DAST晶体的生长与表征

根据实验获得的亚稳区范围为指导,采用籽晶-溶液降温法进行对4-N,N-二甲胺基-4’-N’-甲基-氮杂芪的对甲苯磺酸盐(DAST)晶体的生长,获得了2颗尺寸较大的DAST晶体。X线衍射(XRD)图谱分析发现有较强的(004)面和(006)面的特征峰,光致发光谱(PL)测试发现573.5nm处存在N(CH3)2基团产生的特征峰,601.6nm处存在二甲胺基和磺酸盐基分子间电荷转移过程产生的特征峰,647nm存在由烯双键产生的特征峰,通过晶体的XRD、PL光谱测试,证实了实验制备的晶体为DAST晶体。同时,还测试了晶体的维氏硬度,以及使用原子力显微镜(AFM)及微分干涉显微镜对晶体的表面形貌进行了观测。     

籽晶偏向对高纯半绝缘4H-SiC晶体影响的研究

采用PVT法得到高纯4H-SiC体单晶。研究了0°、1°、4°晶体对晶体台阶流、晶体结晶质量、晶体缺陷、晶体电学性能的影响;晶体台阶流采用奥林巴斯显微镜进行表征,晶体缺陷采用莱卡体系显微镜进行表征,晶体结晶质量采用高分辨XRD进行表征,晶体电学性能采用非接触电阻率测试仪进行表征。实验结果表明:4°籽晶生长的晶体缺陷最少,1°与4°籽晶生长的晶体结晶质量相当,0°籽晶生长的晶体电学性能最均匀。     

InP籽晶表面处理的装置设计与工艺优化

为改善InP籽晶表面洁净度,保证InP材料生长时的电学参数并减小引晶阶段孪晶形成概率,设计了InP籽晶表面处理装置.该装置采用动态方式对籽晶表面进行处理,采用原子力显微镜扫描处理后籽晶的表面形貌,结果显示籽晶表面无杂质和沾污.通过在晶体引晶部位的不同位置取样进行霍尔测试.测试结果显示,用常规静态方式和动态方式处理的籽晶,其生长出晶体引晶部分的样品的平均迁移率分别约为4 100 cm2/(V·s)和4 600 cm2/(V·s),平均载流子浓度分别约为7×1015 cm-3和4×1015 cm-3.通过该装置及工艺处理的籽晶,表面被处理得彻底、无沾污,容易生长出电学参数优异的晶体.     

DAST源粉表征与晶体制备

通过X射线粉末衍射、核磁共振波谱法对制得的DAST源粉进行表征,确证其分子结构并计算出源粉纯度为99.7%。然后使用该DAST源粉配制其甲醇溶液,并利用溶液降温法通过自发成核过程培养出尺寸为(2~3)mm×(2~3)mm×(0.3~0.5)mm的DAST晶体。     

DAST 源粉表征与晶体制备

通过X 射线粉末衍射、核磁共振波谱法对制得的DAST 源粉进行表征，确证其分子结构并计算出源粉纯度为 99.7 %。然后使用该DAST 源粉配制其甲醇溶液，并利用溶液降温法通过自发成核过程培养出尺寸为(2~3) mm×(2~3) mm×(0.3~0.5) mm 的DAST 晶体。     

有机非线性光学晶体DAST的太赫兹发射性能

研究了DAST晶体的有效二阶非线性系数和太赫兹发射性能。实验以DAST-甲醇溶液的亚稳区范围为依据,采用溶液降温法进行DAST的生长。实验发现,降温速率越快,晶体的生长速度越快,但晶体易发生多晶转变;在晶体生长后期,采用较慢的降温速率,有利于晶体厚度的增加。经磨抛后的晶体表面粗糙度能够达到光学测试等级(微米级)要求。经测试,DAST晶片有效二阶非线性系数平均值为16.58 pm/V,实现了频率范围0.84~10 THz的太赫兹波发射,并在2.72 THz处具有最大发射强度。     

SPK1基因转染对大鼠骨髓间充质干细胞的影响

籽晶是影响K(DxH1-x)2PO4(DKDP)晶体生长和光损伤阈值的一个重要因素.该文采用传统降温法,分别利用Z片和[101]晶片作为籽晶,从氘化程度为85%的溶液生长了DKDP晶体,并加工部分Ⅱ类3倍频晶片样品,进行了3倍频光损伤阈值测试和损伤形貌观测的实验.结果表明,相较于Z片籽晶,[101]晶片作为籽晶所得晶体样品光损伤阈值提高1.54倍且能有效缩短晶体的生长周期.     

异型籽晶DKDP晶体的激光损伤

籽晶是影响K(DxH1-x)2PO4(DKDP)晶体生长和光损伤阈值的一个重要因素.该文采用传统降温法,分别利用Z片和[101]晶片作为籽晶,从氘化程度为85%的溶液生长了DKDP晶体,并加工部分Ⅱ类3倍频晶片样品,进行了3倍频光损伤阈值测试和损伤形貌观测的实验.结果表明,相较于Z片籽晶,[101]晶片作为籽晶所得晶体样品光损伤阈值提高1.54倍且能有效缩短晶体的生长周期.     

CdS籽晶扩大技术北大核心

采用物理气相传输(PVT)法制备大尺寸硫化镉(CdS)籽晶,通过调整源区与生长区温差进行了籽晶扩大实验,并进行了X射线衍射(XRD)、红外透过率和腐蚀坑密度等测试。研究表明,在15,10,5和2℃等不同温差条件下,均可实现CdS籽晶的扩展,扩展的晶体区域具有和初始籽晶相同的晶向,而且低温差利于获得更大的单晶扩展面积。当温差为5℃时,扩展出的CdS单晶的X射线衍射半高宽(FWHM)较小、红外透过率较高且腐蚀位错密度较低,表明此时晶体的质量较好;当温差增大为10℃和15℃时,蒸气过饱和度高、晶体生长速率大,导致晶体质量变差;当温差减小为2℃时,晶体生长驱动力不足,这容易形成不稳定的生长界面并导致晶体质量下降。     

基于DAST晶体的高能量超宽带可调谐小型化差频THz辐射源研究

基于双温区法生长的高质量DAST(4-(4-二甲基氨基苯乙烯基)甲基吡啶对甲苯酸盐)晶体,成功搭建了高能量、超宽带可调谐差频THz辐射源,系统尺寸40 cm×25 cm,调谐范围达到0. 3～19. 6 THz,最大输出能量达到4. 02μJ/pulse@18. 6 THz,信噪比最高达到32. 24 dB,结合振镜扫描技术,以0. 1 THz为步长,超宽带光谱扫描时间小于1min.实验中观测到差频产生THz波的输出饱和现象并研究了基于DAST晶体差频产生THz波的偏振特性与传输特性,证明基于DAST晶体差频产生的THz波消光比达到0. 05,且差频过程满足0类相位匹配条件.基于该太赫兹辐射源,对多种固体样品在2～14 THz范围内的超宽带THz光谱信息进行了有效获取.     

Fabrication of DAST Channel Optical Waveguides

In order to use the large, electro‐optic coefficient of a nonlinear optical ionic crystal, 4‐(p‐dimethylaminostyryl)‐1‐methylpyridinium tosylate (DAST), a channel optical waveguide structure is needed. We successfully fabricated a waveguide using two methods: by a dry‐etching technique and by photo‐bleaching. Because DAST has a large optical loss, parts of the waveguide should be composed of a transparent polymer. We used photolithography and a reactive ion etching method to fabricate a serially grafted (conjunct) waveguide of DAST with a transparent polymer waveguide. The waveguide was also fabricated by photobleaching, whereby the refractive indices of the crystal’s a‐ and b‐axes were decreased by degrading the crystal. The cladding part of the DAST waveguide was photobleached by irradiating with UV light. The under‐ and over‐cladding layers of these channel waveguides were composed of a UV‐cured resin that did not dissolve the DAST crystal. The loss of the crystal waveguide for the crystal b‐direction was around 10 dB/cm, due to the scattering loss of the DAST single crystal.     

Temperature Dependence of Crystal Structure and THz Absorption Spectra of Organic Nonlinear Optical Stilbazolium Material for High-Output THz-Wave Generation

A stilbazolium material comprising 4-dimethylamino-N′-methyl-4′-stilbazolium tosylate (DAST), which has a large nonlinear optical susceptibility, was studied for application in terahertz (THz)-wave generation. The temperature-dependent structure of the DAST crystal was measured by using powder X-ray diffraction from ?100 to 200 °C, indicating a volume expansion of 4.6 %. The lattice constants show anisotropic thermal expansion. Also, the temperature dependence of THz absorption spectra was measured by terahertz time-domain spectroscopy (THz-TDS) in the temperature range varying from ?80 to 88.1 °C. A strong absorption peak was found at around 1 THz, shifting slightly toward a lower frequency with increasing temperature. The temperature dependence of the THz spectra was compared with that of X-ray diffraction. The shifting of THz-vibrational frequencies of the DAST crystal suggests that the change in its lattice structure is temperature dependent.     

Seeded growth of AlN crystals on nonpolar seeds via physical vapor transport

Seeded growth of AlN single crystals was demonstrated in an induction-heated, high-temperature reactor via a physical vapor transport (PVT) process. AlN seeds were prepared from a self-seeded boule containing large single-crystalline grains. Seeded growth was interrupted several times in order to refill the AlN powder source, and a dedicated process scheme was used to ensure epitaxial growth on the seed surface, after prior exposure to air. The growth temperatures were in the range of 2200–2300°C, and the reactor pressure was in the range of 500–900 torr of UHP-grade nitrogen during each growth run. Under these growth conditions, a seed (10 mm diameter) expanded at an angle of 45°, and a larger single crystal up to 18 mm in diameter was obtained. The as-grown surface had three facets, of which facet (1120) was smooth and featureless while the other two, (4150) and (2570), showed serrated morphologies. The double-crystal x-ray rocking curve and glow discharge mass spectroscopy analysis confirmed that the grown crystal was of high crystalline quality with low impurity incorporation.     

PVT法生长大直径SiC晶体粉源的热特性及对生长的影响

研究了SiC粉料的空隙率对晶体生长的影响.分析比较了当粉料取不同空隙率时粉料中以及生长腔内温度分布的异同,并结合实验研究了生长腔内等温线的不同形状和生长晶体表面形貌之间的关系.数值计算和实验结果均表明,生长腔内等温线的形状直接决定着生长晶体的表面形貌;粉源内较大的空隙率有利于粉的有效升华和晶体的稳定生长.     

Half Cycle Terahertz Pulse Generation by Prism-Coupled Cherenkov Phase-Matching Method

Nonlinear optical terahertz wave generation is a promising method for realizing a practical source with wide frequency range and high peak power. Unfortunately, many nonlinear crystals have a strong absorption in the terahertz frequency region. This limits efficient and widely tunable terahertz wave generation. The Cherenkov phase-matching method is one of the most promising techniques for overcoming these problems. We propose a prism-coupled Cherenkov phase-matching method, in which a prism with a suitable refractive index at terahertz frequencies is coupled to a nonlinear crystal. We demonstrate prism-coupled Cherenkov phase-matching terahertz generation using the DAST and LiNbO₃ crystals. With a DAST crystal, we obtain a spectral flat tunability up to 10 THz by difference frequency generation. With a LiNbO₃ crystal, we observe a spectral flat broadband terahertz pulse generation up to 5 THz pumped by a femto second fiber laser. The obtained temporal waveform is an ideal half cycle pulse suitable for reflection terahertz tomography.     

Continuously tunable THz and far-infrared wave generation from DAST crystal

Continuously tunable terahertz (THz) and far-infrared waves over a wide range of 2 to 30 THz were generated in a 4-N,N-dimethylamino-4'-N'-methyl-stilbazolium tosylate (DAST) crystal by difference frequency mixing. A dual-wavelength optical parametric oscillator in the range of 1250 to 1450 nm as the input light source was developed.     

坩埚位置对PVT生长AlN晶体过程中物质传输的影响

使用FEMAG晶体生长模拟仿真软件以及自主开发的PVT法有限元传质模块对全自动、双电阻加热物理气相沉积炉开展了AlN晶体生长工艺过程中不同坩埚埚位对温度场、过饱和度场及烧结体升华速率等影响的模拟仿真分析研究。模拟仿真结果表明:在给定工艺条件下,坩埚埚位较低时烧结体温度较高且内部温差较小,烧结体升华表面存在较大的Al蒸气分压梯度,各表面升华速率较快且均匀,籽晶衬底生长前沿温度场呈微凸分布,有利于晶体扩径及生长高质量晶体。随着坩埚埚位的上升,低温区向坩埚壁扩展,预烧结体内轴向及径向温度梯度增加,籽晶衬底附近径向温度梯度逐步降低,过饱和度区域扩大且增强。在坩埚埚位较高情况下,坩埚内原料升华变得不均匀,坩埚侧壁存在高过饱和区域,极易在坩埚壁上发生大量的AlN多晶沉积。模拟分析结果与大量实际晶体生长实验后的坩埚壁处沉积现象及剩余烧结体原料形态相符,较好地验证了模拟仿真分析结果的准确性。     

直拉单晶硅中埚跟比的精确计算研究

在直拉单晶硅生长过程中,埚跟比（即坩埚上升速度与晶体提拉速度的比值）的设置非常重要,它直接决定了液面位置的稳定性。其不但影响单晶硅成品的质量,而且不合理的埚跟比设置可能会在直拉单晶硅生长过程中出现变晶断苞,导致单晶生长失败。目前国内大多数光伏单晶硅生产商仅仅依靠人工经验来设置埚跟比,其准确性很难保证。采用体积元积分的方...