| 薄膜抛光实验平台设计开发的研究 |
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| 引用本文： | 杨浩,董丽华,范春华.薄膜抛光实验平台设计开发的研究[J].机械工程师,2006(3):77-79. |
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| 作者姓名： | 杨浩 董丽华 范春华 |
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| 作者单位： | 上海海事大学,物流工程学院,上海,200135 |
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| 基金项目： | 上海市教委"曙光计划" |
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| 摘 要： | 薄膜抛光技术是超精密磨削领域中一种新兴的磨削技术。文中以MCS51系列单片机为核心,结合研磨抛光薄膜以及自制便携式抛光机的特点,设计开发了薄膜抛光实验的测力平台。该平台主要用于薄膜抛光过程中磨削力的实时监测,分析磨削力对抛光精度的影响,有助于研究抛光膜损伤机理与磨削力、工艺参数之间的关系。
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| 关 键 词： | 薄膜抛光 单片机 实验平台 |
| 文章编号： | 1002-2333(2006)03-0077-03 |
| 收稿时间： | 2005-12-21 |
| 修稿时间： | 2005年12月21 |
A Study of Polishing Experiment Platform Design |
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| YANG Hao,DONG Li-hua,FAN Chun-hua.A Study of Polishing Experiment Platform Design[J].Mechanical Engineer,2006(3):77-79. |
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| Authors: | YANG Hao DONG Li-hua FAN Chun-hua |
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| Affiliation: | Logistics Engineering College of Shanghai Maritime University, shanghai, 200135, China |
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| Abstract: | The polishing technology of membrane is a new grinding technology in the field of ultra-precision manufacture. According to the characteristics of grinding polishing film and portable polishing machine made by ourselves, this paper has designed and developed a polishing experiment platform on the basis of MCS51 series. The platform is used to monitor the grinding strength in the course of polishing. It would be helpful to study the relation among abrasion mechanism, grinding strength and technology parameters by analyzing the influence of the strength to the polishing precision. |
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| Keywords: | polishing film single chip micyoco experiment platform |
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