基于DPVBi发光的新结构有机白光器件

介绍了结构为ITO/4,4',4"-tris{N,-(3-methylphenyl)-N-phenylamino}tripheny-lamine(m-MTDATA,40 nm)/N,N'-diphenyl-N,N'-bis(1-naphthyl)-(1,1'-biphenyl)-4,4'-diamine(NPB,5 nm)/4,4'-bis(2,2'diphenyl vinyl)-1,1'-biphenyl(DPVBi,x nm)/5,6,11,12,-tetraphenylnaphthacene(Rubrene,0.5 nm)/DPVBi(20 nm)/tris(8-hydroxyquinoline)aluminum(Alq,45-x nm)/LiF(0.5 nm)/Al的白光器件.采用了2个DPVBi层中间夹1个Rubrene的薄层,这种结构充分利用了DPVBi的空穴阻挡特性和发光特性,有力地平衡了来自于DPVBi的蓝光和Rubrene的黄光,从而使器件发出性能较好的白光.器件保持第2层DPVBi的厚度为20 nm,第1层的DPVBi的厚度按照5、8、11和14 nm的规律进行变化,相应改变Alq的厚度,使得这两者的总厚度为45 nm保持不变.当第1层DPVBi的厚度是8 nm、Alq的厚度是37 nm和其它层的厚度保持不变时,在13 V的电压下,器件的最大亮度为18 710 cd/m2,对应的效率为2.06 cd/A,色坐标为(0.29,0.30),属于白光发射.     

掺杂浓度和厚度对有机白光器件性能的影响

介绍了结构为ITO/2T(20nm)/NPBX(15nm)/DPVBi(15nm)/Alq3:Rubrene(10,x)nm/Alq3(40nm)/LiF(0.5nm)/Al的掺杂方法制备的白光器件。其中掺杂浓度x分别为1%、2%、3%、4%和5%(质量分数)。这种结构充分利用了Rubrene在有机电致发光器件中的良好的掺杂特性,从而使器件发射出性能较好的白光。首先讨论了Rubrene的掺杂浓度对器件性能的影响。当Rubrene掺杂浓度是3%(质量分数)时,色度最好(0.32,0.32)且色坐标稳定。在此基础上,讨论了掺杂层厚度对器件性能的影响。掺杂层的厚度Y分别为10,15,20,25,30nm变化时,制作了5个器件。随着掺杂层厚度的增加,器件发出的蓝光和黄光相对平衡,色度较好。其中掺杂层厚度为20nm时,器件的效率和亮度均最高,分别达到5.10cd/A和17130cd/m2。     

空穴传输层NPBX厚度对白光OLED性能的影响

讨论了空穴传输层材料NPBX厚度对白光有机电致发光器件(OLED)性能的影响.采用了ITO/2T-NATA/NPBX/DPVBi/Rubrene/DPVBi/Rubrene/Alq3/LiF/Al的多层结构器件.在这种多层结构的器件中,其他材料的厚度保持不变,使NPBX的厚度按10、15、20、25 nm的规律改变.当NPBX厚度为15 am时,器件性能最好.该器件在14 V电压下最大亮度为19 300cd/m2,在7 V的电压下最大效率为5.326 cd/A,色坐标为(0.27,0.33).     

基于rubrene掺杂剂的高亮度白色有机电致发光器件

采用CBP主体材料中掺杂rubrene,制备了结构为ITO/2T-NATA(25 nm)/NPBX(20 nm)/CBP: 1%rubrene(10 nm)/NPBX(5 nm)/DPVBi(30 nm)/TPBi(20 nm)/Alq(10 nm)/LiF(1 nm)/Al的白光器件,此结构将器件的发光区控制在了DPVBi层和rubrene掺杂层.利用rubrene染料本身的载流子俘获空穴特性与CBP母体转移来的能量发射荧光特性,以及插入的5 nm NPBX的电子阻挡特性获得了高亮度的白光器件.此器件在驱动电压为16 V时最大亮度达到25 110 cd/m2,对应的色坐标为(0.30,0.34),在驱动电压为10 V时最大电流效率为5.32 cd/A,外量子效率为1.65%.而且,驱动电压在10～16 V时,即达到最大亮度和最大效率时,其色坐标都在白光等能点(0.33,0.33)附近.     

利用C-545T超薄层多层结构的白光器件

为了探讨(3-545T超薄层的发光特性,设计了结构为:ITO/2T-NATA(20 nm)/NPBX(20 nm)/C-545T(d nm)/BCP(8 nm)./Alq(40 nm)/LiF(0.5 nm)/Al的绿光器件.结果表明,随着C-545T层厚度d的增加,器件的亮度和效率均下降,这是由于C-545T染料的浓度淬灭效应引起的.在此基础上,制备了基于C-545T超薄层为发光层之一的多层结构的白光器件,器件结构为:ITO/NPBX(30 nm)/Rubrene(0.2 nm)/NPBX(5 nm)/DPVBi (20 nm)/NPBX(4 nm)/C-545T(0.1 nm)/Alq(30 nm)/LiF(0.5 nm)/Al.在驱动电压为16 V时,其最大亮度达到12 320 cd/m2,对应的色坐标为(0.32,0.40),在电压为4 V时,最大光功率效率达到了3.45 lm/w.     

通过引入电子阻挡层的高效率的有机磷光白光器件

以CBP作为母体材料,绿色磷光染料Ir(ppy)3作为敏化剂,以荧光染料rubrene作为受主,制备了结构为ITO/2T-NATA(25 nm)/ NPBX (25-d nm)/ CBP:5%Ir(ppy)3:0.5%Rubrene(8 nm)/NPBX(d nm)/DPVBi(30 nm)/TPBi(20 nm)/Alq(10 nm)/LiF(1 nm)/Al的白光器件.在器件中,敏化剂Ir(ppy)3、荧光染料rubrene的浓度分别为5.0 wt%和0.5 wt%,发光层的厚度选择8 nm,通过调整两层NPBX的厚度来改善器件的性能,得到了比较理想的白光发射.当d的厚度为10 nm 时,器件在7 V的电压下最大电流效率达到11.2 cd/A,在17 V的电压下其最大亮度达到28 170 cd/m2,色坐标为(0.37,0.42),处于白光区.     

通过Ir(ppy)3敏化黄光发射的白色有机电致发光器件

通过Ir(ppy)3的磷光敏化作用,制作了结构为:ITO/2T-NATA(20 nm)/NPBX(20 mm)/CPB∶x%Ir(ppy)3∶0.5%rubrene(8 nm)/NPBX(5 nm)/DPVBi(30 nm)/Alq(30 nm)/LiF(0.5 nm)/Al的有机白光器件.当Ir(ppy)3的掺杂浓度为6%时,器件的性能最好.在15 V的电压下最大亮度达到24 960 cd/m2,在电压为8 V的情况下,发光效率达到最大,为5.17 cd/A.该器件的色坐标在白光等能点附近,是色度较好的白光器件.     

高效率双发光层结构白色荧光有机电致发光器件

通过将橙色荧光染料Rubrene和蓝色荧光染料BCzVBi分别掺入NPB和DPVBi中作为发光层,制备了结构为ITO/m-MTDATA(30nm)/NPB(20nm)/NPB∶0.5wt% Rubrene(10nm)/DPVBi∶5wt% BCzVBi(15nm)/Bphen(25nm)/LiF(0.6nm)/Al的双发光层结构白色有机荧光电致发光器件。器件发光主要是Rubrene直接俘获载流子和主体材料DPVBi到客体BCzVBi的能量传递两种发光机制竞争的结果。在低压下Rubrene俘获载流子发光占主导地位,导致器件的橙光相对较强,随电压升高主客体能量传递增强,使蓝光相对强度增强。器件最大电流效率为6.5cd/A,最大亮度为16 140cd/m2。亮度从1 000cd/m2增加到10 000cd/m2,器件的发光色坐标从(0.33,0.37)变化到(0.30,0.32),始终处于白光区。     

基于MCzHQZn的有机电致发光器件

通过结构为ITO/2T-NATA(20nm/NPBx(20nm)/MCzHQZn(30nm)/BCP(10nm)/Alq3(20nm)/LiF(0.5nm)/Al、ITO/2T-NATA(30nm/MCzHQZn(30nm)/BCP(10nm)/Alq3(30nm)/LiF(0.5nm)/Al和ITO/2T-NATA(20nm/MCzHQZn(30nm)/NPBx(16nm)/BCP(10nm)/Alq3(25nm)/LiF(0.5nm)/Al的3组有机电致发光器件(OLED),证明了MCzHQZn既具有空穴传输特性,又具有较好的发光特性。MCzHQZn在器件1中作发光层,器件最大亮度在电压16V时达到3692cd/m2,电压13V时的最大效率为0.90cd/A,发光的峰值波长为564nm;MCzHQZn在器件2中既作发光层又作空穴传输层,器件最大亮度在电压为13V时达到1929cd/m2,电压12V时的最大效率为0.57cd/A,发光的峰值波长也为564nm;MCzHQZn在器件3中作空穴传输层,由NPBx作发光层,器件最大亮度在电压为14V时达到3556cd/m2,电压9V时的最大效率为1.08cd/A,发光的峰值波长为444nm。     

CdS薄层对有机电致发光器件性能的影响

将光电材料硫化镉(CdS)薄层插入到结构为ITO/NPB/Rubrene/NPB/DPVBi/Alq3/LiF/Al的白光有机发光器件(OLED)的Alq3和LiF之间,研究了CdS对OLED性能的影响。结果表明,0.1nm厚的CdS插入Alq3和LiF之间的器件性能最好。器件电压从7 V变化到14 V时,色度均在白光的中心区域;当电压为7V时,器件的最大电流效率为9.09cd/A;当电压为14V时,器件的最大亮度为16 370cd/m2。不加CdS时,当电压为8V时,器件的最大效率为5.16cd/A;当电压为14V时,最大亮度为6 669cd/m2。加CdS的器件比不加CdS的器件最大效率提高了1.76倍,最大亮度提高了2.42倍。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.