Aluminum‐enhanced alkali diffusion from float glass to PVD‐sputtered silica thin films |
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| Authors: | Jean‐Thomas Fonné Ekaterina Burov Emmanuelle Gouillart Sergey Grachev Hervé Montigaud Damien Vandembroucq |
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| Affiliation: | 1. Surface du Verre et Interfaces, UMR 125 CNRS/Saint‐Gobain, Aubervilliers, France;2. Laboratoire PMMH, UMR 7636 CNRS/ESPCI/Univ. Paris 6 UPMC/Univ. Paris 7 Diderot, Paris Cedex 05, France |
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| Abstract: | Interdiffusion processes between aluminum enriched PVD‐sputtered silica thin films and industrial float soda‐lime silicate glass substrates are quantitatively studied using SIMS analysis. Heat treatments are performed at temperatures close or above the glass transition temperature of the float glass. Aluminum doping of the film is shown to strongly increase the migration of alkali from the glass substrate to the silica thin film. In particular the final alkali content in the film exhibits a linear scaling with the aluminum concentration. An interdiffusion process is evidenced between bulk alkali ions and protons originating from a significant water content in the as‐deposited silica film. Experimental measurements of sodium concentration are shown to be consistent with a simple thermodynamic model based on the equilibration of the activity of sodium between the film and the glass substrate. |
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| Keywords: | diffusion/diffusivity silica soda‐lime‐silica thermal treatment thin films |
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