Influence of silver doping on the phase transformation and crystallite growth of electrospun TiO2 nanofibers

Ag doped TiO₂ nanofibers were fabricated by electrospinning technique using polyvinyl pyrrolidone (PVP) and titanium isopropoxide (TiP) as precursor. The effects of silver and calcination temperature on the preparation of electrospun TiO₂ nanofibers were investigated. The calcination temperature determines the TiO₂ phases as ether anatase or rutile. When the calcination temperature increased, crystallite size of TiO₂ nanofiber increased. The crystallite size of Ag doped TiO₂ nanofiber is smaller than that of the pure TiO₂ nanofiber because silver is retrained in this phase transformation. Silver controlled the phase transformation as well as had an inhibition effect on the growth of anatase crystallite.     

Phase transformation in semi-transparent TiO2 films irradiated with CO2 laser

Anatase (TiO₂) thin films were obtained by immersion of glass plates into a titanium sol-gel precursor followed by calcination at 450 °C for 3 h. The Raman results for the CO₂ laser irradiated TiO₂ films show that laser radiation is able to promote favorable changes of anatase phase in anatase/rutile mixtures. Nevertheless, the transformation process level depends on laser characteristics and scan speed of the radiation treatment.     

Preparation, characterization and photocatalytic activity of in situ Fe-doped TiO2 thin films

Fe-doped TiO₂ thin films were prepared in situ on stainless steel substrates by liquid phase deposition, followed by calcination at various temperatures. It was found that some Fe³⁺ ions were in situ doped into the TiO₂ thin films. At 400 °C, the film became photoactive due to the formation of anatase phase. At 500 °C, the film showed the highest photocatalytic activity due to an optimal Fe³⁺ ion concentration in the film. At 900 °C, the photocatalytic activity of the films decreased significantly due to the further increase of Fe³⁺ ion concentration, the formation of rutile phase and the sintering and growth of TiO₂ crystallites.     

Structural and electrical characterization of TiO2 films grown by spray pyrolysis

The sol-gel spray pyrolysis method was used to grow TiO₂ thin films onto silicon wafers at substrate temperatures between 315 and 500 °C using pulsed spray solution feed followed by annealing in the temperature interval from 500 to 800 °C in air. According to FTIR, XRD, and Raman, the anatase/rutile phase transformation temperature was found to depend on the film deposition temperature. Film thickness and refractive index were determined by Ellipsometry, giving the refractive indexes of 2.1-2.3 and 2.2-2.6 for anatase and rutile, respectively. According to AFM, film roughness increases with annealing temperature from 700 to 800 °C from 0.60 to 1.10 nm and from 0.35 to 0.70 nm for the films deposited at 375 and 435 °C, respectively. The effective dielectric constant values were in the range of 36 to 46 for anatase and 53 to 70 for rutile at 10 kHz. The conductivity activation energy for TiO₂ films with anatase and rutile structure was found to be 100 and 60 meV, respectively.     

Hydrophilic properties of nano-TiO2 thin films deposited by RF magnetron sputtering

Microstructure and hydrophilicity of nano-titanium dioxide (TiO₂) thin films, deposited by radio frequency magnetron sputtering, annealed at different temperatures, were studied by field emission scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and water contact angle methods. It is found that the crystal phase transforms from amorphous to rutile structure with increase of annealing temperature from room temperature to 800 °C. It is also indicated that the organic contaminants on the surface of the films can be removed and the oxygen vacancies can be reduced by the annealing treatment. Annealed at the temperature below 300 °C, amorphous TiO₂ thin films show rather poor hydrophilicity, and annealed at the temperature range from 400 to 650 °C, the super hydrophilicity anatase of TiO₂ thin films can be observed. However, when the annealing temperature reaches 800 °C, the hydrophilicity of the films declines mainly derived from the appearance of rutile.     

Structural, morphological and optical properties of TiO2 films prepared using aqueous sol–gel methods

The influence of the preparation conditions on the structural, morphological and optical properties of TiO₂ thin films deposited on silicon substrate (Si), indium tin oxide coated glass (ITO) and alkali-free borosilicate glass (AFG), respectively is studied in this work. The X-ray diffraction analysis revealed that all TiO₂ samples had a polycrystalline structure. The TiO₂ films coated on Si showed a mixed phase of anatase and rutile while in the case of those on ITO and AFG only the pure anatase phase was observed. The crystallite size within the TiO₂ thin films varied with the calcinations temperature, solvent lateral chain and catalyst type. The optical transmittance, band gap, reflective index and porosity were strongly affected by the annealing temperature, substrate nature and solvent.     

Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition

Titanium dioxide (TiO₂) thin films were prepared on Galvanized Iron (GI) substrate by plasma-enhanced atomic layer deposition (PE-ALD) using tetrakis-dimethylamido titanium and O₂ plasma to investigate the photocatalytic activities. The PE-ALD TiO₂ thin films exhibited relatively high growth rate and the crystal structures of TiO₂ thin films depended on the growth temperatures. TiO₂ thin films deposited at 200 °C have amorphous phase, whereas those with anatase phase and bandgap energy about 3.2 eV were deposited at growth temperature of 250 °C and 300 °C. From contact angles measurement of water droplet, TiO₂ thin films with anatase phase and Activ™ glass exhibited superhydrophilic surfaces after UV light exposure. And from photo-induced degradation test of organic solution, anatase TiO₂ thin films and Activ™ glass decomposed organic solution under UV illumination. The anatase TiO₂ thin film on GI substrate showed higher photocatalytic efficiency than Activ™ glass after 5 h UV light exposure. Thus, we suggest that the anatase phase in TiO₂ thin film contributes to both superhydrophilicity and photocatalytic decomposition of 4-chlorophenol solution and anatase TiO₂ thin films are suitable for self-cleaning applications.     

Effects of oxygen flow ratios and annealing temperatures on Raman and photoluminescence of titanium oxide thin films deposited by reactive magnetron sputtering

Titanium oxide (TiO_x) thin films were deposited on the Si(100) substrates by direct-current reactive magnetron sputtering at 3-15 % oxygen flow ratios (FO₂% = FO₂/(FO₂ + FAr) × 100%), and then annealed by rapid thermal annealing (RTA) at 350-750 °C for 2 min in air. The phase, bonding and luminescence behaviors of the as-deposited and annealed TiO_x thin films were analyzed by X-ray diffraction (XRD), Raman spectroscopy and photoluminescence (PL) spectroscopy, respectively. The as-deposited TiO_x films were amorphous from XRD and showed weak Raman intensity. In contrast, the distinct crystalline peaks of anatase and rutile phases were detected after RTA at 550-750 °C from both XRD and Raman spectra. A mixture of anatase and rutile phases was obtained by RTA at 3 FO₂% and its amount increased with annealing temperature. Only the anatase phase was detected in the 6-15 FO₂% specimens after RTA. The PL spectra of all post-annealed TiO_x films showed a broad peak in visible light region. The PL peak of TiO_x film at 3 FO₂% at 750 °C annealing can be fitted into two Gaussian peaks at ~ 486 nm (2.55 eV) and ~ 588 nm (2.11 eV) which were attributed to deep-level emissions of oxygen vacancies in the rutile and anatase phases, respectively. The peak around 550 nm was observed at 6-15 FO₂% which is attributed to electron-hole pair recombination from oxygen vacancy state in anatase phase to valence band. The variation of intensity of PL peaks is concerned with the formation of the rutile and anatase phases at different FO₂% and annealing temperatures.     

Synthesis and photocatalytic activity of nanocrystalline TiO2-SrO composite powders under visible light irradiation

Nano-sized homogeneously distributed TiO₂-20, -40, -60 wt.% SrO composite powders were successfully synthesized by a sol-gel method. The as-received amorphous TiO₂—20 wt.% SrO composite powders were crystallized with anatase TiO₂ at around 750 °C. As calcination temperatures increased, the anatase TiO₂ crystalline phase was transformed to rutile TiO₂ at about 900 °C, whereas nano-sized, squarish SrTiO₃ phase was detected. The peaks obtained after calcining at 1050 °C mainly exhibited the rutile TiO₂ and SrTiO₃ phases. However, a small number of SrO₂ peaks were also detected. For the comparison of photocatalytic activity depending on light sources, TiO₂-SrO composite powders were tested in phenol degradation. TiO₂-60 wt.% SrO composite powder showed good visible light photoactivity for the photo-oxidation of phenol.     

Titanium dioxide thin films for high temperature gas sensors

Titanium dioxide (TiO₂) thin film gas sensors were fabricated via the sol-gel method from a starting solution of titanium isopropoxide dissolved in methoxyethanol. Spin coating was used to deposit the sol on electroded aluminum oxide (Al₂O₃) substrates forming a film 1 μm thick. The influence of crystallization temperature and operating temperature on crystalline phase, grain size, electronic conduction activation energy, and gas sensing response toward carbon monoxide (CO) and methane (CH₄) was studied. Pure anatase phase was found with crystallization temperatures up to 800 °C, however, rutile began to form by 900 °C. Grain size increased with increasing calcination temperature. Activation energy was dependent on crystallite size and phase. Sensing response toward CO and CH₄ was dependent on both calcination and operating temperatures. Films crystallized at 650 °C and operated at 450 °C showed the best selectivity toward CO.     

Chemical bonding structure of TiO2 thin films grown on n-type Si

Titanium dioxide thin films were obtained by RF magnetron sputtering system with different Ar and O atmospheres. Chemical bonding structures of the thin films were investigated using the Fourier transform infrared spectroscopy (FTIR) in the range of 400-7500 cm^− 1 for as-deposited and conventionally thermal annealed films at different temperature in air. These structural characterizations of the films were carried out by describing the low-frequency fluctuations of the FTIR spectra using the noninvasive (i.e. error controllable) procedure of the optimal linear smoothing. This approach is based on the criterion of the minimal relative error in selection of the proper smoothing window. It allows the receiving an optimal separation of a possible trend from the high-frequency fluctuations, defined as a random sequence of the relative fluctuations possessing zero trends. Thus, the noise can be read and extra information about the structures was then obtained by comparing with the experimental results. In the film annealed at 900 °C, the rutile phase was the dominant crystalline phase as revealed by infrared spectroscopy. At the annealing temperatures lower than 900 °C, both the anatase and the rutile phases were coexisting. In addition, symmetric and asymmetric Si-O-Si vibrations modes were observed at around 1000 cm^− 1 and 800 cm^− 1, respectively. These peaks suggest that a thin SiO₂ film was formed at the TiO₂/Si interface during the growth and the annealing of the TiO₂ films. It was also observed that the reactivity between TiO₂ film and Si substrate is increased with the increasing annealing temperature.     

Photocatalytic properties of porous TiO2/Ag thin films

In this study, nanocrystalline TiO₂/Ag composite thin films were prepared by a sol-gel spin-coating technique. By introducing polystyrene (PS) spheres into the precursor solution, porous TiO₂/Ag thin films were prepared after calcination at a temperature of 500 °C for 4 h. Three different sizes (50, 200, and 400 nm) of PS spheres were used to prepare porous TiO₂ films. The as-prepared TiO₂ and TiO₂/Ag thin films were characterized by X-ray diffractometry (XRD) and by scanning electron microscopy to reveal structural and morphological differences. In addition, the photocatalytic properties of these films were investigated by degrading methylene blue under UV irradiation.When PS spheres of different sizes were introduced after calcination, the as-prepared TiO₂ films exhibited different porous structures. XRD results showed that all TiO₂/Ag films exhibited a major anatase phase. The photodegradation of porous TiO₂ thin films prepared with 200 nm PS spheres and doped with 1 mol% Ag exhibited the best photocatalytic efficiency where ∼ 100% methylene blue was decomposed within 8 h under UV exposure.     

Nanocrystalline TiO<Subscript>2</Subscript> preparation by microwave route and nature of anatase–rutile phase transition in nano TiO<Subscript>2</Subscript>

Nanopowders of TiO₂ has been prepared using a microwave irradiation-assisted route, starting from a metalorganic precursor, bis(ethyl-3-oxo-butanoato)oxotitanium (IV), [TiO(etob)₂]₂. Polyvinylpyrrolidone (PVP) was used as a capping agent. The as-prepared amorphous powders crystallize into anatase phase, when calcined. At higher calcination temperature, the rutile phase is observed to form in increasing quantities as the calcination temperature is raised. The structural and physicochemical properties were measured using XRD, FT–IR, SEM, TEM and thermal analyses. The mechanisms of formation of nano-TiO₂ from the metal–organic precursor and the irreversible phase transformation of nano TiO₂ from anatase to rutile structure at higher temperatures have been discussed. It is suggested that a unique step of initiation of transformation takes place in Ti_1/2O layers in anatase which propagates. This mechanism rationalizes several key observations associated with the anatase–rutile transformation.     

Nonlinear optical response of titanium oxide nanostructured thin films

Titanium (IV) oxide thin films prepared by low temperature (95 °C) hydrothermal growth were observed to undergo important structural modifications upon variation of the deposition period, modifications strongly affecting the nonlinear optical (NLO) response of the films. Depending on the growth time, the films were observed to contain anatase or rutile TiO₂. It was found that only anatase TiO₂ exhibits significant nonlinear optical response.     

Structural study of lithium titanium mixed oxides prepared by sol-gel process

A structural study, using TGA-DSC analysis, X-ray diffraction, Raman scattering and FT Infrared absorption, is performed on mixed titanium lithium oxide with 20% of lithium prepared by sol-gel process. The structure is investigated as a function of the annealing temperature. At low temperatures the sample is in the anatase phase and transforms to the rutile phase near 500°C. The crystallite size of rutile TiO₂ increases from 40 to 100 nm as the temperature increases. However the size increase presents some discontinuity at temperature around 600°C. At thermal treatment temperatures from 500°C to 850°C the presence of LiTi₂O₄ in the sample is clearly observed. Finally at 1000°C the sample is composed by a mixture of rutile TiO₂ and Li₂Ti₃O₇.     

Characterization of titania thin films grown by dip-coating technique

A dip-coating technique was employed to prepare anatase phase of titania thin films. Fluorine doped tin oxide substrates were used to prepare titania thin films. The samples were annealed at 550 °C for 18 h. X-ray diffraction results revealed the amorphous and anatase phases of TiO₂ for as-synthesized and annealed samples, respectively. The crystallite size of anatase TiO₂ thin films was almost 25 nm for annealed samples. UV–visible confirmed the energy band gap 3.86 and 3.64 eV for as-prepared and calcinated titania thin films. The reduction in the energy band gap could be due to the change in crystallization and agglomeration of small grains after calcination. The morphology of the prepared films was investigated by field emission scanning electron microscopy which demonstrated the agglomeration of spherical particles of TiO₂ with average particle size of about 30 nm. The molecular properties (chemical bonding) of the samples were investigated by means of Fourier Transform Infrared (FTIR) spectroscopy. FTIR analysis exhibited the formation of titania, functional group OH, hydroxyl stretching vibrations of the C–OH groups, bending vibration mode of H–O–H, alkyl C–H stretch, stretching band of Ti–OH, CN asymmetric band stretching, and C=O saturated aldehyde.     

Photocatalysis and characterization of the gel-derived TiO2 and P-TiO2 transparent thin films

The gel-derived TiO₂ and P-TiO₂ transparent films coated on fused-SiO₂ substrates were prepared using a spin-coating technique. Effects of phosphorus dopants and calcination temperature on crystal structure, crystallite size, microstructure, light transmittance and photocatalytic activity of the films were investigated. By introducing P atoms to Ti-O framework, the growth of anatase crystallites was hindered and the crystal structure of anatase-TiO₂ could withstand temperature up to 900 °C. The photocatalytic activities of the prepared films were characterized using the characteristic time constant (τ) for the photocatalytic reaction. The titania film with a smaller τ value possesses a higher photocatalytic ability. After exposing to 365-nm UV light for 12 h, the P-TiO₂ films calcined between 600 °C and 900 °C can photocatalytically decomposed ≥ 84 mol% of the methylene blue in water with corresponding τ ≤ 7.1 h, which were better than the pure TiO₂ films prepared at the same calcination temperature.     

TiO2 nanorod films grown on Si wafers by a nanodot-assisted hydrothermal growth

We report the controlled hydrothermal growth of rutile TiO₂ nanorods on Si wafers by using an anatase TiO₂ nanodot film as an assisted growth layer. The anatase nanodot film was prepared on the wafer by phase-separation-induced self-assembly and subsequent heat-treatment at 500 °C. The nanodots on the wafer were then subjected to hydrothermal treatment to induce the growth of rutile TiO₂ nanorod films. The size and dispersion density of the resulting TiO₂ nanorods could be varied by adjusting the Ti ion concentration in the growth solution. The TiO₂ nanorods were of the rutile phase and grew in the [001] direction. The growth mechanism reveals that the growth of the rutile nanorods was wholly dependent on the existence of rutile TiO₂ seeds, which could be formed by the dissolution-reprecipitation of the anatase nanodots during hydrothermal treatment or under the high-temperature conditions of the subsequent heat-treatment of the as-prepared nanodots. In controlling the rutile nanorod growth, the anatase nanodots show more efficiency than a dense anatase film. Preliminary evaluations of the rutile nanorod films have demonstrated that the wettability changed from highly hydrophobic to superhydrophilic and that the photocatalytic activity was enhanced with increasing nanorod dispersion density.     

Photocatalytic activities of Ion doped TiO2 thin films when prepared on different substrates

Pure and ion doped TiO₂ thin films were prepared by sol-gel dip coating process on metallic and non-metallic substrates. Test metal ion concentration ranged from 0.000002 to 0.4 at.%. The resulting films were annealed in air and characterized by optical spectroscopy and X-ray diffraction. The photodegradation of methyl orange under UV irradiation by pristine and ion-doped TiO₂ films was quantified in a photocatalytic reactor developed in this study. In general, both doped and undoped TiO₂ crystals appeared in anatase phase and the photocatalytic activities of the TiO₂ thin films varied with substrates, calcination temperature, doping ions and their concentrations. The best calcination temperature for different substrates ranged from 450 to 580 °C. Films prepared on the metallic substrates resulted in higher photocatalytic activities, while ion doping lowered their efficiencies. On the contrary, for non-metallic substrates except ceramic the photocatalytic efficiencies of undoped films were much lower (< 30%), while ion doping was shown to increase the photocatalytic efficiencies remarkably in some cases, e.g., Cr³⁺ with the tile substrate. Overall, ion doping affected the photocatalytic efficiency of TiO₂ films, and an optimal doping concentration of between 0.0002 and 0.002 at.%, close to an estimate by the Debye length equation, resulted in the highest efficiency for most substrates.     

Epitaxial growth of anatase by reactive sputter deposition using water vapor as the oxidant

The growth of TiO₂ films in the anatase crystal structure was investigated using reactive sputter deposition with H₂O serving as the oxidizing species. With water vapor, the formation of phase-pure anatase TiO₂ thin films via epitaxial stabilization on (001) LaAlO₃ was achieved, although crystallinity was slightly inferior to that obtained when O₂ was employed. Films grown using water vapor exhibited a rougher surface morphology indicating a difference in growth mechanisms. At low H₂O pressure, the formation of a Ti_nO_2n−1 Magnéli phase was observed. When hydrogen was employed during growth, mixed phase films of rutile and anatase resulted. The development of crystallinity and phase as a function of deposition temperature and oxidant pressure are discussed.