MgO界面层对n-ZnO纳米棒/p-GaN异质结LED光电性能的影响

为了较好地实现n-ZnO的电致发光(EL),利用水热法在p-GaN外延片上制备了ZnO纳米棒阵列,构造了n-ZnO纳米棒/p-GaN异质结LED原型器件,并研究了MgO界面层对器件光电性能的影响。结果表明,n-ZnO纳米棒/p-GaN异质结器件具有明显的二极管整流效应。室温、正向偏压下,n-ZnO纳米棒/p-GaN异质结LED仅在430nm附近具有单一的发光峰,而n-ZnO纳米棒/MgO/p-GaN异质结LED的电致发光光谱由一个从近紫外到蓝绿光区的宽发光带组成。结合光致发光(PL)谱和Anderson能带模型,深入分析了n-ZnO纳米棒/p-GaN异质结的载流子复合机制。     

n-ZnO/p-GaN异质结构发光二极管的制备与特性

报道了n-ZnO/p-GaN异质结构发光二极管的制备及其发光特性.采用金属有机气相外延技术在Mg掺杂p型GaN衬底上外延n型ZnO薄膜以形成p-n结.实验发现在一定配比的HF酸和NH4Cl溶液中,腐蚀深度和腐蚀时间呈线性关系,并且二氧化硅和ZnO的腐蚀速率得到很好的控制,这对器件制备的可靠性非常重要.电流-电压(I-V)特性测试显示该器件结构具有明显的整流特性.室温下,在正反向偏压状态下都可用肉眼观察到电致发光现象.同时,通过与光致发光谱进行比较,对电致发光谱中发光峰的起源和发光机制进行了探讨.     

Fabrication and Emission Properties of a n-ZnO/p-GaN Heterojunction Light-Emitting Diode

报道了n-ZnO/p-GaN异质结构发光二极管的制备及其发光特性.采用金属有机气相外延技术在Mg掺杂p型GaN衬底上外延n型ZnO薄膜以形成p-n结.实验发现在一定配比的HF酸和NH4Cl溶液中,腐蚀深度和腐蚀时间呈线性关系,并且二氧化硅和ZnO的腐蚀速率得到很好的控制,这对器件制备的可靠性非常重要.电流-电压(I-V)特性测试显示该器件结构具有明显的整流特性.室温下,在正反向偏压状态下都可用肉眼观察到电致发光现象.同时,通过与光致发光谱进行比较,对电致发光谱中发光峰的起源和发光机制进行了探讨.     

LP-MOCVD法制作n-ZnO/p-Si异质结及其电致发光研究

采用低压-金属有机化学气相沉积法(LP-MOCVD)在(100)p-Si衬底上制备未掺杂n型ZnO薄膜,并制作了相应的n-ZnO/p-Si异质结器件.通过X射线衍射(XRD)、光致发光(PL)光谱和霍尔测试分别研究了所制备薄膜的结构、光学和电学特性.得到具有较高质量的n型ZnO薄膜.在室温条件下,测得了该类异质结器件正向注入电流下可见光和近红外区域的电致发光(EL).     

波长可调谐聚合膜/无机膜异质结电致发光

针对聚合物电致发光材料缺乏可用的电子型聚合物半导体材料的现状,采用无机电子型半导体材料ZnO∶Zn与空穴型聚合物材料PDDOPV[poly (2,5-bis (dodecyloxy)-phenylenevinylene)]成功制备了结构为ITO/PDDOPV/ZnO∶Zn/Al的异质结双层器件.异质结器件的发光效率与亮度较单层器件提高1个数量级以上.该异质结器件的发光颜色是随着电压的增加而蓝移的,其光致发光光谱也随着激发波长的改变而改变,可能形成了新的发光基团.     

n-ZnO/p-Si异质结UV增强型光电探测器的研究

采用平面工艺,在p+-Si背底上电子束蒸发Al制作欧姆电极,在p-Si外延层上溅射掺Al的 ZnO薄膜,再蒸发Al作有源区欧姆电极,研制成n-ZnO/p-Si异质结UV(ultraviolet)增强型光电探测器。测试结果表明:器件明显增强了200～400 nm紫外光的响应,同时保持了传统的Si探测器对波长大于400 nm波段的光谱响应,在330,420,468、525 nm附近有四个明显的光谱峰值响应。器件光致发光谱(PL)在371 nm处有发光峰值。     

p-GaN/Al0.35Ga0.65N/GaN应变量子阱肖特基紫外探测器

报道了p-GaN/Al0.35Ga0.65N/GaN应变量子阱结构的肖特基紫外探测器的制备及性能.器件的测试结果表明,在p-GaN/Al0.35Ga0.65N/GaN双异质结中强烈的压电极化和Stark效应共同作用下使得器件在正偏和反偏时的响应光谱都向短波方向移动了10nm.零偏下器件在280nm时的峰值响应为0.022A/W,在反向偏压为1V时,峰值响应增加到0.19A/W,接近理论值.在正向偏压下器件则呈平带状态,并在283和355nm处分别出现了两个小峰.在考虑极化的情况下,通过器件中载流子浓度分布的变化解释了器件在不同偏压下的响应特性,发现p-GaN/Al0.35Ga0.65N/GaN中的极化效应对器件的响应特性影响很大,通过改变偏压和适当的优化设计可以使探测器在紫外波段进行选择性吸收.     

p-GaN/Al0.35Ga0.65N/GaN应变量子阱肖特基紫外探测器

报道了p-GaN/Al0.35Ga0.65N/GaN应变量子阱结构的肖特基紫外探测器的制备及性能.器件的测试结果表明,在p-GaN/Al0.35Ga0.65N/GaN双异质结中强烈的压电极化和Stark效应共同作用下使得器件在正偏和反偏时的响应光谱都向短波方向移动了10nm.零偏下器件在280nm时的峰值响应为0.022A/W,在反向偏压为1V时,峰值响应增加到0.19A/W,接近理论值.在正向偏压下器件则呈平带状态,并在283和355nm处分别出现了两个小峰.在考虑极化的情况下,通过器件中载流子浓度分布的变化解释了器件在不同偏压下的响应特性,发现p-GaN/Al0.35Ga0.65N/GaN中的极化效应对器件的响应特性影响很大,通过改变偏压和适当的优化设计可以使探测器在紫外波段进行选择性吸收.     

n-ZnO/p-GaN异质结紫外探测器及其光电性能研究

利用脉冲激光沉积(PLD)方法在p-GaN衬底上沉积了n-ZnO薄膜,构造了n-ZnO/p-GaN异质结型紫外(UV)光-电探测器原型器件,在(UV)光照条件下测试了器件的光电性能。扫描电镜(SEM)和X射线衍射(XRD)测试结果表明,ZnO薄膜具有很好的结晶质量;I-V曲线显示,器件在黑暗和光照环境下都表现出明显的整流行为;光谱响应曲线表明,器件响应度峰值出现在364nm附近,当反向电压为-5V时光电流达到饱和,此时响应度峰值达到1.19A/W。不同反向工作电压下的光谱探测率曲线表明,器件对364nm附近的UV光有较强的选择性,在-2V偏压下具有最佳的探测率,其探测率峰值达到8.9×1010 cm·Hz1/2/W。     

热退火对Mg掺杂InGaN/GaN异质结特性的影响

系统地研究了氧气氛围中退火温度对Mg掺杂InGaN/GaN异质结电学特性及光学性能的影响.电流电压特性和表面方块电阻的测试表明,与p-GaN相比,p-InGaN/GaN异质结的最佳退火温度较低,而且容易与非合金化的Ni/Au电极形成欧姆接触.分析认为InGaN具有的较小带隙能量和p-InGaN/GaN异质结中存在强烈的极化效应以及InN较高的平衡蒸汽压是引起以上结果的主要原因.p-InGaN/GaN异质结10 K的光致荧光光谱中存在两个分别位于2.95 eV和2.25 eV的发光峰,随着材料退火温度的提高,这两个发光峰的强度逐渐降低.提出了类施主补偿中心参与的与H相关的络合物与Mg受主的复合发光机制,对退火前后光致荧光光谱的变化进行了解释.     

Transparent Al/WO3/Au film as anode for high efficiency organic light-emitting diodes

A transparent Al/WO₃/Au anode is introduced to fabricate high efficiency organic light-emitting devices (OLEDs). By optimizing the thicknesses of each layers of the Al/WO₃/Au structure, the transmittance of Al(7 nm)/WO₃(3 nm)/Au(13 nm) has reached over 55%. Concerning the performance of OLEDs using the optimized anode, the electroluminescence (EL) current efficiency and brightness are enhanced and the EL spectrum is greatly narrowed as compared to the OLEDs using indium-tin-oxide (ITO) as the anode. The results indicate that the metal/metal oxide/metal transparent electrode is a good structure for the anode of high performance OLEDs. In addition, Al/WO₃/Au can function as a composite transparent electrode for top-emitting OLEDs.     

Ultraviolet Electroluminescence From n-ZnO–SiO$_{2}$–ZnO Nanocomposite/p-GaN Heterojunction Light-Emitting Diodes at Forward and Reverse Bias

Ultraviolet (UV) light-emitting diodes composed of n-ZnO : Al–SiO$_{2}$–ZnO nanocomposite/p-GaN : Mg heterojunction were fabricated on the (0002) Al$_{2}$O$_{3}$ substrate. A SiO$_{2}$ layer embedded with ZnO nanodots was prepared on the p-type GaN using spin-on coating of SiO$_{2}$ nanoparticles together with atomic layer deposition (ALD). An n-type Al-doped ZnO layer was deposited also by ALD. The SiO$_{2}$ –ZnO nanocomposite layer accomplishes a role of the current blocking layer and also causes, by its low refractive index, the increase in the light extraction efficiency from n-ZnO. Significant UV electroluminescence from n-ZnO was achieved at a low forward-bias current of 1.8 mA. Strong UV emission arising from impact ionization in GaN, ZnO, and GaN : Mg states was also observed at reverse breakdown bias.      

A Ga-doped ZnO transparent conduct layer for GaN-based LEDs

An 8 μm thick Ga-doped ZnO (GZO) film grown by metal-source vapor phase epitaxy was deposited on a GaN-based light-emitting diode (LED) to substitute for the conventional ITO as a transparent conduct layer (TCL). Electroluminescence spectra exhibited that the intensity value of LED emission with a GZO TCL is markedly improved by 23.6% as compared to an LED with an ITO TCL at 20 mA. In addition, the forward voltage of the LED with a GZO TCL at 20 mA is higher than that of the conventional LED. To investigate the reason for the increase of the forward voltage, X-ray photoelectron spectroscopy was performed to analyze the interface properties of the GZO/p-GaN heterojunction. The large valence band offset (2.24±0.21 eV) resulting from the formation of Ga2O3 in the GZO/p-GaN interface was attributed to the increase of the forward voltage.     

Improved light extraction efficiency and leakage characteristics in light-emitting diodes by nanorod arrays formed on hexagonal pits

We report the enhancement of light extraction efficiency (LEE) and electrical performance in GaN-based green light-emitting diodes (LEDs) using ZnO nanorods formed on the etched surface of p-GaN. Green LEDs with hybrid ZnO nanorod structures grown on the hexagonally etched topmost layer of the LEDs, show an improvement in electroluminescence intensity that is 3.5 times higher than LEDs without any other surface treatments. The improvement in LEE in LEDs with nanohybrid structures was confirmed by finite-difference time-domain simulation analysis. Besides LEE enhancement, the surface etching effects on the reduction of leakage current of fabricated LEDs were also investigated.     

磁控溅射NiO/ZnO透明异质结二极管及其光电特性研究

采用磁控溅射方法在ITO玻璃基板上沉积NiO,ZnO,AZO三层透明氧化物薄膜,成功制备了NiO/ZnO透明异质结二极管.实验结果表明,PN结展示出明显的I-V整流特性,正向开启电压1V;在氙灯光照条件下,二极管反向电流在5V偏置时,达到1.5 mA.二极管在可见光的平均透过率约为25%.     

基于BAlq的有机电致发光器件的磁效应

研究了ITO/NPB(40nm)/BAlq(60nm)/BCP(5nm)/LiF(0.8nm)/AI有机电致发光器件(OLED)的磁效应.实验结果表明,磁场在10mT时,器件的效率最大增加了34%,这一结果是由于三线态激子与三线态激子间的相互淬灭产生激发单线态激子从而使单线态激子比率增加,致使电致发光(EL)增强.当磁...     

Electron Injection Enhancement by Diamond-Like Carbon Film in Polymer Electroluminescence Devices

用正丁胺作碳源,采用射频辉光等离子系统制备类金刚石碳膜(DLC),沉积在聚合物发光器件中的发光层(MEH-PPV)和铝(Al)阴极间作电子注入层.制备了结构为ITO/MEH-PPV/DLC/Al的不同DLC厚度的器件,测量了器件的I-V特性、亮度及效率,研究了DLC层对器件电子注入性能影响的机制.结果表明:当DLC厚度小于1.0nm时,其器件有较ITO/MEH-PPV/Al高的启动电压和低的发光效率;当DLC厚度在1.0～5.0nm之间时,器件的性能随着DLC厚度增加而变好;当DLC厚度为5.0nm时,器件具有最低的启动电压与最高的发光效率;当DLC厚度继续增加时,器件的性能随着DLC厚度增加而变差.并对ITO/MEH-PPV/DLC/Al和ITO/MEH-PPV/LiF/Al的器件性能进行了比较研究.