论真空镀膜射频叠加直流偏压工艺

VCT(Vacuum coating technology真空镀膜技术)是现阶段较为先进的材料合成及加工技术,系统经VC(Vacuum chamber真空室)、泵组、电源以及控制系统构成。VCT的电源是整个工艺的主要构成因子,VCT的电源性能会从根本影响镀膜工艺的流畅性和质量。目前RF辉光放电镀膜装置大多以RFPS(Radio Frequency power supply射频电源)为主,而经调整VC内环境去改变VC两侧偏压系数,具有较强的制约性。为了从根本改善镀膜工艺,要设计出RF和DC(直流电源powerDC)双系统,经调节DC的输出去改变VC两侧的负偏压系数,这也是现阶段业内所面对的主要课题。

On the Process of Vacuum Coating Radio Frequency Superimposed DC Bias

VCT(Vacuum coating technology)is a relatively advanced material synthesis and processing technology at this stage.The system is composed of VC(Vacuum chamber),pumps,power supplies and control systems.The power supply of VCT is the main component of the whole process,and the power performance of VCT will fundamentally affect the fluency and quality of the coating process.Currently,most of the RF glow discharge electroplating film devices are based on RFPS(Radio Frequency power supply),and the internal environment of the VC is adjusted to change the bias coefficient on both sides of the VC,which has a strong restriction.In order to fundamentally improve the coating process,it is necessary to design a dual system of RF and DC(powerDC),and adjust the DC output to change the negative bias coefficient on both sides of the VC.This is also the main issue facing the industry at this stage.