脉冲激光沉积Er:LiNbO3薄膜及1.54μm光致发光的研究

利用脉冲激光沉积(PLD)技术,通过双靶(Er₃O₂/LiNbO₃)交替与脉冲激光作用,在SiO ₂/Si 衬底上制备了c-轴择优取向的Er掺杂LiNbO₃(Er:LiNbO₃)薄 膜。用X射线衍射(XRD)、 场发射扫描电子显微镜(FESEM)、台阶仪及光致发光(PL)光 谱对制备的掺杂薄膜进行了表征。研究了衬底温度、O₂压及沉积时间对Er:LiNbO₃薄膜 结晶、表面形貌及 PL性能的影响。结果发现,衬底温度低于300℃时制备的Er:LiNbO 3薄膜为非晶膜,随衬底温度升高,薄膜出 现(006)衍射峰,并且其强度随衬底温度升高而增大;O₂压变化对 利用双靶沉积获得的Er:LiNbO₃薄膜择优 取向及(006)衍射峰强度影响不明显;沉积时间越长Er:LiNbO₃薄膜 中Er³⁺浓度越大,但结晶择优取向 变差;利用532nm波长激光泵浦,室温下,在1537nm波长处测得很强的光致荧光峰,而且沉积时间越长谱峰越尖锐强 度越大。     

分子束外延高铟组分InGaAs薄膜研究

研究了分子束外延生长条件对高铟组分InGaAs材料性能的影响,分析了生长温度、V/III比和As分子束形态对In_0.74Ga_0.26As材料光致发光和X射线衍射峰强度、本底载流子浓度和迁移率的影响。测试结果表明：适中的生长温度和V/III比可以提高材料晶格质量,减少非辐射复合,降低本底杂质浓度。As分子束为As₂时In_0.74Ga_0.26As材料质量优于As₄分子束。当生长温度为570 ℃,As分子束形态为As₂,V/III比为18时,可以获得较高的光致发光和X射线衍射峰强度,室温和77 K下的本底载流子浓度分别达到6.3×10¹⁴ cm^-3和4.0×10¹⁴ cm^-3,迁移率分别达到13 400 cm²/Vs和45 160 cm²/Vs。     

掺氮氧化铪的光学特性研究

掺氮氧化铪是半导体工业非常重要的材料。在本论文中,我们利用Hf[N(C₂H₅)(CH₃)]₄ 和 H₂O₂作为原子层淀积的前驱体,制备了二氧化铪材料。然后,我们使用快速热退火的办法,在不同温度下,对二氧化铪进行了氮掺杂工艺。我们对掺氮二氧化铪的组分,跟硅界面的稳定性以及薄膜材料的光学特性随退火温度的变化进行了细致的研究。研究发现,随着退火温度的提高,二氧化铪薄膜材料的氮组分从1.41% 上升至 7.45%,相应的,薄膜材料的禁带宽度从5.82 eV 降低为 4.94 eV。     

InSb薄膜磁阻效应的厚度依赖性

在12~300K的温度范围内研究了InSb薄膜(利用MBE生长)的磁阻效应随厚度的变化关系.实验发现厚的InSb薄膜只能产生半经典(∝B2)磁阻效应.而减小薄膜厚度,在薄的InSb薄膜中会更容易出现弱反局域化效应,从而造成在低温下(35K)出现了一个异常的随温度增加而迁移率降低的趋势.我们发现该弱反局域化效应可用HLN模型拟合,证明了它可能来源于二维(2-D)体系,比如InSb的界面态.     

退火Cu2O薄膜的结构及光学特性

采用射频(RF)磁控溅射单质金属铜(Cu)靶, 在O₂和Ar的混合气氛下制备了Cu₂O薄 膜,并在N₂气氛下对预沉积的Cu₂O薄膜进行快速光热退火(RTA)处理,研究了 衬底温度及退火温度对Cu₂O 薄膜的生长行为、物相结构、表面形貌及光学性能的影响。结果表明,衬底温度在300℃以 下预沉积的Cu₂O薄膜 为非晶薄膜,退火处理对Cu₂O薄膜的结晶行为有明显影响,在N₂气氛下对Cu₂O薄膜进 行退火处理不影响薄膜的物 相结构;预沉积和退火Cu₂O薄膜在650nm以下波长范围内均有较强 吸收,吸收强度随退火温度的增加而增强,薄 膜在400nm以下波长范围内出现两个由缺陷引起的中间带(IB)吸收行 为,快速热退火处理不能减少或消除薄膜沉积 过程中形成的缺陷态;退火处理影响薄膜的光学带隙Eg,预沉 积薄膜经600℃退火处理,E_g值增大了 0.26eV。     

大面积ReS2微结构的制备及表征

采用化学气相沉积法(Chemical Vapor Deposition,CVD),通过控制生长温度和时间,在氟金云母衬底(KMg₃(AlSi₃O₁₀)F₂)上制备出大面积、高质量的ReS₂层状薄膜、纳米片、纳米花等微结构。利用拉曼显微镜(Raman)、光致发光光谱(PL)、原子力显微镜(AFM)、X射线光电子能谱分析(XPS)、扫描电子显微镜(SEM)及能谱仪(EDS)对所制备的ReS₂结构进行表征。结果显示:ReS₂能够在表面平整且为惰性的氟金云母衬底上实现大面积高质量的面内、外生长;面外生长的ReS₂纳米片和纳米花结构的拉曼光谱相对于层状的ReS₂结构在207cm-1附近的特征峰处存在红移现象,在163cm-1附近的特征峰相对强度不断减弱;ReS₂微结构的PL峰的位置基本无变化,但是峰值强度随面外生长而不断减弱。     

溅射压力对制备a-GaAs1-xNx 薄膜光学常数的影响

采用反应磁控溅射法在室温条件下制备了a-GaAs_1-xN_x 薄膜。实验测定了薄膜厚度、氮含量、载流子浓度和光学透过率及并研究了其随溅射压的变化。系统研究了溅射压对所制备薄膜的光学带隙、折射率和色散参数的影响。所制备的薄膜为直接带隙材料,利用Cauchy和Wemple模型能够很好地拟合所制备薄膜的折射率色散曲线。     

（英）沉积温度对脉冲激光沉积法在YSZ (100)衬底上生长的Mn1.56Co0.96Ni0.48O4尖晶石薄膜结构、电学和磁学性能的影响

在YSZ（100）衬底上,采用脉冲激光沉积法在500℃至700℃的不同沉积温度下生长出尖晶石结构的Mn_1.56Co_0.96Ni_0.48O₄（MCNO）薄膜.由于沉积温度是制备高质量薄膜的重要因素,本文研究了MCNO薄膜结构、电学和磁学性能随沉积温度的变化.通过对X射线衍射图和原子力显微镜图像的分析,发现MCNO薄膜的结晶与沉积温度有很大关系.随着沉积温度的升高,MCNO薄膜的电阻率呈V型变化,其导电过程可以用小极化子跳跃机理来描述.同时,随温度变化的磁化曲线表明所有样品都显示出从铁磁性到顺磁性的转变,且沉积温度为600℃的MCNO薄膜具有216 K的高居里温度.以上研究结果表明,在600℃沉积的MCNO薄膜具有适用于热敏电阻器件和多功能异质结所需的良好性能.     

渠道火花烧蚀法制备In2O3∶Mo透明导电薄膜

采用渠道火花烧蚀技术在普通玻璃基板上制备了掺钼氧化铟In₂O₃∶Mo透明导电薄膜，研究了烧蚀时氧气压强对薄膜光电性能的影响. 在基板温度Ts=350℃时，薄膜的电阻率和载流子浓度随氧气压强增大分别呈凹形和凸形的变化趋势. 薄膜电阻率最小值是4.8e-4Ω·cm，载流子浓度为7.1e20cm^-3. 载流子迁移率最高可达49.6cm²/ (V·s) . 可见光区域平均透射率大于87%以上，由紫外光电子谱分析得到薄膜的表面功函数为4.6eV. X射线衍射分析表明，薄膜结晶性良好并在（222）晶面择优取向生长. 原子力显微镜观察薄膜样品表面得到方均根粗糙度为0.72nm,平均粗糙度为0.44nm，峰谷最大差值为15.4nm.     

太赫兹瞬态光谱研究La0.7Ca0.3MnO3薄膜的温度相关相变

利用太赫兹瞬态光谱研究了La_0.7Ca_0.3MnO₃薄膜的热力学性质。La_0.7Ca_0.3MnO₃薄膜的金属-绝缘体相变温度在260 K左右,与铁磁-顺磁相变温度几乎相同。结果表明,La_0.7Ca_0.3MnO₃薄膜的电导率与薄膜中磁矩取向密切相关。研究发现在40～200 K的低温范围内,La_0.7Ca_0.3MnO₃薄膜的电导率可以用Drude模型拟合,在210～290 K的高温范围内可以用Drude-Lorentz模型拟合。     

多层In_(0.55)Al_(0.45)As/A_(0.5)Ga_(0.5)As量子点的变温光致发光研究

测量了自组织多层In0.55Al0.45As/Al0.5Ga0.5As量子点的变温光致发光谱,同时观察到来自浸润层和量子点的发光,首次直接观察到了浸润层和量子点之间的载流子热转移.分析发光强度随温度的变化发现浸润层发光的热淬灭包括两个过程:低温时浸润层的激子从局域态热激发到扩展态,然后被量子点俘获;而温度较高时则通过势垒层的X能谷淬灭.利用速率方程模拟了激子在浸润层和量子点间的转移过程,计算结果与实验符合得很好     

Optical properties of GaAs/AlAs superlattices grown on (311)A GaAs surfaces

We present a temperature-dependence photoluminescence of (GaAs)₅/(AlAs)₅ superlattice grown on (311)A-oriented semi-insulating substrate by molecular beam epitaxy. The temperature dependence reveals an anomalous decrease of the PL width, which is explained in terms of phonon-assisted thermal activation of localized excitons.     

Synthesis and photoluminescence properties of the 4H-SiC/SiO2 nanowires

4H-SiC/SiO2 nanowires are synthesized and the temperature-dependent photoluminescence （PL） properties of the nanowires are studied. Their structure and chemical composition are studied by scanning electron microscopy （SEM）, transmission electron microscopy （TEM）, X-ray diffraction （XRD）, and Raman spectra. At room temperature, an ul- traviolet PL peak and a green PL band are observed. From the PL spectrum measured in the temperature range from 80 K to 300 K, the free excition emission, donor bound excition emission and their multiple-phonon replicas have been observed in ultraviolet region, and their origins have been identified. Moreover, it has been found that the temperature dependence of the free exciton peak position can be described by standard expression, and the thermal activation en- ergy values extracted from the temperature dependence of the free exciton and bound exciton peak integral intensity are about 40 meV and 181 meV, respectively.     

Influence of the cap layer thickness on photoluminescence properties in strained InGaAs/GaAs single quantum wells

The influence of the GaAs cap layer thickness on the luminescence properties in strained In_0.20Ga_0.80As/GaAs single quantum well (SQW) structures has been investigated using temperature-dependent photoluminescence (PL) spectroscopy. The luminescence peak is shifted to lower energy as the GaAs cap layer thickness decreases, which demonstrates the effect of the GaAs cap layer thickness on the strain of InGaAs/GaAs single quantum wells (SQW). We find the PL quenching mechanism is the thermal activation of electron hole pairs from the wells into the GaAs cap layer for the samples with thicker GaAs cap layer, while in sample with thinner GaAs cap layer exciton trapping on misfit dislocations is dominated.     

Tuning the Excitonic States in MoS2/Graphene van der Waals Heterostructures via Electrochemical Gating

The behavior of excitons in van der Waals (vdWs) heterostructures depends on electron–electron interactions and charge transfer at the hetero‐interface. However, what still remains to be unraveled is to which extent the carrier densities of both counterparts and the band alignment in the vdWs heterostructures determine the photoluminescence properties. Here, we systematically study the photoluminescence properties of monolayer MoS₂/graphene heterostructures by modulating the carrier densities and contact barrier at the interface via electrochemical gating. It is shown that the PL intensities of excitons can be tuned by more than two orders of magnitude, and a blue‐shift of the exciton peak of up to 40 meV is observed. By extracting the carrier density of MoS₂ using an electric potential distribution model, and the Schottky barrier using first‐principle calculations, we find that the controllable carrier density in MoS₂ plays a dominant role in the PL tuning at negative gate bias, whereas the interlayer relaxation of excitons induced by the Schottky barrier has a major contribution at positive gate bias. This is further verified by controlling the tunneling barrier and screening field across MoS₂ by inserting self‐assembled monolayers (SAMs) at the interface. These findings will benefit to better understand the effect of many‐body interactions and hetero‐interfaces on the optical and optoelectronic properties in vdWs heterostructures.     

Growth and photoluminescence study of ZnSe quantum dots

We report detailed photoluminescence (PL) studies of ZnSe quantum dots grown by controlling the flow duration of the precursors in a metal-organic chemical vapor deposition system. The growth time of the quantum dots determines the amount of blue shift observed in the PL measurements. Blue shift as large as 320 meV was observed, and the emission was found to persist up to room temperature. It is found that changing the flow rate and the total number of quantum dot layers also affect the peak PL energy. The temperature dependence of the peak PL energy follows the Varshni relation. From analyzing the temperature-dependent integrated intensity of the photoluminescence spectra, it is found that the activation energy for the quenching of photoluminescence increases with decreasing quantum dot size, and is identified as the binding energy of the exciton in ZnSe quantum dot.     

Aggregate States and Energetic Disorder in Highly Ordered Nanostructures of para‐Sexiphenyl Grown by Hot Wall Epitaxy

We report on photoluminescence (PL) and thermally stimulated luminescence (TSL) in highly ordered nanostructures of para‐sexiphenyl (PSP) grown by hot wall epitaxy (HWE). A low‐energy broad band is observed in the PL spectra that can be attributed to the emission from molecular aggregates. While the intrinsic exciton emission in steady‐state PL dominates at low temperatures, the emission from aggregates increases with elevating temperature and its magnitude depends sensitively on film preparation conditions. Time‐resolved PL measurements showed that the aggregate emission decays with a life‐time of ≈ 4 ns, which is approximately an order of magnitude larger than the lifetime of singlet excitons. TSL data suggests the presence of an energetically disordered distribution of localized states for charge carriers in PSP films, which results from an intrinsic disorder in this material. A low‐temperature TSL peak with the maximum at around 30 K evidences for a weak energy disorder in PSP films, and has been interpreted in terms of a hopping model of TSL in disordered organic materials.     

Optical spectroscopy of free excitons in a CuInS<Subscript>2</Subscript> chalcopyrite semiconductor compound

The spectra of reflectance and luminescence of high-quality CuInS₂ single crystals grown by oriented crystallization are studied at the temperature 4.2 K. In the region of the fundamental absorption edge, the two excitonic resonance reflectance peaks, nondegenerate peak A at the energy ～1.5356 eV and doubly degenerate peak BC at the energy ～1.5567 eV, and the luminescence signal produced by free and bound excitons are observed. The luminescence lines, A _UPB at ～1.5361 eV and A _LPB at ～1.5347 eV, with a half-width ～1 meV, are attributed to exciton-polariton recombination. From the experimentally observed energy position of the exciton ground state and excited states, the binding energy of free excitons is determined to be ～18.5 meV. In studying the photoluminescence in magnetic fields up to 10 T, a diamagnetic shift of the ground state of free excitons A is observed.     

Photoluminescent properties of ZnO thin films grown on SiO2/Si(100) by metal-organic chemical vapor deposition

We report on the photoluminescent (PL) properties of ZnO thin films grown on SiO₂/Si(100) substrates using low pressure metal-organic chemical vapor deposition. The growth temperature of the films was as low as 400°C. From the PL spectra of the films at 10–300 K, strong PL peaks due to free and bound excitons were observed. The origin of the near bandedge emission peaks was investigated measuring temperature-dependent PL spectra. In addition, the Zn O films demonstrated a stimulated emission peak at room temperature. Upon illumination with an excitation density of 1 MW/cm², a strong, sharp peak was observed at 3.181 eV.     

Quantitative estimation of exciton quenching strength at interface of charge injection layers and organic semiconductor

The performance of polymer light emitting diodes (PLEDs) degrades due to exciton quenching at the interface with charge injection layers and electrodes. We investigate the photo-physics of singlet excitons in Poly (9, 9-dioctylfluorene-alt-benzothiadiazole) (F8BT) conjugated polymer interfaced with various commonly used hole and electron injection layers. Absolute, steady-state and transient photoluminescence (PL) studies are carried out on pristine F8BT film and films with injection layer/F8BT to understand the role of injection layers on exciton quenching. Exciton quenching by the charge injection layers is treated by accounting for both exciton diffusion and the non-radiative transfer of energy to the charge injection layer. The non-radiative transfer of energy is modelled using dipole-dipole interaction theory coupled with diffusion of excitons, from which we obtain the exciton capture radius (x₀) in the range of 1–7 nm. We also correlate x₀ with PL decay time (τ) using the relation τ α 1/x₀³. The steady-state PL yield for each case also shows correlation with the PL decay lifetime. This study provides interesting insight on the selection criterion for injection layer to be used in PLEDs for minimizing optical losses while preserving the electronic injection properties.