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米级弯月面化学薄膜涂覆装备的研制
引用本文:徐佳,许文斌,卜和阳,卢振武,刘正坤,洪义麟,鱼卫星.米级弯月面化学薄膜涂覆装备的研制[J].光学精密工程,2017,25(1):133-140.
作者姓名:徐佳  许文斌  卜和阳  卢振武  刘正坤  洪义麟  鱼卫星
作者单位:1. 中国科学院 长春光学精密机械与物理研究所, 吉林 长春 130033;2. 中国科学技术大学, 安徽 合肥 230026;3. 中国科学院 西安光学精密机械研究所, 陕西 西安 710119
基金项目:国际科技重大专项资助项目,国家自然科学基金资助项目,2014年吉林省博士后科研项目
摘    要:弯月面化学涂膜技术因其具有大面积、低成本以及高效率等优势成为继旋涂、喷涂等传统涂膜工艺后极具发展潜力的新型化学薄膜涂覆技术。本文针对国家某重大项目对米级光学元件表面的化学薄膜涂覆需求,对基于弯月面涂胶的技术原理进行了系统研究,分析了涂胶压强、基片和狭缝间距以及材料亲疏水性与涂胶面形态的关系,实现了对弯月液面的精密调控并研制出基于弯月面化学薄膜涂覆技术的装备,在1 400mm×420mm尺寸玻璃基片上实现了光刻胶的均匀涂覆,使整体胶膜厚度误差4%,满足了米级元件表面精密化学薄膜的涂覆需求。

关 键 词:弯月面  大面积  涂胶  液面调控  光学元件
收稿时间:2016-06-20

Meter-scale thin film coating equipment based on meniscus-coating technology
XU Jia,XU Wen-bin,BU He-yang,LU Zheng-wu,LIU Zheng-kun,HONG Yi-lin,YU Wei-xing.Meter-scale thin film coating equipment based on meniscus-coating technology[J].Optics and Precision Engineering,2017,25(1):133-140.
Authors:XU Jia  XU Wen-bin  BU He-yang  LU Zheng-wu  LIU Zheng-kun  HONG Yi-lin  YU Wei-xing
Affiliation:1. Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;2. University of Science and Technology of China, Hefei 230026, China;3. Key Laboratory of Spectral Imaging Technology of CAS, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Changchun 710119, China
Abstract:The meniscus chemical coating technology becomes a very promising new chemical thin-film coating technology after traditional coating technologies such as spin-coating and spray coating due to its merits of large area, low-cost and high efficiency. To meet the requirements of one national major projects on the meter-scale chemical thin film coating of optical component surface, based on the systematical research of the meniscus chemical film coating principal, static and dynamic gluing experiments were respectively conducted, and the relationships among the gluing pressure, the gap between substrate and slit, the material hydrophobicity and the morphology of meniscus were analyzed, then the fine tuning of the meniscus could be achieved and equipment based on the meniscus chemical thin film coating technology was developed. The coating uniformity of photo-resist was realized using this equipment on the glass substrate sizing 1 400 mm×420 mm, making overall coating thickness error less than 4% and satisfying coating requirements of meter-scale chemical precision thin film coating of optical component surface.
Keywords:chemical coating  optical components  meniscus  large area  gluing  liquid level regulation
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