| 同步辐射X射线光刻掩模镀金工艺的研究 |
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| 引用本文： | 陈颖新 王飞. 同步辐射X射线光刻掩模镀金工艺的研究[J]. 仪表技术与传感器, 1996, 0(12): 16-18 |
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| 作者姓名： | 陈颖新 王飞 |
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| 作者单位： | 长春光机所微型机械工程研究室，长春光机所微型机械工程研究室 长春市 130022，长春市 130022 |
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| 基金项目： | 国家自然科学基金资助课题 |
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| 摘 要： | 介绍了利用北京正负对撞机(BEPC)同步辐射X射线光刻装置,进行LIGA工艺技术深结构光刻实验研究,详细论述了X射线光刻使用的掩模制备过程及掩模镀金工艺,在国内最早曝光出直径为400μm、厚为27～45μm的三维立体齿轮胶图形。
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| 关 键 词： | 同步辐射 X射线 掩模制备 镀金工艺 |
Research on Process of Mask Au-Plating in Synchrotron Radiation X-Ray Lithography |
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| Chen Yingxin,and Wang FeiMicromechanical Lab.,Changchun Institute of Optics and Fine Mechanics,Academia Sinica,Changchun .. Research on Process of Mask Au-Plating in Synchrotron Radiation X-Ray Lithography[J]. Instrument Technique and Sensor, 1996, 0(12): 16-18 |
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| Authors: | Chen Yingxin and Wang FeiMicromechanical Lab. Changchun Institute of Optics Fine Mechanics Academia Sinica Changchun . |
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| Affiliation: | Chen Yingxin,and Wang FeiMicromechanical Lab.,Changchun Institute of Optics and Fine Mechanics,Academia Sinica,Changchun 130022. |
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| Abstract: | An experimental research on deep lithography through the LIGA technique by utilizing the synchrotron radiation X-ray lithographic equipment of BEPC, is presented in this paper. The procedures of mask fabrication and processes of mask Au-plating used in X-ray lithography are discussed in detail. For the first time in China, a 400 diameter and 27-45 thick 3-D gear pattern has been exposed. |
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| Keywords: | Synchrotron Radiation X-Ray Mask Fabrication Au-Plating. |
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