CdTe和CdTe/CdS量子点的量子尺寸效应

利用水热法合成了三种不同尺寸的单核CdTe量子点和核壳CdTe/CdS量子点。应用Top-hat Z-scan技术在纳秒、皮秒、飞秒激光脉冲作用下研究了三种不同尺寸单核CdTe量子点的非线性吸收特性。实验结果表明:在不同激光脉冲作用下三种不同尺寸的CdTe量子点的非线性吸收特性均表现为饱和吸收,并且均呈现出随着量子点尺寸的减小,其非线性吸收特性增大的趋势。为了进一步研究量子点尺寸的变化对非线性吸收特性的影响,又在飞秒激光脉冲作用下研究了核壳CdTe/CdS量子点的非线性吸收特性;随着包壳时间的增加,壳层厚度增加,量子点尺寸增加,其非线性吸收特性呈减小趋势,并且核壳CdTe/CdS量子点的非线性吸收特性明显优于单核CdTe量子点;分析讨论了单核CdTe量子点与核壳CdTe/CdS量子点的非线性吸收特性和量子尺寸效应机制,实验结果表明合成的量子点样品均具有良好的量子尺寸效应。     

硼预淀积对自组织生长Ge量子点尺寸分布的影响

研究了以不同B2H6流量预淀积硼对UHV/CVD自组织生长Ge量子点尺寸分布的影响。在适当的生长条件下,得到了尺寸分布很窄的均匀Ge量子点,用AFM对量子点的形貌进行观察,Ge量子点尺寸的涨落小于±3%,量子点的水平尺寸和高度分别为60nm和10nm,密度为8×109cm-2。实验结果表明,通过预淀积硼表面处理,可以得到尺寸分布很窄的量子点,以满足量子点光电器件方面应用的要求。     

UHV/CVD自对准生长Ge量子点(英文)

在超高真空化学汽相淀积设备(UHV/CVD)上生长了小尺寸、大密度、垂直自对准的Ge量子点。采用原子力显微镜分析量子点的尺寸,可优化其生长温度和时间,在550℃,15s的条件下生长出尺寸最小的量子点,直径30nm,高约2nm。最上层多层结构Ge量子点中岛状量子点的比例为75%,其直径66nm,高11nm,密度4.5×109cm-2。利用透射电子显微镜分析了垂直自对准的Ge量子点的截面形貌,结果表明多层结构Ge量子点是垂直自对准的。Ge量子点及其浸润层的喇曼谱峰位分别为299cm-1和417cm-1,说明Ge量子点是应变的并且界面存在互混现象。采用光荧光谱分析了Ge量子点的光学特性。     

玻璃中半导体CdSSe量子点的界面态发光

研究了玻璃中半导体Cd SSe量子点的界面态发光.在10 K温度下,通过PL 和吸收光谱实验,研究了半导体Cd SSe量子点,并进行了变温测量.分析了半导体量子点的量子尺寸效应、温度对PL 和吸收光谱的影响.实验发现PL 谱中在1.84e V和1.91e V有两个尖锐的发光峰,且峰位不随量子点尺寸大小变化而漂移,这是来源于与量子点尺寸无关的界面态的发光;同时,界面态的发光强度应与量子点半径成反比,实验结果与之相符.     

玻璃中半导体CdSSe量子点的界面态发光

研究了玻璃中半导体CdSSe量子点的界面态发光.在10K温度下,通过PL和吸收光谱实验,研究了半导体CdSSe量子点,并进行了变温测量.分析了半导体量子点的量子尺寸效应、温度对PL和吸收光谱的影响.实验发现PL谱中在1.84eV和1.91eV有两个尖锐的发光峰,且峰位不随量子点尺寸大小变化而漂移,这是来源于与量子点尺寸无关的界面态的发光;同时,界面态的发光强度应与量子点半径成反比,实验结果与之相符.     

纳米量子点能级以及能隙计算和修正

用一个简单模型分析了量子点产生能级的原因,推导出能级与量子点尺寸的表达式。根据量子点表面势垒为有限值的特点以及表面存在衰减波,提出量子点内电子波函数不完全满足驻波条件的观点,在量子点的能级表达式中引入一个修正系数。结合量子点表面衰减波的特征,给出量子点修正系数的计算方法。通过理论计算表明：量子点的能级以及能级之间的能量差（间隙）不但与量子点的尺寸有关,而且与其边界条件有关。特别是对于非光滑的表面,其表面势垒对量子点的能级与能隙影响非常大。     

玻璃中CdSeS量子点的结构和光学性质

用两步退火法在掺 Cd Se S的玻璃中制备了高密度的量子点 ,均匀性较好 .量子点尺寸随第二步退火时间加长而增大 ,但组份基本不变 .研究了量子点光学性质与退火时间的依赖关系 ,证明光致发光谱中的低能峰与量子点表面缺陷态有关 .量子点尺寸越小 ,比表面积越大 ,该峰相对强度越大     

玻璃中CdSeS量子点的结构和光学性质

用两步退火法在掺CdSeS的玻璃中制备了高密度的量子点,均匀性较好.量子点尺寸随第二步退火时间加长而增大,但组份基本不变.研究了量子点光学性质与退火时间的依赖关系,证明光致发光谱中的低能峰与量子点表面缺陷态有关.量子点尺寸越小,比表面积越大,该峰相对强度越大.     

半导体量子点的电子结构

半导体量子点是一种具有显著量子尺寸效应的介观体系。文中从固体能带理论出发，对箱形量子点、球形鼻子点、巨型鼻子点以及磁场中量子点的电子结构进行了讨论。     

PbSe量子点的制备与近红外波段光学性质研究

通过化学溶液体系中反应温度与原料配比的控制获得了尺寸分布均匀的窄带隙半导体PbSe量子点。利用吸收光谱、X射线衍射（XRD）、透射电子显微镜（TEM）和高分辨透射电子显微镜（HRTEM）等手段研究了化学溶液法制备的PbSe量子点形貌、尺寸分布及红外吸收等特性。结果表明,所获得的量子点尺寸分布均匀,结晶性良好,并实现了第一吸收峰在885 nm～2 200 nm范围内可调的PbSe量子点。     

Confinement of gold quantum dot arrays inside ordered mesoporous silica thin film

Periodic disposed quantum dot arrays are very useful for the large scale integration of single electron devices. Gold quantum dot arrays were self-assembled inside pore channels of ordered amino-functionalized mesoporous silica thin films, employing the neutralization reaction between chloroauric acid and amino groups. The diameters of quantum dots are controlled via changing the aperture of pore channels from 2.3 to 8.3 nm, which are characterized by HRTEM, SEM and FT-IR. UV-vis absorption spectra of gold nanoparticle/mesoporous silica composite thin films exhibit a blue shift and intensity drop of the absorption peak as the aperture of mesopores decreases,which represents the energy level change of quantum dot arrays due to the quantum size effect.     

金量子点阵列在有序二氧化硅介孔薄膜中的束缚研究

Periodic disposed quantum dot arrays are very useful for the large scale integration of single electron devices. Gold quantum dot arrays were self-assembled inside pore channels of ordered amino-functionalized mesoporous silica thin films, employing the neutralization reaction between chloroauric acid and amino groups. The diameters of quantum dots are controlled via changing the aperture of pore channels from 2.3 to 8.3 nm, which are characterized by HRTEM, SEM and FT-IR. UV-vis absorption spectra of gold nanoparticle/mesoporous silica composite thin films exhibit a blue shift and intensity drop of the absorption peak as the aperture of mesopores decreases, which represents the energy level change of quantum dot arrays due to the quantum size effect.     

Facetting of the self-assembled droplet epitaxial GaAs quantum dot

In this work, droplet epitaxially grown GaAs quantum dots on AlGaAs surface are studied. The quantum dots are investigated in situ with RHEED and ex situ with TEM method. The TEM picture shows that the quantum dot is perfectly crystalline and fits very well to the crystal structure of the substrate. Furthermore, the side of the quantum dot shows stepped facet shape. Here, we show, how the stepped side shape forms from the droplet during crystallization. The RHEED picture shows broadened chevron-tail, which can be explained by the shape of the quantum dot.     

半导体量子点的电容

当电子数目很少量,用简谐势来描述量子点中电子所受的约束是一种很准确的近似。文章利用量子力学中的少体理论方法研究了二电子系统和三电子系统的行为。少体理论可以把质心运动和相对运动分离,从而得到精确的数值解。利用单个电子在量子点中的基态波函数的束缚行为,选择了量子点的束缚能。通过对ＣｄＳ、ＰｂＳ等半导体纳米粒子的充电电容的计算找到了其在室温下形成单电子器件的最大粒径。     

Self-assembled semiconductor structures: electronic andoptoelectronic properties

Strained epitaxy has been shown to produce pyramidal-shaped semiconductor dot structures by single-step epitaxy. The very high density of these dots (approaching per wafer) and their ever improving uniformity suggest that these features could have important applications in future microelectronics. Understanding the structural and electronic properties of these quantum dots is therefore of great importance. In this paper, we examine some of the physics controlling the performance of devices that could be made from such structures. The self-assembled quantum dots are highly strained and we will examine the strain tensor in these quantum dots using a valence force-field model. In this paper we will address the following issues: (1) What is the general nature of the strain tensor in self assembled quantum dots? (2) What are the electron and hole spectra for InAs-GaAs quantum dots? (a) What are the important intersubband radiative and nonradiative scattering processes in the self assembled quantum dots? In particular, we will discuss how the electron-phonon interactions are modified in the quantum dot structures. Consequences for uncooled intersubband devices such as lasers, detectors, and quantum transistors will be briefly discussed     

Growth and characterizations of InP self-assembled quantum dots embedded in InAIP grown on GaAs substrates

We report the characteristics of InP self-assembled quantum dots embedded in In_0.5Al_0.5P on GaAs substrates grown by metalorganic chemical vapor deposition. The InP quantum dots show increased average dot sizes and decreased dot densities, as the growth temperature increases from 475°C to 600°C with constant growth time. Above the growth temperature of 600°C, however, dramatically smaller and densely distributed self-assembled InP quantum dots are formed. The small InP quantum dots grown at 650°C are dislocation-free “coherent” regions with an average size of ∼20 nm (height) and a density of ∼1.5 × 10⁸ mm⁻². These InP quantum dots have a broad range of luminescence corresponding to red or organge in the visible spectrum.     

Photoluminescence of strain-induced coupled InGaAs/GaAs quantum-dot pairs

Coupled quantum dot-pairs were fabricated by growing InP self-assembled islands as stressors on InGaAs/GaAs double quantum wells. State filling in the photoluminescence spectra was used to resolve the quantum states in the coupled dots. The total strain field below the stressor decays exponentially with a penetration depth of about 25 nm, within which a dot-pair can be fabricated. Strong coupling is observed at a barrier width less than 4 nm separating the dot-pair. By increasing the indium composition in the lower well in order to match its dot level with one in the upper dot with identical quantum numbers, resonant coupling between the electron states with identical quantum numbers in the two dots can be achieved. Decoupling of the hole states and exchange of the electron bonding states from dominating the upper dot to the lower one are clearly resolved from the state energies and their spacings.     

分子束外延InAs量子点的RHEED实时原位分析

介绍了利用反射式高能电子衍射(RHEED)方法在自组装InAs量子点制备过程中进行结构分析的理论研究与实验工作的最新进展。从反射式高能电子衍射在InAs量子点临界转变状态测定、量子点表面取向、量子点应力分布测定、量子点形核长大动力学过程研究等方面的应用,可以看出RHEED在InAs量子点形成过程中对多种结构特征的原位分析具有突出优势。反射式高能电子衍射仪作为分子束外延系统中的标准配置,已成为一种对InAs量子点微观结构进行分析的简易而理想的分析测试工具。随着反射式高能电子衍射以及衍射理论的进一步发展,必将促进InAs量子点结构的精确表征水平的提高,进而实现更加理想结构的InAs量子点的制备及其应用。     

量子点外延生长新模型(英文)

目前在原子尺度上人们对量子点分子束外延生长过程了解很少,所有关于量子点外延生长的理论模型和计算机模拟都是建立在传统的外延生长理论框架内。在传统理论框架内,量子点的生长过程被理解为发生在生长表面上一系列的单一的原子事件,如原子沉积、扩散、聚集等。在这种理论中,外延生长表面原子之间的相互作用被忽略;另外,按照这种理论,量子点生长过程必须是一个相对缓慢的过程。这种理论模型不可能恰当地解释所观察到的大量复杂的量子点外延生长实验现象。作者在两个实验现象基础上,提出了在InAs/GaAs(001)体系中量子点外延生长过程的新模型。这两个实验现象分别是在InAs/GaAs(001)生长表面有大量的"浮游"In原子,一个量子点的生长过程可以在很短的时间内完成(10-4 s)。在提出的新模型中,量子点的自组装过程是一个大数量原子的集体、协调运动过程。     

杂质对方形量子点基态能和束缚能的影响

用有限差分法求解了二维方形量子点中有 杂质时的量子体系,得到了离散薛定谔方程。对体系中电子处于基态时的能量和杂质的束缚能进行了数值计算,讨论了不同间距的杂质离子对不同尺寸量子点中电子的基态能量和束缚能的影响。计算结果表明：量子点中电子基态能量是杂质位置和量子点尺度的函数;基态能量随着量子点尺度的增加先急剧减小后缓慢增大,最后趋于定值;杂质对电子的束缚能随着量子点尺度的增加而减小;杂质间距越小对量子点基态能影响越大。