基于离子束溅射Ta2O5薄膜的紫外吸收膜技术

为获得高性能紫外激光薄膜元件,急需研制紫外高反射吸收薄膜,实现吸收损耗的精确测量。本文采用离子束溅射技术,通过调控氧气流量实现了具有不同吸收的Ta_2O_5薄膜的制备。以Ta_2O_5薄膜作为高折射率材料,设计了355nm的紫外高反射吸收薄膜。采用离子束溅射沉积技术,在熔融石英基底上制备了355nm的吸收薄膜,对于A=5%的紫外吸收光谱,在355nm的透射率、反射率和吸收率分别为0.1%,95.0%和4.9%;对于A=12%的紫外吸收光谱,在355nm的透射率、反射率和吸收率分别为0.1%,87.4%和12.5%。实验结果表明,采用离子束溅射沉积技术,可以实现不同吸收率的355nm高反射吸收薄膜的制备,对于基于光热偏转测量技术的紫外光学薄膜弱吸收测量仪的定标具有重要的意义。

Ultraviolet absorption film technology based on ion beam sputtering Ta2O5 thin films

With the rapid development of ultraviolet laser technology, the performance of ultraviolet laser films is becoming more and more demanding. In order to obtain the accurate measurement of absorption loss of ultraviolet laser thin film, it is necessary to develop ultraviolet high reflection absorption film and calibrate the ultraviolet absorption loss measuring instrument. In this paper, Ta2O5 thin films with different absorption were deposited on fused quartz substrate using ion beam sputtering technique by changing the oxygen flow. Ta2O5 thin films were selected as high refractive index materials, and the UV high reflectance absorption thin films of 355nm were designed. Two kinds of 355nm absorption films were prepared on fused quartz substrates by ion beam sputtering deposition technique. The transmissivity, reflectivity and absorptivity at the wavelength of 355nm were 0.1%, 95.0% and 4.9% for 5% UV absorption spectra, respectively. The transmissivity, reflectivity and absorptivity at the wavelength of 355nm were 0.1%, 87.4% and 12.5%, respectively. The experimental results show that the preparation of high reflectance thin films of 355nm with different absorptivity can be prepared by ion beam sputtering deposition, which is of great significance to the calibration of UV thin film weak absorption measuring instrument based on photothermal deflection measurement technology.