具有持续反应活性的g-C3N4/Sr2MgSi2O7:Eu2+,Dy3+复合材料的光学-催化行为研究

为促进环境友好型光催化技术的应用推广,通过热解聚合方式将g-C₃N₄负载于多孔Sr₂MgSi₂O₇:Eu²⁺,Dy³⁺蓝色长余辉荧光粉上,制备具有持续反应活性的g-C₃N₄/Sr₂MgSi₂O₇:Eu²⁺,Dy³⁺复合材料。首次采用累积污染物降解效率等一系列指标评价材料在光照及暗态下综合去除污染物效果。通过微观表征手段和NO去除试验研究了单组分复配质量比对复合材料的光学及催化性能的影响。结果表明,g-C₃N₄的复合对Sr₂MgSi₂O₇:Eu²⁺,Dy³⁺的荧光强度和余辉性能产生了不利影响;但光照下,提高的光生载流子分离效率和光吸收...     

Si3N4掺杂氮化对Sr3SiO5:Eu2+荧光粉发光性能的影响

采用高温固相法制备Si₃N₄掺杂氮化Sr_2.99SiO_5-6xN_4x:0.01Eu²⁺荧光粉。采用XRD、EDS和SEM测试结果表明: N^3-进入Sr₃SiO₅基质晶格中取代部分O^2-离子, 形成了单一相Sr_2.99SiO_5-6xN_4x:0.01Eu²⁺固溶体。PL&PLE荧光光谱测试结果显示, Sr_2.99SiO_5-6xN_4x:0.01Eu²⁺荧光粉在344nm紫外光的激发下发射出红橙光, 属于Eu²⁺离子典型的 4f⁶5d¹→4f⁷电子跃迁。随着N浓度的增加, Sr_2.99SiO_5-6xN_4x:0.01Eu²⁺荧光粉发射光谱和激发光谱的强度明显增强。热稳定性测试结果表明, Si₃N₄掺杂氮化能够显著提高Sr₃SiO₅:Eu²⁺荧光粉的热稳定性。通过Arrhennius模型拟合结果表明横向穿越过程(crossover)引起的Sr₃SiO₅:Eu²⁺荧光粉氮化前后的温度猝灭。     

Sr2Si5N8:Eu2+荧光粉的制备及其发光性能研究

以Sr₂CO₃、Si₃N₄和Eu₂O₃为原料, 以C为主要还原剂, 采用碳热还原氮化工艺合成Sr₂Si₅N₈:Eu²⁺荧光粉, 着重研究了C、Sr₂CO₃添加量及Eu²⁺浓度对产物物相及发光性能的影响。研究结果表明: 当C与Si₃N₄的摩尔比 n_c/=9/5时,合成出Sr₂Si₅N₈:Eu²⁺单相荧光粉, 添加适当过量的Sr₂CO₃可提高合成产物的N含量, 且荧光粉的发光强度与其N含量呈现正相关关系。在450 nm蓝光激发下, 受Eu²⁺的4f⁶5d¹ → 4f⁷跃迁作用, Sr₂Si₅N₈:Eu²⁺荧光粉在550~700 nm波段范围产生非对称宽带发射。随着Eu²⁺掺杂浓度由1.5mol%增加到20mol%, 荧光粉的发光强度先增强后减弱, 达到2mol%时发生浓度淬灭现象; 发射主峰由608 nm逐步红移至641 nm; CIE色坐标从(0.606, 0.393)位移至(0.656, 0.343), 是一种可用于白光LED的优质红色荧光粉。     

——————————CaSi2O2N2:Eu2+中空荧光纤维的制备及其发光性能研究

采用静电纺丝与气相还原氮化相结合的方式制备了用于白光LED的CaSi₂O₂N₂:Eu²⁺荧光纤维。通过调节纺丝溶液溶剂的配比, 得到了空心结构的Ca-Si-O-Eu纳米纤维和CaSi₂O₂N₂:Eu²⁺荧光纳米纤维。样品在微观上保持中空纤维结构, 宏观上也保持薄膜的状态。利用X射线衍射对样品物相结构进行分析, Ca-Si-O-Eu中空纤维在1300℃保温5 h后得到层状结构的CaSi₂O₂N₂, Eu²⁺离子的掺入没有改变CaSi₂O₂N₂的主晶相。在400 nm激发光照射下CaSi₂O₂N₂:Eu²⁺荧光纤维在550 nm附近具有一个宽发射峰, 对应着Eu²⁺离子4f⁶5d→4f⁷跃迁。与CaSi₂O₂N₂:Eu²⁺荧光粉或普通荧光纤维膜比较, 制备的中空荧光纤维膜有更高的发射光强度。     

紫外激发蓝色荧光粉Sr2-x-yB5O9Cl:xEu2+,yTb3+的合成和发光性能

采用高温固相反应法合成Sr_2-x-yB₅O₉Cl:xEu²⁺,yTb³⁺蓝色荧光粉。用X射线衍射表征材料的晶体结构、用荧光光谱仪测定Eu²⁺和Tb³⁺的掺杂浓度,研究了助溶剂H₃BO₃过量浓度和反应温度对荧光粉发光性质的影响。结果表明,单掺杂Eu²⁺时,其浓度猝灭机理为电偶极-电偶极交互作用机制,浓度猝灭临界距离为R_C=1.71 nm。在紫外（230-410 nm）波段有强而宽的吸收带,表明此粉是一种近紫外白光LED用的蓝色荧光粉。     

Yb3+,Tb3+共掺杂Sr2B2O5荧光粉的制备及其下转换发光性能的研究

采用高温固相法合成了Tb³⁺, Yb³⁺共掺杂的Sr₂B₂O₅荧光粉。通过X射线衍射(XRD)和荧光光谱(PL)对样品的物相结构和发光性质进行了表征。XRD结果表明, 合成样品为单斜结构的Sr₂B₂O₅相。分别使用543 nm和980 nm的监测波长, 得到的激发光谱均在354 nm、374 nm处有较强的激发峰, 其中374 nm处最强, 说明Sr₂B₂O₅荧光材料在近紫外光区对太阳光有很强的吸收; 在374 nm( Tb³⁺:⁷F₆→⁵D₃) 紫外光激发下, 观察到Tb³⁺: ⁵D₄→⁷F_J ( J = 6, 5, 4, 3) 可见光区发射光, 并检测到Yb³⁺: ²F_5/2→²F_7/2的近红外发射光。通过研究激发光谱和发射光谱与Yb³⁺掺杂浓度的关系, 发现在单斜晶体Sr₂B₂O₅中, Yb³⁺具有很高的猝灭浓度。     

废弃聚酯发光纤维的降解及产物性能研究

为探究聚酯发光纤维中发光材料SrAl₂O₄∶Eu²⁺,Dy³⁺及其降解产物回收再利用的可行性，以废弃聚酯发光纤维为原料，在传统乙二醇(EG)降解体系中加入二甲苯溶剂，用溶解-降解方法来回收SrAl₂O₄∶Eu²⁺,Dy³⁺和聚对苯二甲酸乙二醇酯(PET)降解产物以达到循环利用目的，并通过改变EG用量及反应时间来优化降解效果。利用扫描电镜、X射线衍射仪、荧光余辉亮度仪等对SrAl₂O₄∶Eu²⁺,Dy³⁺的表面形貌及发光性能进行表征；利用核磁共振氢谱、凝胶渗透色谱、差示扫描量热仪等对降解产物的性能及分子含量进行表征，结果表明，降解过程对SrAl₂O₄∶Eu²⁺,Dy³⁺的晶格没有影响，回收率达97%,发光亮度达6.264cd/m^2<...     

Eu2+/Tb3+掺杂的Sr2Si5N8基荧光粉的制备与发光性能

采用碳热还原氮化法合成了Eu²⁺/Tb³⁺掺杂的Sr₂Si₅N₈基荧光粉, 并重点研究了Tb³⁺-Eu²⁺共掺时Sr₂Si₅N₈基荧光粉的发光性能。研究结果表明: 由于Tb³⁺的f → d间的跃迁是自旋允许的, Sr₂Si₅N₈:Tb³⁺在330 nm激发光下, 在490、543、585和623 nm四处各有一发射峰, 它们分别来源于Tb³⁺的⁵D₄ → ⁷F_j (j = 6、5、4、3)能级跃迁; 掺入Tb³⁺对Sr_1.96Si₅N₈:0.04Eu²⁺的激发谱和发射谱的形状及峰位无明显影响, 当共掺离子Tb³⁺浓度为x = 0.01时, 样品发射强度比未共掺的Sr_1.96Si₅N₈:0.04Eu²⁺提高了约20%, Tb³⁺主要通过电多极能量传递的方式转向Eu²⁺。     

溶胶-凝胶法制备Gd4Ga2O9: Dy3+白光发射荧光粉及其性能

通过溶胶-凝胶法制备了具有白光发射的Gd₄Ga₂O₉:x%Dy³⁺荧光粉,利用X射线粉末衍射(XRD)、扫描电子显微镜(SEM)、能谱仪(EDS)、紫外-可见漫反射光谱(UV-Vis DRS)和荧光光谱等对产物的物相结构、形貌、组分和光学性能进行研究,并分析了Dy³⁺掺杂量对样品的影响。XRD结果表明,所制备的样品为Dy³⁺掺杂的Gd₄Ga₂O₉单斜晶体和少量Ga₂O₃杂质相的混合物。紫外-可见漫反射光谱结果表明制备的Dy³⁺掺杂Gd₄Ga₂O₉晶体是一种光学带隙为5.29 eV的直接带隙半导体。荧光检测结果表明Dy³⁺掺杂Gd₄Ga₂O₉荧光粉可被属于Gd³⁺     

Li2B4O7:Eu3+荧光体的合成及表征

利用Li₂B₄O₇作为基质,掺杂稀土元素Eu³⁺,在空气中合成了Li₂B₄O₇:Eu³⁺荧 光体.探讨了体系的烧结条件,分析了晶体结构,并研究了该体系的荧光性质.结果表明,体 系中同时存在着[BO₄]和[BO₃]结构;稀土离子Eu3+的发光以电偶极跃迁⁵D₀-⁷F₂为主,处 于非中心对称的格位上,并且可以很好地存在于基质中.     

Long lasting phosphorescence of Sr4Al14O25:Eu,Dy thin films by magnetron sputtering

This paper reports the preparation process and the long lasting phosphorescence of the Sr₄Al₁₄O₂₅:Eu²⁺,Dy³⁺ thin films obtained by magnetron sputtering. Phosphorescence was achieved by annealing the films in reducing atmosphere. Sr₄Al₁₄O₂₅ thin film was obtained when the films were treated at 1200 °C, while SrAl₂O₄ was generated as the intermediate phase during the annealing process. Sr₄Al₁₄O₂₅:Eu²⁺,Dy³⁺ film generated an emission at 485 nm, and SrAl₂O₄:Eu²⁺,Dy³⁺ film showed an emission peaking at 515 nm. Afterglow characteristics were observed for both films, and Sr₄Al₁₄O₂₅:Eu²⁺,Dy³⁺ film showed a better afterglow property than the SrAl₂O₄:Eu²⁺,Dy³⁺ film due to a deeper trap level and a higher trap concentration formed in the thin films.     

Nanosized strontium aluminate phosphors prepared via a reverse microemulsion route

Nanosized strontium aluminate phosphors co-activated by Eu²⁺ and Dy³⁺ were prepared via a novel reverse microemulsion process. This new synthesis technique lowered the synthesis temperature of SrAl₂O₄: Eu²⁺, Dy³⁺ phosphors to as low as 900 °C, and also reduced the particle size to the nanometer scale (around 40 nm). In the microemulsion process, the constituent cations were trapped by numerous nano-scaled micelles, leading to a shortening of the inter-diffusion length and enhancement of the precursor reactivity. The excitation intensity and emission peaks of nanosized SrAl₂O₄: Eu²⁺, Dy³⁺ phosphors significantly increased with increasing heating temperatures.     

Valency states of Yb, Eu, Dy and Ti ions in Li2B4O7 glasses

Absorption and emission spectra of Eu and Dy, Yb and Ti ions in Li₂B₄O₇ glasses grown in oxygen and hydrogen gas atmospheres were measured for valency states and lattice-sites analysis. For the Li₂B₄O₇ glass doped with Eu²⁺, Eu³⁺ and Dy³⁺ ions which were grown in oxidizing and reducing atmospheres, absorption and emission bands due to these ions were investigated before and after γ-irradiation. For the Yb³⁺-doped Li₂B₄O₇ glass, a weak, broad band was observed near the sharp 976.3 nm absorption band. The origin of this band is discussed in comparison with other glasses. Moreover, irradiation experiments using γ-rays were also performed in order to investigate the possibility of valency change of Yb ions. It was found that Ti⁴⁺ ions, which are produced under oxidizing atmosphere, change to Ti³⁺ ions after γ-irradiation with a dose of 10⁵ Gy. An additional absorption band observed at about 500 nm is due to the Ti³⁺ ions accompanied by charge-compensating vacancy and does not give any emission.     

Eu3+、Dy3+和Er3+对制备堇青石晶相转变的对比表征

以菱镁矿风化石、工业Al₂O₃和SiO₂微粉为原料, 固相反应烧结合成制备堇青石。通过在反应物中分别加入不同含量的Eu₂O₃、Dy₂O₃和Er₂O₃, 研究分析和对比了Eu³⁺、Dy³⁺和Er³⁺对堇青石晶相组成、晶粒大小、晶胞常数、结晶度及显微结构的影响。采用XRD和SEM表征试样中的晶相和显微结构, 利用X'Pert Plus软件对结晶相的晶胞参数和结晶度进行分析, 采用半定量法对试样晶相组成进行计算, 利用Scherrer公式计算堇青石的晶粒大小。结果表明: 由于Eu₂O₃、Dy₂O₃和Er₂O₃的加入, 通过固相反应烧结所得堇青石试样中出现了莫来石相, Eu³⁺、Dy³⁺和Er³⁺对Mg²⁺的置换作用改变了堇青石相晶格常数和晶胞体积。随着添加剂含量的增加, 堇青石结构中液相量增加, 相对结晶度降低, 常温致密度提高, 堇青石晶粒粒径减小。综合对比分析, Eu₂O₃对堇青石晶相转变的影响程度最弱, Er₂O₃对堇青石晶相转变的影响程度最强, 对提高合成堇青石的烧结性和热震稳定性效果最好。     

Preparation, patterning and luminescent properties of nanocrystalline Gd2O3:A (A=Eu, Dy, Sm, Er) phosphor films via Pechini sol–gel soft lithography

Nanocrystalline Gd₂O₃:A (A=Eu³⁺, Dy³⁺, Sm³⁺, Er³⁺) phosphor films and their patterning were fabricated by a Pechini sol–gel process combined with a soft lithography. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and optical microscopy, UV/vis transmission and photoluminescence (PL) spectra as well as lifetimes were used to characterize the resulting films. The results of XRD indicated that the films began to crystallize at 500 °C and that the crystallinity increased with the elevation of annealing temperatures. Uniform and crack free non-patterned phosphor films were obtained by optimizing the composition of the coating sol, which mainly consisted of grains with an average size of 70 nm and a thickness of 550 nm. Using micro-molding in capillaries technique, we obtained homogeneous and defects-free patterned gel and crystalline phosphor films with different stripe widths (5, 10, 20 and 50 μm). Significant shrinkage (50%) was observed in the patterned films during the heat treatment process. The doped rare earth ions (A) showed their characteristic emission in crystalline Gd₂O₃ phosphor films due to an efficient energy transfer from Gd₂O₃ host to them. Both the lifetimes and PL intensity of the rare earth ions increased with increasing the annealing temperature from 500 to 900 °C, and the optimum concentrations for Eu³⁺, Dy³⁺, Sm³⁺, Er³⁺ were determined to be 5, 0.25, 1 and 1.5 mol% of Gd³⁺ in Gd₂O₃ films, respectively.