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Highly Robust Transparent and Conductive Gas Diffusion Barriers Based on Tin Oxide
Authors:Andreas Behrendt  Christian Friedenberger  Tobias Gahlmann  Sara Trost  Tim Becker  Kirill Zilberberg  Andreas Polywka  Patrick Görrn  Thomas Riedl
Affiliation:1. Institute of Electronic Devices, University of Wuppertal, Wuppertal, Germany;2. Electronic Materials and Nanoelectronics, Ruhr‐Universit?t Bochum, Bochum, Germany;3. Chair of Large Area Optoelectronics, University of Wuppertal, Wuppertal, Germany
Abstract:
Keywords:atomic layer deposition  organic electronics  tin oxide  transparent and conductive gas diffusion barriers  transparent electrodes
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