| 激光能量对沉积纳米Si薄膜晶粒尺寸的影响 |
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| 引用本文： | 陈俊领,段国平,黄明举. 激光能量对沉积纳米Si薄膜晶粒尺寸的影响[J]. 激光技术, 2012, 36(3): 322-325 |
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| 作者姓名： | 陈俊领 段国平 黄明举 |
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| 作者单位： | 1.河南大学 物理与电子学院 河南省光电信息材料与器件重点学科开放实验室 开封 475001 |
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| 基金项目： | 省部共建河南大学科研基金资助项目(SBGJ090513) |
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| 摘 要： | 为了制备纳米硅薄膜,采用脉冲激光沉积系统,保持靶材和衬底间距不变,在不同激光能量条件下,得到一系列纳米Si薄膜。利用喇曼散射光谱和X射线衍射谱对晶粒尺寸进行了计算和分析,取得了几组数据。结果表明,改变脉冲激光能量时,纳米Si晶粒平均尺寸均随能量的增强先增大后减小;在单脉冲能量为300mJ时制备的纳米Si晶粒平均尺寸最大,为8.58nm。这一结果对纳米硅薄膜制备的研究有积极意义。
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| 关 键 词： | 薄膜 纳米硅晶粒 脉冲激光能量密度 Raman谱 X射线衍射谱 |
| 收稿时间： | 2011-07-27 |
Influence of laser energy on average size of Si nanoparticles deposited in thin film |
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| CHEN Jun-ling , DUAN Guo-ping , HUANG Ming-ju. Influence of laser energy on average size of Si nanoparticles deposited in thin film[J]. Laser Technology, 2012, 36(3): 322-325 |
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| Authors: | CHEN Jun-ling DUAN Guo-ping HUANG Ming-ju |
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| Affiliation: | (Open Laboratory of Key Subject of Photoelectric Information Material and Devices of Henan Province,School of Physics and Electron,Henan University,Kaifeng 475001,China) |
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| Abstract: | A series of nano-crystalline silicon films were deposited maintaining the same distance between the target and substrate by means of a pulse laser deposition system. The crystalline volume fraction of films and the average grain size were calculated based on Raman scattering and X-ray diffraction spectra. The results show that with the increase of the pulse energy, the average grain size becomes larger at first, and then goes smaller. The largest average grain size is 8.58nm when the pulse laser energy is 300mJ. The results have positive significance to the preparation of nano-crystalline silicon thin film. |
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| Keywords: | thin films nano-crystalline silicon pulse laser energy intensity Raman spectra X-ray diffraction spectra |
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