The acceptor and donor defects of thick (approx. 0.4 mm) free-standing boron and nitrogen containing microwave plasma CVD polycrystalline diamond films were investigated. Charge-based deep level transient spectroscopy (Q-DLTS) was applied to study impurity-induced defects, their density and energy distribution in the energy range of 0.01 eV≤E−Ev≤1.1 eV above the valence band. It was shown, that differential capacitance–voltage, and Hall effect measurements combined with DLTS data can be used to determine the degree of compensation, and the concentration of compensating donors (mostly the positively charged single-substitutional nitrogen (N+)) in p-type CVD polycrystalline diamond films. It was found, that incorporated boron atoms induce three levels of electrically active defects. Two of them with concentration (2–3)×1016 cm−3 each have activation energies of 0.36 and 0.25 eV with capture cross-sections of 1.3×10−13 and 4.5×10−19 cm2, respectively. The third type of defect has an activation energy of 0.02 eV, capture cross-section 3×10−20 cm2 and concentration 1015 cm−3, this shallow trap being a probable general caterer of holes in low-doped films. The total concentration of electrically active uncompensated acceptors in all p-type diamond samples was approximately 2×1017 cm−3 with hole concentration of approximately 1.5×1014 cm−3 and hole mobility in the range of 30–40 cm2 V−1 s−1 at room temperature. If assumed that compensating donors are mostly nitrogen, the films contained no less than 3×1016 cm−3 of N+. 相似文献
Prime novelty: The smoothness of the synthesized boron-doped diamond was improved by the pre-treatment of a hydrogen plasma. Moreover, the Hall mobility also increased with this pre-treatment.Surface morphology and electrical properties, such as electrical conductivity, hole concentration and Hall mobility, were investigated for boron-doped diamond films, which were synthesized by microwave-assisted chemical vapor deposition (MPCVD) on a (100) diamond substrate. Trimethylboron (TMB) was used as a dopant source and methane (CH4) was used as a carbon source. The morphology of the synthesized diamond surface depended on the MPCVD conditions such as TMB and CH4 concentrations in the gas phase, and lower concentrations of TMB and CH4 lead to a smoother surface. When the substrate was treated in a hydrogen plasma, the electrical properties of the boron-doped diamond films, as well as the smoothness of the surface, were improved. After optimizing the synthesis conditions, Hall mobility reached to 2020 cm2 V−1 s−1 at 243 K for a diamond film with a hole concentration of 5×1012 cm−3. 相似文献
A rapid lightwave (LW) irradiation method was presented for the low-temperature solution production of ZrO2 films as high-k dielectrics for flexible high-performance thin-film transistors (TFTs). The LW irradiation process markedly decreased the required processing temperature and processing time. Microstructure characterizations confirmed the successful formation of ZrO2 films with an ultrasmooth surface, large band gap (>5 eV) and low defect level. The ZrO2 film produced via LW irradiation at ∼200 °C in only 8 min presented excellent dielectric properties, including a small leakage current of 3.3 × 10−8 A/cm2 and a large capacitance of 296 nF/cm2, significantly outperforming the films by the conventional high-temperature annealing process at 400 °C for 60 min. Furthermore, LW irradiation was extended to the channel layer. The rapid low-temperature solution-processed InZrOx TFTs exhibited superior electrical characteristics, such as a high carrier mobility of 41.3 cm2V−1s−1 and a high on-off current ratio of 105∼106 at a low operation voltage of 3 V due to the employment of high-quality ZrO2 dielectric films. Moreover, the flexible TFT on a polyimide (PI) plastic substrate achieved a high mobility of nearly 30 cm2V−1s−1, indicating that LW irradiation is highly promising for the rapid and low-temperature solution production of high-quality and flexible oxide electronic devices. 相似文献
Microwave CVD heteroepitaxial diamond film on a 4° off-axis Si(100) substrate is obtained by two stages. The first one is to grow oriented 3c-SiC layers on Si(100) using a non-toxic and non-inflammable (CH3)6Si2NH organic compound carried by hydrogen. The following stage is to grow oriented diamond films on them under the atmosphere of CH4 and H2. In each stage there are bias and growth processions. The micro-Raman and micro-Auger analyses prove that there is a perfect orientation relationship between the film and substrate as following: diamond 〈001〉//3c-SiC〈001〉//Si〈001〉. The Hall effect indicates that the film is a P type, whose resistivity is 9.4×10−3 Ω cm, the Hall coefficient is 2.9 cm3/Q, the hole mobility is 309 cm2/V s and the carrier concentration reaches 2.2×1018 cm−3. 相似文献
Summary: We have prepared waterborne polyurethane (WBPU) thin films containing gold nanoparticles by casting WBPU/Au solutions. The effect of the Au nanoparticle contents on the microstructure and properties of the composite films was investigated by thermogravimetric analysis (TGA), differential scanning calorimetry (DSC), field emission scanning electron microscopy (FESEM), transmittance electron microscopy (TEM), FTIR spectroscopy (FTIR) and dynamic mechanical analysis (DMA). The Au nanoparticles initially in the WBPU solution were well dispersed in the WBPU films cast and dried at 60 °C. The thermostability and mechanical properties of the polymer increased with Au contents up to 4.35 × 10?2 wt.‐%, which was believed to be a result of induced crystallization in the presence of Au nanoparticles. The Au/WBPU nanocomposite containing with 6.5 × 10?2 wt.‐% of Au resulted in the aggregation of Au particles, which leads to a worsening of the thermal and mechanical properties.
TEM micrograph of nanocomposites filled with 4.35 × 10?2 wt.‐% of Au nanoparticles. 相似文献
Conductive polymer film that possess stable electrical conductivity and good mechanical performance was prepared with the incorporation of polyaniline (PAni) and carboxymethyl cellulose (CMC) in grafted rubber (MG49) matrix was synthesized in this research study. PAni was synthesized through the chemical oxidation process while CMC was produced using the carboxymethylation reaction. Besides, conductive polymer films of MG 49/PAni/CMC were synthesized using ex-situ polymerization. The optimum reinforcement of CMC in the polymer films was proven through UTM analysis at 8% CMC loading with tensile strength and Young Modulus of 12.1 and 630 MPa, respectively. The chemical interaction, crystallinity, thermal stability, and morphology behaviors of the conductive polymer films before and after chemical modifications were confirmed by FTIR, XRD, TGA, and SEM analyses. Chemical modification by the introduction of silane coupling agent into conductive polymer films significantly enhances the homogeneity of the composites by giving a stable and narrow range of electrical conductivity with the value of 6.931 × 10−7–8.768 × 10−7 S cm−1. As conclusion, the mechanical performance, and electrical conductivity of MG49/PAni/CMC(8%)-TMMS is more homogenous and fulfils the requirements of conductive polymer film that can be potentially applied in the flexible conductors of stretchable electronics. 相似文献
Fabrication of highly conductive and transparent TiO2/Ag/TiO2 (referred hereafter as TAT) multilayer films with nitrogen implantation is reported. In the present work, TAT films were fabricated with a total thickness of 100 nm by sputtering on glass substrates at room temperature. The as-deposited films were implanted with 40 keV N ions for different fluences (1×1014, 5×1014, 1×1015, 5×1015 and 1×1016 ions/cm2). The objective of this study was to investigate the effect of N+ implantation on the optical and electrical properties of TAT multilayer films. X-ray diffraction of TAT films shows an amorphous TiO2 film with a crystalline peak assigned to Ag (111) diffraction plane. The surface morphology studied by atomic force microscopy (AFM) and field emission scanning electron microscope (FESEM) revealed smooth and uniform top layer of the sandwich structure. The surface roughness of pristine film was 1.7 nm which increases to 2.34 nm on implantation for 1×1014 ions/cm2 fluence. Beyond this fluence, the roughness decreases. The oxide/metal/oxide structure exhibits an average transmittance ~80% for pristine and ~70% for the implanted film at fluence of 1×1016 ions/cm2 in the visible region. The electrical resistivity of the pristine sample was obtained as 2.04×10−4 Ω cm which is minimized to 9.62×10−5 Ω cm at highest fluence. Sheet resistance of TAT films decreased from 20.4 to 9.62 Ω/□ with an increase in fluence. Electrical and optical parameters such as carrier concentration, carrier mobility, absorption coefficient, band gap, refractive index and extinction coefficient have been calculated for the pristine and implanted films to assess the performance of films. The TAT multilayer film with fluence of 1×1016 ions/cm2 showed maximum Haacke figure of merit (FOM) of 5.7×10−3 Ω−1. X-ray photoelectron spectroscopy (XPS) analysis of N 1s and Ti 2p spectra revealed that substitutional implantation of nitrogen into the TiO2 lattice added new electronic states just above the valence band which is responsible for the narrowing of band gap resulting in the enhancement in electrical conductivity. This study reports that fabrication of multilayer transparent conducting electrode with nitrogen implantation that exhibits superior electrical and optical properties and hence can be an alternative to indium tin oxide (ITO) for futuristic TCE applications in optoelectronic devices. 相似文献
In this study, nanostructured tungsten trioxide (WO3) thin films were deposited on Indium tin oxide (ITO)-coated glass substrate using electrochemical deposition (ECD). After deposition, the films were annealed at 450 °C for 2 h in an air atmosphere. X-ray diffraction (XRD) analysis confirmed that the prepared WO3 thin films have crystalline phases. According to the absorption measurements, the optical bandgap of the WO3 film was calculated as Eg 2.80 eV. Based on the scanning electron microscopy (SEM) images, the surface morphology of the thin films was influenced by deposition conditions. Raman spectroscopy analysis was also used to further examine the structure and chemical compositions of the thin films. The nature of the nanostructured WO3 thin films was studied with Electrochemical Impedance Spectroscopy (EIS) and Tafel. Nyquist, open circuit potential and Bode analysis were used to evaluate structural changing and corrosion behavior of the prepared WO3 thin films. With the help of these measurements and analyzes, the parameters such as solution resistance (Rs), polarization resistance (Rpo), a constant phase element (CPE) and a CPE exponent (n) were calculated as 43.43 Ω cm2, 2.67 × 106 Ω cm2, 18.45 × 10−6 Ω−1 s cm−2, 0.958, respectively. Also, the corrosion features of the WO3 thin films were investigated with the help of tafel measurements and the corrosion potential and current values were calculated as −0.583 V and 5.09 × 10−15 A, respectively. It is thought that the prepared thin film might have the potential to be used industrially with these features. 相似文献