Microstructure and optical properties of TiO2 thin films deposited at different oxygen flow rates

To research the influence of oxygen flow rate on the structural and optical properties of TiO₂ thin film, TiO₂ films on glass were deposited by reactive magnetron sputtering. The microstructure and optical properties were measured by X-ray diffractometry, AFM and UV-VIS transmittance spectroscopy, respectively. The results show that the films deposited at oxygen flow rate of 10 mL/min has the lowest roughness and the highest transmittance. The absorption angle shifts to longer wavelengths as oxygen flow rates increase from 5 to 10 mL/min, then to shorter ones as the oxygen flow rate increase from 10 to 30 mL/min. The band gap is 3.38 eV, which is nearly constant in the experiment. For the TiO₂ thin films deposited at 10 mL/min of oxyge flow rate, there are nano-crystalline structures, which are suitable for anti-reflection (AR) coating in the solar cells structure system.     

Ti/TiB2多层镀层的组织和性能研究

为了进一步提高超硬TiB2镀层与基体的结合力,采用磁空溅射法在高速钢表面上制备了多层相间的Ti/TiB2超硬镀层.利用多种实验方法测试和研究了镀层的组织结构,形貌,表面粗糙度,硬度和与基体的结合力.结果表明,镀层的Ti/TiB2相间层数对这些性能有很大的影响.当层数从二逐渐增加到十二,TiB2镀层的（001）织构逐渐消失而变成无择优取向,镀层表面粗糙度增加,但镀层硬度基本不变.只有当层数为十二时,镀层硬度才明显降低.结果也表明,多层镀层可有效地提高镀层与基体的结合力,并存在着一最佳的多层结合.本文也对多层结构对其它组织和性能特征的影响进行了分析.     

Preparation and properties of tungsten-doped indium oxide thin films

Tungsten-doped indium oxide (IWO) thin films were deposited on glass substrate by DC reactive magnetron sputtering. The effects of sputtering power and growth temperature on the structure, surface morphology, optical and electrical properties of IWO thin films were investigated. The thickness and surface morphology of the films are both closely dependent on the sputtering power and the substrate temperature. The transparency of the films decreases with the increase of the sputtering power but is not seriously influenced by substrate temperature. All the IWO thin film samples have high transmittance in near-infrared spectral range. With either the sputtering power or the growth temperature increases, the resistivity of the film decreases at the beginning and increases after the optimum parameters. The as-deposited IWO films with minimum resistivity of 6. 4× 10-4 Ω·cm were obtained at a growth temperature of 225 ℃ and sputtering power of 40 W, with carrier mobility of 33. 0 cm2· V-1·s-1 and carrier concentration of 2. 8× 1020 cm-3 and the average transmittance of about 81％ in near-infrared region and about 87％ in visible region.     

Influence of bilayer period and thickness ratio on the mechanical and tribological properties of CrSiN/TiAlN multilayer coatings

Nanostructured CrSiN/TiAlN multilayer coatings were deposited by a bipolar asymmetric reactive pulsed DC magnetron sputtering system. The thickness ratio of CrSiN to TiAlN layers was fixed at 1:1. The bilayer periods of the coatings were controlled to be from 6 to 40 nm. Furthermore, two CrSiN/TiAlN multilayer coatings with the same bilayer period (20 nm) but different CrSiN/TiAlN thickness ratios (2:8 and 8:2) were also deposited to explore the influence of thickness ratio on the mechanical properties of the multilayer coatings. The crystalline structures of the coatings were determined by a glancing angle X-ray diffractometer. The microstructures of thin films were examined by a scanning electron microscopy and a transmission electron microscopy, respectively. A nanoindenter, a micro Vickers hardness tester, and a pin-on-disk wear tester were used to evaluate the hardness, the toughness and the tribological properties of the thin films, respectively. The maximum hardness of the multilayers was obtained when the bilayer period was at 10 nm for the coating with the same thickness ratio of CrSiN to TiAlN layers (1:1). Meanwhile, the thickness ratio of CrSiN to TiAlN layer had great influence on the hardness and the toughness properties of the multilayer coatings. The hardness and the toughness of the CrSiN/TiAlN multilayer coatings increased as the individual TiAlN layer thickness increased.     

掺铝氧化锌薄膜的红外性能及机制

采用中频交流磁控溅射氧化锌铝(ZnO 2％Al2O3)陶瓷靶材的方法制备了掺铝氧化锌ZAO(ZnO：Al)薄膜．利用红外光谱仪测试了薄膜的红外反射性能,研究了薄膜厚度、基体温度和氩气压力对ZAO薄膜红外反射性能的影响规律,确定了制备具有高红外反射率的ZAO薄膜的工艺参数．     

TiBCN:CNx multilayer coatings deposited by pulsed closed field unbalanced magnetron sputtering

In this study, a combination of nanocomposite and multilayer coating design was investigated in an effort to reduce the coefficient of friction (COF) while maintaining good mechanical properties of the TiBCN coatings. The TiBCN:CN_x coatings consist of TiBCN and CN_x nanolayers which were deposited alternately by reactive sputtering a TiBC composite target (80 mol% TiB₂ + 20 mol% TiC) and a graphite target in an Ar:N₂ mixture using a pulsed closed field unbalanced magnetron sputtering system. Low angle X-ray diffraction and transmission electron microscopy characterizations confirmed that the coatings consist of different bilayer periods in a range of 3.5 to 7.0 nm. The TiBCN layers exhibited a nanocomposite structure, whereas the CN_x layers were in an amorphous state. The mechanical properties and wear resistance of the TiBCN:CN_x multilayer coatings were investigated using nanoindentation and ball-on-disk wear test. The TiBCN:CN_x coatings exhibited high hardness in a range of 20-30 GPa. The highest hardness of 30 GPa was achieved in the coating with a bilayer period of 4.5 nm. A low COF of 0.17 sliding against a WC-Co ball was obtained at a bilayer period of 4.5 nm, which is much lower than those of the single layer TiBCN and TiBC nanocomposite coatings (0.55-0.7).     

磁控溅射法制备SnS薄膜的结构和光学性能

利用磁控溅射法在FTO玻璃上制备了Sn S薄膜。采用X射线衍射仪、扫描电子显微镜和紫外可见分光光度计对不同溅射参数下制备的Sn S薄膜的晶体结构、表面形貌和光学性能进行研究,确定出制备Sn S薄膜的最优溅射参数。结果表明:溅射功率为28 W,沉积气压在2.5 Pa时,制备出的Sn S薄膜在(111)晶面具有最好的择优取向,薄膜微观形貌呈单片树叶状,晶粒粒径约370 nm,晶粒分布均匀,薄膜表面光滑致密;最优溅射参数下制备的Sn S薄膜的吸收系数可达到105cm-1,比其他方法制备的Sn S薄膜的吸收系数值高,禁带宽度为1.48 e V,与半导体太阳能电池所要求的最佳禁带宽度(1.5 e V)十分接近。     

偏压对非平衡磁控溅射ZrNbAlN薄膜的成分、力学性能及腐蚀特性的影响

采用反应非平衡磁控溅射技术在青铜及Si（100）衬底上沉积不同负偏压（Vb）的纳米ZrNbAlN薄膜。薄膜结构及成分采用X射线光电子能谱及X射线衍射进行表征。结果表明,Zr和Nb的原子浓度受负偏压影响,Vb导致N 1s谱和Al 2p谱的结合能增加及Zr 3d5/2和Nb 3d5/2谱的结合能降低,薄膜表面形貌的演化受控于Vb。X射线衍射谱显示这些薄膜具有（111）择优取向。此外,薄膜的力学特性及腐蚀行为分别通过纳米压痕测试及腐蚀测试表征。当负偏压为-70 V时,纳米压痕测试显示的最大显微硬度为21.85 GPa,ZrNbAlN膜在青铜衬底上的性能远优于未涂层处理的衬底。在0.5 mol/L NaCl和0.5 mol/L HCl溶液中的腐蚀实验表明,腐蚀势能及腐蚀电流依赖于衬底偏压,在-90 V时能够获得较高的抗腐蚀特性。     

Hydrogen storage properties of preferentially orientated Mg-Ni multilayer film prepared by magnetron sputtering

Mg-Ni multi-layer thin film was deposited on (001) Si wafer by magnetron sputtering with dual-target. X-ray diffraction (XRD) and scanning electron microscopy (SEM) analysis reveal that the microstructure of the Mg-Ni multilayer thin film is composed of fine-crystalline Ni layer and crystalline [001] Mg layer. Hydrogenation process of the films were carried out by using the automatic gas reaction controller. The films undergone hydrogenation for different time were analyzed by XRD. The results show that hydrogenation properties of Mg with different preferential orientations are different. (002) diffraction peak of Mg disappears in compensating the appearing of the peaks of Mg2NiH4 and MgH2 in hydrogenation at 533 K, while the (101) peak still remains. The result reveals that the Mg film with (001) preferential orientation absorbs hydrogen at certain temperature easier than that of the Mg film with (101) orientation. This phenomenon can be explained in the view point of the energy change for the nucleation and growth of hydride in different crystal plane.     

不同沉积温度下CrCN涂层的力学性能

使用磁控溅射技术在304不锈钢表面制备CrCN涂层,研究了沉积温度(200、250、300、350和400 ℃)对涂层结构及力学性能的影响。研究表明,沉积温度为250 ℃时,涂层的晶粒尺寸及表面粗糙度最大,但随着沉积温度的进一步升高,涂层的晶粒逐渐细化,表面粗糙度明显下降;同时涂层硬度伴随沉积温度的升高出现先增大后减少的趋势,沉积温度为350 ℃时,薄膜具有最高的硬度(22.85 GPa),抗弹性形变和抗塑性形变能力最好,体现出优异的力学性能。     

溅射气压对ZnO透明导电薄膜光电性能的影响

采用射频磁控溅射方法,在普通玻璃上制备了具有高度c轴取向的ZnO薄膜,研究了溅射气压(0.2～1.5 Pa)对ZnO薄膜的微观结构和光电性能的影响.AFM、XRD、UV-Vis分光光度计及四探针法研究表明:随着溅射气压的增大,ZnO薄膜沿c轴方向的结晶质量提高,晶粒细化,薄膜表面更加致密,晶粒大小更加均匀;ZnO薄膜在400～900nm范围内的平均透过率均高于85%,其中在0.5～1.5 Pa范围内其透过率高于90%;样品在高纯氮气气氛中经350 ℃,300 s退火后,电阻率最低达到10-2 Ω-cm量级.     

STUDY ON Ni-Cr SYSTEM SOLAR SELECTIVE THIN FILMS PREPARED BY MAGNETRON REACTIVE SPUTTERING PROCESS

1. IntroductionSolar selective thiIl solid fil1us are the key part for solar heat collect'ors. But ll1ostfactories still produced solar absorptive filn1s by traditional tecIl11ology sucl1 as pai1ltillga1ld electrocl1eluical process that nlust result in po…     

Structural, optical and magnetic properties of Eu-doped ZnO films

Polycrystalline Zn_1−xEu_xO (x = 0, 0.02, 0.05) films were deposited on silicon (1 0 0) substrates by radio-frequency magnetron sputtering. The structural, optical and magnetic properties of the films were investigated. The results from both the X-ray diffraction and photoluminescence spectra reveal that Eu³⁺ ions successfully substitute for Zn²⁺ ions in the ZnO lattice. The magnetic field and temperature dependence of magnetization curves demonstrate that the Zn_0.95Eu_0.05O films are ferromagnetic at room temperature. No impurity phase was found in Eu-doped films with X-ray diffraction, Raman spectroscopy and zero-field-cooled measurements. The ferromagnetism is attributed to the intrinsic property of Eu-doped ZnO films and could be interpreted by the bound-magnetic-polaron model.     

Role of deposition parameters on microstructure and mechanical properties of chromium oxide coatings

Chromium oxide coatings were deposited by reactive magnetron sputtering on high speed steel (HSS) substrate under various oxygen flow rates and radio frequency (RF) powers. The effect of deposition conditions on the microstructure, hardness and critical load of chromium oxide coating failure was studied. The results indicated that a crystalline chromium oxide coating formed at a high oxygen flow rate and a low RF power exhibited a higher hardness and a lower critical load as compared to a chromium oxide coating with an amorphous microstructure.     

磁控溅射法ZnO-TiO2复合薄膜的制备及性能

采用双靶共溅射的方法在FJL600EI型超高真空多功能磁控溅射仪上制备不同复合量的ZnO-TiO2复合薄膜,对不同工艺参数制备的ZnO-TiO2复合薄膜进行形貌结构分析、光催化性测定和亲水性检测。结果表明,当Ti靶材的溅射功率为150 W时,得到了颗粒大小均匀的ZnO-TiO2复合薄膜,且复合薄膜对甲基橙的降解率最高,亲水性最优。ZnO-TiO2薄膜的光催化性明显高于单一ZnO薄膜。     

磁控溅射沉积银薄膜/涂层的研究进展

银薄膜/涂层是一种在高新技术领域极具潜力的新材料,近年来在现代工业中得到了广泛的应用。采用磁控溅射制备的银薄膜/涂层具有优异的附着力,通过选择相应的沉积参数可以实现对银薄膜/涂层微观结构及性能的调控。本文综述了磁控溅射沉积银薄膜/涂层的主要制备工艺,评述了银薄膜/涂层在其主要应用领域内的研究进展,并对其未来的发展进行了展望。     

Nd-Fe-B薄膜的磁控溅射法制备与组织结构

对直流磁控溅射法制备Nd-Fe-B薄膜工艺进行了研究.在不同的溅射功率、溅射气压、溅射时间等条件下制备薄膜,并对薄膜进行了AFM、XRD分析.结果表明,Nd-Fe-B薄膜的沉积速率、表面形貌及相结构与溅射功率、溅射气压、溅射时间密切相关.薄膜的沉积速率随磁控溅射功率的增加而增加,薄膜表面晶粒尺寸和表面粗糙度随溅射功率增加而增大.沉积速率随溅射气压的升高先增大后减小.低功率溅射时,薄膜中出现α-Fe、Nd2Fe14B相相对较少,随溅射功率增加,α-Fe相消失,Nd2Fe14B相增多.综合考虑各种因素,最佳溅射功率为100～130 W.     

反应火焰喷涂Mo-FeB-Fe系金属陶瓷涂层的制备及性能

以Mo粉、FeB合金粉、Fe粉为原料,将混合粉末在900℃下真空热处理2h,破碎,过75μm筛制备喷涂喂料;采用反应火焰喷涂技术在Q235钢表面制备Mo2FeB2金属陶瓷涂层。将反应热喷涂制备的涂层在真空炉中1000℃下热处理5h,测试涂层的性能。结果表明：在室温球磨15h后粉体中有Fe2B生成,在900℃下烧结后破碎的喷涂粉末中有部分三元硼化物（Mo2FeB2）生成;涂层由占主体的Mo2FeB2和α-Fe相和少量Fe2O3、FeO相及气孔组成。在涂层和基体的结合面处,存在由高硬度涂层到低硬度钢基体的过渡区;涂层和基体的结合强度为32.73MPa,抗热震次数可以达到43次左右,耐磨性比钢基体提高5.28倍;涂层经过1000℃真空扩散热处理后,具有更加优异的力学性能。     

The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering

The time averaged ion energy distributions and ion fluxes of continuous dc magnetron sputtering (dcMS), middle frequency pulsed dc magnetron sputtering (PMS), and modulated pulse power (MPP) magnetron sputtering plasmas were compared during sputtering of a Cr target in an Ar/N₂ atmosphere in a closed field unbalanced magnetron sputtering system. The results showed that the dcMS plasma exhibited a low ion energy and ion flux; the PMS plasma generated a moderate ion flux of multiple high ion energy regions; while the MPP plasma exhibited a significantly increased number of target Cr⁺ and gas ions with a low ion energy as compared to the dcMS and PMS plasmas. Cubic CrN coatings were deposited using these three techniques with a floating substrate bias. The structure and properties of the coatings were characterized using X-ray diffraction, scanning electron microscopy, transmission electron microscopy, nanoindentation, microscratch and ball-on-disk wear tests. It was found that the deposition rate of the MPP CrN depositions was slightly lower than those of the dcMS depositions, but higher than in the PMS depositions at similar average target powers. The coatings deposited in the dcMS and PMS conditions without the aid of the substrate bias exhibited large columnar grains with clear grain boundaries. On the other hand, the interruption of the large columnar grain growth accompanied with the renucleation and growth of the grains was revealed in the MPP CrN coatings. The MPP CrN coatings exhibited a dense microstructure, fine grain size and smooth surface with high hardness (24.5 and 26 GPa), improved wear resistance (COF = 0.33 and 0.36) and adhesion, which are the results of the low ion energy and high ion flux bombardment from the MPP plasma.     

Effect of bias voltage on microstructure and nanomechanical properties of Ti films

In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM). It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.