首页 | 本学科首页   官方微博 | 高级检索  
     

ChCl-urea-ZnO-Cu2O低共熔溶剂电镀铜锌合金
引用本文:刘海,徐存英,唐杰,朱啸林,王祥,黄梦婷,华一新,张启波. ChCl-urea-ZnO-Cu2O低共熔溶剂电镀铜锌合金[J]. 化工学报, 2018, 69(10): 4402-4408. DOI: 10.11949/j.issn.0438-1157.20180649
作者姓名:刘海  徐存英  唐杰  朱啸林  王祥  黄梦婷  华一新  张启波
作者单位:昆明理工大学冶金与能源工程学院, 云南 昆明 650093
基金项目:国家自然科学基金项目(21263007);国家重点基础研发展计划项目(2014CB643404)。
摘    要:以ChCl-urea-ZnO-Cu2O低共熔溶剂为电解质在343 K镍基体上电沉积制备得到了铜锌合金镀层。伏安曲线测试表明在沉积过程中,镍基体能够诱导金属Zn发生欠电位沉积,从而实现了Cu-Zn合金的共沉积。同时研究了沉积电势对镀层成分和形貌的影响,结果表明:沉积电势由-0.85 V (vs Ag)增加到-1.3 V (vs Ag)时,合金镀层中Zn原子百分数从0升高到76.29%。在沉积电势为-1.10~-1.15 V范围内,Zn原子百分数为12.5%~20.81%时,镀层平整致密,颜色为金色,达到仿金镀的效果。

关 键 词:铜锌合金  低共熔溶剂  共沉积  仿金镀    沉积物  电化学  
收稿时间:2018-06-13
修稿时间:2018-07-30

Electroplating of Zn-Cu alloys in ChCl-urea-ZnO-Cu2O deep eutectic solvents
LIU Hai,XU Cunying,TANG Jie,ZHU Xiaolin,WANG Xiang,HUANG Mengting,HUA Yixin,ZHANG Qibo. Electroplating of Zn-Cu alloys in ChCl-urea-ZnO-Cu2O deep eutectic solvents[J]. Journal of Chemical Industry and Engineering(China), 2018, 69(10): 4402-4408. DOI: 10.11949/j.issn.0438-1157.20180649
Authors:LIU Hai  XU Cunying  TANG Jie  ZHU Xiaolin  WANG Xiang  HUANG Mengting  HUA Yixin  ZHANG Qibo
Affiliation:College of Metallurgical and Energy Engineering, Kunming University of Science and Technology, Kunming 650093, Yunnan, China
Abstract:Cu-Zn alloy was electrodeposited on nickel substrate in ChCl-urea-ZnO-Cu2O deep eutectic solvents at 343 K. The voltammetric curve test shows that cluring the deposition process, the nickel matrix can induce the underpotential deposition of the metallic Zn, thus achieving the co-deposition of the Cu-Zn alloy. The effects of deposition potential on composition, surface and morphology of Cu-Zn alloy coatings were also studied. The results indicate that when deposition potential negatively shifts from -0.85 V(vs Ag) to -1.30 V (vs Ag), the Zn content in the alloy increases from 0 to 76.29%(atom). When deposition potential is located in the range of -1.10——1.15 V, the content of Zn is in the range of 12.5%(atom)-20.81%(atom), the alloy coating is golden. Thus, the imitating Gold plating can be achieved in ChCl-urea-ZnO-Cu2O deep eutectic solvents by controlling a suitable deposition potential.
Keywords:Cu-Zn alloys  deep eutectic solvent  co-deposition  imitating gold plating  membranes  deposition  electrochemistry  
点击此处可从《化工学报》浏览原始摘要信息
点击此处可从《化工学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号