激光熔覆Al2CrFeCoCuNixTi高熵合金涂层的组织及耐蚀性能

采用激光熔覆工艺在Q235钢表面制备了Al2CrFeCoCuNixTi高熵合金涂层,分析了Al2CrFeCoCuNixTi高熵合金涂层的组织结构,测试了Al2CrFeCoCuNixTi高熵合金涂层在0.5 mol/L HNO3溶液及0.5 mol/L HCl溶液中的耐蚀性能。结果表明:Al2CrFeCoCuNixTi高熵合金涂层主要分为熔覆区、结合区、热影响区,熔覆区组织主要由等轴晶组成,等轴晶上分布有微米尺度的粒子;合金相结构简单,由体心立方（BCC）及面心立方（FCC）结构组成;Cr元素和Ni元素的钝化作用及由Al元素形成Al2O3或Al2O3H2O膜使得Al2CrFeCoCuNixTi高熵合金涂层在0.5 mol/L HNO3溶液及0.5 mol/L HCl溶液中具有较好的耐蚀性能,自腐蚀电流密度与基体Q235钢相比降低一两个数量级;0.5 mol/L HCl溶液中的Cl-会穿透Ni0.5高熵合金涂层表面形成的钝化膜,出现轻微小孔腐蚀。     

碳纳米管对Ni60激光熔覆层的耐蚀性影响

利用自动送粉激光熔覆技术,在A3钢表面进行了Ni60合金添加碳纳米管的激光熔覆实验,采用静态浸泡法对相同工艺条件下获得的纯Ni60熔覆层和碳纳米管/镍基熔覆层的耐腐蚀性进行研究,在光学显微镜下观察样品表面腐蚀形貌,并对碳纳米管/镍基熔覆层的腐蚀机理进行了分析.结果表明:当碳纳米管的含量为0.3 wt%时,碳纳米管/镍基激光熔覆层的耐腐蚀性能最好,与纯Ni60激光熔覆层相比,耐腐蚀性提高1倍多.碳纳米管/镍基激光熔覆层耐腐蚀的原因在于熔覆层保留的碳纳米管使熔覆层更加致密,隔离了腐蚀介质,促进了镍基合金的钝化,从而提高了熔覆层的耐蚀性;同时,熔覆层中保留下来的碳纳米管和被分解的碳纳米管与金属基体形成碳化物,作为增强相均匀弥散在熔覆层中,它们的存在阻止了腐蚀坑的长大,因而蚀坑较小,耐腐蚀性得到提高.     

Ta2O5Ni60激光熔覆层的耐蚀性研究

利用激光熔覆技术,在A3钢表面进行了Ni60合金添加Ta2O5的激光熔覆实验.采用静态浸泡法对相同工艺条件下获得的纯Ni60熔覆层和Ta2O5/Ni60熔覆层的耐腐蚀性进行了研究.在光学显微镜下观察样品表面腐蚀形貌,并对Ta2O5/Ni60熔覆层的腐蚀机理进行了分析.结果表明:在Ni60自熔合金粉末中加入Ta2O5,可以形成一种新的耐腐蚀体系.然而加入的Ta2O5必须有足够的量(＞7wt.%),才有提高耐蚀性的作用.随着Ta2O5的加入量的增加,试样的耐腐蚀性也增加.当Ta2O5的加入量为11wt.%时,可以使耐蚀性提高20%.     

激光熔覆高耐蚀Fe基固溶体合金涂层

Fe基非晶合金具有优异的机械性能与耐蚀性。采用激光熔覆技术在304L不锈钢基体表面熔覆Fe-Cr-Ni-Co-B非晶粉末涂层,利用X射线衍射仪、光学显微镜、扫描电镜和电化学测试系统研究了涂层组织及耐蚀性能。研究结果表明,涂层组织涂层均匀、致密,无裂纹、气孔等缺陷。结合区为平面晶和柱状晶、熔覆层为丝条状树枝晶。熔覆层各区域由于成分和冷却速度的差异,致使树枝晶的大小和生长方向明显不同。涂层主要由Fe64Ni36和（FeCrNi）固溶体组成。熔覆层硬度分布较为均匀,涂层平均硬度约为480HV0.2,约是304L不锈钢基材的2.5倍。熔覆层的腐蚀电位高于304L基材,自腐蚀电流密度小于304L基材,具有较强的耐蚀性。     

飞机起落架轴颈模拟试样的激光熔覆

采用三种不同的合金粉末对制造飞机起落架的常用材料30CrMnSiNi2A进行了激光熔覆处理。并与对磨的高频淬火试样进行了环与环的接触疲劳磨损试验,用失重法比较了三种粉末激光熔覆后的耐磨性。并且对其中Ni基试样的熔覆层及过渡层进行了硬度分析、金相组织及性能分析。结果表明:采用激光熔覆工艺能显着提高试样的耐磨性,其中又以含有30%WC的Ni基粉末为最好。     

提高2Cr13钢汽轮机末级叶片耐蚀性能的研究

对汽轮机未级叶片进气边分别进行了激光直接重熔和激光馆敷镍基会金处理。经组织形貌观察，物相分析及阳极极化曲线测定，结果表明，激光处理后组织细致，硬度提高，耐蚀性也比处理前提高。其中熔敷镍基G112合金的耐蚀性提高特别显著，若激光处理参数恰当，三者比较，徐敷镍基WC105合金更易钝化，耐蚀性最好。     

Corrosion‐Resistant Superhydrophobic Coatings on Mg Alloy Surfaces Inspired by Lotus Seedpod

Superhydrophobic surfaces are widely found in nature, inspiring the development of excellent antiwater surfaces with barrier coatings isolating the underlying materials from the external environment. Here, the naturally occurring superhydrophobicity of lotus seedpod surfaces is reported. Protective coatings that mimic the lotus seedpod are fabricated on AZ91D Mg alloy surfaces with the synergistic effect of robust superhydrophobicity and durable corrosion resistance. The predesigned titanium dioxide films are coated on AZ91D by an in situ hydrothermal synthesis technique. Through sonication assisted electroless plating combined with a self‐assembling method, the densely packed Cu‐thiolate layers are uniformly plated with robust adhesion on the Mg alloy substrate, which function as a superhydrophobic barrier that can hold back the transport of water and corrosive ions contained such as Cl^?. Notably, the two extreme wetting behaviors (superhydrophilicity and superhydrophobicity) as well as corrosion resistance and improved corrosion resistance can be easily controlled by removal of the hydrophobic materials (n ‐dodecanethiol) at elevated temperature (350 °C) and modifying them at room temperature for 18 cycles, indicative of exceptional adhesion between the superhydrophobic coating and the underlying AZ91D Mg alloy.     

激光熔覆Ni42Zr30Ta28非晶合金涂层组织与性能研究

为了研究预置激光熔覆在45#钢制备Ni基非晶合金涂层,采用非晶形成能力三判据原则及非晶成分团簇线定律法则,选取常规非晶合金制备方法中具有较强非晶形成能力的Ni42Zr30Ta28合金成分,并对不同输出功率下得到的熔覆层微观组织和力学及腐蚀性能进行了理论分析和结果验证,取得了涂层的显微硬度、耐磨性、耐盐性的数据。结果表明,激光熔覆Ni42Zr30Ta28涂层中除含有非晶相外还含有Ni3Zr,Ni5Ta,Ni7Zr2等晶化相。相比45#钢,非晶合金涂层在力学和腐蚀性能上都有较大提高。当激光功率为3300W时,熔覆层表层显微硬度值最大为1496.4HK,表面磨损率为0.778g·mm-2;涂层由于非晶相的存在耐蚀性有明显提高,在功率为3000W时,试样单位面积增重量为0.0026g·mm-2,耐盐性最好。这为高能激光制备大面积非晶涂层提供了理论依据。     

Microstructure and corrosion resistance of room-temperature RF sputtered Ta2O5 thin films

The connection between the chemical corrosion resistance and the microstructure of the Ta₂O₅ thin films prepared at room temperature by a RF magnetron sputtering technique on Si substrates has been investigated. We find that the microstructure of the films changes with different RF sputtering power, and is responsible for the degradation of the corrosion resistance in HF solutions. The deposited films are amorphous and porous when the RF power is low. A preferred orientation toward (200) β-Ta₂O₅ can be observed when the RF power is increased to 150 W. In addition, the films deposited under this condition are dense and are consequently more resistant to the attack of chemicals. AT an RF power of 300 W the corrosion resistance of the films declines due to an increase of the exposed pore surface to the HF solution.     

SiCp/6061Al复合材料激光表面熔化及合金化显微组织与耐蚀性

为提高颗粒增强铝基复合材料耐蚀性，对ＳｉＣｐ／６０６１Ａｌ复合材料进行激光表面熔化和激光表面合金化。结果表明：激光表面熔化后，因熔化层中形成大量耐蚀性低的针状Ａｌ_４Ｃ_３相及Ａｌ_４ＳｉＣ相而使激光表面熔化层耐蚀性降低，以Ｎｉ－Ｃｒ－Ｂ粉末为原料对ＳｉＣｐ／６０６１Ａｌ复合材料进行激光表面合金化后，合金层耐蚀性明显提高。     

化学镀镍铜磷在钕铁硼表面处理上的应用研究

为提高钕铁硼表面镀层的耐蚀性,使其具有更高的经济附加值,采用在化学镀镍磷合金液中添加适量的铜离子及其复合络合剂,制得镍铜磷三元合金。研究了镍离子、铜离子、次亚磷酸钠、复合络合剂添加量,沉积温度、pH值对合金镀层沉积速度的影响。利用中性盐雾试验比较了其与电镀镍、化学镀镍磷合金的耐蚀性能。结果表明：化学镀镍铜磷合金能明显提高钕铁硼表面处理后的耐蚀能力。     

激光熔覆Ni35+11%wc熔覆层的组织及耐腐蚀研究

镍基合金熔覆层的耐腐蚀、耐磨性、硬度,是45钢零件表面技术改性的理想熔覆层。为节约45钢的成本,增加45钢零件使用寿命,研究了激光熔覆Ni35+11%wc熔覆层的组织及耐腐蚀性。采用Xrd、维氏硬度计,磨损实验,电化学腐蚀方式研究熔覆层的组织和性能。结果表明:熔覆层的主相为Fe2Ni7Si20、NiSi,与基体冶金结合良好。熔覆层的硬度值均在730 HV左右,自腐蚀电位是-0.833 V,自腐蚀电流密度是 0.981 A/m2,熔覆层tafel曲线正向偏移耐腐蚀性有所提高,熔覆层的磨擦系数低于基体。     

非晶态电磁屏蔽材料的制备与性能

利用电镀技术在高电导率的铝箔上沉积非晶态Fe-Ni合金,通过加入适当的添加剂,并控制镀液的pH值在2～4,电流密度为2.0～4.0A/dm2,扫描电镜观察得到表面平整、形态良好的镀层,X射线分析了镀层的晶相,屏蔽效能测试表明该样品在高频和低频范围显示了较好的屏蔽效能.     

激光熔覆Ni31Si12/FeNi金属硅化物复合材料涂层显微组织与耐蚀性研究

以Ni、Si元素粉末为原料,利用激光熔覆技术在A3钢表面制得了Ni_(31)Si_(12)/FeNi金属硅化物复合材料涂层。分析了该涂层显微组织,采用测定阳极极化曲线的方法评价了该涂层在0.5mol/l H_2SO_4水溶液中的耐蚀性能,考察了添加少量合金元素Cr对涂层耐酸腐蚀性能的影响。结果表明:激光熔覆Ni_(31)Si_(12) /12/FeNi金属硅化物复合材料涂层组织由带状Ni31Si12初生相及带间FeNi/Ni_(31)Si_(12)/12共晶组成,涂层表面平整、组织细小、与基体间为完全冶金结合;涂层组织显微硬度在HV650—75O之间,沿层深分布均匀;涂层组织组成相Ni_(31)Si_(12)/FeNi本身具有良好的耐酸腐蚀性能,具有快速凝固成分均匀的显微组织,激光熔覆Ni_(31)Si_(12)//FeNi金属硅化物复合材料涂层在H_2SO_4水溶液中表现出良好的耐蚀性。合金元素Cr的添加进一步提高了涂层的耐酸腐蚀性能。     

Ni-Al薄膜的制备和电性能研究

用双靶直流磁控共溅射制备了NixAl(1-x)(0.75相似文献   

Electrochemically deposited thin film alloys for ULSI and MEMS applications

Thin metal films can be electro-deposited for interconnect metallization and packaging. Electro-forming offers unique properties, such as excellent filling of high aspect ratio structures, unique compositions, low temperature processing and low stress films. Electroless forming offers also high selectivity. Binary and ternary metallic alloys, such as Ni, Co and Cu, alloyed with iron, phosphorous, boron and refractory metals have been demonstrated to form conducting layers, barriers, and corrosion protection layers. High quality very thin films, with thickness varied between 5 nm and 1 μm, have been demonstrated with good composition control. After reviewing the basic deposition mechanisms we focus on Co and Ni alloys with refractory metals (e.g., tungsten and molybdenum) and with phosphorous and/or boron. We present results of electroless deposition of CoWP as examples for an electrochemical process compatible with silicon technology. Finally we present a process outline for alloy deposition on silicon, or SiO₂, for MEMS applications.     

非晶硒合金膜的制备方法研究

基于传统工艺,新研制开发了一套非晶硒合金膜制备的设备和工艺流程。实验采用高真空电阻加热蒸镀方法,已制备出面积为180mm×180mm的非晶硒合金膜并进行了基本特性检测。测试结果表明:所制备的膜非晶化程度高,厚度最大为90μm,厚度分布比较均匀,相对误差在10%以内。所制备的膜满足光电转换膜的基本特性要求。     

Granular Films for Use as Thin-Film Resistors

Abstact  In this paper we discuss thin-film electrical resistors utilizing granular films of the type (Co,Ni)-(Al,Si)-O and their electrical resistive properties. Resistive properties of the granular film resistors drastically change with metal content and after annealing at 450°C. The values of temperature coefficient of resistance (TCR) in the optimum metal content of the granular films were as low as those of conventional metallic alloy film resistors. The values of sheet resistance were much higher than those of conventional metallic alloy resistors. Therefore, granular films are useful for application to thin-film resistors with the goal of miniaturizing them.     

n型SiC的Ni基欧姆接触中C空位作用的实验证明

通过在Si面p型4H-SiC外延层上使用P+离子注入来形成n阱.Ti和Ni依次淀积在有源区的表面,金属化退火后的XRD分析结果表明Ni2Si是主要的合金相.XEDS的结果表明在Ni2Si/SiC界面处存在一层无定型C.去除Ni2Si合金相与无定型C之后重新淀积金属,不经退火即可形成欧姆接触.同时,注入层的方块电阻Rsh从975下降到438Ω/□.结果表明,合金化退火过程中形成了起施主作用的C空位(VC).C空位提高了有效载流子浓度并对最终形成欧姆接触起到了重要作用.     

镀镍铜粉填充型电磁屏蔽硅橡胶性能研究

研究了镀镍铜粉填充型电磁屏蔽硅橡胶的力学性能、电性能、电磁屏蔽效能及耐电化腐蚀性能。结果表明,在保证其良好的力学性能前提下,镀镍铜粉填充型硅橡胶在30 MHz～18 GHz的频段范围内具有良好的屏蔽效能,并且可提供极好的耐电化腐蚀性能。在高温高湿环境中具有良好的电性能和屏蔽效能稳定性。通过与镀银铜粉填充型的硅橡胶相比较,发现材料体积电阻率的大小和屏蔽性能的优劣没有直接的相关关系。