| Al、Sn掺杂对于ZnO薄膜微结构及光学特性的影响 |
| |
| 引用本文： | 脱文刚,洪瑞金,张大伟,陶春先.Al、Sn掺杂对于ZnO薄膜微结构及光学特性的影响[J].光学仪器,2015,37(3):278-282. |
| |
| 作者姓名： | 脱文刚 洪瑞金 张大伟 陶春先 |
| |
| 作者单位： | 上海理工大学 光电信息与计算机工程学院, 上海 200093,上海理工大学 光电信息与计算机工程学院, 上海 200093;上海理工大学 上海市现代系统光学重点实验室, 上海 200093,上海理工大学 光电信息与计算机工程学院, 上海 200093;上海理工大学 上海市现代系统光学重点实验室, 上海 200093,上海理工大学 光电信息与计算机工程学院, 上海 200093;上海理工大学 上海市现代系统光学重点实验室, 上海 200093 |
| |
| 基金项目： | 国家高技术研究发展计划(863计划)资助项目(2013AA030602);上海市自然科学基金资助项目(13ZR1427800);国家自然科学基金资助项目(61176085、11105149) |
| |
| 摘 要： | 采用真空电子束蒸发金属薄膜及后续热氧化技术在石英衬底上分别制备出了ZnO、Al∶ZnO以及Sn∶ZnO薄膜。通过X射线衍射仪(XRD),紫外-可见分光光度计和原子力显微镜(AFM)等分析仪器对比研究了Al、Sn掺杂对ZnO薄膜结晶质量、光学性质及表面形貌的影响。测试结果表明,Al、Sn掺杂可以使薄膜结晶质量得到提高,薄膜应力部分释放,薄膜表面的粗糙度也相应增加,掺杂对薄膜光学带隙的影响在一定程度取决于金属薄膜的氧化程度,氧化充分可以使光学带隙变宽,反之则变窄。
|
| 关 键 词： | ZnO薄膜 热氧化 掺杂 可见光谱 微结构 |
| 收稿时间： | 2014/11/4 0:00:00 |
The microstrcuture and optical properties of Al,Sn doped ZnO thin film |
| |
| TUO Wengang,HONG Ruijin,ZHANG Dawei and TAO Chunxian.The microstrcuture and optical properties of Al,Sn doped ZnO thin film[J].Optical Instruments,2015,37(3):278-282. |
| |
| Authors: | TUO Wengang HONG Ruijin ZHANG Dawei and TAO Chunxian |
| |
| Affiliation: | School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China,School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China,School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China and School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China |
| |
| Abstract: | ZnO, Al:ZnO and Sn:ZnO thin film were obtained by thermal oxidation metal or alloy films deposited by vacuum electron beam evaporation technology. The effects of different dopants on the microstructure and optical properties of ZnO thin films were investigated by X-ray diffraction(XRD), optical transmittance, absorption and atomic force microscopy (AFM) measurement. The characterization results indicate that the metal doping has the effect of improving the crystal quality, partially releasing the stress and increasing the surface roughness of the film. The effect of dopant on the optical band-gap of the film depends on the oxidation level of the metal film. |
| |
| Keywords: | ZnO thin film thermal oxidation dopants visible spectrum microstructure |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
| 点击此处可从《光学仪器》浏览原始摘要信息 |
|
点击此处可从《光学仪器》下载全文 |
|
