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二元光学元件激光直接写入设备的研制
引用本文:张景和,廖江红,刘伟,冯晓国.二元光学元件激光直接写入设备的研制[J].仪器仪表学报,2001,22(2):154-157.
作者姓名:张景和  廖江红  刘伟  冯晓国
作者单位:中国科学院长春光学精密机械与物理研究所 长春 130021
摘    要:本文介绍了二元光学元件制作的基本情况,国外制作二元光学元件设备的发展情况及国内制作二元光学元件设备的现状。重点介绍了长春光机所研制的二元光学元件激光直接写入设备中机械总体方面的主要关键技术,给出了导轨、传动系统、回转轴系、调焦伺服机构的主要技术指标和完成情况。另外还介绍了临界角法的调焦原理及实现光学调焦的调焦机构。

关 键 词:二元光学元件  激光直写设备  临界角法  研制  导轨  传动系统  回转轴系  调焦伺服机构
修稿时间:1999年12月1日

Manufacture of Laser Direct Lithography Equipment of Binary Optics Elements
Zhang Jinghe,Liao Jianghong,Liu Wei,Feng Xiaoguo.Manufacture of Laser Direct Lithography Equipment of Binary Optics Elements[J].Chinese Journal of Scientific Instrument,2001,22(2):154-157.
Authors:Zhang Jinghe  Liao Jianghong  Liu Wei  Feng Xiaoguo
Abstract:The paper describes the development state of manufacturing binary optical element's equipment in abroad and the present situation of it in home. It explains mainly essential techniques on the mechanical overall aspect on binary optical element's laser direct lithography equipment which has been manufactured by us. Simultaneous, it still gives the essential technology indexes and development state of slideway, transmission systems, round journal and focusing servo. The paper also introduces the focusing principle of critical angle and focusing mechanism of achieving optical focusing.
Keywords:Binary optical elements  Laser direct lithography equipment  Critical angle  
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