Some physical properties of Sn-doped CdO thin films prepared by chemical bath deposition

Undoped and Sn-doped CdO thin films were prepared by the chemical bath deposition method by means of a procedure that improves the deposition efficiency. All as-grown films were crystallized in the cubic structure of cadmium peroxide (CdO₂) and transformed into CdO with a cubic structure after an annealing process. The as-grown films have a high resistivity (> 10⁶ Ω cm) and an optical bandgap around 3.6 eV. Undoped CdO displays an optical bandgap around 2.32–2.54 eV and has an electrical conductivity of 8 × 10^− 4 Ω cm. The Sn incorporation into CdO produces a blue shift in the optical bandgap (from 2.55 to 2.84 eV) and a decrease in the electrical conductivity.The deposition procedure described here gives colloid-free surface thin films as indicated by the surface morphology analysis.     

Effects of complexing agent on CdS thin films prepared by chemical bath deposition

CdS films have been prepared by chemical bath deposition (CBD) without stirring using weak and strong complexing agents, i.e., ammonia and ethylenediaminetetraacetic acid (EDTA). The optical, structural, and morphological properties of chemical bath deposited CdS films have been investigated. When the complexing agent is ammonia, five peaks in the X-ray diffraction (XRD) patterns from the CdS film, respectively, correspond to the interplanar spacing of 3.5498, 3.3429, 3.1449, 2.0574, and 1.7487 Å, which are definitely ascribed to hexagonal structure; unfortunately, this hexagonal CdS film is with poor morphology and its optical property in the visible region is not desirable for the solar cells. While, when the complexing agent is EDTA, three diffraction peaks in the XRD patterns from the CdS film, respectively, correspond to the interplanar spacing of 3.1164, 2.6716, and 1.8507 Å, indicating that the film is of a cubic structure. Furthermore, the CdS film has good morphology and its optical property in the visible region is compliant to the requirements of solar cells.     

化学水浴法制备ZnS薄膜光学性能

利用薄膜分析系统测量不同沉积时间制备的ZnS薄膜透射谱,通过分析薄膜透射谱,来确定ZnS薄膜光学常数和禁带宽度.实验结果表明,在线性生长阶段,薄膜的沉积速率大约为1 nm/min,具有很好的线性关系,沉积0.5 h的ZnS薄膜在可见光范围内光透过率为82%左右.     

Optical properties of nanocrystalline ZnS:Mn thin films prepared by chemical bath deposition method

Nanocrystalline ZnS:Mn thin films were fabricated by a chemical bath deposition route on glass, silicon, and quartz substrates using a weak acidic bath, in which citrate ions acts as a nontoxic complexing agent for zinc ions and thioacetamide acts as a source of sulfide ions at 60 °C. The composition of films were characterized by energy-dispersive X-ray spectrometer, inductively coupled plasma atomic emission spectroscopy, Rutherford backscattering, and attenuated total reflection-Fourier transform infrared spectroscopy. X-ray diffraction pattern and transmission electron microscopy image confirm that the films have nanocrystalline nature. The band gap energy of ZnS:Mn films is blue-shifted by about 0.3 eV with respect to the bulk value (3.67 eV), probably due to the quantum size effect as expected from the nanocrystalline nature of the ZnS:Mn thin films. The dispersion and optical constants of the films were determined. These parameters changed with the deposition time.     

Multiple dip deposition of CdS films prepared by oscillating chemical bath

Highly oriented CdS thin films with thicknesses greater than 1 μm were deposited using the oscillating chemical bath deposition technique with multiple dips at 75 °C, and from 15 to 75 min as deposition times. Samples with different thicknesses were deposited by repeating the chemical deposition process one, two and three times. All CdS films present the α-greenockite hexagonal structure with (002) as the preferential orientation. Band-gap energy values ranged from 2.35 to 2.42 eV, being the smaller value for the two dip processes. Energy dispersion spectroscopy measurements show good stoichiometry of the CdS films with 4.3 at.% as the maximum Cd variation.     

Structural and optical properties of nanocrystalline CdS thin films prepared using microwave-assisted chemical bath deposition

Cadmium sulfide (CdS) nanocrystalline thin films were prepared using the microwave-assisted chemical bath deposition method onto glass substrates at 80 °C. Aqueous solutions of either cadmium chloride or cadmium acetate and thiourea were used as sources of Cd²⁺ and S²⁻ ions, respectively. Two sets of samples with different concentrations were prepared. A microwave oven was used as a heating source to synthesize the nanocrystalline CdS thin films. The prepared thin films had a good adhesion with no pinholes. These films were examined for their structural and surface morphologies by X-ray diffraction (XRD), scanning electron microscopy, and atomic force microscopy. The optical properties were investigated using UV-vis spectrophotometer, photoluminescence, and Raman spectroscopy. Particle size values obtained from XRD were compared with these calculated using effective mass models. The values of optical band gaps according to optical transmission measurements decreased as the ion source molar concentration increased.     

CdS thin films growth by ammonia free chemical bath deposition technique

Cadmium Sulfide CdS thin films were deposited by chemical bath deposition technique using ethanolamine as complexing agent instead of commonly used ammonia to avoid its toxicity and volatility during film preparation. In order to investigate the film growth mechanism samples were prepared with different deposition times. A set of substrates were dropped in the same bath and each 30 minutes a sample is withdrawn from the bath, by this way all the obtained films were grown in the same condition. The films structure was analyzed by X rays diffraction. In early stage of growth the obtained films are amorphous, with increasing the deposition time, the films exhibits a pure hexagonal structure with (101) preferential orientation. The film surface morphology was studied by atomic force microscopy. From these observations we concluded that the early growth stage starts in the 3D Volmer-Weber mode, followed by a transition to the Stransky-Krastanov mode with increasing deposition time. The critical thickness of this transition is 120 nm. CdS quantum dots were formed at end of the film growth. The optical transmittance characterization in the UV-Visible range shows that the prepared films have a high transparency ranging from 60 to 80% for photons having wavelength greater than 600 nm.     

Structural analysis of indium sulphide thin films elaborated by chemical bath deposition

X-ray diffraction and scanning electron microscopy show that the crystalline state of indium sulphide thin films, elaborated by chemical bath deposition technique on various substrates, is strongly affected by deposition parameters (deposition time t_D, pH solution and thioacetamide concentration), as well as by annealing treatment.We show that β-In₂S₃ thin films grown on glass substrate during t_D=60 min, and annealed under nitrogen at 400 °C during 1 h are well crystallized according to the cubic structure with the preferential orientation (610). They have a good homogenity and crystallinity.     

Preparation and characterization of ZnS thin films by the chemical bath deposition method

ZnS thin films prepared on quartz substrates by the chemical bath deposition (CBD) method with three type temperature profile processes have been investigated by X-ray diffraction, scanning electron microscope, energy dispersive X-ray analysis and light transmission. One is a 1-step growth process, and the other is 2-steps growth and self-catalyst growth processes. The surface morphology of CBD-ZnS thin films prepared by the CBD method with the self-catalyst growth process is flat and smooth compared with that prepared by the 1-step and 2-steps growth processes. The self-catalyst growth process in order to prepare the particles of ZnS as initial nucleus layer was useful for improvement in crystallinity of ZnS thin films prepared by CBD. ZnS thin films prepared by CBD method with self-catalyst growth process can be expected for improvement in the conversion efficiency of Cu(InGa)Se₂-based thin film solar cells by using it for the buffer layer.     

Study of trap levels by electrical techniques in p-type CuInSe2 thin films prepared using chemical bath deposition

CuInSe₂ thin films, prepared using the Chemical Bath Deposition (CBD) technique, were analysed using Thermally Stimulated Current (TSC) measurements in order to get a clear picture of the different trap levels present in it. As-prepared samples showed two trap levels: the prominent one was due to the presence of a Se vacancy, while the weak one was due to the presence of a Cu vacancy. After annealing in air, the Se vacancy disappeared and a new level appeared which is suspected to be due to adsorbed oxygen. But annealing in air does not affect the Cu vacancy. On the other hand, annealing in vacuum does not affect Se vacancy, but the presence of an Fe impurity was detected in this case. A possible explanation for this phenomenon is also discussed. The dark conductivity measurements were also conducted on as-prepared as well as annealed CuInSe₂ samples. These results are found to be in good agreement with the results obtained from TSC measurements.     

Effect of CdCl2 annealing treatment on thin CdS films prepared by chemical bath deposition

In order to study the CdS recrystallization mechanism, a comparative study was carried out on thin films prepared by chemical bath deposition. The CdS films were annealed in air with or without a CdCl₂ coating layer. In-situ Raman spectra obtained during the annealing showed that both the air- and the CdCl₂-annealing did not cause rearrangement of the neighboring atoms in the CdS clusters below ~ 300 °C. CdS thin film was partially oxidated to CdO and CdSO₄ on the cluster surface when annealed in air. The oxides and the sulfur stoichiometric deficiency prevented the clusters to coalesce at higher temperatures. Coating thin CdS film with a thin CdCl₂ layer protected it from oxidation during annealing in air and promoted formation of Cl_S and V_Cd point defects in CdS. The anti-oxidation was attributed to the incorporation of a significant amount of Cl into CdS to form the Cl_S, which prevented the oxygen in-diffusion and chemical bonding during the annealing. The anti-oxidation at the CdS nano-crystalline surface and the point defects formed in the CdS promoted coalescence of the neighboring clusters without the need of long-range redistribution of the atoms. Large CdS grains with good crystalline quality formed through recrystallization during the CdCl₂ heat treatment, which provided the solid basis for the subsequent CdTe growth and high efficient CdS/CdTe solar cell fabrication.     

化学水浴中氨浓度对沉积ZnS薄膜的影响

用化学水浴法在玻璃衬底上沉积ZnS薄膜。采用XRD、SEM、nkd-薄膜分析系统对薄膜的形貌、结构和光学性能进行了分析，结果表明：当氨浓度〈1．50mol／L，可获得白点较少、平整性较好的非晶ZnS薄膜，在红移方向上很长的波段内透过率较好，可达95％以上，禁带宽度为3．81eV，折射率随波长的增加而减小，从2．32变化到1．92。有关化学水浴ZnS薄膜折射率的报道极少；当氨浓度〉1．50mol／L时，薄膜白点增多，易龟裂和剥落，结构是立方闪锌矿。     

Copper thin films prepared by chemical vapour deposition from copper dipivalylmethanate

Copper thin films were prepared by a low-temperature atmospheric-pressure chemical vapour deposition method. The raw material was copper dipivalylmethanate which is volatile and thermally stable. At a reaction temperature above 220°C, polycrystalline copper films can be obtained by hydrogen reduction of the raw material. The resistivity of the film was in the range 1.7–2.7 cm.     

Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate

Nickel thin films were prepared by a low-temperature atmospheric-pressure chemical vapour deposition method. The raw material was nickel acetylacetonate. At a reaction temperature above 250 °C, polycrystalline nickel films can be obtained by hydrogen reduction of the raw material. The resistivity (8.1–13.3 cm) of the film was close to that of bulk nickel.     

Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

A combination of hot-wire chemical vapor deposition (HWCVD) and RF plasma, referred to as plasma-assisted HWCVD (P-HWCVD) was used to prepare poly-crystalline silicon (poly-Si) thin films. The effects of the plasma on the film properties were studied by varying the RF power (P_w) from 0 to 40 W. The results indicate that, compared with that of HWCVD samples, the film crystalline fraction (X_c) is enhanced at low P_w assistance, whereas it decreases at higher P_w. The uniformity of the film thickness is considerably improved by introducing plasma. It is also found that the porosity of the film, indirectly detected from infrared spectra, is much reduced. Auger analysis of the tantalum filament used in the P-HWCVD process shows much lower silicon contamination than that in HWCVD.     

Structural and optical properties of CdS thin films grown by chemical bath deposition

Cubic cadmium sulphide (CdS) thin films with (111) preferential orientation were prepared by chemical bath deposition (CBD) technique, using the reaction between NH₄OH, CdSO₄ and CS(NH₂)₂. The films properties have been investigated as a function of bath temperature and deposition time. Structural properties of the obtained films were studied by X-ray diffraction analysis. The structural parameters such as crystallite size have been evaluated. The transmission spectra, recorded in the UV visible range reveal a relatively high transmission coefficient (70%) in the obtained films. The transmittance data analysis indicates that the optical band gap is closely related to the deposition conditions, a direct band gap ranging from 2.0 eV to 2.34 eV was deduced. The electrical characterization shows that CdS films' dark conductivities can be controlled either by the deposition time or the bath temperature.