| 柔性衬底直流磁控溅射ZnO基高性能透明导电薄膜的制备及性能研究 |
| |
| 引用本文： | 张涛,洪瑞金,张大伟,陶春先.柔性衬底直流磁控溅射ZnO基高性能透明导电薄膜的制备及性能研究[J].光学仪器,2018,40(2):77-84. |
| |
| 作者姓名： | 张涛 洪瑞金 张大伟 陶春先 |
| |
| 作者单位： | 上海理工大学光电信息与计算机工程学院;上海理工大学上海市现代系统光学重点实验室 |
| |
| 基金项目： | 国家重点研发与发展资助项目（2016YFB1102303）；国家自然科学基金资助项目（61775140、61775141） |
| |
| 摘 要： | 采用直流磁控溅射法,以柔性PET(聚对苯二甲酸乙二醇酯)为基底,通过参数优化以求在室温下制备高性能ZnO/Ag/ZnO多层薄膜。实验中,使用X射线衍射仪(XRD)、原子力显微镜(AFM)、紫外-可见分光光度计、四探针电阻测试仪等仪器分别对ZnO/Ag/ZnO多层薄膜的微观结构、表面形貌、透过率及方块电阻进行测试及表征。结果表明,随着Ag层厚度增加,薄膜方块电阻急剧下降,通过改变ZnO层厚度,可有效调节薄膜光学性能,随着ZnO层厚度增加,可见光区平均透过率先增大后减小。引入品质因子FTC作为评价指标可知,当依次沉积ZnO、Ag、ZnO厚度为50nm、8nm、50nm时,薄膜光电性能最佳,其在可见光平均透过率为82.3%、方块电阻为2.8Ω/、禁带宽度为3.332eV。
|
| 关 键 词： | ZnO薄膜 磁控溅射 透明导电薄膜 光电特性 |
| 收稿时间： | 2017/8/24 0:00:00 |
Study on the preparation and properties of ZnO based high-performance transparent conductive thin films on flexible substrates by direct current magnetron sputtering |
| |
| ZHANG Tao,HONG Ruijin,ZHANG Dawei and TAO Chunxian.Study on the preparation and properties of ZnO based high-performance transparent conductive thin films on flexible substrates by direct current magnetron sputtering[J].Optical Instruments,2018,40(2):77-84. |
| |
| Authors: | ZHANG Tao HONG Ruijin ZHANG Dawei and TAO Chunxian |
| |
| Affiliation: | School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China,School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China,School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China and School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China |
| |
| Abstract: | The high-performance ZnO/Ag/ZnO multilayers are prepared by direct current(DC) magnetron sputtering on a flexible polyethylene terephthalate(PET) as substrate at room temperature and optimized by changing parameters.The microstructure,surface morphology,optical transmittance and sheet resistance of multilayers were measured by X-ray diffraction(XRD),atomic force microscopy(AFM),UV-VIS spectrophotometer and four-probe resistance tester,respectively.The results show that the sheet resistance decreases rapidly with the increase of the Ag layer thickness.The optical properties can be adjusted effectively by changing the thickness of ZnO layer.The average transmittance of the visible region increases firstly and then decreases with the increase of the Ag layer thickness.The quality factor FTC was introduced as the evaluation index.As the thickness of ZnO and Ag is 50nm and 8nm respectively,the photoelectric performance of multilayers is optimal.The average transmittance of visible light is 83.2%.The sheet resistance is 2.4 ohm/sq and the optical energy band gap is 3.332 eV. |
| |
| Keywords: | ZnO thin film magnetron sputtering transparent conductive film photoelectric characteristics |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《光学仪器》浏览原始摘要信息 |
|
点击此处可从《光学仪器》下载全文 |
|
