OMVPE growth of In0.53Ga0.47As on InP using tertiarybutylarsine

We have successfully grown bulk In_0.53Ga_0.47As on InP using tertiarybutylarsine (TBA), trimethylindium and trimethylgallium. The growth temperature was 602° and the V/III ratio ranged from 19 to 38. Net carrier concentrations were 2 – 4 × 10¹⁵ cm^-3, n-type, with a peak 77 K mobility of 68,000 cm²/V. sec. Increasing compensation was observed in In_0.53Ga_0.47As grown at higher V/III ratios. PL spectra taken at 5 K revealed strong near bandgap emission at 0.81 eV—with the best sample having a FWHM of 2.5 meV. At lower energies, donor-acceptor pair transitions were evident. Strong and sharp 5 K PL emission was observed from InP/In_0.53Ga_0.47As/InP quantum wells grown with TBA.     

NH3-Ar气氛下制备的Zn3N2薄膜的结构和光学性能

在NH3-Ar气氛下,用RF磁控溅射金属Zn靶在玻璃衬底上室温制备了Zn3N2薄膜,研究了NH3分压对Zn3N2薄膜的结构和光学特性的影响。XRD分析表明Zn3N2薄膜出现多晶结构,具有(321)择优取向。当NH3分压从5%变化到25%时,Zn3N2薄膜的间接光学带隙从2.33eV升高到2.70eV。室温下Zn3N2薄膜在437nm和459nm波长出现了发光峰,并对发光机理进行了分析。     

Photoluminescence of V-doped GaN thin films grown by MOVPE technique

This work reports the photoluminescence (PL) study of vanadium-doped GaN (GaN: V) in the 9-300 K range. Samples have been successfully prepared on sapphire substrates by metalorganic vapour phase epitaxy technique (MOVPE). At room temperature (RT) the PL spectra of GaN: V are dominated by a blue band (BB) in the 2.6 eV range. This BB emission is very strong and its intensity increases with increasing V doping level. We also observed that the peak position of the blue luminescence shifted at lower energy with decreasing excitation density. Upon V-doping, the yellow luminescence band shows a drastic reduction in integrated intensity. This observation is explained by a reaction involving V and gallium vacancy (_√Ga). PL spectra at low temperature exhibited a series of peaks. The donor-acceptor (D-A) pair emission peak at 3.27 eV was strongly pronounced, as the temperature was decreased. On the other hand, the intensity of the BB emission decreased. This BB emission is due to a radiative transition from a shallow donor with a depth of 29 meV to a deep acceptor with a depth of 832 meV.     

Optical study of InP quantum dots

Results of photoluminescence (PL) studies of self-organized nanoscale InP islands (quantum dots, QDs) in the In_0.49Ga_0.51P matrix, grown on a GaAs substrate by metalorganic vapor phase epitaxy (MOVPE), are presented. Dependences of the PL efficiency on temperature in the range 77–300 K and on excitation level at pumping power densities of 0.01–5 kW/cm² have been obtained. The PL spectra are a superposition of emission peaks from QDs and the wetting layer. Their intensity ratio depends on the pumping power and temperature, and the emission wavelength varies in the range 0.65–0.73 μm. At 77 K and low excitation level, InP QDs exhibit high temperature stability of the emission wavelength and high quantum efficiency. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 35, No. 2, 2001, pp. 242–244. Original Russian Text Copyright ? 2001 by Vinokurov, Kapitonov, Nikolaev, Sokolova, Tarasov.     

溶胶-凝胶法制备Co,Cu共掺杂ZnO薄膜 结构及光学特性

采用溶胶-凝胶法在玻璃基片上制备了纯ZnO薄膜和高浓度Cu掺杂的Co,Cu共掺ZnO(Zn0.90CoxCu0.1-xO,x=0.01,0.03,0.05)薄膜。扫描电镜观察到无论是纯ZnO还是掺杂ZnO薄膜表面都有均匀分布的颗粒,但是在Cu含量较高时均匀性更好。X射线衍射揭示所有样品都具有纤锌矿结构,但是Cu掺杂量的增加使晶格常数略有减小,而晶粒尺寸却略有增大。XPS测试结果表明样品中Co离子的价态为+2价和+3价,Cu离子的价态为+2价和+1价共存。室温光致发光测量在所有样品中均观察到较强的紫外发光峰、蓝光双峰和较弱的绿光发光峰。     

溅射气压对氧化镓薄膜光学特性的影响

采用射频磁控溅射法在石英衬底上制备了氧化镓(Ga2O3)薄膜.利用X射线衍射仪和紫外-可见-红外分光光度计分别对Ga2O3薄膜的晶体结构和光学带隙进行了表征,并在室温下测量了 Ga2O3薄膜的光致发光(PL)谱.结果表明:制备的Ga2O3薄膜呈非晶态.吸收边随着溅射气压的增加先蓝移后红移,光学带隙值范围为5.06～5.37 eV,溅射气压为1 Pa时,制备的Ga2O3薄膜具有最大的光学带隙.在325 nm激光激发下,400 nm附近和525 nm附近处出现与缺陷能级相关的发光峰.     

Growth and characterization of (111)B InGaAs/GaAs multi-quantum well PIN diode structures

High quality piezoelectric strained InGaAs/GaAs multi-quantum well structures on (111)B GaAs substrates have been grown by solid-source molecular beam epitaxy in a PIN configuration. 10K photoluminescence (PL) shows narrow peaks with widths as low as 3 meV for a 25-period structure while room temperature (RT) PL shows several higher order peaks, normally forbidden, indicating breaking of inversion symmetry by the piezoelectric field. Furthermore, both the 10K PL peak position and the form of the RT PL spectra depend on the number of quantum wells within the intrinsic region, suggesting that the electric-field distribution is altered thereby. Diodes fabricated from these structures had sharp avalanche breakdown voltages (V_bd) and leakage currents as low as 8 × 10⁻⁶ A/cm² at 0.95 V_bd, indicating quality as high as in (100) devices. On leave from: Department de Ingeniera Electronica, Universidad Politecnica de Madrid, Madrid, Spain.     

Optical properties of undoped and iodine-doped CdTe

A comprehensive study of the properties of undoped and iodine-doped CdTe structures by photoluminescence (PL) and photoreflectance (PR) is reported. Undoped bulk CdTe and iodine-doped CdTe layers grown by metalorganic molecular beam epitaxy on (lOO)-oriented CdTe and (211)B-oriented GaAs substrates with electron concentrations ranging from 10¹⁴ to mid-10¹⁸ cm^-3 were included in this study. Lineshape modeling of 80KPL and PR spectra indicated the presence of both free exciton and donor-hole transitions at the higher doping levels. Strong PL and PR signals were also observed at room temperature. If only a single transition is considered for the analysis of the 300K spectra, the PL emission peak and the PR transition energy both exhibit a strong dependence on electron concentration for doped layers. However, lineshape modeling of the room-temperature spectra indicated the presence of multiple transitions consisting of free exciton and direct band-to-band transitions. The use of two transitions resulted in a constant value of bandgap over the entire range of conductivities studied. A strong correlation remained between the broadening of the PR and PL spectra and excess carrier concentration N_D-N_A. In addition, the E₁ transition energy measured by PR was found to vary dramatically with growth conditions.     

Synthesis and Room‐Temperature Ultraviolet Photoluminescence Properties of Zirconia Nanowires

This paper reports the synthesis of tetragonal zirconia nanowires using template method. An as‐prepared sample was characterized by scanning and transmission electron microscopy. It was found that the as‐prepared materials were tetragonal zirconia nanowires with average diameters of ca. 80 nm and length of over 10 μm. The Raman spectrum showed peaks at 120, 461, and 629 cm^–1, which are attributed to the E_g, E_g, and B_1g phonon modes of the tetragonal zirconia structure, respectively. The UV‐vis absorption spectrum showed an absorption peak at 232.5 nm (5.33 eV in photon energy). Photoluminescence (PL) spectra of zirconia nanowires showed a strong emission peak at ca. 388 nm at room temperature, which is attributed to the ionized oxygen vacancy in the zirconia nanowires system.     

二氧化硅纳米花的制备及发光特性研究

采用磁控溅射和化学气相沉积技术制备出二氧化硅纳米花。利用扫描电子显微镜(SEM),X射线光电子能谱(XPS)和傅里叶红外吸收谱(FTIR)对上述纳米结构进行结构表征。用荧光光谱仪(PL)对其光致发光特性进行了研究。结果表明在激发波长为325nm时,在394nm处出现一个发光峰,表现出良好的发光特性。     

Light emission from crystalline silicon and amorphous silicon oxide (SiOx) nanoparticles

Bright orange-red light emission was observed from single crystal silicon nanoparticles and silicon oxide (SiO_x) nanoparticles. The emission peak was recorded at about 1.5 eV both at room temperature and 77K. Varying the mean silicon particle size, we observed no effect of particle diameter on the emission wavelength. Amorphous silicon oxide (SiO_x) nanoparticles also showed essentially the same emission spectrum as the crystalline particles. The absence of change in the photoluminescence (PL) spectrum with variations in particle size and crystallinity indicates that quantum confinement is not the controlling PL mechanism. An examination of the hydrogen content with relation to the PL intensity showed no direct correlation; however, all samples did contain some hydrogen, so its effect on PL cannot be ruled out. To test for the presence of photoluminescent siloxene on the surface of the particles, nitric acid was applied; a violent reaction occurred with the silicon particles, while the SiO_x particles showed no reaction. Taken in conjunction with the emission data, these experiments demonstrate that the PL of the SiO_x is also not dependant on siloxene. Evidence points to an amorphous coating as the source of photoluminescence.     

Electrical properties and luminescence of CuInSe2

We have studied the electrical properties and luminescence spectra of melt-grown CuInSe₂ single crystals and the doping of the crystals with intrinsic defects and extrinsic impurities. The preparation and the properties of p-n junctions are also discussed. We find that the low temperature photoluminescence spectra of crystals as-grown or annealed between 400 and 700 C are characteristic of the conductivity type. At 77 K, p-type crystals emit in a band peaked at 1.00 eV (type A spectrum) whereas the emission of n-type crystals peaks at 0.93 eV (type B spectrum). Type A and type B spectra can be interchanged by alternate anneals in minimum or maximum Se pressure. Type B emission dominates the electroluminescence spectrum of p-n junctions. These features are explained by the appearing and disappearing of a donor level as a consequence of annealing in vacuum or in Se atmosphere. We find that Zn and Cd act as donors. Crystals doped with these impurities have electron concentrations above 10¹⁸ cm⁻³. Zn-dopped samples exhibit a very broad recombination band below the bandgap in photoluminescence both at 77 and 300 K.     

Deep level transient spectroscopy study of electron-irradiated CuInSe<Subscript>2</Subscript> thin films

Irradiation of high-energy (2-MeV and 3-MeV) electrons on single-crystalline n-CuInSe₂ films has been investigated. From Hall-effect measurements of the film, the carrier density and mobility were decreased by increasing the electron fluence above 1×10¹⁷ cm⁻². In both as-grown and electron-irradiated CuInSe₂ films, the deep level transient spectroscopy (DLTS) peak, indicating electron trap, was found at around 180 K. However, Arrhenius plots of the observed DLTS peaks in as-grown and electron-irradiated films showed different behavior, suggesting the presence of electron traps introduced by high-energy electron irradiation.     

Correlation between the surface morphology and structure and the photoluminescence of amorphous PbTiO3 thin films obtained by the chemical route

A polymeric precursor method was used to synthesis PbTiO₃ amorphous thin film processed at low temperature. The luminescence spectra of PbTiO₃ amorphous thin films at room temperature revealed an intense single‐emission band in the visible region. The visible emission band was found to be dependent on the thermal treatment history. Photoluminescence properties versus different annealing temperatures were investigated. The experimental results (XRD, AFM, PL) indicate that the nature of photoluminescence (PL) must be related to the disordered structure of PbTiO₃ amorphous thin films. Copyright © 2000 John Wiley & Sons, Ltd.     

Luminescence Properties of Cobalt-Doped ZnO Films Prepared by Sol–Gel Method

Pure ZnO and Co-doped ZnO films have been deposited on coverslip substrates by sol–gel spin coating. The morphological, structural, and optical properties of the films were investigated. The microstructure of the ZnO films became increasingly fine and the crystalline size decreased with Co doping. Analysis of x-ray diffraction (XRD) and Raman spectra reveals that Co²⁺ ions are substituted for Zn²⁺ ions in the ZnO lattice without changing its wurtzite structure. Co doping induces a decrease of the band-gap energy and fluorescence quenching of the emission bands. The spectra related to transitions within the tetrahedral Co²⁺ ions in the ZnO host crystal were observed in absorption and luminescence spectra. Photoluminescence (PL) spectra under different excitation energies and PL excitation spectra for the visible emissions suggest that the orange–red emission and green emission could be related to interstitial zinc (Zn_i) shallow donors and oxygen vacancy (V _O) deep donors, respectively. The red emission of Co-doped ZnO film could be assigned to the radiative transitions within the tetrahedral Co²⁺ ions in the ZnO host crystal after band-to-band excitation. A consistent explanation for the pure and Co-doped ZnO films is that the red emission under the excitation energy below the band gap is probably associated with extended Zn_i states.     

OMVPE growth of InP and Ga0.47ln0.53as using ethyldimethylindium

We report the organometallic vapor phase epitaxial (OMVPE) growth of InP and Ga_0.47In_0.53As using a new organometallic indium source, ethyldimethylindium (EDMIn), rather than the traditional sources triethylindium (TEIn) or trimethylindium (TMIn). EDMIn is a liquid at room temperature and its vapor pressure at 17° C was found to be 0.85 Torr using thermal decomposition experiments. The growth results using EDMIn were compared to those using TMIn in the same atmospheric pressure reactor. For InP, use of EDMIn resulted in a high growth efficiency of 1.3 × 10⁴ μm/ mole, which was independent of the growth temperature and comparable to the growth efficiency obtained with TMIn. The high growth efficiency is consistent with the observation of no visible parasitic gas phase reactions upstream of the substrate. The 4K photoluminescence (PL) spectra consist of a peak due to bound excitons and an impurity related peak 38 meV lower in energy. This impurity peak is ascribed to conduction band to acceptor transitions from carbon, due to the decreasing relative intensity of this peak with increasing V/III ratio. The relative intensity of the C impurity peak decreases by five times when the growth temperature is increased from 575 to 675° C, with a corresponding increase in the room temperature electron mobility from 725 to 3875 cm²/ Vs. For GalnAs lattice-matched to InP, use of EDMIn also resulted in a temperatureindependent high growth efficiency of 1.0 x 10⁴ μm/mole, indicating negligible parasitic reactions with AsH₃. The In distribution coefficient was nearly constant at a value of 0.9, however the run to run composition variation was slightly higher for EDMIn than for TMIn. The 4K PL showed donor-acceptor pair transitions due to C and Zn. The C impurity peak intensity decreased dramatically with increasing growth temperature, accompanied by an increase in the room temperature electron mobility to 5200 cm²/Vs. Overall, the growth of both InP and GalnAs using EDMIn was qualitatively similar to that using TMIn, although the room temperature electron mobilities were lower for the new source than for our highest purity bottle of TMIn.     

Characterization of GaxIn1−xAs grown with TMIn

High quality Ga_xIn_1−xAs, lattice matched to InP, has been reproducibly grown by organometallic vapor phase epitaxy using trimethylgallium (TMGa), trimethylindium (TMIn), and AsH₃ in an atmospheric pressure reactor with no observable adduct formation. For the first time, using TMIn, room temperature electron mobilities of 10⁴ cm²/Vs and 77 K mobilities greater than 4 × 10⁴ cm²/Vs have beep obtained. Residual donor doping densities in the low 10¹⁵ cm⁻³ range have been routinely obtained. Material with excellent morphology has been grown from 540 to 670 C with the highest quality material being obtained near 650 C. The 4 K photoluminescence (PL) peak due to carbon is not seen in the material grown at higher temperatures; however, it increases dramatically as the growth temperature is lowered. This increased carbon incorporation leads to a sharp drop in the electron mobility, which exhibits a T^−0.5 behavior between 77 and 300 K. With optimum growth conditions, 4 K PL halfwidths of 4–5 meV are commonly observed. This high quality material is characterized by x-ray diffraction, PL, and Hall mobility measurements. Carbon and other impurity incorporation as a function of the growth parameters will be described.     

Enhancing optical properties of nanocrystalline silicon films with air exposure

We report the effect of air exposure and deposition temperatures, T_d, on the optical property of nanocrystalline silicon (nc-Si). The nc-Si thin films were investigated by photoluminescence (PL), optical absorption, X-ray diffraction (XRD), Fourier-transform infrared (FTIR) absorption and Raman scattering. Experimental results show the structural change from an amorphous to a nanocrystalline phase at T_d=80 °C. In addition, it suggests that T_d low condition leads to the increase in the density of SiH-related bonds and a decrease in the average grain size, δ. The oxygen absorption peak increases with the air-exposure time. The PL exhibited two peaks at around 1.75–1.78 and 2.1–2.3 eV. The PL increases and blue shifts consistently with the decrease of δ and increase of oxygen content. The first peak may be related to nanocrystallites in nc-Si films and the origin of another one may be due to defect-related oxygen. Thus, by the plasma-enhanced chemical vapor deposition (PECVD) technique at low T_d, we can produce the nc-Si films with different grain sizes, causing the corresponding luminescent properties. The new method processes advantages of low deposition temperature and effective oxidation of nc-Si on inexpensive substrates, thus making it more suitable for developing low-cost array or flexible nc-Si optoelectronic devices.     

Growth and characterization of GaN thin films on SiC SOI substrates

SiC semiconductor-on-insulator (SOI) structures have been investigated as substrates for the growth of GaN films. The SiC SOI was obtained through the conversion of Si SOI wafers by reaction with propane and H₂. (111) SiC SOI have been produced by this carbonization process at temperatures ranging from 1200 to 1300°C. X-ray diffraction (XRD) and infrared spectroscopy (FTIR) are used to chart the conversion of the Si layer to SiC. Under our conditions, growth time of 3 min at 1250°C is sufficient to completely convert a 1000? layer. XRD of the SiC SOI reveals a single SiC peak at 2θ = 35.7° corresponding to the (111) reflection, with a corrected full width at half-maximum (FWHM) of ~590±90 arc-sec. Infrared spectroscopy of SiC SOI structures obtained under optimum carboniza-tion conditions exhibited a sharp absorption peak produced by the Si-C bond at 795 cm⁻¹, with FWHM of ∼ 20–25 cm⁻¹. Metalorganic CVD growth of GaN on the (111) SiC SOI was carried out with trimethylgallium and NH₃. The growth of a thin (≤200?), low temperature (500°C) GaN buffer layer was followed by the growth of a thick (∼2 μm) layer at 1050°C. Optimum surface morphology was obtained for zero buffer layer. XRD indicates highly oriented hexagonal GaN, with FWHM of the (0002) peak of ~360±90 arc-sec. Under high power excitation, the 300°K photoluminescence (PL) spectrum of GaN films exhibits a strong near band-edge peak (at λ_p~371 nm, with FWHM = 100–150 meV) and very weak yellow emission. Under low power excitation, the 370 nm PL emission from the GaN/SiC SOI structure increases rapidly with SiC carbonization temperature, while the yellow band (∼550–620 nm) correspondingly decreases.     

Photoluminescence of erbium-doped aluminum oxide films with embedded silicon nanoparticles

Erbium-doped aluminum oxide films with embedded Si nanoparticles have been obtained by magnetron puttering of a composite (Al + Er₂O₃ + Si) target and subsequent electrochemical anodization at room temperature. The photoluminescence (PL) spectra of these films are measured in the temperature range 4.2–300 K. Efficient PL is observed at a wavelength of 1.54 μm without preliminary annealing of the samples, which indicates the possibility of activating Er³⁺ ions without any high-temperature treatment. The aluminum oxide films with embedded Si nanoparticles were observed to show stronger PL at a wavelength of 1.54 μm than similar films without Si nanoparticles. This effect can be explained by additional pumping of Er-based luminescence centers and energy transfer from the Si nanoparticles.