The synthesis of tetrahedral bipyridyl metallo-octupoles with large second- and third-order nonlinear optical properties

Two new 4,4′-bis(donor)-6,6′-diphenyl- 2,2′-bipyridine ligands and their corresponding D_2d (Cu^I, Ag^I, Zn^II) octupolar metal complexes were synthesized, and their linear and nonlinear optical properties were investigated. A single crystal X-ray structure was also determined for the bis[4,4′-bis(diethylaminostyryl)-6,6′-diphenyl-bipyridine]copper(I) complex, which revealed a distorded pseudo-tetrahedral geometry. Molecular second-order nonlinear optical properties were determined for the complexes using the Harmonic Light Scatterring technique at 1.91 μm. These metallo-chromophores display large first hyperpolarizabilities β_1.91 in the range of 211-340 × 10⁻³⁰ esu, which increase with the Lewis acidity of the metal ion. The two-photon absorption properties of the bipyridyl ligands and related complexes were determined using either the two-photon emission method for fluorescent compounds or the open aperture Z-scan technique for non emissive ones. The complexes display red-shifted two-photon absorption bands compared to their metal-ion free chromophores, as well as a large increase of the maximum two-photon absorption cross-sections.     

Synthesis of double-walled carbon nanotube films and their field emission properties

Continuous double-walled carbon nanotube (DWCNT) films were synthesized using an Fe-Mo catalyst by the arc discharge method. This new catalyst has dramatically improved the purity and selectivity of DWCNT product. High-resolution transmission electron microscopy indicates that the outer and inner diameter of DWCNT are 1.9-4.7 nm and 1.2-3.8 nm, respectively. The field emission properties of DWCNT films have been studied. The directly grown film was transferred onto quartz substrates and used as emission cathodes, and has demonstrated a quite good emission performance. Moreover, the emissions of DWCNT films have been further improved by heat treatment. The film after 400 °C oxidation shows excellent field emission property with a low turn-on (E_to = 0.6 V/μm) and threshold field (E_th = 0.9 V/μm) corresponding to the emission current density of 1 μA/cm² and 1 mA/cm², respectively.     

Electrodeposition of hard magnetic films and microstructures

Electrochemical deposition of materials with hard magnetic properties in the as-deposited state is essential for the efficient integration of micro-magnetic components into MEMS devices. Here we discuss the growth process and the microstructure-magnetic properties correlation for two Co-rich alloys, Co-Ni-P and Co-Pt. Under suitable synthesis conditions, these materials exhibit perpendicular anisotropy and hard magnetic properties in the as-deposited state; in addition, such properties are maintained up to several micrometer film thickness through close control of the film microstructure. In the case of Co-Ni-P films we achieved a saturation magnetization of 1.21 T (963 emu/cm³), perpendicular coercivity up to 188 kA/m (2.36 kOe) at a thickness of 10 μm, and energy products up to 4.2 kJ/m³. Co-rich Co-Pt films were grown on several substrates - Cr, Cu(0 0 1), Cu(1 1 1), and Ru(0 0 0 1) - in order to control magnetic anisotropy and achieve optimum hard magnetic properties. Cu(1 1 1) contributes to stabilize the hexagonal hcp phase at high current density yielding excellent hard magnetic properties, although only in films thicker than 100 nm; saturation magnetization in these films was about 1.04 T (828 emu/cm³). Perpendicular coercivities up to 485.6 kA/m (6.1 kOe) were obtained in 1 μm thick film deposited at 50 mA/cm². Ru(0 0 0 1) seed layers provide an appropriate interface structure to further facilitate the epitaxial growth of hcp films, yielding hard magnetic properties and perpendicular coercivity with a squareness ∼1 in films as thin as 10 nm. The hard magnetic properties were only marginally compromised at large film thickness. Deposition at higher current density (50 mA/cm²) favored markedly improved hard magnetic properties. The Co-Pt films on Ru exhibited perpendicular anisotropy with anisotropy constant up to 1.2 MJ/m³. The electrodeposition process was further extended to fill lithographically patterned hole arrays (850 nm diameter, center-to-center distance 2550 nm and about 700 nm thick resist), yielding arrays of micron-sized hard magnetic cylinders with perpendicular coercivity of 361 kA/m (4.54 kOe) and high squareness.     

Cathodoluminescence and electron field emission of boron-doped a-C:N films

The optical and electrical properties of so-called carbon nitride films (a-C:N) and boron doped so-called carbon nitride films (a-C:N:B) are studied with cathodoluminescence (CL) spectroscopy and electron field emission measurement. The a-C:N films were first deposited on Si by a filtered cathodic arc plasma system, and then boron ions (∼1 × 10¹⁶ cm⁻²) were implanted into the a-C:N films to form a-C:N:B films by a medium current implanter. The structural and morphological properties of a-C:N and a-C:N:B films were then analyzed using secondary ion mass spectrometer, X-ray photoelectron spectroscopy, FT-IR spectra, Raman spectroscopy and atomic force microscopy. The a-C:N film exhibits luminescence of blue light (∼2.67 eV) and red light (∼1.91 eV), and the a-C:N:B film displays luminescence of blue light (∼2.67 eV) in CL spectra measured at 300 K. Furthermore, the incorporated boron atoms change the electron field emission property, which shows a higher turn on field for the a-C:N:B film (3.6 V/μm) than that for the a-C:N film (2.8 V/μm).     

Characterization of SWCNT and PAN/SWCNT films

Three different films, poly(acrylonitrile-co-methylacrylate)/single wall carbon nanotubes (PAN-MA/SWCNT), poly(acrylonitrile-co-methylacrylate)/carbon black (PAN-MA/CB) and pure functionalized SWCNT, are analyzed. The diffuse reflectance and transmittance of the films from 2 μm to 18 μm are characterized with an integrating-sphere Fourier transform spectrophotometer system. The SWCNT film shows high reflectance and low emissivity. Surface roughness characterization by laser scanning confocal microscopy confirms that the low emissivity is not due to a highly polished surface and is therefore more likely due to the metallic behavior of the SWCNTs. Characterization using infra red thermography highlighted the thermal protective behavior of the SWCNT film; the maximum temperature obtained from a 5.2 kW/m² heat flux exposure was 50 °C lower than that for the two (SWCNT, CB) PAN-MA based films.     

The spatial uniformity and electromechanical stability of transparent, conductive films of single walled nanotubes

We have prepared thin films of arc discharge single walled nanotubes by vacuum filtration. For film thicknesses greater than 40 nm, the films are of high optical quality; the optical transmission varies by <2% over the film area when measured with a spatial resolution of 4 μm. However, the films become spatially non-uniform for film thickness below 40 nm. The in-plane DC conductivity correlates with the uniformity, increasing from ∼3800 S/m for a 10 nm thick film to ∼2-2.5 × 10⁵ S/m for films of thickness >40 nm. Conductive atomic force microscopy maps show reasonably uniform current flow out of the plane of the film. For all thicknesses, the optical transmittance scales with film thickness as expected for a thin conducting film with optical conductivity of 1.7 × 10⁴ S/m (λ = 550 nm). For films with t > 40 nm the ratio of DC to optical conductivity was σ_DC/σ_Op = 13.0, leading to values of transmittance and sheet resistance such as T = 80% and R_s = 110 Ω/□ for the t = 40 nm film. Electromechanically, these films were very stable showing conductivity changes of <5% and <2% when cycled over 2000 times in compression and tension respectively.     

Changes of properties of cured and uncured disiloxane bisbenzocyclobutene thin films under irradiation

The effects induced by α-particles and laser beam irradiation in air atmosphere in uncured and cured bisbenzocyclobutene (BCB) 2 μm thick films, spin-coated on glass/ITO surface have been investigated. α-Particle irradiation was done by means of a thin film ²⁴¹Am source (E_α = 5.486 MeV), up to the total fluence of about 5 × 10¹⁰ particles/cm². Laser irradiation was performed by a Nd³⁺:YAG (λ = 1.06 μm) laser in the free generation and the Q-switch regime, using both focused and unfocused beams. Irradiation induced changes were investigated using Light and Atomic Force Microscopy (AFM), infrared (IR), Ultraviolet/visible (UV/vis) and Raman spectroscopy by inspecting several uncured and cured BCB films before and after irradiation. It has been found that both types of irradiation under investigated conditions have produced a novel phase in the material, which is not present either in the uncured or the cured BCB films. Possible implications of the observed effects on curing and degradation of BCB films have been discussed.     

As-deposited LiCoO2 thin film cathodes prepared by rf magnetron sputtering

LiCoO₂ thin films were deposited using radio frequency (rf) magnetron sputtering system on stainless steel substrates. Different rf powers, up to 150 W, were applied during deposition. The as-deposited films exhibited (1 0 1) and (1 0 4) preferred orientation and the nanocrystalline film structure was enhanced with increasing rf power. The film crystallinity was examined using X-ray diffraction, Raman scattering spectroscopy and transmission electron microscopy. The compositions of the films were determined by inductively coupled plasma-mass spectroscopy. The average discharge capacity of as-deposited films is about 59 μAh/(cm² μm) for cut-off voltage range of 4.2 and 3.0 V. From the electrochemical cycling data, it is suggested that as-deposited LiCoO₂ films with a nanocrystalline structure and a favorable preferred orientation, e.g. (1 0 1) or (1 0 4) texture, can be used without post-annealing at high temperatures for solid-state thin film batteries.     

Importance of water content in formation of porous anodic niobium oxide films in hot phosphate-glycerol electrolyte

Niobium has been anodized at a constant current density to 10 V with a current decay in 0.8 mol dm⁻³ K₂HPO₄-glycerol electrolyte containing 0.08-0.65 mass% water at 433 K to develop porous anodic oxide films. The film growth rate is markedly increased when the water content is reduced to 0.08 mass%; a 28 μm-thick porous film is developed in this electrolyte by anodizing for 3.6 ks, while the thickness is 4.6 and 2.6 μm in the electrolytes containing 0.16 and 0.65 mass% water respectively. For all the electrolytes, the film thickness changes approximately linearly with the charge passed during anodizing, indicating that chemical dissolution of the developing oxide is negligible. SIMS depth profiling analysis was carried for anodic films formed in electrolyte containing ∼0.4 mass% water with and without enrichment of H₂¹⁸O. Findings disclose that water in the electrolyte is a predominant source of oxygen in the anodic oxide films. The anodic films formed in the electrolyte containing 0.65 mass% water are practically free from phosphorus species. Reduction in water content increased the incorporation of phosphorus species.     

Electrochemical characterization of amorphous LiFe(WO4)2 thin films as positive electrodes for rechargeable lithium batteries

Amorphous LiFe(WO₄)₂ thin films have been fabricated by radio-frequency (R.F.) sputtering deposition at room temperature. The as-deposited and electrochemically cycled thin films are, respectively, characterized by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, selected area electron diffraction, and X-ray photoelectron spectra techniques. An initial discharge capacity of 198 mAh/g in Li/LiFe(WO₄)₂ cells is obtained, and the electrochemical behavior is mostly preserved in the following cycling. These results identified the electrochemical reactivity of two redox couples, Fe³⁺/Fe²⁺ and W⁶⁺/W^x+ (x = 4 or 5). The kinetic parameters and chemical diffusion coefficients of Li intercalation/deintercalation are estimated by cyclic voltammetry and alternate-current (AC) impedance measurements. All-solid-state thin film lithium batteries with Li/LiPON/LiFe(WO₄)₂ layers are fabricated and show high capacity of 104 μAh/cm² μm in the first discharge. As-deposited LiFe(WO₄)₂ thin film is expected to be a promising positive electrode material for future rechargeable thin film batteries due to its large volumetric rate capacity, low-temperature fabrication and good electrode/electrolyte interface.     

A chemically amplified positive-working photosensitive polyimide based on a blend of poly(amic acid ethoxymethyl ester) and poly(amic acid)

We prepared a novel chemically amplified photosensitive polyimide based on a blend of poly(amic acid ethoxymethyl ester) (PAAE) and poly(amic acid); this blend produces polyimide (PI) films with improved mechanical properties after imidization with photoacid generator (PAG). PAAE and poly(amic acid) were end-capped with 5-norbornene-2,3-dicarboxylic dianhydride and 2,3-dimethyl maleic anhydride, respectively, to lower their molecular weights without compromising the properties of the resulting PI films. As a result of the blending of these PI precursors, the mechanical properties of the PI films were found to be less affected by the strong acid generated from the PAG than PI films fabricated by imidization of PAAE alone. The relatively high solubility of the blended PI precursor film in basic aqueous solutions was found to be effectively controlled by the use of a high-temperature post-exposure bake process to partially imidize the end-capped PAA. It was found that a 10-μm-thick film of the PSPI precursor system containing 13 wt% PAGs exhibits a sensitivity (D⁰) of 700 mJ/cm² when developed with 2.38 wt% aqueous tetramethyl ammonium hydroxide solution at room temperature. A fine positive pattern was fabricated in a 12 μm thick film with 1000 mJ/cm² of i-line exposure. The resultant PI film was also found to exhibit excellent mechanical and thermal properties, which are critical to its practical use as a stress buffer layer in semiconductor packaging.     

Electrochemical micromachining of Hastelloy B-2 with ultrashort voltage pulses

Electrochemical micromachining (ECMM) with ultrashort voltage pulses, a maskless all-electrochemical micro and nanofabrication technique, was used to fabricate microstructures on a corrosion resistant nickel-based superalloy, Hastelloy B-2,¹ whose work hardening behavior makes it difficult to machine on the macroscale. This work presents a viable, strain-free micromachining strategy for this technologically important material. ECMM was used to machine microstructures to depths of 3 μm and 10 μm, and the resolution of the machining was found to be dependent on the duration of the nanoscale pulses. Microstructures were also machined to 100 μm depths, demonstrating the potential for the fabrication of high aspect ratio features using this technique. The ECMM was performed utilizing an apparatus consisting of standard electrochemical equipment combined with a custom electrical circuit that was constructed easily and at low cost.     

Two-photon absorption properties of hyperbranched conjugated polymers with triphenylamine as the core

Two new hyperbranched phenylene vinylenes (HPVs) with triphenylamine as the core, 2,5-dihexyloxyl substituted phenylene vinylene as the connecting unit, and electron-donating triphenylamine or electron-deficient nitrobenzene as the different terminal groups were synthesized by modified Wittig polymerization reaction. Their one- and two-photon absorption (TPA) properties have been investigated. The two-photon absorption cross sections of the two polymers were performed by open-aperture Z-scan experiment using 120 femtosecond (fs) pulse, and their TPA cross section were determined to be 1.43 and 0.64×10⁻²⁰ cm⁴/GW per repeating unit at 800 nm, respectively. In chloroform, HPVs exhibit intense frequency up-converted fluorescence under the excitation of 120 fs pulses at 800 nm with the peaks located at 544 and 554 nm, respectively.     

Investigation of thin sputtered Mn films for electrochemical capacitors

Pseudocapacitive manganese oxide films have been synthesized by anodic oxidation of metallic films deposited by sputtering. Results are presented from an electrochemical investigation into properties of these thin sputtered manganese films. Mn films with thickness ranging from 20 to 200 nm have been sputtered onto Pt coated Si wafers in an Argon atmosphere. Electrochemical oxidation converts the metal film into a porous, dendritic structure which displays significant pseudocapacitance. We have observed a specific capacitance (C_s) of 700 F/g when cycled very slowly at a constant current density of 160 μA/cm². The same films probed by cyclic voltammetry (CV) at a rate of 5 mV/s yielded a lower specific capacitance of 400-450 F/g. Post-oxidation material loading was measured to be in the range of 25-75 μg/cm².     

Linear and tri-branched copolymers for two-photon absorption and two-photon fluorescent materials

The one- and two-photon properties of linear (M2) and tri-branched (M3) copolymers with triphenylamine and cyano groups in the main chain were experimentally investigated. Open-aperture z-scan experiments were performed with 1 kHz, 120 fs, and 800 nm Ti:sapphire laser pulses to measure the two-photon absorption cross sections. The two-photon cross sections of M2 and M3 were determined to be 0.304 and 1.441×10⁻²⁰ cm⁴/Gw per repeating unit, respectively. In a CHCl₃ solution, M2 and M3 emit strong frequency up-converted fluorescence under the excitation of 120 fs pulses at 800 nm with the peaks located at 561 and 542 nm.     

Improvement of field emission performance on nitrogen ion implanted ultrananocrystalline diamond films through visualization of structure modifications

The relationship between the electron field emission properties and structure of ultra-nanocrystalline diamond (UNCD) films implanted by nitrogen ions or carbon ions was investigated. The electron field emission properties of nitrogen-implanted UNCD films and carbon-implanted UNCD films were pronouncedly improved with respect to those of as-grown UNCD films, that is, the turn-on field decreased from 23.2 V/μm to 12.5 V/μm and the electron field emission current density increased from 10E−5 mA/cm² to 1 × 10E−2 mA/cm². The formation of a graphitic phase in the nitrogen-implanted UNCD films was demonstrated by Raman microscopy and cross-sectional high-resolution transmission electron microscopy. The possible mechanism is presumed to be that the nitrogen ion irradiation induces the structure modification (converting sp³-bonded carbons into sp²-bonded ones) in UNCD films.     

Atomic emission spectroelectrochemistry applied to dealloying phenomena II. Selective dissolution of iron and chromium during active-passive cycles of an austenitic stainless steel

Atomic emission spectroelectrochemistry was used to investigate selective dissolution of a 304 austenitic stainless steel sample in 2 M H₂SO₄. The partial dissolution rates of Fe, Cr, Ni, Mn, Mo, and Cu were measured as function of time during a series of potentiostatic triggered activation/passivation cycles. When first exposed to sulfuric acid solution, the steel sample was in a passive state with a total steady state ionic dissolution rate expressed as an equivalent current density of 10 μA cm⁻². A transition into the active and passive state could be triggered by cathodic (−700 mV vs. Ag/AgCl) and anodic (+400 to +700 mV vs. Ag/AgCl) potentiostatic pulses respectively of variable time. Excess Cr dissolution was observed during the activation cycle as compared to Fe and a depletion of Cr dissolution was observed during the passivation cycle. These results are interpreted in terms of the dissolution of a Cr rich passive layer during activation and selective dissolution of Fe, Mn, Ni and other elements to form a Cr rich passive layer during passivation. Quantitative analysis of the excess Cr showed that the residual film contained approximately 0.38 μg Cr/cm². Fe does not appear to be incorporated into the film at this early stage of passive film growth. Residual films of metallic nickel and copper were formed on the surface during the active period that subsequently dissolved during passivation.     

Deposition of amorphous carbon films from C60 fullerene sublimated in electron beam excited plasma

C₆₀ fullerene clusters are used as a carbon source for amorphous carbon films deposition in an electron beam excited plasma. C₆₀ clusters are sublimated by heating a ceramic crucible containing the C₆₀ powders up to 850 °C, which is located in a highly vacuumed process chamber. The sublimated fullerene powders are injected to the electron beam excited argon plasma and dissociated to be active species that are propelled toward the substrates. Consequently, the carbon species condense as a thin film onto the negatively biased substrates that are immersed in the plasma. Deposition rates of approximately 1.0 μm/h and the average surface roughness of 0.2 nm over an area of 400 μm² are achieved. Decomposition of the C₆₀ fullerene after injecting into the plasma is confirmed by optical emission spectroscopy that shows existence of small carbon species such as C₂ in the plasma. X-ray diffraction pattern reveals that the microstructure of the film is amorphous, while fullerene films deposited without the plasma show crystalline structure. Raman spectroscopic analysis shows that the films deposited in the plasma are one of the types of diamond-like carbon films. Different negative bias voltages have been applied to the substrate holder to examine the effect of the bias voltage to the properties of the films. The nano-indentation technique is used for hardness measurement of the films and results in hardness up to about 28 GPa. In addition, the films are droplet-free and show superior lubricity.     

TiO2 nanoceramic films prepared by ion beam assisted evaporation for optical application

A TiO₂ nanoceramic film was prepared as an alternative absorber layer for infrared thermal detectors. The TiO₂ film was amorphous, and its grain size increased with the ion anode voltage and oxygen flow rate. Moiré deflectometry was applied for measuring the nonlinear refractive indices of TiO₂ films on polycarbonate (PC) substrates. The nonlinear refraction index was measured to be of the order of 10⁻⁸ cm² W⁻¹ and the change in refractive index was of the order of 10⁻⁵. The linear refractive index was correlated with the porosity. Denser TiO₂ films exhibited higher linear refractive indices, obvious red-shifts and narrower absorption bands in the near-IR region.     

Diamond-like carbon film deposited on nitrided 316L stainless steel substrate: A hardness depth-profile modeling

Adhesion and hardness of Diamond-Like Carbon films are improved by nitriding of the steel substrate prior to PVD deposition. Since the mechanical properties of the nitrided steel layer are not homogeneous, i.e. a significant hardness decrease is observed in the upper nitrided layer close to the surface, an outer surface layer of ~ 15 μm is removed prior to the film deposition. In the present work, a 316L stainless steel substrate is nitrided in a cyanide-cyanate solution at 570 °C during 3 h. The coated system involved the deposition of a hydrogenated, amorphous carbon (a-C:H) solid lubricant of ~ 2 μm including a chromium carbide interlayer. The comparison between the hardness behavior of the DLC/steel and the DLC/nitrided steel systems reveals the existence of a very important hardness gap, which highlights the benefit of the nitriding treatment prior to coating deposition. In addition, the microhardness-depth profile is determined from a load-depth curve, by applying a simple hardness model. The predicted change in hardness is found to be in a very good agreement with the experimental profile, which allows the hardness determination both in the white layer and in the diffusion zone over ~ 30 μm in total depth. However, only the composite hardness modeling allows the accurate determination of the intrinsic hardness of the film.