脉冲负偏压对TiN-Cu复合膜结构与性能的影响

为了研究薄膜的生长过程对薄膜结构和性能的影响并促进该类薄膜的商业应用,利用电弧离子镀在不同脉冲负偏压下沉积了TiN-Cu复合膜,并对其表面形貌、晶体结构、能谱、硬度、结合强度和耐磨性进行研究.结果表明,在50~300 V范围内,随脉冲负偏压值增加,沉积薄膜中Cu原子分数逐渐减少;薄膜中最大的Cu原子分数低于Cu-Ti合金靶中Cu原子分数.沉积膜中TiN相存在明显的(111)晶面织构,并且脉冲负偏压值增大,薄膜的织构程度增加.脉冲负偏压值增加,沉积的TiN-Cu复合膜的硬度和耐磨性降低,但结合强度增加.沉积膜结构与性能的变化与脉冲偏压引起薄膜中Cu原子分数的变化有一定关系.     

磁控溅射AI／Pb纳米多层膜调制结构研究

用磁控交替沉积制备Al／Pb纳米多层膜,运用XPS,AFM,TEM考察表面状况及膜结构．结果表明,实验条件下,当Al层厚60nm时,Pb子层标定厚度从20nm增至30nm,可形成较完整埋层调制结构．随Pb层厚度增加,连续性变好、表面糙度降低,Al层对Pb层表面糙度克服能力提高,改善层状结构完整性．多层膜中Al,Pb子层均存在（111）择优取向特征,由fcc结构的表面自由能最小化引起．     

活塞环表面Cr/CrN纳米多层膜的微观结构

为改善发动机活塞环的摩擦学性能,提高其使用寿命,采用多弧离子镀技术在活塞环表面制备了Cr/CrN纳米多层膜.采用x 射线衍射（XRD）、透射电子显微镜（TEM）、俄歇能谱仪（AES）、纳米硬度仪和CETR摩擦磨损试验机,系统分析了不同调制周期Cr/CrN纳米多层膜的微观结构、成分分布、纳米硬度和抗滑动磨损性能.结果表明：Cr/CrN多层膜由CrN、Cr2N和Cr相组成,在CrN（200）方向上出现择优取向.随调制周期的减小,多层膜的硬度和残余应力增大,当调制周期为80nm时,多层膜的硬度值最高达到21.5GPa;当调制周期为120nm时,H³/E²值达到最高,此时划痕临界载荷值最高.根据摩擦磨损试验结果可知,与电镀Cr和CrN涂层相比,Cr/CrN多层膜具有相对较好的抗滑动磨损性能,其磨损机制主要以磨粒磨损为主,有可能替代原活塞环Cr电镀层.     

铜合金表面Ti/TiN多层膜的制备、结构及其性能

为了研究多层膜的腐蚀性能,促进多层膜在生产中的应用,采用电弧离子镀技术,通过调整环境N₂和Ar气的时间比例在铜衬底上成功制备了不同调制周期的Ti/TiN多层膜.利用x 射线衍射谱和交流阻抗谱研究了该多层膜的结构和腐蚀性能.表面形貌显示,沉积的Ti/TiN多层膜具有明显的周期性,环境中N2和Ar气的时间比例决定了多层膜的调制周期,N₂气时间越长,多层膜中TiN相层越厚.腐蚀性能测定表明,多层膜的调制周期影响其耐蚀性,当调制周期为550nm时,沉积膜的耐腐蚀性最好.     

壳聚糖/纳米TiO2复合膜的制备及其性能分析

采用溶胶-凝胶法制备了壳聚糖/纳米二氧化钛复合膜,用X-射线衍射(XRD)、热重分析(TGA)、傅立叶红外分析(FT-IR)进行表征,并测试了壳聚糖膜的机械性能。X-射线衍射(XRD)表明,添加TiO2改变了壳聚糖原来的排列。热重分析(TGA)表明,壳聚糖复合膜比纯壳聚糖膜具有更好的热稳定性。傅立叶红外分析(FT-IR)表明壳聚糖复合膜中存在Ti-O键。拉伸测试表明,添加纳米TiO2后能提高断裂强度。     

用于渗透蒸发的多层复合膜的研究

本文讨论了渗透蒸发多层复合膜的膜材料的选择及其制作方法,并对渗透蒸发膜的发展趋势作了予测。     

Teflon/Al2O3纳米复合膜的结构及微观摩擦学特性

为了提高聚四氟乙烯的耐磨损能力，用射频磁控溅射法交替溅射纯Teflon靶和Al2O3靶获得Teflon/Al2O3多层复合膜，通过PHI－5300ESCA型X射线光电子能谱及原子力显微镜（AFM）对其结构、力学性能和微观摩擦磨损特性研究表明：Teflon/Al2O3多层复合膜不但具有Al2O3膜的较高硬度和抗磨损性能，而且具有纯Teflon膜的减摩性和高承载能力。同Al2O3相比，复合膜的综合性能优于纯Al2O3膜和纯Teflon膜。Teflon/Al2O3多层复合膜的研制，解决了弹性金属塑料瓦耐磨损能力差的问题。     

纳米纤维素晶须/壳聚糖天然可降解复合膜的制备与性能

以纳米纤维素晶须(NCW)为增强体、壳聚糖(CS)为基体,通过流延法制得天然可降解复合膜。通过电子显微镜(SEM)、红外光谱(FT-IR)、X射线衍射(XRD)等手段对复合膜进行结构表征,并对复合膜的动态力学性能、干湿态拉伸性能进行了测试。结果表明:NCW与CS具有很好的相容性;NCW的加入显著提高了CS膜的储能模量、拉伸模量和拉伸强度。NCW能够进一步拓宽CS材料的应用领域和价值。     

纳米TiO2／水性聚氨酯复合膜的制备及其性能研究

用纳米微粒直接分散法制备了纳米TiO2／水性聚氨酯复合膜,考察了纳米TiO2对复合膜性能的影响．粘度分析表明：纳米TiO2有增粘效果．粒径、SEM和AFM分析表明：添加纳米TiO2不影响聚氨酯乳液的稳定性,复合粒子仍然以纳米级存在,纳米TiO2能均匀分散于复合膜中,并对复合膜表面的平整度无影响．接触角和卫生性能测试表明：复合膜都没有防水性．机械性能测试表明：添加纳米TiO2的复合膜具有更好的力学性能．     

CrAlN/TiAlN 纳米多层膜的微结构及其性能研究

采用磁控反应溅射法制备了不同调制周期的CrAlN/TiAlN纳米多层膜,并通过X射线衍射仪 、显微硬度计、扫描电镜分析了调制周期对多层膜的微结构、力学性能和高温抗氧化性能的影响。结果表明：CrAlN/TiAlN纳米多层膜共格外延生长,呈现CrAlN（或TiAlN）面心立方结构,且呈（111）择优取向;CrAlN/TiAlN纳米多层膜在某些调制周期出现硬度异常升高的超硬度效应;CrAlN/TiAlN纳米多层膜比CrAlN, TiAlN单层膜具有更好的高温稳定性,高温时仍具有较高的硬度。     

电弧离子镀TiN/TiAlN复合涂层摩擦磨损性能研究

利用阴极电弧离子镀技术,在硬质合金基体上制得5层和20层TiN/TiAlN复合涂层.研究表明,这两种涂层均为典型的B1-NaCl面心立方结构,且均呈(200)择优取向.两种涂层表面光滑平整,粗糙度分别为0.32和0.11,硬度为1 470HV和2 000HV .20层复合涂层的摩擦系数和比磨损率低于5层,表明增加复合层数有利于提高涂层的耐磨损性能,涂层的磨损机理为磨粒磨损.     

Influence of negative bias voltage on the mechanical and tribological properties of MoS<Subscript>2</Subscript>/Zr composite films

MoS2/Zr composite films were deposited on the cemented carbide YT14 (WC+14%TiC+6%Co) by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage on the composite film properties,including adhesion strength,micro-hardness,thickness and tribological properties were investigated.The results showed that proper negative bias voltage could significantly improve the mechanical and tribological properties of composite films.The effects of negative ...     

Structures and properties of [CoPt/Ag]_n multilayer films

In recent years there has been considerable interest in atomically ordered L10-CoPtfilms as potential materials for ultrahigh density magnetic recording (UDMR) media[1].The L10 phase CoPt alloy has high anisotropy constant of 107—108 erg/cm3, which is ofcrucial importance for UDMR media with a small grain size below 10 nm, because highmagnetocrystalline anisotropy is needed to create a barrier to thermally activatedswitching of the magnetization[2, . The as-deposited CoPt film with equi…     

脉冲激光沉积TiN/AlN多层膜的微结构与力学性能

采用脉冲激光沉积(LPA)法,在单晶Si表面制备了调制周期为50nm的不同调制比的TiN/AlN多层膜,并研究了调制比对多层膜微结构和力学性能的影响。扫描电镜(SEM)和原子力显微镜(AFM)显示,薄膜的调制比在1～4之间。并且小调制比下薄膜表面的岛密度小,岛面积过大,分布不均匀,相邻岛之间的起伏较大。X射线衍射(XRD)结果表明,小调制比下,AlN相为明显的(002)择优取向,TiN相主要以(200)、(220)形式存在;调制比增大后,AlN相的择优取向减弱,同时伴随着薄膜晶粒的细化及硬度增强,这一研究结果说明,调制比对多层膜的性质有一定的影响,大调制比会导致Al元素在界面处聚集,并与TiN进行合金化后的形成TiAlN结构,进而对薄膜的硬度产生影响。     

Influence of modulated structure on magnetic properties of NdFeB/Co multilayer thin films

The Nd Fe B/Co multilayer films were prepared by magnetron sputtering. After that, the samples were annealed at 600 °C for 20 min. The surface morphology, phase structures and magnetic properties of Mo(50 nm)/[Nd Fe B(100 nm)/Co(y)]×10/Mo(50 nm) thin films were researched by AFM, XRD and VSM, respectively. The results show that the films show stronger perpendicular magnetic anisotropy. When the thickness of Co layers is 10 nm, the coercivity Hc⊥ is the maximum, 295 k A/m. However, for y=10-20, the reduced remanence M/Ms of films has increased. When the thickness of Co layers is 20-30 nm, the Nd Fe B/Co multilayer films obtained more superior magnetic properties with M/Ms =0.95.     

Property improvement of multilayer TiN/Ti films with C+ implantation

Using the MEVVA ion source, carbon ions have been implanted in TiN coatings deposited by multiarc ion plating. The Vickers microhardness of the C⁺-implanted TiN films increased with the increase in the ion flux and dose. X-ray diffraction (XRD) analysis showed that the TiC phases had been formed in the films. In addition, the films had the preferred growth orientations of TiN and TiC, both of which were (111) orientation after annealing at 500°C for 30 min. Auger electron spectra analysis indicated that C⁺-implanted profile was in typical Gaussian-like distribution in single films. The distribution with multipeaks of C atoms was obtained in multi-layer TiN/Ti. The possibility of the multilayer films (Ti(C,N)/TiN/Ti(C,N)/TiN and Ti(C,N)/TiC/Ti(C,N)/TiC) forming using the C-implanted TiN/Ti films is presented for the first time. Project supported by the National Natural Science Foundation of China and the “863” Hi-Tech Program of China.     

Property improvement of multilayer TiN/Ti films with C~+ implantation

Using the MEVVA ion source, carbon ions have been implanted in TiN coatings deposited by multi-arc ion plating The Vickers microhardness of the C+ -implanted TiN films increased with the increase in the ion flux and dose. X-ray diffraction (XRD) analysis showed that the TiC phases had been formed in the films. In addition, the films had the preferred growth orientations of TiN and TiC, both of which were (111) orientation after annealing at 500℃ for 30 min. Auger electron spectra analysis indicated that C+ -implanted profile was in typical Gaussian-like distribution in single films. The distribution with multipeaks of C atoms was obtained in multi-layer TiN/Ti. The possibility of the multilayer films (Ti (C, N)/TiN/Ti(C, N)/TiN and Ti(C, N)/TiC/Ti(C, N)/TiC) forming using the C-implanted TiN/Ti films is presented for the first time.     

梯度(Ti,Al)N涂层的微观结构与机械性能研究

利用电弧离子镀技术在航空发动机压气机用1Cr11Ni2W2MoV在不锈钢上沉积了（Ti,Al）N梯度涂层,X射线衍射的结果表明涂层为B1型（Nacl）单相结构,具有（220）择优取向．扫描电镜观察表明,涂层均匀致密,与基体结合良好．电子探针元素线分析和截面面分布表明,所制备的涂层是内层富TiN、外层富（Ti,Al）N的梯度涂层,试验结果表明,（Ti,Al）N梯度涂层具有良好的耐磨性等机械性能．