| 光刻机技术现状及发展趋势 |
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| 引用本文： | 彭祎帆,袁波,曹向群.光刻机技术现状及发展趋势[J].光学仪器,2010,32(4):80-85. |
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| 作者姓名： | 彭祎帆 袁波 曹向群 |
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| 作者单位： | 浙江大学,现代光学仪器国家重点实验室,国家光学仪器工程技术研究中心,浙江,杭州,310027 |
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| 基金项目： | "国家大学生创新性实验计划"资助项目 |
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| 摘 要： | 主要介绍了大规模集成电路制造中光刻工艺的技术现状和发展趋势。首先,在调研光刻机的研发和生产情况的基础上讨论了国内外光刻技术的现状;其次,重点分析了目前用于提高光刻机性能的各种关键技术;最后,简要介绍了下一代光刻技术的研究进展和发展方向。
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| 关 键 词： | 光刻机 技术现状 发展趋势 |
Technical status and developing trend of lithographic tools |
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| PENG Yifan,YUAN Bo,CAO Xiangqun.Technical status and developing trend of lithographic tools[J].Optical Instruments,2010,32(4):80-85. |
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| Authors: | PENG Yifan YUAN Bo CAO Xiangqun |
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| Affiliation: | (NERC for Optical Instrument, Stale Key Laboratory of Modern Optieal Instrumentation,Zhejiang University, Hangzhou 310027, China) |
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| Abstract: | This paper mainly presents the technical status and developing trend of lithography, which is used in the manufacture of large-scale integrated circuit. Firstly, the status of lithography technology at home and abroad is discussed on the basis of the investigation for the research and production of lithographic tools. Then several key techniques to improve the performance of lithographic tools are emphatically analyzed. In the end, the research progress and developing direction of the next-generation lithography are briefly introduced. |
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| Keywords: | lithographic tools technical status developing trend |
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