| LIGA技术基础研究 |
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| 引用本文： | 孙华燕,周道炳,李生良.LIGA技术基础研究[J].光学精密工程,2000,8(1):38-41. |
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| 作者姓名： | 孙华燕 周道炳 李生良 |
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| 作者单位： | 装备指挥技术学院,北京怀柔,101416 |
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| 基金项目： | 国家攀登计划，北京正负电子对撞机国家实验室和合肥国家同步辐射实验室资助 |
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| 摘 要： | 阐述了LIGA技术的组成及特点.对LIGA工艺掩膜、X射线光刻、电铸及塑铸等进行了工艺原理分析.用一次成型法制作了以聚酰亚胺为衬基、以Au为吸收体的X射线光刻掩膜.简单介绍了这种掩膜的制作工艺过程,并用这种掩膜在北京电子对撞机国家实验室进行了同步辐射X射线光刻,得到了深度为500μm,深宽比达8.3的PMMA材料的微型电磁马达联轴器结构.给出掩膜和X射线光刻照片.同时,对Au、Ni等金属材料的厚膜电铸进行了工艺研究.
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| 关 键 词： | LIGA技术 光刻 掩膜 电铸 |
| 收稿时间： | 1999-08-25 |
| 修稿时间： | : |
The study of LIGA technology |
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| LIANG Jing qiu,YAO Jin song.The study of LIGA technology[J].Optics and Precision Engineering,2000,8(1):38-41. |
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| Authors: | LIANG Jing qiu YAO Jin song |
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| Affiliation: | Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130021, China |
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| Abstract: | The composition and feature of LIGA technology was explicated. The principles of LIGA process on mask, X-ray lithography, electroform and model were analyzed. The X-ray lithography mask using polyamide as substrate and using Au as a absorber was fabricated by one step forming. The synchronous radiation X-ray lithography experiment using this kind of mask was made in Beijing Key Lab of the Synchronous Radiation. The PMMA linkage structure of micro electromagnetic motor with depth of 500μm and depth-width radio of 8.3 was made. The SEM photo of X-ray lithography and mask was given. The electroform technique of Au and Ni metal thick film were studied, too. |
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| Keywords: | LIGA technology lithography mask electroform |
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