新型氨烃基聚硅氧烷在不同基质上的膜形貌

以八甲基环四硅氧烷、Ⅳ,Ⅳ-二甲基氨丙基氨丙基二甲氧基硅烷为原料,合成出新型氨烃基聚硅氧烷（ASO-121）,并对其在不同基质上的膜形貌进行了研究。结果表明：经ASO-121整理的棉纤维表面比较光滑,水／硅膜的接触角为106°,静态吸水时间为56．29s;ASO-121在纤维表面成膜所采取的定向排列方式为Si-CH3朝外、Si-O偶极键与阳离子化氨基指向纤维表面。在2um^2的扫描范围内单晶硅片上丝素蛋白基质ASO-121膜的表面均方根粗糙度为1．338nm。     

侧链含PDMS的改性PUA复合乳液的制备与性能

采用阴离子自乳化法合成了聚氨酯分子侧链上含聚二甲基硅氧烷（PDMS）的改性水性聚氨酯-丙烯酸酯系列复合乳液（SiPUA）,主要探讨了氨乙基氨丙基聚二甲基硅氧烷（AEAPS）含量对SiPUA乳液及其涂膜性能的影响．结果表明,AEAPS在SiPUA中质量分数为6％时,乳液稳定性良好;涂膜的吸水率明显降低,断裂伸长率增加,但拉伸强度有所减小．     

金属表面有机硅复合膜的耐腐蚀性能

采用N-氨乙基-3-氨丙基三甲氧基硅烷和3-(2,3-环氧丙氧)丙基三甲氧基硅烷制备了氨基硅树脂和环氧改性氨基硅树脂,加入无机金属盐制得硅烷钝化液,涂覆在镀锌板上形成耐腐蚀的硅烷复合膜。采用傅里叶变换红外光谱仪对硅烷复合膜进行红外光谱分析,用盐水浸泡实验、硫酸铜点蚀实验和电化学腐蚀实验对镀锌板表面硅烷膜耐蚀性能进行了研究,通过SEM电镜扫描对硅烷复合膜的微观形貌进行了表征。结果表明,经氨基硅树脂钝化液处理的金属表面形成一层致密的硅烷复合膜,金属的耐腐蚀性能明显提高。     

氨基聚硅氧烷滑爽剂的研制及应用

以八甲基环四硅氧烷、Ｎ－β－氨乙基－γ－氨丙基甲基二甲氧基硅烷等原料在氢氧化钾催化和促进剂作用下,通过低温开环聚合得到了一系列不同氨值和粘度的氨基聚硅氧烷,复ＩＲ、ＨＮＭＲ对其结构进行了表征,将氨基聚硅氧烷作为滑爽剂应用于皮革,测试了其所处理革的有关性能,研究结果表明,处理革疏水、滑爽,有良好的耐干湿擦和卫生性能,氨值或粘度越高,氨基聚硅氧烷的整理效果越显著。     

聚醚改性氨基硅油的合成及应用

以α,ω-二羟基聚二甲基硅氧烷（W S-62M）、N-β-氨乙基-γ-氨丙基甲基二甲氧基硅烷（DL-602）、单端环氧聚醚（X-O9）为主要原料,合成了一系列聚醚改性氨基聚硅氧烷,探讨了最佳改性条件,并考察了DL-602用量、n（X-O9）∶n（DL-602）对聚醚改性氨基硅油乳液性能及其应用性能的影响.结果表明：以异丙醇作溶剂,偶联剂用量为10%,n（X-O9）∶n（DL-602）=3∶1,80℃下反应4h为最佳反应条件;所制聚醚改性氨基硅油乳液稳定性好,用该乳液整理的织物其白度和亲水性均较氨基硅油有提高,与氨基硅油的摩擦系数相差不大,耐洗.     

织物柔软剂氨基硅油的乳化研究

以低摩尔质量、分子质量分布较窄的端羟基硅油(,-二羟基聚二甲基硅氧烷)和N--氨乙基--氨丙基甲基二甲氧基硅烷为原料,在碱性催化剂KOH存在条件下经本体聚合制得氨基硅油,此种合成方法副反应少,氨基分布均匀。将合成产品乳化成微乳液,实验结果表明,较好的乳化条件是:乳化剂采用AEO-3和AEO-9复配,乳化温度为20℃。     

嵌段型氨基聚醚改性硅油的合成、膜形貌与应用性能

利用乙二胺与环氧基聚醚封端后的聚二甲基硅氧烷在一定条件下合成了一种新型嵌段型氨基聚醚改性硅油(APES),用红外光谱(IR)、核磁共振氢谱(1 H-NMR)对APES的结构进行了表征,用原子力探针显微镜(AFM)等仪器研究了膜形貌及应用性能.结果表明,在单晶硅表面,新合成的APES能够形成微观形态学非均一结构的硅膜,其膜形貌主要由不清晰的连续相与大小不同的微小凸起构成.用APES处理棉纤维织物,能使织物的折皱回复角增大、弯曲刚度明显降低、织物的静态吸水时间仅有3.2s.     

氨基/十二烷基聚硅氧烷(DASO)的合成与应用

利用D4与氨基硅单体以及长链烷基硅烷等的本体聚合反应合成了侧链同时带有氨乙基氨丙基和十二烷基的聚硅氧烷（DASO），用IR、^3H—NMR等表征了DASO的结构，并对其应用性能以及影响因素进行了研究．应用结果表明，经DASO整理的织物手感柔软、蓬松，但随聚硅氧烷侧链烷值的增加，DASO整理的织物其柔软性略有下降，而蓬松感增强．另外，整理工艺对DASO的性能也有影响，用二浸二轧法整理的DASO布样其柔软性和抗皱性明显比一浸一轧法好．     

氨基硅乳滑爽剂AFS的制备及其应用研究

利用D4与氨基硅单体如γ-氨丙基三乙氧基硅烷的本体聚合反应制得了一种γ-氨丙基硅油AFS，用IR谱和^1H—NMR谱表征了它的结构，研究了聚硅氧烷的平均分子质量、氨值、乳化剂T-99用量等对其应用性能的影响。实验结果表明：平均分子质量相对较小、氨值较低、乳化剂用量较少的AFS硅乳赋予成革的柔软滑爽性较好。     

氨基硅油的季铵化及其抗菌性能研究

研究有机硅高分子氨乙基氨丙基硅油的季铵化及其抗菌性能。通过对产物的一系列表征,发现季铵化后的氨基硅油具有良好的抗生物活性,并且具有一定的化学活性,可与基质形成牢固膜,有效抑制大肠杆菌、枯草杆菌和金黄葡萄球菌的繁殖。     

氮化与未氮化38CrMoAlA钢高温水蒸汽氧化比较

通过高温氧化实验,比较了氮化与未氮化38CrMoAlA钢的抗高温氧化性能;利用扫描电镜及能谱仪分析了氮化与未氮化38CrMoAlA钢氧化膜中各元素的分布,以及所形成的氧化物形貌特征.结果表明,氮化后的38CrMoAlA钢较未氮化的38CrMoAlA钢氧化速度快,主要原因是氧与氮化物在高温高压水蒸气条件下发生反应,O置换了N,而且未能在氧化膜中富集Si、Al元素形成保护性氧化膜,使得氮化试样的表面及基体内部沿晶界处产生了氧化物.     

磁控溅射法La0.5Ca0.5MnxTi1-xO3薄膜的制备与结构研究

利用射频磁控溅射法结合后期热处理，在Si（100）基板上以不同的工艺条件成功制备了La0.5Ca
0.5MnxTi1-xO3（LCMTO）复铁电性磁电子薄膜.通过X射线衍射（XRD）、原子力显微镜（AFM）、电子衍射
能谱（EDS）等手段对薄膜进行了相的形成、结构特性及薄膜组成等的测试.研究表明，薄膜在600℃以上
开始析晶，850℃以上结晶完成,形成正交晶系钙钛矿相.硅基板上的LCMTO薄膜在不同温度下析出晶相的晶
格常数不同，温度越高，晶相的晶格常数越大；薄膜厚度越大，晶格常数相对较小;在薄膜制备时提高氧
分压，形成氧空位浓度低的完整晶相， Si基板上LCMTO薄膜的晶格常数相对较小.     

玻璃衬底沉积氮化硅薄膜性能研究

为了改善玻璃衬底上制备的薄膜太阳电池的转换效率,采用高纯氮气作为等离子体气源,以质量分数为5%的SiH_4(Ar稀释)作为前驱气源,利用电子回旋共振-等离子体增强化学气相沉积技术在玻璃衬底上低温制备了氮化硅薄膜;利用各种测试设备分析了薄膜的成分、光学性能和表面形貌.结果表明:实验制备的非晶薄膜含氢量较低;薄膜的折射率随着衬底温度和微波功率的增加而增加.在衬底温度为350℃、微波功率为650 W时,薄膜的折射率在2.0左右,平均粗糙度为1.45 nm,还说明薄膜具有良好的光学性能和较高的表面质量.在此条件下,薄膜的沉积速率达到10.7 nm/min,表明本实验能在较高的沉积速率下制备均匀、平整、优质的SiN薄膜.     

The surface morphologies and spectroscopy analysis of VC coatings on the substrate of Cr12MoV prepared by TD process after salt spray

The normal temperature corrosion of VC coating on the substrate of Cr12MoV prepared by TD process was tested in 5% NaCl aqueous solution, its surface morphologies and corrosion components after salt spray were observed with SEM and EDS, respectively, and the effects of salt spray on micro-structures of VC coating were analyzed. Moreover, the invalidation mechanism of VC coating after salt spray and its effect on substrate material were discussed. The experimental results shown that the uniformity and integrity of VC coating surface are destroyed by salt spray for 120 h, a large number of the pits are produced on the coating surface, and the coating falls off, which speeds corrosion breakage of its substrate; the oxidated film on its surface becomes rougher, broken and discontinuous, and falls off easily, which reduce the ability of resistance salt spray; the failure modes of VC coating after salt spray are expressed with falling off of oxidated film, stress concentration and pore effect and so on, the corrosion breakage of oxidated film is the corrosion result of deoxidization corrosion from oxygen and HCl produced by NaCl and vapor.     

Transport properties of LCMO granular films deposited by the pulsed electron deposition technique

By finely controlling the deposition parameters in the pulsed electron deposition process, granular La 2/3 Ca 1/3 MnO 3 (LCMO) film was grown on silicon substrates. The substrate temperature, ambient pressure in the deposition chamber and acceleration potential for the electron beam were all found to affect the grain size of the film, resulting in different morphologies of the samples. Transport properties of the obtained granular films, especially the magnetoresistance (MR), were studied. Prominent low-field MR was observed in all samples, indicating the forming of grain boundaries in the sample. The low-field MR show great sensitive to the morphology evolution, which reaches the highest value of about 40% for the sample with the grain size of about 250 nm. More interestingly, positive-MR (p-MR) was also detected above 300 K when low magnetic field applying, whereas it disappeared with higher magnetic field applied up to 1.5 and 2 Tesla. Instead of the spin- polarized tunneling process being commonly regarded as a responsible reason, lattice mismatch between LCMO film and silicon substrate appears to be the origin of the p-MR     

THE EFFECT OF DIAMOND FILM NUCLEATION AND GROWTH IN DIFFERENT SUBSTRATE PRETREATMENT METHODS

The diamond film on single crystal silicon substrate in three kinds of substrate is deposited by pretreatment method using microwave plasma, the diamond film is analyzed using SEM and Raman, the reasons why substrate pretreatment affects nucleation and growth are probed. The results show that substrate pretreatment directly affects nucleation and growth of diamond film, homogeneous nucleation and growth can be formed only in suitable pretreatment method.     

激光化学气相沉积非晶硅

本文报道了CO_2激光化学气相沉积非晶硅的实验结果,硅薄膜的沉积速率与硅烷气压、基片温度和激光光强密切有关。 利用不同方法测量了硅薄膜样品的各种特性,证实了薄膜确为非晶硅。 作者也研究了激光化学沉积非晶硅的机理,并给出了理论讨论以解释实验结果。     

高斯长脉冲激光辐照单晶硅温度场的数值模拟

建立二维轴对称模型,通过Matlab软件对长脉冲高斯激光与单晶硅相互作用的加热过程进行数值模拟。分析不同激光功率密度和辐照时间作用下单晶硅的温度分布和温度历史, 估算单晶硅的熔融损伤阈值和热量沉积深度。结果表明:单晶硅的熔融损伤阈值的功率密度I₀=0.22 MW/cm2且激光热量沉积深度大约在1 mm范围内; 单晶硅的温度随激光功率密度和辐照时间的增加而升高,且随着光斑半径方向的延伸与靶材厚度的增加而逐渐减小; 在脉冲作用期间,硅表面中心温度迅速上升,这主要由高斯激光的能量分布特点决定; 在激光作用结束后,辐照区的热量通过热传导效应从高温区向低温区转移,单晶硅的表面中心温度随时间的增加而缓慢下降, 最后趋于室温。     

低氧分压法在服役炉管内表面制备防结焦膜

利用低氧分压法在已服役炉管的内表面制备防结焦氧化膜。用扫描电子显微镜（SEM）、能谱仪（EDAX）、X射线衍射仪（XRD）及划痕仪等实验手段,研究已服役炉管及氧化膜的形貌、组织结构、氧化膜与基体结合状况及氧化膜的抗结焦性能。结果表明,经过低氧分压处理后,已服役炉管试样表面的Fe,Ni元素含量降低,表面形成了以MnCr2O4和Cr2O3为主的氧化膜,氧化膜的临界载荷为9.25N,结焦抑制率达到69.92%,具有明显的防催化结焦效果。     

Microstructure and Mechanical Property of Magnetron Sputtering Deposited DLC Film

A diamond-like carbon (DLC) film was deposited on YT14 substrate using magnetron sputtering (MS). The surface morphologies, roughness and bonding spectra of obtained film were characterized using scanning electron microscopy (SEM), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS), respectively, and its mechanical property and bonding strength were measured using a nanoindentation and scratch tester, respectively. The results show that the C-enriched DLC film exhibits a denser microstructure and smoother surface with lower surface roughness of 21.8 nm. The ratio of C sp2 at 284.4 eV that corresponds to the diamond (111) and the C sp3 at 285.3 eV that corresponds to the diamond (220) plane for the as-received film is 0.36: 0.64, showing that the C sp3 has the high content. The hardness and Young’s modulus of DLC film by nanoindentation are 8.534 41 and 142.158 1 GPa, respectively, and the corresponding bonding strength is 74.55N by scratch test.