热压印刻蚀技术

纳米压印技术是一种高分辨率、廉价、高效的纳米结构制备技术。它既继承了传统光刻技术所具有的并行性,又同时拥有传统光刻技术不易达到的纳米结构制备能力,这为今后纳米结构的广泛应用提供了良好的条件。文章介绍了纳米热压印技术中核心工艺流程,包括：模板的制备、抗粘层的制备、压印过程中温度与压力的影响、反应离子刻蚀,并且给出了利用纳米热压印技术制备的光栅结构,最后展望了纳米压印技术的前景。     

Recent Progress in Simple and Cost-Effective Top-Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

The development of a simple and cost-effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho-graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost-effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion-bombardment technique was reported as a new method to create high-resolution and high-aspect-ratio structures. Recent progress in simple and cost-effective top-down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.     

Lithography: rewriting the rules

Dip-pen nanolithography (DPN) is generating significant interest as a means of patterning surfaces with submicron-scale designs. Advocates of DPN, which effectively uses an atomic force microscope (AFM) as a pen, herald its ability both to fabricate and monitor high-resolution, miniaturized molecular arrays. The novel technology is not without its critics, however, who question the utility and practicality of paint-pot-style nanofabrication. Nonetheless, the relative availability and affordability of DPN tools is allowing an increasing number of scientists and engineers to think small.In December 1959, the Nobel prize-winning physicist Richard Feynman gave a lecture to the American Physical Society that outlined his vision of a futuristic nanoscale world. He dismissed reports of fingernail-sized electric motors and devices that could cram text onto pinheads as little more than crude first steps towards true miniaturization. “It is a staggeringly small world that is below,” he advised the assembled throng.     

分步式压印光刻研究

针对微纳制造中光刻环节的光衍射限制，讨论了可能成为下一代光刻技术路线的压印光刻。通过对比热压印、微接触转印及常温压印的技术特点，设计了一套低成本、结构简单的紫外光固化常温压印光刻机构。其大行程纳米级定位、纳米级下压系统消除了压印过程中的机构热变形误差、驱动间隙、蠕动误差等，具有分步式纳米级驱动多场压印及纳米级下压加载能力，可实现多次重复高保真图形复制。     

One Step Lithography of Polypyrrole

Large areas of polypyrrole (PPy) thin films deposited onto inert polymeric substrates are structured by direct laser interference patterning (DLIP). Several square millimeter areas could be produced with one single (10 ns) pulse, at room temperature and atmospheric pressure. Nanometric arrays of lines (>600 nm) or grids of PPy deposited on dielectric polymers polypropilene or polypirrol (PP or PE) are fabricated by DLIP at 355 nm. The period of the lines structures, measured by white light interferometry (WLI), is 3.5 µm. Regular structures are analyzed using scanning electron microscope (SEM) and a focus ion beam (FIB) tomography. It is shown that only the PPy film is structured while the PP or PE substrate remains unaltered. Fourier transform infrared spectroscopy (FTIR) and UV‐vis spectroscopy, permit to ensure that PPy chemical structure remains unaltered after the structuration process. The width of PPy lines can be tailored by controlling the fluence of the laser beam. Contact angle measurement shows that the wettability is affected by the structuring, making the surface more hydrophobic. The structuring technique seems to be suitable for the fabrication of PPy regular structures over various substrates.     

Lithography with new metallo-organic photoresists

A new method of depositing plain or structured inorganic films onto inorganic substrates without using evaporating or sputtering equipment is described. This method is based on the use of metallo-organic photopolymerizable compounds. Resist formulations for a large variety of metallo-organic photoresists are described. Oxide deposition is demonstrated and the deposition of metallic copper layers is described.     

下一代光刻技术展望

介绍了下一代光刻技术的技术要点,国外研究概况和进展。重点讨论了极紫外（软Ｘ射线）光刻、电子束光刻和离子束光刻技术的进展,提出了我国开展下一代光刻技术研究的技术路线。     

Polycarbonate Heat Molding for Soft Lithography

Soft lithography enables rapid microfabrication of many types of microsystems by replica molding elastomers into master molds. However, master molds can be very costly, hard to fabricate, vulnerable to damage, and have limited casting life. Here, an approach for the multiplication of master molds into monolithic thermoplastic sheets for further soft lithographic fabrication is introduced. The technique is tested with master molds fabricated through photolithography, mechanical micromilling as well as 3D printing, and the results are demonstrated. Microstructures with submicron feature sizes and high aspect ratios are successfully copied. The copying fidelity of the technique is quantitatively characterized and the microfluidic devices fabricated through this technique are functionally tested. This approach is also used to combine different master molds with up to 19 unique geometries into a single monolithic copy mold in a single step displaying the effectiveness of the copying technique over a large footprint area to scale up the microfabrication. This microfabrication technique can be performed outside the cleanroom without using any sophisticated equipment, suggesting a simple way for high‐throughput rigid monolithic mold fabrication that can be used in analytical chemistry studies, biomedical research, and microelectromechanical systems.     

无水胶印的几点体会

介绍了无水胶印在数字式印刷机QM DI46-4中的应用情况,通过制版、印刷工艺、印刷适性、印刷质量、印刷成本方面与传统胶印的比较,得出无水胶印印刷质量较好、印刷适性要求高、目前成本偏高而不能推广的结论.