| 退火温度对HfO2薄膜应力和光学特性的影响 |
| |
| 引用本文： | 齐瑞云,吴福全,郝殿中,王庆,吴闻迪. 退火温度对HfO2薄膜应力和光学特性的影响[J]. 激光技术, 2011, 35(2): 182-184,188. DOI: 10.3969/j.issn.1001-3806.2011.02.011 |
| |
| 作者姓名： | 齐瑞云 吴福全 郝殿中 王庆 吴闻迪 |
| |
| 作者单位： | 1.曲阜师范大学激光研究所山东省激光偏光与信息技术重点实验室, 曲阜, 273165 |
| |
| 摘 要： | 为了研究退火温度对HfO2薄膜应力、光学常数和表面粗糙度的影响,采用电子枪蒸镀法制备了薄膜样品,在不同温度下进行了退火处理.利用ZYGO干涉仪、UV-3101PC分光光度计、X射线衍射仪和冷场发射扫描电镜对样品进行了测试.结果表明,在本实验条件下制备的HfO2薄膜都是无定形结构;残余应力均为张应力,且随退火温度的升高呈...
|
| 关 键 词： | 薄膜 HfO2薄膜 残余应力 退火 微结构 折射率 |
| 收稿时间： | 2010-06-18 |
Effect of annealing temperature on stress and optical properties of hafnium dioxide film |
| |
| QI Rui-yun,WU Fu-quan,HAO Dian-zhong,WANG Qing,WU Wen-di. Effect of annealing temperature on stress and optical properties of hafnium dioxide film[J]. Laser Technology, 2011, 35(2): 182-184,188. DOI: 10.3969/j.issn.1001-3806.2011.02.011 |
| |
| Authors: | QI Rui-yun WU Fu-quan HAO Dian-zhong WANG Qing WU Wen-di |
| |
| Abstract: | In order to study the effect of annealing temperature on the stress,optical constants and surface roughness of HfO2 film,the film specimen was fabricated with electron beam evaporation method,then annealed at different temperatures.The film specimen was tested with interferometer,UV-3101PC spectrophotometer,X-ray diffraction instrument and emission scanning electron microscopy.The experimental results show that the HfO2 film is amorphous under the experimental conditions.The residual stress is tensile stress,first decreases and then increases with annealing temperature,and achieve to the minimum at 300℃.The refractive index increases with annealing temperature,however the dispersion decreases with the annealing temperature.The film roughness annealing at low temperature is smaller than that at high temperature.These results can provide reference for the preparation of high-quality HfO2 films. |
| |
| Keywords: | |
| 本文献已被 万方数据 等数据库收录！ |
| 点击此处可从《激光技术》浏览原始摘要信息 |
|
点击此处可从《激光技术》下载免费的PDF全文 |
|
