LBO晶体上1064 nm,532 nm二倍频增透膜的设计及误差分析

采用矢量合成法设计了LiB3O5(LBO)晶体上1064 nm,532 nm二倍频增透膜,在1064 nm处的反射率为0.0014%,532 nm处的反射率为0.0004%。根据误差分析,薄膜制备时沉积速率精度控制在 6.5%时,1064 nm处的反射率增加至0.22%,532 nm处增加至0.87%。材料折射率的变化控制在 3%时,1064 nm处的反射率达0.24%,532 nm处达0.22%。沉积速率和折射率控制的负变化不增大特定波长处的剩余反射率。与膜层折射率相比,薄膜物理厚度对剩余反射率的影响小。低折射率膜层的厚度变化对特定波长处的剩余反射率影响最明显,即为该膜系的敏感层。为改善膜基之间的附着力,选择Y2O3或SiO2作为过渡层,从过渡层的厚度匹配和膜层的折射率匹配两方面进行了相应的膜系匹配设计。     

Enhanced Omnidirectional Photovoltaic Performance of Solar Cells Using Multiple‐Discrete‐Layer Tailored‐ and Low‐Refractive Index Anti‐Reflection Coatings

An optimized four‐layer tailored‐ and low‐refractive index anti‐reflection (AR) coating on an inverted metamorphic (IMM) triple‐junction solar cell device is demonstrated. Due to an excellent refractive index matching with the ambient air by using tailored‐ and low‐refractive index nanoporous SiO₂ layers and owing to a multiple‐discrete‐layer design of the AR coating optimized by a genetic algorithm, such a four‐layer AR coating shows excellent broadband and omnidirectional AR characteristics and significantly enhances the omnidirectional photovoltaic performance of IMM solar cell devices. Comparing the photovoltaic performance of an IMM solar cell device with the four‐layer AR coating and an IMM solar cell with the conventional SiO₂/TiO₂ double layer AR coating, the four‐layer AR coating achieves an angle‐of‐incidence (AOI) averaged short‐circuit current density, J_SC, enhancement of 34.4%, whereas the conventional double layer AR coating only achieves an AOI‐averaged J_SC enhancement of 25.3%. The measured reflectance reduction and omnidirectional photovoltaic performance enhancement of the four‐layer AR coating are to our knowledge, the largest ever reported in the literature of solar cell devices.     

用于高功率激光放大器的单层宽谱增透膜

为了获得用于高功率激光放大器的单层宽带增透膜,采用有机聚合物聚乙烯吡咯烷酮掺杂调控二氧化硅胶体生长制备了粒度分布更宽广的稳定胶体体系,通过提拉镀膜工艺,制备了单层增透膜。采用粒度仪和粘度仪监测胶体的性质,用分光光度计测量了膜层透过率,并用X射线能谱分析了膜层结构。结果表明,聚乙烯吡咯烷酮引入胶体中使得胶体粒度分布更宽,所得膜层具有折射率渐变特性,因而膜层具有宽带增透的效果;膜层在550nm~950nm连续波段内透射率不低于99%。单层宽谱增透膜层不需后处理就可投入使用,膜层性能稳定,满足了激光装置片状放大器的运行要求。     

可见与近红外激光通信系统光学滤光膜的研制

在空间光通信中,光学系统起着非常重要的作用,光学薄膜技术已成为制作光学元件的关键技术。对532、808、1064、1550nm激光工作的4个波段,选择Ti3O5和SiO2作为高低折射率材料,借助于膜系设计软件,采用电子束蒸发和离子辅助沉积的方法设计并制备了激光滤光膜。镀膜后的基片在808nm处的透射率大于90%,532、1064、1550nm处的反射率均大于99%。重点解决了808nm透射区半波孔的问题,通过对基片进行清洁、减少薄膜的吸收和进行真空退火等方法提高了膜层的激光损伤阈值。经过性能测试和评估,满足系统的要求。     

非制冷热释电薄膜红外探测器热绝缘结构的研制

采用由多孔 Si O2 薄膜和过渡 Si O2 薄膜组成的复合薄膜结构实现了非制冷热释电薄膜红外探测器的热绝缘 .利用溶胶凝胶方法制备了多孔 Si O2 薄膜以及过渡 Si O2 薄膜 ,通过优化制备工艺 ,使得多孔 Si O2 一次成膜厚度达到30 70 nm ,孔率达到 5 9% ;过渡 Si O2 一次成膜的厚度达到 1 88nm,孔率达到 4 % .AFM表明 ,由过渡 Si O2 薄膜与多孔Si O2 组成的复合薄膜结构的表面粗糙度远小于多孔 Si O2 薄膜的表面粗糙度 .该热绝缘结构有利于探测器后续各层功能薄膜的集成     

Reflection z-scan for measuring the nonlinear refractive index of porous silicon

An experimental investigation on the nonlinear refractive index of nanoporous silicon at wavelengths of 532 nm and 1064 nm is reported by the reflection z-scan(RZ-scan) method with picosecond pulses.The porous silicon(PS) does not need to be peeled from silicon substrate.The method uses a p-polarized beam with oblique incidence.The modification of the reflected beam intensity gives the information of the surface nonlinear refractive index.The index of porous silicon at 1064 nm is at the same order of magnit...     

Layer‐By‐Layer Dendritic Growth of Hyperbranched Thin Films for Surface Sol–Gel Syntheses of Conformal,Functional, Nanocrystalline Oxide Coatings on Complex 3D (Bio)silica Templates

Here, a straightforward and general method for the rapid dendritic amplification of accessible surface functional groups on hydroxylated surfaces is described, with focus on its application to 3D biomineral surfaces. Reaction of hydroxyl‐bearing silica surfaces with an aminosilane, followed by alternating exposure to a dipentaerythritol‐derived polyacrylate solution and a polyamine solution, allows the rapid, layer‐by‐layer (LBL) build‐up of hyperbranched polyamine/polyacrylate thin films. Characterization of such LBL‐grown thin films by AFM, ellipsometry, XPS, and contact angle analyses reveals a stepwise and spatially homogeneous increase in film thickness with the number of applied layers. UV–Vis absorption analyses after fluorescein isothiocyanate labeling indicate that significant amine amplification is achieved after the deposition of only 2 layers with saturation achieved after 3–5 layers. Use of this thin‐film surface amplification technique for hydroxyl‐enrichment of biosilica templates facilitates the conformal surface sol–gel deposition of iron oxide that, upon controlled thermal treatment, is converted into a nanocrystalline (～9.5 nm) magnetite (Fe₃O₄) coating. The specific adsorption of arsenic onto such magnetite‐coated frustules from flowing, arsenic‐bearing aqueous solutions is significantly higher than for commercial magnetite nanoparticles (≤50 nm in diameter).     

Optical and Electrical Properties of TixSi1‐xOy Films

Ti_xSi_1xO_y (TSO) thin films are fabricated using plasma‐enhanced atomic layer deposition. The Ti content in the TSO films is controlled by adjusting the sub‐cycle ratio of TiO₂ and SiO₂. The refractive indices of SiO₂ and TiO₂ are 1.4 and 2.4, respectively. Hence, tailoring of the refractivity indices from 1.4 to 2.4 is feasible. The controllability of the refractive index and film thickness enables application of an antireflection coating layer to TSO films for use as a thin film solar cell. The TSO coating layer on an Si wafer dramatically reduces reflectivity compared to a bare Si wafer. In the measurement of the current‐voltage characteristics, a nonlinear coefficient of 13.6 is obtained in the TSO films.     

Silica nanospheres as back surface reflectors for crystalline silicon thin‐film solar cells

In this paper, fabrication of a non‐continuous silicon dioxide layer from a silica nanosphere solution followed by the deposition of an aluminium film is shown to be a low‐cost, low‐thermal‐budget method of forming a high‐quality back surface reflector (BSR) on crystalline silicon (c‐Si) thin‐film solar cells. The silica nanosphere layer has randomly spaced openings which can be used for metal‐silicon contact areas. Using glass/SiN/p⁺nn⁺ c‐Si thin‐film solar cells on glass as test vehicle, the internal quantum efficiency (IQE) at long wavelengths (>900 nm) is experimentally demonstrated to more than double by the implementation of this BSR, compared to the baseline case of a full‐area Al film as BSR. The improved optical performance of the silica nanosphere/aluminium BSR is due to reduced parasitic absorption in the Al film. Copyright © 2007 John Wiley & Sons, Ltd.     

Photocurrent enhancement in thin‐film silicon solar cells by combination of anti‐reflective sub‐wavelength structures and light‐trapping textures

Dielectric films with anti‐reflective sub‐wavelength structures are applied to thin‐film silicon solar cells to improve the light incoupling at the front surface. It is verified that modification of the refractive index of the incident medium using dielectric films with sub‐wavelength structures is beneficial to reduce the average reflectivity of Si solar cells with an anti‐reflective coating based on optical interference. It is also shown that the sub‐wavelength structure must be combined with a proper light‐trapping texture to enhance the absorption within thin‐film silicon solar cells. The effectiveness of dielectric films with sub‐wavelength structures is demonstrated by an increase of the short‐circuit current density of a microcrystalline silicon cell from 29.1 to 30.4 mA/cm² in a designated area of 1 cm². The optical interplay between the dielectric films and the light‐trapping textures is also discussed. Copyright © 2015 John Wiley & Sons, Ltd.     

PbZr0.40Ti0.60O3非晶薄膜透射光谱性质研究

采用溶胶凝胶方法在石英玻璃上制备了均匀透明的PbZr0.40Ti0.60O3(PZT)非晶薄膜，测量了200-1100nm的紫外可见近红外透射光谱，根据经典的包络计算方法，同时获得薄膜在透明振荡区的折射率，消光系数以及厚度，薄膜的折射率色散关系可以通过单电子sellmeier振荡模型成功地进行解释。最后，根据Tauc's法则，得到PbZr0.40Ti0.60O3非晶薄膜的禁带宽度为3.78eV。     

Tin Dioxide Sensing Layer Grown on Tubular Nanostructures by a Non‐Aqueous Atomic Layer Deposition Process

A new atomic layer deposition (ALD) process for nanocrystalline tin dioxide films is developed and applied for the coating of nanostructured materials. This approach, which is adapted from non‐hydrolytic sol‐gel chemistry, permits the deposition of SnO₂ at temperatures as low as 75 °C. It allows the coating of the inner and outer surface of multiwalled carbon nanotubes with a highly conformal film of controllable thickness. The ALD‐coated tubes are investigated as active components in gas‐sensor devices. Due to the formation of a p‐n heterojunction between the highly conductive support and the SnO₂ thin film an enhancement of the gas sensing response is observed.     

Performance enhancement of multicrystalline silicon solar cells and modules using double‐layered SiNx:H antireflection coatings

Silicon nitride coating deposited by the plasma‐enhanced chemical vapor deposition method is the most widely used antireflection coating for crystalline silicon solar cells. In this work, we employed double‐layered silicon nitride coating consisting of a top layer with a lower refractive index and a bottom layer (contacting the silicon wafer) with a higher refractive index for multicrystalline silicon solar cells. An optimization procedure was presented for maximizing the photovoltaic performance of the encapsulated solar cells or modules. The dependence of their photovoltaic properties on the thickness of silicon nitride coatings was carefully analyzed. Desirable thicknesses of the individual silicon nitride layers for the double‐layered coatings were calculated. In order to get statistical conclusions, we fabricated a large number of multicrystalline silicon solar cells using the standard production line for both the double‐layered and single‐layered antireflection coating types. On the cell level, the double‐layered silicon nitride antireflection coating resulted in an increase of 0.21%, absolute for the average conversion efficiency, and 1.8 mV and 0.11 mA/cm² for the average open‐circuit voltage and short‐circuit current density, respectively. On the module level, the cell to module power transfer factor was analyzed, and it was demonstrated that the double‐layered silicon nitride antireflection coating provided a consistent enhancement in the photovoltaic performance for multicrystalline silicon solar cell modules than the single‐layered silicon nitride coating. Copyright © 2015 John Wiley & Sons, Ltd.     

基于反射光谱的单层抗反射膜的非在位膜厚精确控制

提出一种基于反射光谱分析的非在位膜厚控制技术,首先利用椭圆偏振光谱仪确定波长300～1 700 nm范围内的薄膜折射率,由此确定对应于特定波长(如1 550 nm)的最佳抗反射(AR)镀膜沉积条件。然后计算最佳AR镀膜厚度所对应的反射谱,得到相应的CIE标准色谱坐标。通过对比实测镀膜颜色和计算得到的最佳颜色,可以实现小尺寸器件端面上AR镀膜厚度的优化控制。利用这一方法,由等离子体增强化学气相沉积(PECVD)制备的SiNx单层AR镀膜,获得了4.4×10-4的反射率。     

Optimization of moth‐eye antireflection schemes for silicon solar cells

Nanostructured moth‐eye antireflection schemes for silicon solar cells are simulated using rigorous coupled wave analysis and compared to traditional thin film coatings. The design of the moth‐eye arrays is optimized for application to a laboratory cell (air–silicon interface) and an encapsulated cell (EVA‐silicon interface), and the optimization accounts for the solar spectrum incident on the silicon interface in both cells, and the spectral response of both types of cell. The optimized moth‐eye designs are predicted to outperform an optimized double layer thin film coating by approximately 2% for the laboratory cell and approximately 3% for the encapsulated cell. The predicted performance of the silicon moth‐eye under encapsulation is particularly remarkable as it exhibits losses of only 0·6% compared to an ideal AR surface. Copyright © 2010 John Wiley & Sons, Ltd.     

Porous Polymer Films with Gradient‐Refractive‐Index Structure for Broadband and Omnidirectional Antireflection Coatings

Porous polymer films that can be employed for broadband and omnidirectional antireflection coatings are successfully shown. These films form a gradient‐refractive‐index structure and are achieved by spin‐coating the solution of a polystyrene‐block‐poly(methyl methacrylate) (PS‐b‐PMMA)/PMMA blend onto an octadecyltrichlorosilane (OTS)‐modified glass substrate. Thus, a gradient distribution of PMMA domains in the vertical direction of the entire microphase‐separated film is obtained. After those PMMA domains are removed, a PS porous structure with an excellent gradient porosity ratio in the vertical direction of the film is formed. Glass substrates coated with such porous polymer film exhibit both broadband and omnidirectional antireflection properties because the refractive index increases gradually from the top to the bottom of the film. An excellent transmittance of >97% for both visible and near‐infrared (NIR) light is achieved in these gradient‐refractive‐index structures. When the incident angle is increased, the total transmittance for three different incident angles is improved dramatically. Meanwhile, the film possesses a color reproduction character in the visible light range.     

All‐Solution‐Processed Indium‐Free Transparent Composite Electrodes based on Ag Nanowire and Metal Oxide for Thin‐Film Solar Cells

Fully solution‐processed Al‐doped ZnO/silver nanowire (AgNW)/Al‐doped ZnO/ZnO multi‐stacked composite electrodes are introduced as a transparent, conductive window layer for thin‐film solar cells. Unlike conventional sol–gel synthetic pathways, a newly developed combustion reaction‐based sol–gel chemical approach allows dense and uniform composite electrodes at temperatures as low as 200 °C. The resulting composite layer exhibits high transmittance (93.4% at 550 nm) and low sheet resistance (11.3 Ω sq^‐1), which are far superior to those of other solution‐processed transparent electrodes and are comparable to their sputtered counterparts. Conductive atomic force microscopy reveals that the multi‐stacked metal‐oxide layers embedded with the AgNWs enhance the photocarrier collection efficiency by broadening the lateral conduction range. This as‐developed composite electrode is successfully applied in Cu(In_1‐x,Ga_x)S₂ (CIGS) thin‐film solar cells and exhibits a power conversion efficiency of 11.03%. The fully solution‐processed indium‐free composite films demonstrate not only good performance as transparent electrodes but also the potential for applications in various optoelectronic and photovoltaic devices as a cost‐effective and sustainable alternative electrode.     

Surface‐Modified Mesoporous SiO2 Containers for Corrosion Protection

The development of active corrosion protection systems for metallic substrates is an issue of prime importance for many industrial applications. The present work shows a new contribution to the design of a new protective system based on surface modified mesoporous silica containers. Incorporation of silica‐based containers into special sol–gel matrix allows for a self‐healing effect to be achieved during the corrosion process. The self‐healing ability occurs due to release of entrapped corrosion inhibitors in response to pH changes caused by the corrosion process. A silica–zirconia‐based hybrid film is used in this work as a coating matrix deposited on AA2024 aluminum alloy. Mesoporous silica nano‐particles are covered layer‐by‐layer with polyelectrolyte layers and loaded with inhibitor [2‐(benzothiazol‐2‐ylsulfanyl)‐succinic acid]. The hybrid film with nanocontainers reveals enhanced long‐term corrosion protection in comparison with the individual sol–gel films. The scanning vibrating electrode technique also shows an effective healing ability of containers to cure the corrosion defects. This effect is due to the release of the corrosion inhibitor triggered by the corrosion processes started in the cavities. The approach described herein can be used in many applications where active corrosion protection of materials is required.     

Electrochemical synthesis of a double‐layer film of ZnO nanosheets/nanoparticles and its application for dye‐sensitized solar cells

A double‐layer film, consisting of an upper layer of ZnO nanosheets and a lower layer of ZnO nanoparticles (designated as ZnONS/NP), was synthesized for the photoanode of a dye‐sensitized solar cell (DSSC) by a one‐step potentiostatic electrodeposition on a conducting fluorine‐doped tin oxide substrate at 70 °C in a solution containing zinc nitrate and sodium acetate, followed by the pyrolysis of the film at 300 °C. The growth mechanism of the double‐layer nanostructure was studied by monitoring the morphological changes at various periods of electrodeposition. The effects of the concentration of acetate anion on the morphology of the double‐layer structure were also studied. The double‐layer film of ZnONS/NP showed a better self‐established light scattering property, compared with that of a thin film of ZnO nanoparticles, prepared without acetate anion. The concentration of an acetate anion in the electrolyte for the electrodeposition of the double‐layer film, the electrodeposition period, and the period for dye adsorption were optimized for obtaining the best performance for a DSSC with a photoanode consisting of the double layer. A metal‐free dye, coded as D149, was used in this research. A conversion efficiency of 4.65% was achieved for a DSSC (0.2376 cm²) with the photoanode, consisting of the double‐layer film, under 100 mW/cm² illumination in the wavelength range of 400–800 nm. X‐ray diffraction patterns, thermo gravimetric curves, elemental analysis, scanning electron microscopic images, transmission electron microscopic image, transmission spectra, and electrochemical impedance spectra were used to explain observations. Copyright © 2012 John Wiley & Sons, Ltd.     

KTP倍频晶体增透膜的改进

为了改进KTP晶体倍频增透膜的镀膜质量,采用SiO2代替原来使用的MgF2材料作外层膜并重新设计了膜系。实验结果表明,运用上述技术将镀有1064nm和532nm增透膜的KTP倍频晶体应用在高功率Nd:YAG激光器中,当重复频率lkHz、脉宽25ns、基波功率密度高达450MW/cm2时,没有观察到KTP晶体表面激光损伤,膜层表面抗激光损伤和光学性能都得到提高。