用正向栅控二极管的方法对场效应晶体管的参数提取

本文用正向栅控二极管的方法来提取场效应晶体管的栅氧层厚度和体掺杂浓度,尤其是在这两个变量事先都未知的情况下进行提取。首先,用器件物理推导出了以栅氧层厚度、体掺杂浓度为参数的正向栅控二极管峰值电流。然后用ISE-Dessis模拟了不同栅氧层厚度和体衬底掺杂浓度下的产生复合电流峰值的特性,用于参数提取。模拟数据的结果与正向栅控二极管的方法显示出高度的一致性。     

FORWARD GATED—DIODE METHOD FOR DIRECTLY MEASURING STRESS—INDUCED INTERFACE TRAPS IN NMOSFET／SOI

Forward gated-diode Recombination-Generation(R-G) current method is applied to an NMOSFET/SOI to measure the stress-induced interface traps in this letter.This easy but accurate experimental method can directly give stress-induced average interface traps for characterizing the device‘s hot carrier characteristics.For the tested device, an expected power law relationship of Δnit-t^0.787 between pure stress-induced interface traps and accumulated stressing time is obtained.     

FORWARD GATED—DIODE METHOD FOR EXTRACTING HOT—CARRIER—STRESS0INDUCED BACK INTERFACE TRAPS IN SOI／NMOSFETs

The forward gated-diode R-G current method for extracting the hot-carrier-stress-induced back interface traps in SOI/NMOSFET devices has been demonstrated in this letter. This easy and accurate experimental method directly gives the induced interface trap density from the measured R-G current peak of the gated-diode architecture. An expected power law relationship between the induced back interface trap density and the accumulated stress time has been obtained.     

一种改进的LPCC参数提取方法研究

为了提高语音信号的识别率。提出了一种改进的LPCC参数提取方法。该方法先对语音信号进行预加重、分帧加窗处理。然后进行小波分解,在此基础上提取LPCC参数,从而构成新向量作为每帧信号的特征参数。最后采用高斯混合模型（GMM）进行说话人语音识别,实验表明新特征参数取得了较好的识别率。     

Small-signal modeling and parameter extraction method for a multigate GaAs pHEMT switch

This paper presents an accurate small-signal model for multi-gate GaAs pHEMTs in switching-mode.The extraction method for the proposed model is developed.A 2-gate switch structure is fabricated on a commercial 0.5μm AlGaAs/GaAs pHEMT technology to verify the proposed model.Excellent agreement has been obtained between the measured and simulated results over a wide frequency range.     

An improved and simple parameter extraction method and scaling model for RF MOSFETs up to 40 GHz

In this article, a simple and efficient extraction procedure for the extrinsic gate, drain and source resistances is presented. The substrate network parameter, C _sub, dependent on the drain–source (V _ds) voltage is extracted in transistor cut-off region. The scaling rules of the extrinsic and intrinsic parameters are given in detail. Good agreement is obtained between the simulated and measured results for the 0.13?µm radio frequency metal oxide semiconductor field effect transistors in the frequency range of 0.1–40?GHz.     

Analytical modelling for the current-voltage characteristics of undoped or lightly-doped symmetric double-gate MOSFETs

An analytical drain current model for undoped (or lightly-doped) symmetric double-gate (DG) MOSFETs is presented. This model is based on the subthreshold leakage current in weak inversion due to diffusion of carriers from source to drain and an analytical expression for the drain current in strong inversion of long-channel DG MOSFETs, both including the short-channel effects. In the saturation region, the series resistance, the channel length modulation, the surface-roughness scattering and the saturation velocity effects were also considered. The proposed model has been validated by comparing the transfer and output characteristics with simulation and experimental results.     

肖特基二极管毫米波等效电路模型参数提取方法

提出了一种肖特基二极管的毫米波等效电路模型参数提取方法。该方法利用开路测试结构确定焊盘电容,并结合短路测试结构确定馈线电感;基于直流I-V特性曲线和小信号S参数分别提取了寄生电阻并进行了对比分析;给出了本征元件随偏置电压的变化曲线。在频率高达40 GHz的范围内,截止和导通状态下S参数的模拟与测试数据吻合良好,验证了提取方法的有效性。     

Clear correspondence between gated-diode R-G current and performance degradation of SOI n-MOSFETs after F-N stress tests

A clear correspondence between the gated-diode generation-recombination (R-G) current and the per-formance degradation of an SOI n-channel MOS transistor after F-N stress tests has been demonstrated. Due to the increase of interface traps after F-N stress tests, the R-G current of the gated-diode in the SOI-MOSFET architecture increases while the performance characteristics of the MOSFET transistor such as the saturation drain current and sub-threshold slope are degraded. From a series of experimental measurements of the gated-diode and SOI-MOSFET DC characteristics, a linear decrease of the drain saturation current and increase of the threshold volt-age as well as a like-line rise of the sub-threshold swing and a corresponding degradation in the trans-conductance are also observed. These results provide theoretical and experimental evidence for us to use the gated-diode tool to monitor SOI-MOSFET degradation.     

F-N应力下SOI n-MOSFETs性能退化与栅控二极管产生-复合（G-R）电流的对应关系

本文验证了F-N应力导致的SOI n- MOSFET器件性能退化与栅控二极管的产生-复合（G-R）电流的对应关系。F-N应力导致的界面态增加会导致SOI-MOSFET结构的栅控二极管的产生-复合（G-R）电流增大,以及MOSFET饱和漏端电流,亚阈斜率等器件特性退化。通过一系列的SOI-MOSFET栅控二极管和直流特性测试,实验观察到饱和漏端电流的线性退化和阈值电压的线性增加,亚阈摆幅的类线性上升以及相应的跨导退化。理论和实验证明栅控二极管是一种很有效的监控SOI-MOSFET退化的方法。     

Diode parameter extraction by a linear cofactor difference operation method

The linear cofactor difference operator (LCDO) method, a direct parameter extraction method for general diodes, is presented. With the developed LCDO method, the extreme spectral characteristic of the diode voltage-current curves is revealed, and its extreme positions are related to the diode characteristic parameters directly. The method is applied to diodes with different sizes and temperatures, and the related characteristic parameters, such as reverse saturation current, series resistance and non-ideality factor, are extracted directly. The extraction result shows good agreement with the experimental data.     

线性余因子差分法提取二极管参数

本文介绍了一个直接提取二极管参数的方法,线性余因子差分法（LCDO）。通过使用LCDO法,得到二极管的电压-电流特性曲线的极值,根据相应的极值位置可以直接提取二极管的特性参数。利用本方法,提取不同尺寸和温度的二极管的特性参数,如反向饱和电流,串联电阻和非理想因子。提取结果与实验数据吻合的很好。     

一种改进的InP HBT小信号模型的直接提取法

提出了一种改进的直接提取方法来提取InP HBT小信号等效电路中的模型参数,并将其成功地应用InP异质结双极晶体管（HBT）小信号等效电路。在所采用的模型中考虑了分布式基极-集电极电容效应。与其他直接参数提取方法相比,该方法从外围寄生元件到内部本征元件依次进行参数提取,提取过程较为清晰。除寄生参数外,其余所有的参数计算均未经过任何简化近似。该方法依赖于S参数的测量,所有等效电路参数直接从S参数数据中提取,而无需任何基于初始值的近似。在0.1 ~ 40 GHz的频率范围内,直接提取法在InP HBT上得到了成功的验证,并在整个频率范围内得到了较好的测量结果与计算结果的一致性。     

氮化镓功率器件小信号模型参数提取算法研究

针对氮化镓高电子迁移率晶体管(GaN High Electron Mobility Transistor,GaN HEMT)小信号等效电路模型参数提取和优化过程中存在的误差累计问题,基于GaN HEMT 19元件小信号模型,提出了一种扫参与迭代相结合的参数提取算法.该算法在迭代过程中,每次使用比前一次更准确的元件值进行计算,可使结果趋向最优解.通过Mat-lab编程实现后计算结果表明,仿真与实测S参数在0.1～40 GHz频率范围内吻合良好.     

AlGaN/GaN HEMT小信号模型参数提取算法

本文采用了新型的22元件AlGaN/GaN HEMT小信号等效电路模型,较传统的模型,增加了栅漏电导Ggdf和栅源电导Ggsf来表征GaN HEMT的栅极泄漏电流。同时针对新型的栅场板、源场板结构器件,提出了一种改进的寄生电容参数提取方法,使之适用于提取非对称器件的小信号模型参数。为验证此模型,获得了S参数的测试结果和模型仿真结果,此二者的吻合度较高,表明新型的22元件小信号模型精确、稳定而且物理意义明确。     

射频MOSFET噪声模型研究

对0.13μm MOSFET噪声建模和参数提取技术进行了研究,在精确地提取了小信号模型参数之后,利用噪声相关矩阵技术从测量的散射参数和射频噪声参数直接提取了栅极感应噪声电流■、沟道噪声电流■和它们的相关系数,并用PRC模型中的参数来表示。将参数提取结果带入ADS中进行仿真,在2～8GHz频段上仿真结果与测量数据吻合良好。     

A continuous semi-empiric transfer characteristics model for surrounding gate undoped polysilicon nanowire MOSFETs

A new continuous semi-empiric compact model for the current transfer characteristics of surrounding gate undoped polycrystalline silicon (Poly-Si) nanowire (NW) MOSFETs is proposed. The model consists of a single equation based on the Lambert function, which contains only four parameters and is continuously valid and fully differentiable throughout weak and strong conduction regimes of operation. The model is tested on measured transfer characteristics of experimental devices. The extracted model parameters are used to generate transfer characteristics playbacks that are then compared to the measured data to validate the proposed model’s adequacy for these devices.     

An accurate two-dimensional CAD-oriented model of retrograde doped MOSFETs for improved short channel performance

An analytical CAD-oriented model for short channel threshold voltage of retrograde doped MOSFETs is developed. The model is extended to evaluate the drain induced barrier lowering parameter (R) and gradient of threshold voltage. The dependence of short channel threshold voltage and R on thickness of lightly doped layer (d) has also been analyzed in detail. It is shown that a retrograde doping profile reduces short channel effects to a considerable extent. A technique is developed to optimize the device parameters for minimizing short channel effects. The results so obtained are in close proximity with published data.     

一种提取开放微波传输线电磁参数的快速算法--有限元-本征函数展开结合法

基于区域分裂的思想,通过引入一虚拟圆形边界,将开放微波传输线的整个无界区域划分为圆内和圆外两部分.圆内有限区域采用通常的有限元法离散,而将整个圆外无限区域看作一个"无限大"单元,采用以本征函数展开的Fourier级数作为插值函数的离散方法.这种处理方法不仅保留了有限元法非常适合于含有复杂介质和任意柱(带)状导体的特点,同时也能很好地把有限元方法的求解区域推广至无穷远,从而形成了一种提取开放微波传输线电磁参数的快速算法:有限元-本征函数展开结合法.文中对几种(耦合)微带线的实例计算表明,该方法精度高、速度快、简单易行并且对结构的适应性强.     

基于BSIM3的低温MOSFET模型及参数提取

器件模型作为工艺与设计之间的接口,对保证集成电路设计成功具有决定意义.本文介绍了BSIM3模型的原理,并完成了低温下(77K) BSIM3模型的参数提取.同时探讨了使用参数提取软件的具体工作步骤.