Influence of Ag thickness of aluminum-doped ZnO/Ag/aluminum-doped ZnO thin films

Highly conducting aluminum-doped ZnO (30 nm)/Ag (5-15 nm)/aluminum-doped ZnO (30 nm) multilayer thin films were deposited on glass substrate by rf magnetron sputtering (for top/bottom aluminum-doped ZnO films) and e-beam evaporation (for Ag film). The transmittance is more than 70% for wavelengths above 400 nm with the Ag layer thickness of 10 nm. The resistivity is 3.71 × 10^− 4 Ω-cm, which can be decreased to 3.8 × 10^− 5 Ω-cm with the increase of the Ag layer thickness to 15 nm. The Haacke figure of merit has been calculated for the films with the best value being 8 × 10^− 3 Ω^− 1. It was shown that the multilayer thin films have potential for applications in optoelectronics.     

ZnO/Cu/ZnO multilayer films: Structure optimization and investigation on photoelectric properties

A series of ZnO/Cu/ZnO multilayer films has been fabricated from zinc and copper metallic targets by simultaneous RF and DC magnetron sputtering. Numerical simulation of the optical properties of the multilayer films has been carried out in order to guide the experimental work. The influences of the ZnO and Cu layer thicknesses, and of O₂/Ar ratio on the photoelectric and structural properties of the films were investigated. The optical and electrical properties of the multilayers were studied by optical spectrometry and four point probe measurements, respectively. The structural properties were investigated using X-ray diffraction. The performance of the multilayers as transparent conducting coatings was compared using a figure of merit. In experiments, the thickness of the ZnO layers was varied between 4 and 70 nm and those of Cu were between 8 and 37 nm. The O₂/Ar ratios range from 1:5 to 2:1. Low sheet resistance and high transmittance were obtained when the film was prepared using an O₂/Ar ratio of 1:4 and a thickness of ZnO (60 nm)/Cu (15 nm)/ZnO (60 nm).     

Heat generation properties of Ga doped ZnO thin films prepared by rf-magnetron sputtering for transparent heaters

Ga doped ZnO (GZO) thin films were prepared by rf-magnetron sputtering on glass substrate for window heater applications. Electrical and optical properties of these films were analyzed in order to investigate on substrate temperature and rf power dependencies. High quality GZO films with a resistivity of 1.30 × 10^− 4 Ω cm and a transparency above 90% in the visible range were able to be formed. GZO films have been patterned on glass substrate as a line heater. This GZO line heater showed the rapid heat radiation property from room temperature to 90 °C for 22 s at the applied voltage of 42 V. These results could provide a possibility to use GZO as effective transparent heaters.     

Effects of sputtering power and pressure on properties of ZnO:Ga thin films prepared by oblique-angle deposition

The effects of power and pressure on radiofrequency (RF) diode sputtering in oblique-angle (80°) deposition arrangement are presented. Oblique-angle sputtering of ZnO:Ga (GZO) thin films resulted in a tilted columnar crystalline structure and inclination of the c-axis by an angle of approximately 9° with respect to the substrate. This improved their structural, electrical and optical properties in comparison with films deposited perpendicularly to the substrate. GZO films sputtered by an RF power of 600 W at room temperature of the substrate in Ar pressure 1.3 Pa showed strong crystalline (002) texture, lowest electrical resistivity 3.4 × 10^− 3 Ωcm, highest electron mobility 10 cm² V^− 1 s^− 1, high electron concentration 1.8 × 10²⁰ cm^− 3 and good optical transparency up to 88%. The small inclination angle of the film structure is caused by the high kinetic energy of sputtered species and additional energetic particle bombardment causes random surface diffusion, which is suppressing the shadow effect produced by oblique-angle sputtering.     

Effect of post-annealing on the optoelectronic properties of ZnO:Ga films prepared by pulsed direct current magnetron sputtering

In this study, highly conductive films of ZnO:Ga (GZO) were deposited by pulsed direct current magnetron sputtering to explore the effect of post-annealing on the structural, electrical and optical properties of the films. XRD patterns showed that after annealing, the intensity of c-axis preferentially oriented GZO (002) peak was apparently improved. GZO film annealing at 300 °C for 0.5 h exhibits lowest resistivity of 1.36 × 10^− 4 Ω cm. In addition, the film shows good optical transmittance of 88% with optical band gap, 3.82 eV. Carrier concentration and optical band gap both decreases with the annealing temperature. Besides, the near-infrared transmittance at 1400 nm is below 5%, while the reflectivity at 2400 nm is as high as 70%.     

Structural, electrical and optical properties of Ga-doped ZnO films on cyclo-olefin polymer substrates

Ga-doped ZnO (GZO) films with a thickness of 100 nm were prepared on cyclo-olefin polymer (COP) and glass substrates at various temperatures below 100 °C by ion plating with direct-current arc discharge. The dependences of the characteristics of GZO films on the substrate temperature Ts were investigated. All the polycrystalline GZO films, which exhibited a high average visible transmittance of greater than 86%, were crystallized with a wurtzite structure oriented along the c-axis. The lowest resistivities of the GZO films were 5.3 × 10^− 4 Ωcm on the glass substrate and 5.9 × 10^− 4 Ωcm on the COP substrate.     

Organic photovoltaic cells fabricated on a SnOx/Ag/SnOx multilayer transparent conducting electrode

Transparent conducting multilayer structured electrode of a few nm Ag layer embedded in tin oxide thin film SnO_x/Ag/SnO_x was fabricated on a glass by RF magnetron sputtering at room temperature. The multilayer of the SnO_x(40 nm)/Ag(11 nm)/SnO_x(40 nm) electrode shows the maximum optical transmittance of 87.3% at 550 nm and a quite low electrical resistivity of 6.5 × 10^− 5 Ω cm, and the corresponding figure of merit (T¹⁰/R_S) is equivalent to 3.6 × 10^− 2 Ω^− 1. A normal organic photovoltaic (OPV) structure of poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate)/polythiophene:phenyl-C60-butyric acid methyl ester/Al was fabricated on glass/SnO_x/Ag/SnO_x to examine the compatibility of OPV as a transparent conducting electrode. Measured characteristic values of open circuit voltage of 0.62 V, saturation current of 8.11 mA/cm² and fill factor of 0.54 are analogous to 0.63 V, 8.37 mA/cm² and 0.58 of OPV on commercial glass/indium tin oxide (ITO) respectively. A resultant power conversion efficiency of 2.7% is also very comparable with the 3.09% of the same OPV structure on the commercial ITO glass as a reference, and which reveals that SnO_x/Ag/SnO_x can be appropriate to OPV solar cells as a sound transparent conducting electrode.     

Fabrication of transparent conductive films with a sandwich structure composed of ITO/Cu/ITO

New transparent conductive films that had a sandwich structure composed of ITO/Cu/ITO multilayer films were prepared by a conventional RF and DC magnetron sputtering process on a polycarbonate substrate without intentional substrate heating. The thickness of each layer in the ITO/Cu/ITO films was kept constant at 50 nm/5 nm/45 nm. The optoelectrical and structural properties of the films were compared with conventional ITO single-layer films and ITO/Cu/ITO multilayered films. Although both films had identical thickness, 100 nm, the ITO/Cu/ITO films showed a lower resistivity, 3.5 × 10⁻⁴ Ω cm. In optical transmittance measurements, however, the ITO single-layer films showed a higher transmittance of 74% in the wavelength range of 300-800 nm. XRD spectra showed that both the ITO and ITO/Cu/ITO films were amorphous. The figure of merit, φ_TC, reached a maximum of 5.2 × 10⁻⁴ Ω⁻¹ for the ITO/Cu/ITO films, which was higher than the φ_TC of the ITO films (1.6 × 10⁻⁴ Ω⁻¹). The φ_TC results suggested that ITO/Cu/ITO films had better optoelectrical properties than conventional ITO single-layer films.     

Thermally stable, highly conductive, and transparent Ga-doped ZnO thin films

Highly conductive and transparent films of Ga-doped ZnO (GZO) have been prepared by pulsed laser deposition using a ZnO target with Ga₂O₃ dopant of 3 wt.% in content added. Films with resistivity as low as 3.3 × 10^− 4 Ω cm and transmittance above 80% at the wavelength between 400 and 800 nm can be produced on glass substrate at room temperature. It is shown that a stable resistivity for use in oxidation ambient at high temperature can be attained for the films. The electrical and optical properties, as well as the thermal stability of resistivity, of GZO films were comparable to those of undoped ZnO films.     

Ion sputter etching of ZnO:Ga thin film surfaces

In this article the modification of surface morphology of ZnO:Ga (GZO) thin films by ion sputter etching is presented. GZO thin films were prepared at room temperature on Corning glass substrates by both normal and oblique angle RF diode sputtering from ZnO:2%Ga ceramic target in Ar gas. Ion sputter etching was performed by RF re-sputtering of GZO thin films on substrates. During RF sputter etching, Ar pressure of 1.3 Pa and RF power of 250 W were kept constant, only the time of sputter etching was changed. Ion sputter etching had remarkable influence on surface morphology of GZO thin films: increase of roughness R_q and the “homogenization” of film surfaces, i.e. skewness (R_sk) and spikiness (R_ku) parameters (R_sk ≈ 0/R_ku ≈ 3).Surface root-mean-square roughness (R_q) increased from 15.3 nm (after sputter deposition) to 29.1 nm (after ion sputter etching). For obliquely thin films increased from 16.5 nm (after sputter deposition) to 38.2 nm. Changes of these parameters R_q, R_sk, R_ku influenced optical properties of GZO films, increased Haze parameter up to values 7.7% and width of optical band gap 3.44 eV, respectively.     

Effects of the O2 flow rate and post-deposition thermal annealing on the optical absorption spectra of Ga-doped ZnO films

The optical absorption spectra of polycrystalline Ga-doped ZnO (GZO) thin films deposited by ion plating with direct current arc discharge have been studied. The GZO films that were deficient in oxygen showed absorption in the visible wavelength range. The intensity of the absorption band decreased with increasing O₂ flow rate during the deposition. Post-deposition thermal annealing in air and in a N₂ gas atmosphere also decreased the intensity of the absorption band. The intensity of the absorption band showed a slight correlation with carrier concentrations in the GZO films. The absorption intensity decreased with the decrease of the carrier concentration and diminished at a carrier concentration of around 7 × 10²⁰ cm^− 3. The contribution of carriers from native donors to transport in GZO films is discussed.     

Investigation of low resistance transparent MoO3/Ag/MoO3 multilayer and application as anode in organic solar cells

Depending on the resistivity and transmittance, transparent conductive oxides (TCO) are widely used in thin film optoelectronic devices. Thus doped In₂O₃ (ITO), ZnO, SnO₂ are commercially developed. However, the deposition process of these films need sputtering and/or heating cycle, which has negative effect on the performances of the organic devices due to the sputtering and heat damages. Therefore a thermally evaporable, low resistance, transparent electrode, deposited onto substrates room temperature, has to be developed to overcome these difficulties. For these reasons combination of dielectric materials and metal multilayer has been proposed to achieve high transparent conductive oxides. In this work the different structures probed were: MoO₃ (45 nm)/Ag (x nm)/MoO₃ (37.5 nm), with x = 5-15 nm. The measure of the electrical conductivity of the structures shows that there is a threshold value of the silver thickness: below 10 nm the films are semiconductor, from 10 nm and above the films are conductor. However, the transmittance of the structures decreases with the silver thickness, therefore the optimum Ag thickness is 10 nm. A structure MoO₃ (45 nm)/Ag (10 nm)/MoO₃ (37.5 nm) resulted with a resistivity of 8 × 10^− 5 Ω cm and a transmittance, at around 600 nm, of 80%. Such multilayer structure can be used as anode in organic solar cells according to the device anode/CuPc/C₆₀/Alq₃/Al. We have already shown that when the anode of the cells is an ITO film the introduction of a thin (3 nm) MoO₃ layer at the interface anode (ITO)/organic electron donor (CuPc) allows reducing the energy barrier due to the difference between the work function of ITO and the highest occupied molecular orbital of CuPc [1]. This property has been used in the present work to achieve a high hole transfer efficiency between the CuPc and the anode. For comparison MoO₃/Ag/MoO₃/CuPc/C₆₀/Alq₃/Al and ITO/MoO₃/CuPc/C₆₀/Alq3/Al solar cells have been deposited in the same run. These devices exhibit efficiency of the same order of magnitude.     

Thermally stable transparent conducting and highly infrared reflective Ga-doped ZnO thin films by metal organic chemical vapor deposition

Highly transparent conductive Ga-doped ZnO (GZO) thin films have been prepared on glass substrates by metal organic chemical vapor deposition. The effect of Ga doping on the structural, electrical and optical properties of GZO films has been systematically investigated. Under the optimum Ga doping concentration (∼4.9 at.%), c-axis textured GZO film with the lowest resistivity of 3.6 × 10⁻⁴ Ω cm and high visible transmittance of 90% has been achieved. The film also exhibits low transmittance (<1% at 2500 nm) and high reflectance (>70% at 2500 nm) to the infrared radiation. Furthermore, our developed GZO thin film can well retain the highly transparent conductive performance in oxidation ambient at elevated temperature (up to 500 °C).     

Effect of organic-buffer-layer on electrical property and environmental reliability of Ga-doped ZnO films prepared by RF plasma assisted DC magnetron sputtering on plastic substrate

Ga-doped ZnO (GZO) transparent conductive films have been prepared by RF plasma assisted DC magnetron sputtering under a reductive atmosphere on organic-buffer-layer (OBL) coated polyethylene telephthalate (PET) substrates without intentionally heating substrates. Electrical and optical properties, crystallinity, and environmental reliability of the GZO films have been investigated. The distributional characteristic of resistivity is observed in the GZO film deposited on the OBL-coated PET substrates. The high resistivity at facing the erosion area in the source target is reduced by providing the RF plasma and H₂ gas near the substrate, resulting in a uniform distribution of the sheet resistance. It has been also found that the increase of resistivity by an accelerated aging test performed under a storage condition at 60 °C and at a relative humidity of 95% is suppressed by employing the OBL. The OBL suppresses the formation of cracks, which are induced by the aging test. These facts are thought to contribute to a high environmental reliability of GZO films on PET substrates. Values of resistivity, Hall mobility and carrier concentration are obtained: 5.0-20 × 10⁻³ Ω cm, 4.0 cm²/Vs, and 3.8 × 10²⁰ cm⁻³, respectively. An average transmittance of the GZO film including OBL and PET substrate is 78% in a visible region. The OBL enables to realize the practical use of GZO films on PET sheets.     

Preparation of wide gap Cu(In,Ga)S2 films on ZnO coated substrates

We have prepared Cu(In,Ga)S₂ films at growth temperatures from 300 °C to 580 °C with a homogeneous gallium depth distribution (estimated band gap 1.67 eV) onto soda lime glass (SLG) substrates with one of three different kinds of back contact: Mo(1000 nm), ZnO(500 nm), and Mo(30 nm)/ZnO(500 nm), respectively. We have also investigated the depth profiles of Zn and Na (diffused from SLG) in Cu(In,Ga)S₂ films by secondary ion mass spectroscopy (SIMS). The efficiency of solar cells on Mo increases with increasing growth temperature. It is higher on Mo/ZnO than on ZnO, and increases from 350 °C to 450 °C, then decreases above 450 °C. It was observed by SIMS that the amount of Zn in Cu(In,Ga)S₂ on Mo/ZnO is lower than it is on ZnO up to 450 °C, and a large amount of Zn diffuses into absorbers over 450 °C, which contributes to decreasing efficiency. The amount of Na in the back contact increases with growth temperature. The depth distribution of Na in Cu(In,Ga)S₂ films on Mo is almost constant in the order of 10¹⁷-10¹⁸ cm^− 3, on ZnO and Mo/ZnO the Na concentration increases towards the surface and is in the range of 10¹⁵-10¹⁷ cm^− 3.     

Dielectric/metal/dielectric structures using copper as metal and MoO3 as dielectric for use as transparent electrode

Transparent conductive oxide/metal/oxide, where the oxide is MoO₃ and the metal is Cu, is realized and characterized. The films are deposited by simple joule effect. It is shown that relatively thick Cu films are necessary for achieving conductive structures, what implies a weak transmission of the light. Such large thicknesses are necessary because Cu diffuses strongly into the MoO₃ films. We show that the Cu diffusion can be strongly limited by sandwiching the Cu layer between two Al ultra-thin films (1.4 nm). The best structures are glass/MoO₃ (20 nm)/Al (1.4 nm)/Cu (18 nm)/Al (1.4 nm)/MoO₃ (35 nm). They exhibit a transmission of 70% at 590 nm and a resistivity of 5.0 · 10^− 4 Ω cm. A first attempt shows that such structures can be used as anode in organic photovoltaic cells.     

Dependence of optical and structural properties of ZnS and MgF2 multilayers as a function of the number of layers

In this paper, optical and structural properties of ZnS and MgF₂ multilayers grown by thermal evaporation are studied. Effects of annealing at different temperatures on samples with different number of layers are investigated. The maximum of reflection is shifted to different wavelengths, depending on the number of layers of the annealed samples. Using X-ray diffraction analysis, structural properties have been studied, and grain size and microstrain have been obtained by the Scherrer-Wilson formula, with grain sizes ranging from 10 nm to 22 nm for MgF₂ and from 0.9 nm to 210 nm for ZnS, and microstrain values from 2.5 × 10^− 3 to 3 × 10^− 3 for MgF₂, and from 1.2 × 10^− 3 to 2.6 × 10^− 3 for ZnS. Competition between crystallite size and microstrain is observed.     

Novel Ga-doped ZnO nanocrystal ink: Synthesis and characterization

Ga-doped ZnO (GZO) nanocrystals were synthesized via the hot-injection method for the first time. The characterizations of its structure, composition, morphology, and absorption properties were conducted by using powder X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDS), transmission electron microscopy (TEM) and UV-vis absorption spectroscopy. The results indicated that GZO nanocrystals were single phase polycrystalline within a range of 5―10 nm. Optical measurements illustrated that GZO nanocrystals have a tunable band gap from 3.35 to 3.81 eV, depending on the Ga doping level. GZO nanocrystals were dispersed in nonpolar solvents to form a nanocrystal ink which could remain stable after a month of storage. The GZO thin film was fabricated by spin coating the GZO nanocrystal ink and annealing in air. The electrical resistivity of the film was measured to be 7.5 × 10⁻² Ω cm. This method, which eliminated the requirement of high vacuum and high temperature, was a promising alternative for transparent conducting oxide (TCO) fabrication.     

Characteristics of transparent ZnO based thin film transistors with amorphous HfO2 gate insulators and Ga doped ZnO electrodes

Coplanar type transparent thin film transistors (TFTs) have been fabricated on the glass substrates. The devices consist of intrinsic ZnO, Ga doped ZnO (GZO), and amorphous HfO₂ for the semiconductor active channel layer, electrode, and gate insulator, respectively. GZO and HfO₂ layers were prepared by using a pulsed laser deposition (PLD) and intrinsic ZnO layers were fabricated by using an rf-magnetron sputtering. The transparent TFT exhibits n-channel, enhancement mode behavior. The field effect mobility, threshold voltage, and a drain current on-to-off ratio were measured to be 14.7 cm²/Vs, 2 V, and 10⁵, respectively. High optical transmittance (> 85%) in visible region makes ZnO TFTs attractive for transparent electronics.     

Electrical and structural properties of Ta-N thin film and Ta/Ta-N multilayer for embedded resistor

Ta/Ta-N multilayer has been developed to control temperature coefficient of resistance (TCR) in a thin-film embedded resistor with the incorporation of Ta layer (+ TCR) inserted into Ta-N layers (− TCR). Electrical and structural properties of sputtered Ta, Ta-N and the multilayer films were investigated. The stable resistivity value of 0.0065 Ω·cm in β-Ta film was obtained, and phase change from fcc-TaN to orthorhombic Ta₃N₅ in Ta-N films was observed at nitrogen partial pressure of 22%. The multilayer of Si/Ta(60 nm)/Ta₃N₅(104 nm)/Ta(60 nm)/Ta₃N₅(104 nm) showed TCR value of − 284 ppm/K, where TCR of Ta was − 183 ppm/K and that of Ta₃N₅ was − 3193 ppm/K.