环己基甲基二甲氧基硅烷的合成

介绍了一步格氏试剂新工艺合成环己基甲基二甲氧基硅烷的方法 ,并对此工艺条件作了一定的优化 ,使环己基甲基二甲氧基硅烷收率达到 85 %以上。     

环己基甲基二甲氧基硅烷的合成

介绍了一步格氏试剂新工艺合成环乙基甲基二甲氧基硅烷的方法,并对此工艺条件作了一定的优化,使环己基甲基二甲氧基硅烷收率达到85％以上。     

二环戊基二甲氧基硅烷的合成方法

综合阐述了二环戊基二甲氧基硅烷的几种合成方法。     

环己基甲基二甲氧基硅烷的合成工艺探讨

介绍环己基甲基二甲氧基硅烷的几种合成方法,并对其工艺方法的优劣作了述评。     

硅氢加成法合成甲基环己基二甲氧基硅烷

蚌埠医学院的韦正友等人以环己烯和甲基氢二氯硅烷 (DCMS)为原料 ,在硅氧烷铂配合物催化下 ,制得甲基环己基二氯硅烷 (CMCS) ,然后再与甲醇反应 ,得到甲基环己基二甲氧基硅烷 (CMMS)。合成CMCS的最佳工艺条件为 :反应温度 80～ 90℃ ,环己烯和DCMS的量之比为 1 0 0∶1 2 2 ,催化剂用量为 0 8mL ,叔丁醇1 0mL ,反应时间 4h ,收率 87 9% ;CMMS的合成条件为 :第一阶段反应室温下进行 ,甲醇与CMCS的量之比为 1 2 2∶1 0 0 ;第二阶段反应温度不高于 40℃ ,甲醇与CMCS的量之比为5 0 0∶1 0 0。产品中残留的氯化氢用甲醇钠溶…     

由二硅烷馏分制备氯硅烷单体和含硅聚合物的研究进展

综述了由直接甲基氯硅烷法合成中的副产物二硅烷馏分制备氯硅烷单体与合成含硅聚合物的主要方法和应用领域，指出了开发利用这种副产物的实际意义。     

甲基苯基二甲氧基硅烷合成方法的研究进展

介绍了甲基苯基二甲氧基硅烷的几种合成方法:格氏试剂法、钠缩合法和醇解法。并对几种方法进行了比较。电子产品方面封装材料的合成优选格氏试剂法。     

格氏试剂法合成二环戊基二甲氧基硅烷的研究

研究了格氏试剂法合成二环戊基二甲氮基硅烷(D-Donor)的工艺。用氯代环戊烷与镁粉、四甲氧基硅烷在溶剂甲苯中同时完成格氏化反应和取代反应，经分离、精馏得二环戊基二甲氧基硅烷。四甲氮基硅烷74mL(0．5mo1)、镁粉30g(1．25mo1)、THFl00mL、氯代环戊烷10mL，在氮气保护下回流，滴加105mL氯代环戊烷和500mL甲苯的混合液，回流5h。过滤、精馏得二环戊基二甲氮基硅烷89．3g，纯度99％，收率78．2％。     

六甲基二硅脲的合成试验

以六甲基二硅氨烷、悄素为原料合成了六甲基二硅脲,通过实验确定了反应的适宜条件,收率≥９６％。     

聚硅烷的发光性质

介绍了光致发光和电致发光的过程及聚硅烷的光致发光和电致发光性的研究进展。     

聚硅烷的电子特性及非线性光学材料

综述了聚硅烷的电子结构、光吸收特性。重点介绍了聚硅烷在非线性光学材料中的研究与应用。     

Electroreductive block copolymerization of dichlorosilanes in the presence of disilane additives

The electroreductive polymerization of dichloromethylphenylsilane in the presence of triphenylsilyl group‐containing disilanes such as hexaphenyldisilane followed by the electroreductive termination with chlorotriphenylsilane afforded triphenylsilyl group‐terminated polymethylphenylsilane in 15–32% yield. The isolated polymethylphenylsilane (M_n = 3350 g mol^?1, M_w/M_n = 1.4) was found to react as a macroinitiator to copolymerize with dibutyldichlorosilane under electroreductive conditions producing the corresponding block copolymer (M_n = 4730 g mol^?1, M_w/M_n = 1.2) in 38% yield. The ratio of monomer units (? MeSiPh? to? BuSiBu? ) of the copolymer was determined to be 75:25 using ¹H NMR analysis, which was in good agreement with the calculated ratio (74:26) on the assumption that molecular weight of the macroinitiator was not changed. The block structure of the resulting copolymer, poly(methylphenylsilane)‐block‐poly(dibutylsilane), was also confirmed by comparing its ¹H NMR and UV absorption spectra with those of polymethylphenylsilane, polydibutylsilane and a statistical copolymer prepared by electroreductive polymerization of dichloromethylphenylsilane with dibutyldichlorosilane. This method is applicable to the preparation of other types of macroinitiator such as triphenylsilyl group‐terminated polydibutylsilane, and polydibutylsilane‐block‐polymethylphenylsilane was also obtained using this macroinitiator. Copyright © 2011 Society of Chemical Industry     

Studies on the laser degradation of the CHCl3 solution of polysilane

In this paper, the XeCl excimer laser was used to irradiate the CHCl₃ solution of polymethylphenethylsilane (PMPES) and that of poly(dimethylsilane-co-methylphenethylsilane) (PDM-MPES). The laser energy absorbed by the polysilane macromolecules was measured, the gel permeation chromatography molecular weights of the polysilane macromolecules both before and after irradiation were determined, and their corresponding apparent quantum yields under the irradiation were calculated. The apparent quantum yield of laser degradation of the CHCl₃ solution of PMPES is two orders of magnitude larger than that of the CHCl₃ solution of PDM-MPES, indicating that the spatial obstruction of the substituents attached to the polysilane chains has great effect on its apparent quantum yield of laser degradation. For the polysilane photodegradation under a rather low laser energy, with the increase of the laser energy absorbed by the polysilane macromolecules, the average molecular weight after irradiation decreases gradually while the average scissions per macromolecule and the apparent quantum yield increase. The concentration of the CHCl₃ solution of polysilane has only small effect on its apparent quantum yield of laser degradation. According to the X-ray photoelectron spectroscopy analysis, the CHCl₃ solvent is involved in the photoreaction and combined into the dissociated product. In light of the references, it is preliminarily proposed that the laser degradation of the CHCl₃ solution of polysilane may result from the comprehensive action of such factors as homolytic cleavage, silylene extrusion, chain cleavage by reductive elimination, the radical chain transfer process, the fluorescence quenching of polysilane by CHCl₃, etc. © 1997 John Wiley & Sons, Inc. J Appl Polym Sci 66: 1515–1519, 1997     

Preparation and characterization of a novel composite based on hyperbranched polysilane and fullerene

Conjugated polymers doped with fullerenes have shown promising application in photovoltaic cells, in which photoinduced charge transfer takes place. Here, we report a novel composite that was prepared by in situ polymerization of σ‐conjugated hyperbranched polysilane in the presence of fullerene. Both of the hyperbranched polysilane and fullerene have 3D structures, which are propitious to preparing materials with interpenetrating structure. The resulting composite has good solubility in common organic solvents and the UV spectrum edge suggests a low bandgap. Photoluminescence quenching in the composite is shown by the PL spectra and is also observed from the fluorescence microscopy images, which may be ascribed to the PCT from the hyperbranched polysilane to the fullerene. The composite was also characterized by GPC, FTIR, NMR, XRD, and TGA. Through further discussion, there may be π‐π stacking between hyperbranched polysilane and fullerene, which enhances the photoinduced charge transfer. © 2007 Wiley Periodicals, Inc. J Appl Polym Sci 2007     

主链液晶聚硅（氧）烷的液晶行为

综述了主链液晶聚硅烷和主链液晶聚硅氧烷（包括线型、环型和梯形结构）的热致和溶致液晶行为,指出主链液晶聚硅（氧）烷具有较稳定的热致液性能,其液晶相态温度范围最宽可达３７５℃,且多数在室温下 柱状液晶相态。带有表面活性苈团例链的线型聚硅烷以水为溶剂时,可形成溶致液晶,其呈现液晶行为的临界浓度约为３０％。液晶聚硅（氧）烷所具有的液晶行为膜使其成为一种新型的功能性硅橡胶。     

Effect of the polysilane structure on its solution fluorescence quenching

We studied the solution fluorescence quenching of poly(methylphenethylsilane) (1^#), poly(dimethylsilane‐co‐methylphenethylsilane) (2^#), poly(n‐hexylmethylsilane) (3^#), and poly(dimethylsilane‐co‐n‐hexylmethylsilane) (4^#) by such quenchers as CCl₄, CHCl₃, Cl₂CHCHCl₂, and methyl benzoate. We treated the fluorescence quenching data using the equations F₀/F = 1 +K_SV[Q],F₀/F exp(−NV[Q]) = 1 +K_SV[Q], and ln(F₀/F) =NV[Q], where F and F₀ are the fluorescence intensity with and without the addition of a quencher, respectively; K_SV, the Stern–Volmer constant; [Q], the quencher concentration; N, Avogadro's constant; and V, the volume of the active sphere. For the systems with both static quenching and dynamic quenching, we calculated their contributions and the critical quencher concentration [Q]_C and determined the nature of the fluorescence quenching in different quencher concentration ranges. We observed that, under the condition of the same quencher, the fluorescence quenching of the polysilane homopolymer is smaller than that of its corresponding polysilane copolymer, that is, 1^# < 2^# and 3^# < 4^#, and that for the fluorescence quenching of the same polysilane by different chlorohydrocarbons the fluorescence quenching ability of CCl₄ is larger than that of CHCl₃ and Cl₂CHCHCl₂. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 78: 133–139, 2000     

聚硅烷的合成研究进展

聚硅烷主链Si-Si单键中Si原子的σ键电子的非定域作用赋予了聚硅烷独特的光电特性,引起了学者们广泛的研究兴趣。本文在前人研究的基础上,对聚硅烷的合成进行了简要概述。     

聚硅烷的合成与应用

聚硅烷是一种主链完全由Si—Si组成的高聚物 ,其主链的σ键电子的非定域作用赋予了聚硅烷独特的光电性质 ,从而使其成为极有前途的功能性材料 ,引起广泛的研究兴趣。本文在前人总结的基础上对聚硅烷的合成和应用的近期发展做了简要概述