉拼接测量系统
引用本文:于瀛洁,齐特,武欣.大尺寸光学元件在位动态干涉拼接测量系统[J].光学精密工程,2017,25(7):1764-1770.
作者姓名:于瀛洁  齐特  武欣
作者单位:上海大学 机电工程及自动化学院, 上海 200072
基金项目:国家重大科技专项,国家自然科学基金资助项目
摘    要:为了满足车间条件下大口径光学元件的高精度在位、在线检测的迫切需求,本文构建了一个适于一般环境下应用的动态干涉拼接测量实验系统。该系统由动态干涉仪、二维移动平台、控制系统及拼接软件等部分构成。应用该系统对200mm×300mm×20mm的光学元件在一般应用环境下进行了拼接测量实验,采用误差均化拼接算法进行拼接,并对拼接后的结果进行分析处理,比较拼接测量与全口径测量结果,PV值的相对误差为3.1%,RMS值的相对误差为1.6%,Power值的相对误差为2.1%。该系统为在车间环境下建立大口径光学元件在位检测建立了基础。

关 键 词:光学检测  子孔径拼接  动态干涉仪  大口径光学元件  误差均化拼接
收稿时间:2017-01-19

On-line dynamic interference stitching measurement system for large optical elements
YU Ying-jie,QI Te,WU Xin.On-line dynamic interference stitching measurement system for large optical elements[J].Optics and Precision Engineering,2017,25(7):1764-1770.
Authors:YU Ying-jie  QI Te  WU Xin
Affiliation:Department of Precision Mechanical Engineering, Shanghai University, Shanghai 200072, China
Abstract:In order to realize on-line and in-situ measurement of high precision optical elements in workshop,a dynamic interference stitching system for large optical elements measured in general environment was investigated.The system was consisted of a dynamic interferometer,twodimensional mobile platform,control system and stitching software.A stitching experiment for an 200 mm× 300 mm optical element was completed by this system in general environment,based on error averaging stitching algorithm.Moreover,the stitching results were analyzed.Comparing the results between stitching measurement and full aperture measurement,the relative deviations of PV,RMS and Power are 3.1 %,1.6 % and 2.1% respectively.The system lays a foundation for the online and in-situ measurement system for large optical elements in the workshop environment.
Keywords:optical testing  sub-aperture stitching  dynamic interferometer  large optical elements  error average stitching
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