氧化物高温超导薄膜制备技术的进展

本文较系统地介绍了高温超导薄膜的制备方法与生长机理,讨论了生长工艺与薄膜超导性能之间的关系,并对高温超导薄膜的异质外延、多层膜结构及超晶格制备等一些最新进展作了介绍。     

薄膜的截面TEM样品制备

薄膜材料的厚度仅为微米量级或者更薄，对其微结构的研究十分困难，许多表征方法难以采用。透射电子显微分析（TEM）是薄膜材料微结构研究最重要的手段之一。尽管采用TEM平面样品研究薄膜的微结构在样品制备方面相对容易，但由于薄膜依附于基材生长，且通常具有择优取向和柱状晶生长等微结构特征，因而采用截面样品从薄膜生长的横断面进行观察和研究，可以得到更多的材料微结构信息。但是薄膜的TEM截面样品制备过程较为繁杂，难以掌握。已有的文献主要介绍了Si基片上生长薄膜的TEM截面样品制备方法，对金属基片薄膜截面样品的制备方法介绍不多。     

射频磁控溅射法制备(111)取向Pt薄膜

以稀土元素Pr薄膜为缓冲层,采用低功率射频磁控溅射法在室温玻璃衬底上成功制备了(111)强烈取向的Pt薄膜,研究了退火热处理工艺对Pt薄膜择优取向及晶粒尺寸的影响规律,并对Pt(111)取向生长机制进行了初步探讨。结果表明,所采用的退火工艺能够促进Pt纳米晶粒的逐步长大,但对Pt薄膜沿(111)择优取向生长的影响并不明显;保温5 h时晶粒生长较快,延长保温时间对晶粒生长速度的影响不大,但随着退火时间的增加,薄膜质量会越来越好。稀土Pr对Pt(111)择优取向生长可能有一定的促进作用。从简化工艺及降低成本角度考虑,该工艺优于以往的制备工艺,可望用做制备高取向PZT铁电薄膜所需的(111)强烈取向Pt底电极。     

多层W—Si薄膜及其与GaAs衬底间的界面特性

本文详细叙述了多层W-Si薄膜的制备技术、生长速率、热退火对薄膜性能的影响,薄膜与GaAs衬底间的界面行为等。     

磁控溅射SiGe异质结的薄膜分析

膜层生长不均匀是制备SiGe异质结的研究热点。采用射频磁控溅射方法,通过不断改变溅射时的实验参数,寻找能使Ge纳米薄膜在Si基片上均匀生长的溅射实验条件。实验中,在不同时间条件下分别制备了三种纳米Ge薄膜,通过原子力显微镜对其微观形貌的分析扫描,可以观察到纳米薄膜生长过程中的四个典型阶段,发现Ge/Si的共度生长取得了较好的结果,为SiGe异质结的进一步制备研究奠定了一定的实验基础。     

组分和应力不均匀分布对薄膜铁电性的影响

采用组合靶射频溅射的方法、制备后慢速降温的途径在（１１１）Ｓｉ基板上制备出了成膜较好的ＰｂＴｉＯ３薄膜，通过测试分析发现在薄膜中形成了一个缓解应力的过渡层，薄膜中的Ｐｂ、Ｔｉ组分比沿着薄膜生长的方向成非线性增长，并在薄膜表面形成一个富Ｐｂ层，薄膜的Ｃ－Ｖ特性曲线中存在负方向的位移和畸变。结合实验结果对薄膜的生长机理进行了探讨，并且对薄膜的应力和不均匀分布组分对薄膜铁电特性的影响进行了理论上的分析，     

溅射功率对AlN/ZnO薄膜结构形貌的影响

采用直流反应磁控溅射法以ZnO为缓冲层在Si衬底上制备了AlN/ZnO薄膜。利用台阶仪、X线衍射(XRD)仪和原子力显微镜(AFM)对不同溅射功率下制备的AlN/ZnO薄膜的厚度、结构及表面形貌进行测试表征。结果表明,不同溅射功率下生长的AlN薄膜都沿(002)择优生长,且随着功率的增大,薄膜的沉积速率增加,晶粒长大,AlN薄膜的(002)取向性变好。同时还利用扫描电子显微镜(SEM)对在优化工艺下制得AlN/ZnO薄膜断面的形貌进行表征,结果显示AlN薄膜呈柱状生长。     

RF磁控溅射法原位制备C轴择优取向ZnO薄膜

采用RF磁控溅射法在玻璃衬底上原位低温生长ZnO薄膜.生长出的薄膜对可见光具有高于90%的透射率,该薄膜具有良好的C轴取向.利用X射线衍射(XRD)的测试结果,分析了溅射工艺条件如衬底温度、氩氧比和溅射气压等对薄膜性能的影响,得到最佳的生长工艺条件为:衬底温度300 ℃,溅射气压1 Pa,氩氧比为25 sccm∶15 sccm.在此条件下生长的ZnO薄膜具有良好的C轴择优取向,并且薄膜的结晶性能良好.采用这种方法制备的ZnO薄膜适合用于制备平板显示器的透明薄膜晶体管和太阳电池的透明导电电极.     

两步生长和直接生长GaAs/Si单晶薄膜的比较

报道了采用热壁外延(HWE)技术,在(100),(111)和(211)三种典型Si表面通过两步生长和直接生长法制备GaAs单晶薄膜,经过拉曼光谱、霍尔测试和荧光光谱分析比较,得出结论:(1)相同取向Si衬底,两步生长法制备的GaAs薄膜结晶质量比直接生长法制备的GaAs薄膜的要好;(2)采用HWE技术在Si上异质外延GaAs薄膜,其表面缓冲层的生长是降低位错、提高外延质量的基础;(3)不同取向Si衬底对GaAs外延层结晶质量有影响, (211)面外延的GaAs薄膜质量最好,(100)面次之,(111)面最差.     

原子层沉积制备ZnO薄膜研究进展

随着半导体技术的发展,ZnO作为第三代半导体材料,具有禁带宽度大、载流子漂移饱和速度高和介电常数小等优点,更适合制作蓝光和紫外光的发光器件。与传统的薄膜制备技术相比,原子层沉积技术(ALD)在膜生长方面具有生长温度低、厚度高度可控、保形性好和均匀性高等优点,逐渐成为制备ZnO薄膜的主流方法。综述了ALD制备ZnO薄膜的反应机制、生长机制和掺杂方面的研究进展,针对当前ZnO薄膜p型掺杂的难点,指出了V族元素中的大半径原子(磷和砷等)掺杂有可能成为制备高质量、可重复和稳定的p型ZnO的潜力研究点,最后总结和展望了ALD制备ZnO薄膜的应用前景和研究趋势。     

过渡层对Ge衬底GaAs外延层晶体质量的影响

利用低压金属有机化学汽相淀积(MOCVD)设备在Ge衬底上生长GaAs外延层.通过改变GaAs过渡层的生长温度对GaAs外延层进行了表征,利用扫描电镜(SEM)和X射线衍射仪研究了表面形貌和晶体质量,优化出满足高效太阳能电池要求的高质量GaAs单晶层生长条件.     

三种凝胶剂对MnZn铁氧体性能的影响

以铁、锰和锌的硝酸盐为原料,分别以柠檬酸铵、酒石酸或EDTA为凝胶剂,采用有机物络合sol-gel法制备了MnZn铁氧体。借助XRD、SEM和振动样品磁强计(VSM)等表征手段,研究和比较了三种凝胶剂对所得MnZn铁氧体产品的晶型、晶貌及磁性能的影响。结果表明:以柠檬酸铵为凝胶剂时,所得MnZn铁氧体的磁性能最佳:其Ms达到1.1237×105A/m,而Hc仅为1.6716×103A/m。     

Selective Nucleation of Organic Single Crystals from Vapor Phase on Nanoscopically Rough Surfaces

Organic field‐effect transistors (OFETs) are attractive for microelectronic applications such as sensor arrays or flexible displays, due to their adequate performance and relatively low production costs. Organic single‐crystal transistors have emerged as benchmark devices for studying the intrinsic charge‐transport properties in organic semiconductor materials. Conventional approaches for growing organic single crystals result in uncontrollable dimensions and the formation of extremely fragile crystals. In addition, the hand‐selection and placement of individual crystals on a device structure represents a severe limitation for producing arrays of single‐crystal transistors with high density and reasonable throughput. As a result, the application of organic single‐crystal transistors has been restricted to fundamental charge transport studies, with their commercial application not yet realizable. We recently reported a materials‐general method of fabricating large‐area arrays of patterned organic single crystals. Microcontact‐printed octadecyltriethoxysilane (OTS) film domains on smooth, inert substrates were found to act as preferential nucleation sites for single crystals for a broad range of organic semiconductor materials, such as pentacene, tetracene, rubrene and C₆₀. In order to understand the underlying mechanism of preferential nucleation, the stamped OTS domains and the contact plane between the OTS domains and the organic crystals were inspected by atomic force microscopy (AFM) and optical microscopy. Our analysis suggests that crystals nucleate at the base of tall OTS pillars that form the significantly rough surface in the stamped domains. The selective nucleation inside the rough surface regions is discussed by means of a rate‐equation model of the growth process.     

草酸钙在硫酸软骨素自组装膜上周期沉淀的研究

利用硫酸软骨素(chondroitin sulfate，CS)在云母基底上通过浇铸法制备的自组装膜为基底，诱导草酸钙在其上的凝集生长。发现当硫酸软骨素的浓度为1．Omg／ml时在该膜体系中可形成规整的周期性草酸钙环状沉淀。这种有序的环状结构可能是耗散结构的一种具体表现形式。利用原子力显微镜(atomic forcemicroscope，AFM)和傅立叶红外光谱仪对这种结构进行了表征，实验结果显示合适浓度下形成的CS膜在一定程度上可以抑制草酸钙的凝集结晶，表明高分子基质与无机离子间强烈的相互作用对无机盐的成核结晶有显著影响，为探讨结石的形成与抑制提供了一定的实验依据。     

Highly Efficient Three Primary Color Organic Single‐Crystal Light‐Emitting Devices with Balanced Carrier Injection and Transport

Organic single crystals have a great potential in the field of organic optoelectronics because of their advantages of high carrier mobility and high thermal stability. However, the application of the organic single crystals in light‐emitting devices (OLEDs) has been limited by single‐layered structure with unbalanced carrier injection and transport. Here, fabrication of a multilayered‐structure crystal‐based OLED constitutes a major step toward balanced carrier injection and transport by introducing an anodic buffer layer and electron transport layer into the device structure. Three primary color single‐crystal‐based OLEDs based on the multilayered structure and molecular doping exhibit a maximum luminance and current efficiency of 820 cd cm^?2 and 0.9 cd A^?1, respectively, which are the highest performance to date for organic single‐crystal‐based OLEDs. This work paves the way toward high‐performance organic optoelectronic devices based on the organic single crystals.     

基于液晶/聚合物光栅选频的高效率有机半导体激光器

报道了一种基于液晶/聚合物光栅选频的高效率有机半导体激光器的制备方法。首先在一片玻璃基板上旋涂有机半导体荧光薄膜MEH-PPV作为增益介质,然后在其上通过光场中的定域光聚合制备液晶/聚合物光栅,形成分布式反馈(DFB)有机半导体激光器。激光出射阈值0.32μJ/pulse,斜率转化效率高达7.8%,呈现良好的s偏振特性。采集了激光束的光斑,轮廓清晰,呈现扇形结构。通过改变光栅周期,实现了53.4nm激光出射范围。本工作为新型有机激光器的制备提供了有益的指导和借鉴意义。     

Naturally and Elastically Bent Organic Polymorphs for Multifunctional Optical Applications

Recently, mechanically bendable organic single crystals have been widely studied as emerging flexible materials. However, only a very small percentage of organic crystals have been found to be elastic or plastic. In this study, crystal engineering is employed as a powerful strategy to improve the probability of constructing flexible organic crystals. Based on an organic compound, two polymorphs Cry‐ R and Cry‐ O with bright red and orange emissions, respectively, are obtained. Cry‐ R , being brittle inherently, can form a naturally bent crystal with an optical waveguide as efficient as the straight crystal. The other polymorph Cry‐ O can be elastically bent, almost into a loop, and displays an optical waveguide and amplified spontaneous emission in both the straight and bent state, demonstrating its multifunctional applications in flexible optical devices. In addition, the Y‐shaped crystals of Cry‐ O obtained by natural growth are found to transduce single emitted light through the two branches and thus generate dual output signals simultaneously, which further highlights the utility of “crystal flexibility”. The results not only suggest a guideline to modify the mechanical compliance by crystal engineering but also provide a model of flexible organic crystals for multifunctional optical applications.     

InGaAs（P）／InP应变量子阱和超晶格的光电性质

利用低压金属有机化合物化学汽相沉积（ＭＯＣＶＤ）生长技术在ＩｎＰ衬底上生长ＩｎＧａＡｓ／ＩｎＰ应变量子阱，超晶格和ＩｎＧａＡｓＰ／ＩｎＰ量子阱结构材料，利用７７Ｋ光荧光（ＰＬ）测量这一应变量了阱和量子阱的光学性质，利用双晶Ｘ光测量应变超晶格的性质。     

有机半导体研究进展

1977年人们发现通过掺杂可以使聚乙炔膜的电导率提高 1 2个量级 ,由绝缘体变成导体 ,从此掀起了有机半导体的研究热潮。其研究工作包括有机高分子材料、有机小分子材料和有机分子晶体材料的电学、光学等性质。有机半导体中的载流子除了电子和空穴外 ,还有孤子、极化子等。人们已经获得低温迁移率高达 1 0 5cm2 /V.s的高质量有机半导体晶体 ,在其中观察到量子霍尔效应 ,并用其制成有机半导体激光器。如今有机半导体彩色显示屏已进入实用阶段。     

Emission Color Tuning in Ambipolar Organic Single‐Crystal Field‐Effect Transistors by Dye‐Doping

The effect of dye‐doping in ambipolar light‐emitting organic field‐effect transistors (LE‐OFETs) is investigated from the standpoint of the carrier mobilities and the electroluminescence (EL) characteristics under ambipolar operation. Dye‐doping of organic crystals permits not only tuning of the emission color but also significantly increases the efficiency of ambipolar LE‐OFETs. A rather high external EL quantum efficiency (～0.64%) of one order of magnitude higher than that of a pure p‐distyrylbenzene (P3V2) single crystal is obtained by tetracene doping. The doping of tetracene molecules into a host P3V2 crystal has almost no effect on the electron mobility and the dominant carrier recombination process in the tetracene‐doped P3V2 crystal involves direct carrier recombination on the tetracene molecules.