Vertically aligned ZnO nanowires prepared by thermal oxidation of RF magnetron sputtered metallic zinc films

ZnO nanowires have been successfully grown by thermal oxidation of metallic zinc films at 430 °C. Polycrystalline zinc films were deposited on Si (100) substrates by RF magnetron sputtering utilizing discharge power from 70 to 180 W. Experimental results show that 70 W discharge power results in the formation of porous zinc nanoparticles that prevent zinc atom from diffusion and thus does not result in the formation of ZnO nanowires by subsequent thermal oxidation. By increasing discharge power to 120 W the zinc film transforms to Zone II with a columnar structure, while further increase in discharge power to 180 W results in re-crystallization and formation of micron-sized hexagonal structures on the surface. Vertically aligned ZnO nanowires can only be obtained by thermal oxidation of columnar zinc films that exhibit a field emission threshold of 5.3 V/μm (at a current density of 10 μA/cm²) with a field enhancement factor of 1834. A target current density of 0.75 mA/cm² is achieved with a bias field less than 10 V/μm.     

High photosensitivity with enhanced photoelectrical contribution in hybrid nanocomposite flexible UV photodetector

To devise a reliable strategy to develop an ultraviolet (UV) sensitive hybrid photodetector, plasma process is utilized as a single step method for production of large area nanocomposite films based on plasma polymerized aniline–titanium dioxide (PPani–TiO₂). The synthesis of PPani–TiO₂ nanocomposite films are made using reactive magnetron sputtering in combination with plasma polymerization. The deposited PPani–TiO₂ nanocomposite films are characterized and discussed in terms of structural, optical and electrochemical properties. A hybrid flexible nanostructured UV photodetector is constructed from PPani–TiO₂ nanocomposite and its optoelectronic properties are evaluated which exhibits a greatly enhanced photosensitivity resulting in high photoconductive gain (G = 4.56 × 10⁴) and high responsivity (R = 9.36 × 10³ AW⁻¹) under UV illumination of 254 nm. The flexible devices are successfully operated under bending up to 170° (bending radius, R = 8 mm) and showed a good folding strength and stability. The proposed plasma based method provides a green technology where the self-assembly of molecules, that is, the spontaneous association of atomic or molecular building blocks under plasma environment, emerge as a successful strategy to form well-defined structural and morphological units of nanometer dimensions.     

Ultraviolet photodetectors based on low temperature processed ZnO/PEDOT:PSS Schottky barrier diodes

In this work, vertical Schottky barrier diodes (SBDs) were fabricated using a thin film of ZnO (50 nm) and PEDOT:PSS deposited by RF Sputtering and micro-drop casting, respectively. ITO and Au were used as ohmic contacts to ZnO and PEDOT:PSS films, respectively. The final structure consisted on Glass/ITO/ZnO/PEDOT:PSS/Au. The SBDs performance was characterized under dark and four different wavelengths conditions. From current–voltage characteristics, under dark and ambient conditions, a diode ideality factor of 1.4; a saturation current density of 1×10⁻⁹ A/cm²; a Schottky barrier height of 0.9 eV and a rectification ratio of 5 orders of magnitude at ±1 V were obtained. A carrier density of 5×10¹⁷ cm⁻³ for the ZnO film was estimated from capacitance–voltage measurements. For their characterization as photodiodes, the SBDs were illuminated with an ultra-bright UV (~380 nm) LED. A maximum UV responsivity of 0.013 A/W was obtained. The transient response of the SBDs was also analyzed with the UV LED connected to a pulsed signal of 0.5 Hz, demonstrating rise and fall times in the order of 200 ms. With a low temperature processing (<80 °C), visible-blind and UV photon-detection characteristics, the fabricated SBDs are candidates for flexible optoelectronics devices such as optical receivers for digital signal processing and measurement of light intensity.     

The effects of carrier gas and substrate temperature on ZnO films prepared by ultrasonic spray pyrolysis

ZnO films were deposited on glass substrates in the temperature range of 350–470 °C under an atmosphere of compressed air or nitrogen (N₂) by using ultrasonic spray pyrolysis technique. Structural, electrical and optical properties of the ZnO films were investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM), electrical two-probe and optical transmittance measurements. The ZnO films deposited in the range of 350–430 °C were polycrystalline with the wurtzite hexagonal structure having preferred orientation depending on the substrate temperature. The ZnO films deposited below 400 °C had a preferred (100) orientation while those deposited above 400 °C mostly had a preferred (002) orientation. The resistivity values of ZnO films depended on the types of carrier gas. The ZnO thin films deposited under N₂ atmosphere in the range of 370–410 °C showed dense surface morphologies and resistivity values of 0.6–1.1 Ω-cm, a few orders of magnitude lower than those deposited under compressed air. Hydrogen substition in ZnO possibly contributed to decreasing resistivity in ZnO thin films deposited under N₂ gas. The Hall measurements showed that the behavior of ZnO films deposited at 410 °C under the N₂ atmosphere was n-type with a carrier density of 8.9–9.2×10¹⁶ cm^-3 and mobility of ～70 cm²/Vs. ZnO thin films showed transmission values at 550 nm wavelength in a range of 70–80%. The values of band gaps extrapolated from the transmission results showed bandgap shrinkage in an order of milli electron volts in ZnO films deposited under N₂ compared to those deposited under compressed air. The calculation showed that the bandgap reduction was possibly a result of carrier–carrier interactions.     

Synthesis and characterization of nanostructured magnetoresistive Ni doped ZnO films

We report a method to produce magnetic nanostructured semiconductor films based in ZnO doped with Nickel to control their magnetic properties. The method is based on a combined diffusion–oxidation process within a controlled atmosphere chamber to produce a uniform distribution of Ni ions in the ZnO films (ZnO:Ni). The synthesis of ZnO:Ni films is reported as well as the magnetoresistive characteristics, the used method yields films with reproducible and homogeneous properties. The films were also characterized structurally by X-Ray Diffraction (XRD) and Raman spectroscopy, and by Hall–van der Pauw measurements. The XRD measurements confirm the nanocrystalline films character. The films resulted of n-type conductivity with electron concentrations of ~10²⁰ cm⁻³ in average and carrier mobilities of 5 cm²/V s. The Magnetoresistance (MR) behavior of the films at 300 K shows negative changes of ΔR~0.5% in accordance with the usual literature reports on samples produced by other methods.     

Varying load resistances of zinc oxide ultraviolet photodetectors: A simple method to change responsivity

The metal–semiconductor–metal structured ultraviolet photodetector has been fabricated based on Zinc oxide thin films grown by a radio frequency magnetron sputtering technique, and Au is used as the contact metal. The dark current of the photodetector is as low as 1.17 nA at 3 V bias in the current–voltage measurements. The photoresponse properties are characterized by varying the load resistors (1 kΩ, 10 kΩ, 100 kΩ, 1 MΩ and 22 MΩ), and the corresponding responsivities are 2.69, 1.27, 0.25, 0.02 and 7.20×10⁻⁴ A/W. It can be found that the responsivity of the photodetector is enhanced with the load resistors decreasing; however, the signal-to-noise ratio decreases. It is demonstrated that the best method to make the ZnO-based photodetector suitable for different application environments is with the appropriate load resistance.     

Effects of the substrate temperature and solution molarity on the structural opto-electric properties of ZnO thin films deposited by spray pyrolysis

Zinc oxide (ZnO) was largely studied in various applications such as photovoltaic conversion, optoelectronics and piezoelectric, because of its interesting physical properties (morphological, structural, optical and electrical). The present work deals with the preparation of zinc oxide thin films (ZnO) deposited by the spray pyrolysis method. The starting solution was zinc chloride (ZnCl₂). Effects of solution molarity and substrate temperature on films properties were investigated. All films deposited were characterized by various techniques such as X-ray diffraction for structural characterizations, profilometry for thickness measurements, UV–vis transmission spectrophotometry for optical properties and the four probes conductivity measurements for electrical characterization. The X-ray diffraction (XRD) patterns show that the films deposited are polycrystalline with (0 0 2) plan as preferential orientation. The UV–vis spectroscopy confirms the possibility of good transparent ZnO thin films deposition with an average transmission of about ∼85% in the visible region. However, the measured electrical resistivities of the deposited films were in the order of 10⁴ Ω cm     

Ultraviolet photoresistors based on ZnO thin films grown by P-MBE

Ultraviolet photoresistors based on ZnO thin films were fabricated on sapphire substrates with MgO buffer layer by plasma-assisted molecular beam epitaxy. An extremely large dark resistance up to 4 × 10¹⁰ Ω was obtained and the dark/photo resistance ratio is up to 2.3 × 10⁵ with a light intensity of 1.3 mW/cm² at 370 nm. The spectral response shows a large responsivity of more than 1 Ω^?1 W^?1 in the UV region. The photo-resistance depends linearly on the reciprocal of the optical power density for more than two orders of magnitude. The transient response property shows a decay time of 167 μs and the relaxation mechanisms are also discussed.     

Ultraviolet photoresponse of ZnO nanostructured AlGaN/GaN HEMTs

We present the first active visible blind ultraviolet (UV) photodetector based on zinc oxide (ZnO) nanostructured AlGaN/GaN high electron mobility transistors (HEMTs). The ZnO nanorods (NRs) are selectively grown on the gate area by using hydrothermal method. It is shown that ZnO nanorod (NR)-gated UV detectors exhibit much superior performance in terms of response speed and recovery time to those of seed-layer-gated detectors. It is also found that the best response speed (~10 and~190 ms) and responsivity (~1.1×10⁵ A/W) were observed from detectors of the shortest gate length of 2 µm among our NR-gated devices of three different gate dimensions, and this responsivity is about one order higher than the best performance of ZnO NR-based UV detectors reported to date.     

Characterization of solution processed,p-doped films using hole-only devices and organic field-effect transistors

We report a solution processed, p-doped film consisting of the organic materials 4,4′,4″-tris(3-methylphenylphenylamino)triphenylamine (MTDATA) as the electron donor and 2-(3-(adamantan-1-yl)propyl)-3,5,6-trifluorotetracyanoquinodimethane (F3TCNQ-Adl) as the electron acceptor. UV–vis–NIR absorption spectra identified the presence of a charge transfer complex between the donor and acceptor in the doped films. Field-effect transistors were used to characterize charge transport properties of the films, yielding mobility values. Upon doping, mobility increased and then slightly decreased while carrier concentration increased by two orders of magnitude, which in tandem leads to conductivity increasing from 4 × 10^?10 S/cm when undoped to 2 × 10^?7 S/cm at 30 mol% F3TCNQ-Adl. The hole density was calculated based on mobility values extracted from OFET data and conductivity values extracted from bulk I–V data for the MTDATA: x mol% F3TCNQ-Sdl films. These films were then shown to function as the hole injection/hole transport layer in a phosphorescent blue OLED.     

Low temperature Solution-Processed ZnO film on flexible substrate

Transparent conductive ZnO films were directly deposited on unseeded polyethersulfone (PES) substrates with a spin-spray method using aqueous solution at a low substrate temperature of 85 °C. All ZnO films were crystalline with wurtzite hexagonal structure and impurity phases were not detected. ZnO films deposited without citrate ions in the reaction solution had a rod array structure. In contrast, ZnO films deposited with citrate ions in the reaction solution had a continuous, dense structure. The transmittance of the ZnO films was improved from 11.9% to 85.3% as their structure changed from rod-like to continuous. After UV irradiation, the ZnO films with a continuous, dense structure had a low resistivity of 9.1×10⁻³ Ω cm, high carrier concentration of 2.7×10²⁰ cm⁻³ and mobility of 2.5 cm² V⁻¹ s⁻¹.     

Ultraviolet-assisted annealing for low-temperature solution-processed p-type gallium tin oxide (GTO) transparent semiconductor thin films

Solution-processed p-type gallium tin oxide (GTO) transparent semiconductor thin films were prepared at a low temperature of 300 °C using ultraviolet (UV)-assisted annealing instead of conventional high-temperature annealing (> 500 °C). We report the effects of UV irradiation time on the structural, optical, and electrical properties of sol-gel derived GTO thin films and a comparison study of the physical properties of UV-assisted annealed (UVA) and conventional thermally annealed (CTA) GTO thin films. The Ga doping content was fixed at 15 at% in the precursor solution ([Ga]/[Sn]+[Ga] = 15%). After a spin-coating and preheating procedure was performed two times, the dried sol-gel films were heated on a hotplate at 300 °C under UV light irradiation for 1–4 h. Each UVA GTO thin film had a dense microstructure and flat free surface and exhibited an average optical transmittance approaching 85.0%. The level of crystallinity, crystallite size, and hole concentration density of the GTO thin films increased with increasing UV irradiation time. In this study, the UVA 4 h thin film samples exhibited the highest hole concentration (9.87 × 10¹⁷ cm⁻³) and the lowest resistivity (1.8 Ω cm) and had a hole mobility of 5.1 cm²/Vs.     

Effect of 100 MeV O7+ ion beam irradiation on radio frequency reactive magnetron sputtered ZnO thin films

Zinc oxide (ZnO) thin films were deposited on sapphire substrates at room temperature by radio frequency (RF) magnetron sputtering. These films were irradiated with 100 MeV O⁷⁺ ions of the fluencies 5×10¹³ ions/cm² at room temperature (RT) and at liquid nitrogen temperature (LNT). Profilometer studies showed that the roughness of pristine and LNT irradiated ZnO thin films were higher than that of the RT irradiated ZnO thin film. The glancing angle X-ray diffraction analysis reveals a reduced intensity and increased full width at half maximum (FWHM) of the (002) diffraction peak in the case of LNT irradiated film indicating disorder. However, the intensity and FWHM of the (002) diffraction peak in the case of RT irradiated ZnO thin films are comparable to those of the pristine film. UV–visible transmission spectra show that the percentage of transmission and band gap energy are different for RT and LNT irradiated films. While the pristine ZnO thin film exhibits two emissions—a broad emission at 403 nm and a sharp emission at 472 nm in its photoluminescence spectrum; the emission at 472 nm was absent for the irradiated films. The atomic concentrations of zinc and oxygen during the irradiation process were obtained using auger electron spectroscopy.     

Effect of processing parameter on structural,optical and electrical properties of photovoltaic chalcogenide nanostructured RF magnetron sputtered thin absorbing films

The aim of this work was to develop high quality of CuIn_1−xGa_xSe₂ thin absorbing films with x (Ga/In+Ga)<0.3 by sputtering without selenization process. CuIn_0.8Ga_0.2Se₂ (CIGS) thin absorbing films were deposited on soda lime glass substrate by RF magnetron sputtering using single quaternary chalcogenide (CIGS) target. The effect of substrate temperature, sputtering power & working pressure on structural, morphological, optical and electrical properties of deposited films were studied. CIGS thin films were characterised by X-ray diffraction (XRD), Field emission scanning electron microscope (FE-SEM), Energy dispersive X-ray spectroscopy (EDAX), Atomic force microscopy (AFM), UV–vis–NIR spectroscopy and four probe methods. It was observed that microstructure, surface morphology, elemental composition, transmittance as well as conductivity of thin films were strongly dependent on deposition parameters. The optimum parameters for CIGS thin films were obtained at a power 100 W, pressure 5 mT and substrate temperature 500 °C. XRD revealed that thin film deposited at above said parameters was polycrystalline in nature with larger crystallite size (32 nm) and low dislocation density (0.97×10¹⁵ lines m⁻²). The deposited film also showed preferred orientation along (112) plane. The morphology of the film depicted by FE-SEM was compact and uniform without any micro cracks and pits. The deposited film exhibited good stoichiometry (Ga/In+Ga=0.19 and In/In+Ga=0.8) with desired Cu/In+Ga ratio (0.92), which is essential for high efficiency solar cells. Transmittance of deposited film was found to be very low (1.09%). The absorption coefficient of film was ~10⁵ cm⁻¹ for high energy photon. The band gap of CIGS thin film evaluated from transmission data was found to be 1.13 eV which is optimum for solar cell application. The electrical conductivity (7.87 Ω⁻¹ cm⁻¹) of deposited CIGS thin film at optimum parameters was also high enough for practical purpose.     

Effect of UV light irradiation on photovoltaic characteristics of inverted polymer solar cells containing sol–gel zinc oxide electron collection layer

An inverted organic bulk-heterojunction solar cell containing a zinc oxide (ZnO) based electron collection layer with a structure of ITO/ZnO/[6,6]-phenyl C₆₁ butyric acid methyl ester (PCBM): regioregular poly(3-hexylthiophene) (P3HT)/poly(3,4-ethylenedioxylenethiophene): poly(4-styrene sulfonic acid)/Au (ZnO cell) was fabricated. We examined the relationship between the heating temperature of the ZnO layer and the device performance under irradiation by simulated sunlight while cutting the UV light. The effects of the UV light contained in simulated sunlight were investigated by photocurrent–voltage (I–V) and alternating current impedance spectroscopy (IS) measurements. When the ZnO cells were irradiated with simulated sunlight, they exhibited a maximum power conversion efficiency (PCE) of over 3%, which hardly varied with the heating temperature of ZnO layers treated at 250 °C, 350 °C, and 450 °C. In contrast, when the ZnO cells were irradiated with simulated sunlight without UV content, their photovoltaic characteristics were very different. In the case of the cell with ZnO prepared by heating at 250 °C, PCE of 2.7% was maintained even under continuous irradiation with simulated sunlight without UV. However, for the cells with ZnO prepared by heating at 350 °C and 450 °C, the shapes of the I–V curves changed with the UV-cut light irradiation time, accompanying an increase in their series resistance. Overall, after UV-cut light irradiation for 1 h, the PCE of the cell with ZnO prepared by heating at 350 °C decreased to 1.80%, while that of the cell with ZnO prepared by heating at 450 °C fell to 1.35%. The photo IS investigations suggested that this performance change was responsible for the formation of charge-trapping sites at the ZnO/PCBM:P3HT interface which act as recombination centers for photo-produced charges in the PCBM:P3HT layer.     

Fabrication and characterization of Pb1−xYbxTe-based alloy thin-film thermoelectric generators grown by thermal evaporation technique

In this study p-Pb_0.925Yb_0.075Te:Te and n-Pb_0.94Yb_0.06Te powders synthesized by solid-state microwave technique were used to fabricate thermally evaporated thin films. The nanostructure and composition of the films were studied using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and energy dispersive X-ray spectroscopy (EDX). Electrical characterizations of the as-deposited films in terms of the Seebeck coefficient and electrical conductivity and power factor were conducted at a range of 298 K to 523 K. The microthermoelectric devices were composed of 20-pair and 10-pair p-Pb_0.925Yb_0.075Te:Te and n-Pb_0.94Yb_0.06Te thin films on glass substrates. The dimensions of the thin-film thermoelectric generators, which consisted of 20-pair and 10-pair legs connected by aluminum electrodes, were 23 mm×20 mm and 12 mm×10 mm, respectively. The 20-pair p–n thermocouples in series generated a maximum open-circuit voltage output (V_oc) of 0.581 V and a maximum output power of 25.87×10^?8 W at a temperature difference ΔT=164 K, whereas the 10-pair p–n thermocouples generated 0.311 V and 13.71×10^?8 W maximum V_oc and maximum output power, respectively, at ΔT=164 K.     

Using pyridal[2,1,3]thiadiazole as an acceptor unit in a low band-gap copolymer for photovoltaic applications

In this report, we explore the optoelectronic properties of a low band-gap copolymer based on the alternation of electron rich (thiophene and thienothiophene units) and electron deficient units (pyridal[2,1,3]thiadiazole (Py)). Initial density functional theory calculations point out the interest of using the Py unit to optimize the polymer frontier orbital energy levels. A high molecular weight (M_n = 49 kg/mol) solution-processable copolymer, based on Py, thiophene and thienothiophene units, has been synthesized successfully. From cyclic-voltammetry and UV–visible absorption measurements a relatively deep HOMO level (−5.1 eV) and an optical band-gap (1.48 eV) have been estimated. Charge transport both in horizontal and vertical directions were extracted from field-effect transistors and space charge limited current diodes, respectively, and led to a relatively high in-plane hole mobility in pure polymer films (0.7 × 10⁻² cm² V⁻¹ s⁻¹). GIWAXS results showed almost identical in-plane lamellar morphologies, with similar average size and orientation of the polymer crystalline domains in both, pure polymer films and polymer:fullerene blends. Also, the gate-voltage dependence of the field-effect mobility revealed that the energy disorder in the polymer domains was not altered by the introduction of fullerenes. The nevertheless significantly higher out-of-plane hole mobility in blends, in comparison to pure polymer films, was attributed to the minor amorphous polymer phase, presumably localized close to the donor/acceptor interface, whose signature was observed by UV–vis absorption. Promising photovoltaic performances could be achieved in a standard device configuration. The corresponding power conversion efficiency of 4.5% is above the value achieved previously with a comparable polymer using benzo [2,1,3]thiadiazole instead of Py as acceptor unit.     

Investigation of the blue–green emission and UV photosensitivity of Cu-doped ZnO films

Cu-doped zinc oxide (ZnO:Cu) films were deposited on p-Si (100) substrates using radio-frequency reactive magnetron sputtering. The structure and optical properties of the films were characterized by X-ray diffraction spectroscopy (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and fluorescence spectroscopy. XRD and SEM results revealed that ZnO:Cu film had a better preferential orientation along the c-axis compared with pure ZnO film. The chemical state of copper and oxygen in ZnO:Cu films was investigated by XPS. The results suggest that the Cu ion has a mixed univalent and bivalent state. The integrated Cu²⁺/Cu⁺ intensity ratio increased with the O₂ partial pressure. Photoluminescence measurements at room temperature revealed a double peak in the blue regions and a green emission peak. The close relationship between the valence state of Cu ions and the blue–green emission is discussed in detail. A higher photocurrent was observed for ZnO:Cu films under UV illumination. UV photodetectors based on ZnO:Cu films have high sensitivity and fast response and recovery times. Under periodic UV illumination at 380 nm the ZnO:Cu films showed stable photocurrent growth and decay, so the films are potential candidate materials for UV photodetectors.     

Effects of ultraviolet–ozone treatment on organic-stabilized ZnO nanoparticle-based electron transporting layers in inverted polymer solar cells

Electron transporting layers (ETLs) in inverted polymer solar cells (I-PSCs) were fabricated by spin coating a colloidal dispersion of ZnO nanoparticles (NPs), and the effects of ultraviolet–ozone (UVO) treatment on the ZnO NP ETLs were investigated. The brief UVO treatment (<5 min) could considerably improve the performance of the resulting I-PSCs (∼30% increase in power conversion efficiency); whereas, excessive UVO treatment (>10 min) caused significant degradation. The characterization of the ZnO ETLs as a function of the UVO treatment duration revealed that brief treatment can remove the residual organic stabilizer molecules on the surface of the ZnO films by UV induced decomposition mechanism. However, excessive treatment can generate additional defects on/within the ZnO films, which can induce charge recombination. This effect was further confirmed by the thermal treatment of the ZnO ETLs at a high temperature (280 °C) at which the organic surfactants could be removed. Flexible I-PSCs were also fabricated using indium doped tin oxide coated plastic substrates and the usefulness of the room temperature UVO treatment was further confirmed in view of its potential applicability in flexible devices.     

Microbridge preparation through spincoating and photolithography without etching

It is possible to produce HTSC thin films of polymer metal precursors by the simple spincoating technique. This method can be used to manufacture of Y–Ba–Cu–O- and Bi–Sr–Ca–Cu–O–HTSC thin films. The microbridges are generated into the precursor film by photolithography. The etching process step is cancelled. After that the superconducting phases are formed at 950°C respectively 865°C during the tempering process. The HTSC structures serve as a previous stage for SNS contact. The critical temperatures (T_c) measured on the 20 and 200 μm wide microbridges are 82 K for Y–Ba–Cu–O and 108 K for Bi–Sr–Ca–Cu–O. The critical current density (j_c) obtained is 10⁵ A/cm² for 65 K.