MoS2/Si Heterojunction with Vertically Standing Layered Structure for Ultrafast,High‐Detectivity,Self‐Driven Visible–Near Infrared Photodetectors

As an interesting layered material, molybdenum disulfide (MoS₂) has been extensively studied in recent years due to its exciting properties. However, the applications of MoS₂ in optoelectronic devices are impeded by the lack of high‐quality p–n junction, low light absorption for mono‐/multilayers, and the difficulty for large‐scale monolayer growth. Here, it is demonstrated that MoS₂ films with vertically standing layered structure can be deposited on silicon substrate with a scalable sputtering method, forming the heterojunction‐type photodetectors. Molecular layers of the MoS₂ films are perpendicular to the substrate, offering high‐speed paths for the separation and transportation of photo‐generated carriers. Owing to the strong light absorption of the relatively thick MoS₂ film and the unique vertically standing layered structure, MoS₂/Si heterojunction photodetectors with unprecedented performance are actualized. The self‐driven MoS₂/Si heterojunction photodetector is sensitive to a broadband wavelength from visible light to near‐infrared light, showing an extremely high detectivity up to ≈10¹³ Jones (Jones = cm Hz^1/2 W^?1), and an ultrafast response speed of ≈3 μs. The performance is significantly better than the photodetectors based on mono‐/multilayer MoS₂ nanosheets. Additionally, the MoS₂/Si photodetectors exhibit excellent stability in air for a month. This work unveils the great potential of MoS₂/Si heterojunction for optoelectronic applications.     

Junction Field-Effect Transistors Based on PdSe2/MoS2 Heterostructures for Photodetectors Showing High Responsivity and Detectivity

2D materials have shown great promise for next-generation high-performance photodetectors. However, the performance of photodetectors based on 2D materials is generally limited by the tradeoff between photoresponsivity and photodetectivity. Here, a novel junction field-effect transistor (JFET) photodetector consisting of a PdSe₂ gate and MoS₂ channel is constructed to realize high responsivity and high detectivity through effective modulation of top junction gate and back gate. The JFET exhibits high carrier mobility of 213 cm² V⁻¹ s⁻¹. What is more, the high responsivity of 6 × 10² A W⁻¹, as well as the high detectivity of 10¹¹ Jones, are achieved simultaneously through the dual-gate modulation. The high performance is attributed to the modulation of the depletion region by the dual-gate, which can effectively suppress the dark current and enhance the photocurrent, thereby realizing high detectivity and responsivity. The JFET photodetector provides a new approach to realize photodetectors with high responsivity and detectivity.     

Few‐Layered PtS2 Phototransistor on h‐BN with High Gain

The very recently rediscovered group‐10 transition metal dichalcogenides (TMDs) such as PtS₂ and PtSe₂, have joined the 2D material family as potentially promising candidates for electronic and optoeletronic applications due to their theoretically high carrier mobility, widely tunable bandgap, and ultrastability. Here, the first exploration of optoelectronic application based on few‐layered PtS₂ using h‐BN as substrate is presented. The phototransistor exhibits high responsivity up to 1.56 × 10³ A W^?1 and detectivity of 2.9 × 10¹¹ Jones. Additionally, an ultrahigh photogain ≈2 × 10⁶ is obtained at a gate voltage V _g = 30 V, one of the highest gain among 2D photodetectors, which is attributed to the existence of trap states. More interestingly, the few‐layered PtS₂ phototransistor shows a back gate modulated photocurrent generation mechanism, that is, from the photoconductive effect dominant to photogating effect dominant via tuning the gate voltage from the OFF state to the ON state. Such good properties combined with gate‐controlled photoresponse of PtS₂ make it a competitive candidate for future 2D optoelectronic applications.     

High‐Sensitivity Floating‐Gate Phototransistors Based on WS2 and MoS2

In recent years, 2D layered materials have been considered as promising photon absorption channel media for next‐generation phototransistors due to their atomic thickness, easily tailored single‐crystal van der Waals heterostructures, ultrafast optoelectronic characteristics, and broadband photon absorption. However, the photosensitivity obtained from such devices, even under a large bias voltage, is still unsatisfactory until now. In this paper, high‐sensitivity phototransistors based on WS₂ and MoS₂ are proposed, designed, and fabricated with gold nanoparticles (AuNPs) embedded in the gate dielectric. These AuNPs, located between the tunneling and blocking dielectric, are found to enable efficient electron trapping in order to strongly suppress dark current. Ultralow dark current (10^?11 A), high photoresponsivity (1090 A W^?1), and high detectivity (3.5 × 10¹¹ Jones) are obtained for the WS₂ devices under a low source/drain and a zero gate voltage at a wavelength of 520 nm. These results demonstrate that the floating‐gate memory structure is an effective configuration to achieve high‐performance 2D electronic/optoelectronic devices.     

High‐Performance Transition Metal Dichalcogenide Photodetectors Enhanced by Self‐Assembled Monolayer Doping

Most doping research into transition metal dichalcogenides (TMDs) has been mainly focused on the improvement of electronic device performance. Here, the effect of self‐assembled monolayer (SAM)‐based doping on the performance of WSe₂‐ and MoS₂‐based transistors and photodetectors is investigated. The achieved doping concentrations are ≈1.4 × 10¹¹ for octadecyltrichlorosilane (OTS) p‐doping and ≈10¹¹ for aminopropyltriethoxysilane (APTES) n‐doping (nondegenerate). Using this SAM doping technique, the field‐effect mobility is increased from 32.58 to 168.9 cm² V^?1 s in OTS/WSe₂ transistors and from 28.75 to 142.2 cm² V^?1 s in APTES/MoS₂ transistors. For the photodetectors, the responsivity is improved by a factor of ≈28.2 (from 517.2 to 1.45 × 10⁴ A W^?1) in the OTS/WSe₂ devices and by a factor of ≈26.4 (from 219 to 5.75 × 10³ A W^?1) in the APTES/MoS₂ devices. The enhanced photoresponsivity values are much higher than that of the previously reported TMD photodetectors. The detectivity enhancement is ≈26.6‐fold in the OTS/WSe₂ devices and ≈24.5‐fold in the APTES/MoS₂ devices and is caused by the increased photocurrent and maintained dark current after doping. The optoelectronic performance is also investigated with different optical powers and the air‐exposure times. This doping study performed on TMD devices will play a significant role for optimizing the performance of future TMD‐based electronic/optoelectronic applications.     

Full Energy Spectra of Interface State Densities for n‐ and p‐type MoS2 Field‐Effect Transistors

2D materials are promising to overcome the scaling limit of Si field‐effect transistors (FETs). However, the insulator/2D channel interface severely degrades the performance of 2D FETs, and the origin of the degradation remains largely unexplored. Here, the full energy spectra of the interface state densities (D_it) are presented for both n‐ and p‐ MoS₂ FETs, based on the comprehensive and systematic studies, i.e., full rage of channel thickness and various gate stack structures with h‐BN as well as high‐k oxides. For n‐MoS₂, D_it around the mid‐gap is drastically reduced to 5 × 10¹¹ cm^?2 eV^?1 for the heterostructure FET with h‐BN from 5 × 10¹² cm^?2 eV^?1 for the high‐k top‐gate. On the other hand, D_it remains high, ≈ 10¹³ cm^?2 eV^?1, even for the heterostructure FET for p‐MoS₂. The systematic study elucidates that the strain induced externally through the substrate surface roughness and high‐k deposition process is the origin for the interface degradation on conduction band side, while sulfur‐vacancy‐induced defect states dominate the interface degradation on valance band side. The present understanding of the interface properties provides the key to further improving the performance of 2D FETs.     

High Responsivity Phototransistors Based on Few‐Layer ReS2 for Weak Signal Detection

2D transition metal dichalcogenides are emerging with tremendous potential in many optoelectronic applications due to their strong light–matter interactions. To fully explore their potential in photoconductive detectors, high responsivity is required. Here, high responsivity phototransistors based on few‐layer rhenium disulfide (ReS₂) are presented. Depending on the back gate voltage, source drain bias and incident optical light intensity, the maximum attainable photoresponsivity can reach as high as 88 600 A W^?1, which is a record value compared to other individual 2D materials with similar device structures and two orders of magnitude higher than that of monolayer MoS₂. Such high photoresponsivity is attributed to the increased light absorption as well as the gain enhancement due to the existence of trap states in the few‐layer ReS₂ flakes. It further enables the detection of weak signals, as successfully demonstrated with weak light sources including a lighter and limited fluorescent lighting. Our studies underscore ReS₂ as a promising material for future sensitive optoelectronic applications.     

ReS2‐Based Field‐Effect Transistors and Photodetectors

Atomically thin 2D layered transition metal dichalcogenides (TMDs) have been extensively studied in recent years because of their appealing electrical and optical properties. Here, the fabrication of ReS₂ field‐effect transistors is reported via the encapsulation of ReS₂ nanosheets in a high‐κ Al₂O₃ dielectric environment. Low‐temperature transport measurements allow to observe a direct metal‐to‐insulator transition originating from strong electron–electron interactions. Remarkably, the photodetectors based on ReS₂ exhibit gate‐tunable photoresponsivity up to 16.14 A W^?1 and external quantum efficiency reaching 3168%, showing a competitive device performance to those reported in graphene, MoSe₂, GaS, and GaSe‐based photodetectors. This study unambiguously distinguishes ReS₂ as a new candidate for future applications in electronics and optoelectronics.     

Large‐Size Growth of Ultrathin SnS2 Nanosheets and High Performance for Phototransistors

2D SnS₂ nanosheets have been attracting intensive attention as one potential candidate for the modern electronic and/or optoelectronic fields. However, the controllable large‐size growth of ultrathin SnS₂ nanosheets still remains a great challenge and the photodetectors based on SnS₂ nanosheets suffer from low responsivity, thus hindering their further applications so far. Herein, an improved chemical vapor deposition route is provided to synthesize large‐size SnS₂ nanosheets, the side length of which can surpass 150 μm. Then, ultrathin SnS₂ nanosheet‐based phototransistors are fabricated, which achieve high photoresponsivities up to 261 A W^?1 (with a fast rising time of 20 ms and a falling time of 16 ms) in air and 722 A W^?1 in vacuum, respectively. Furthermore, the effects of back‐gate voltage and air adsorbates on the optoelectronic properties of the SnS₂ nanosheet have been systematically investigated. In addition, a high‐performance flexible photodetector based on SnS₂ nanosheet is also fabricated with a high responsivity of 34.6 A W^?1.     

Ultrahigh Speed and Broadband Few‐Layer MoTe2/Si 2D–3D Heterojunction‐Based Photodiodes Fabricated by Pulsed Laser Deposition

2D transition metal dichalcogenides are promising candidates for high‐performance photodetectors. However, the relatively low response speed as well as the complex transfer process hinders their wide applications. Herein, for the first time, the fabrication of a few‐layer MoTe₂/Si 2D–3D vertical heterojunction for high‐speed and broadband photodiodes by a pulsed laser deposition technique is reported. Owing to the high junction quality, ultrathin MoTe₂ film thickness, and unique vertical n–n heterojunction structure, the photodiode exhibits excellent device performance in terms of a high responsivity of 0.19 A W^?1 and a large detectivity of 6.8 × 10¹³ Jones. The device is also capable of detecting a broadband light with wavelength spanning from 300 to 1800 nm. More importantly, the device possesses an ultrahigh response speed up to 150 ns with a 3‐dB electrical bandwidth approaching 0.12 GHz. This work paves the way toward the fabrication of novel 2D–3D heterojunctions for high‐performance, ultrafast photodetectors.     

Transition‐Metal‐Carbide (Mo2C) Multiperiod Gratings for Realization of High‐Sensitivity and Broad‐Spectrum Photodetection

A novel hybrid phototransistor consisting of molybdenum carbide (Mo₂C) and molybdenum disulfide (MoS₂) is proposed. By exploiting the interface properties of MoS₂ and Mo₂C, a highly sensitive and broad‐spectral response photodetector is fabricated. The underlying mechanism of the enhanced performance is the efficient hot carrier injection from Mo₂C to MoS₂. The strong coupling of MoS₂ and Mo₂C at the interface provides the significantly low Schottky barrier height (≈70 meV), which gives rise to the significantly efficient hot carrier transfer from Mo₂C to MoS₂. The grating of metallic Mo₂C produces plasmonic resonance, which provides hot carriers to the MoS₂ channel. By adjusting the grating period of Mo₂C (400–1000 nm), the optimal photoresponse of light can be controlled, from visible to NIR. By integrating various Mo₂C multigrating periods (400–1000 nm) with MoS₂, a novel photodetector is demonstrated with high responsivity (R > 10³ A W^?1) and light‐to‐dark current ratio (>10²) over a broad spectral range (405–1310 nm). The proposed novel hybrid photodetector, 2D semiconductors with multigrating 2D metallic stripes, exhibits high sensitivity and broad spectral detection of light and can overcome the inherent weakness of conventional 2D photodetectors, paving the way forward for next‐generation photoelectric devices.     

Facile Spraying Synthesis and High‐Performance Sodium Storage of Mesoporous MoS2/C Microspheres

A facile one‐step spraying synthesis of MoS₂/C microspheres and their enhanced electrochemical performance as anode of sodium‐ion batteries is reported. An aerosol spraying pyrolysis without any template is employed to synthesize MoS₂/C microspheres, in which ultrathin MoS₂ nanosheets (≈2 nm) with enlarged interlayers (≈0.64 nm) are homogeneously embedded in mesoporous carbon microspheres. The as‐synthesized mesoporous MoS₂/C microspheres with 31 wt% carbon have been applied as an anode material for sodium ion batteries, demonstrating long cycling stability (390 mAh g^?1 after 2500 cycles at 1.0 A g^?1) and high rate capability (312 mAh g^?1 at 10.0 A g^?1 and 244 mAh g^?1 at 20.0 A g^?1). The superior electrochemical performance is due to the uniform distribution of ultrathin MoS₂ nanosheets in mesoporous carbon frameworks. This kind of structure not only effectively improves the electronic and ionic transport through MoS₂/C microspheres, but also minimizes the influence of pulverization and aggregation of MoS₂ nanosheets during repeated sodiation and desodiation.     

2D Nanospace Confined Synthesis of Pseudocapacitance‐Dominated MoS2‐in‐Ti3C2 Superstructure for Ultrafast and Stable Li/Na‐Ion Batteries

Exploring a universal strategy to implement the precise control of 2D nanomaterials in size and layer number is a big challenge for achieving ultrafast and stable Li/Na‐ion batteries. Herein, the confined synthesis of 1–3 layered MoS₂ nanocrystals into 2D Ti₃C₂ interlayer nanospace with the help of electrostatic attraction and subsequent cetyltrimethyl ammonium bromide (CTAB) directed growth is reported. The MoS₂ nanocrystals are tightly anchored into the interlayer by 2D confinement effect and strong Mo? C covalent bond. Impressively, the disappearance of Li⁺ intercalated into MoS₂ reduction peak is successfully observed for the first time in the experiment, showing in a typical surface‐controlled charge storage behavior. The pseudocapacitance‐dominated contribution guarantees a much faster and more stable Li/Na storage performance. As predicted, this electrode exhibits a very high Li⁺ storage capacity of 340 mAh g^?1 even at 20 A g^?1 and a long cycle life (>1000 times). It also shows an excellent Na⁺ storage capacity of 310 mAh g^?1 at 1 A g^?1 with a 1600 times high‐rate cycling. Such impressive confined synthesis strategy can be extended to the precise control of other 2D nanomaterials.     

High‐Performance,Air‐Stable,Top‐Gate,p‐Channel WSe2 Field‐Effect Transistor with Fluoropolymer Buffer Layer

High‐performance, air‐stable, p‐channel WSe₂ top‐gate field‐effect transistors (FETs) using a bilayer gate dielectric composed of high‐ and low‐k dielectrics are reported. Using only a high‐k Al₂O₃ as the top‐gate dielectric generally degrades the electrical properties of p‐channel WSe₂, therefore, a thin fluoropolymer (Cytop) as a buffer layer to protect the 2D channel from high‐k oxide forming is deposited. As a result, a top‐gate‐patterned 2D WSe₂ FET is realized. The top‐gate p‐channel WSe₂ FET demonstrates a high hole mobility of 100 cm²_­ V^?1 s^?1 and a I_ON/I_OFF ratio > 10⁷ at low gate voltages (V_GS ca. ?4 V) and a drain voltage (V_DS) of ?1 V on a glass substrate. Furthermore, the top‐gate FET shows a very good stability in ambient air with a relative humidity of 45% for 7 days after device fabrication. Our approach of creating a high‐k oxide/low‐k organic bilayer dielectric is advantageous over single‐layer high‐k dielectrics for top‐gate p‐channel WSe₂ FETs, which will lead the way toward future electronic nanodevices and their integration.     

Single‐Crystalline p‐Type Zn3As2 Nanowires for Field‐Effect Transistors and Visible‐Light Photodetectors on Rigid and Flexible Substrates

Zn₃As₂ is an important p‐type semiconductor with the merit of high effective mobility. The synthesis of single‐crystalline Zn₃As₂ nanowires (NWs) via a simple chemical vapor deposition method is reported. High‐performance single Zn₃As₂ NW field‐effect transistors (FETs) on rigid SiO₂/Si substrates and visible‐light photodetectors on rigid and flexible substrates are fabricated and studied. As‐fabricated single‐NW FETs exhibit typical p‐type transistor characteristics with the features of high mobility (305.5 cm² V^?1 s^?1) and a high I_on/I_off ratio (10⁵). Single‐NW photodetectors on SiO₂/Si substrate show good sensitivity to visible light. Using the contact printing process, large‐scale ordered Zn₃As₂ NW arrays are successfully assembled on SiO₂/Si substrate to prepare NW thin‐film transistors and photodetectors. The NW‐array photodetectors on rigid SiO₂/Si substrate and flexible PET substrate exhibit enhanced optoelectronic performance compared with the single‐NW devices. The results reveal that the p‐type Zn₃As₂ NWs have important applications in future electronic and optoelectronic devices.     

Position‐Sensitive Array Photodetector Based on Comb‐Like CdS Nanostructure with Cone‐Shape Branches

2D microscale position‐sensitive detectors (PSDs) are highly desirable with the degree of integration increase and the size reduction of nanodevices, which are still unavailable. Multichannel devices with outstanding photoelectric properties attract considerable interest as powerful building blocks to be applied in on‐chip systems. Here, based on a highly ordered comb‐like CdS nanowire array with cone‐shape branches through a one‐step synthesis strategy, a high‐resolution 2D position‐sensitive photodetector is realized through variable resistance in different transportation routes and variable optical responses at different parts of the cone‐shape branches, which enable accurate position identification of incident light in various zones of nanowire arrays according to photocurrent changes. In a broadband from 310 to 560 nm, the PSD exhibits high sensitivity with 85 and 58 KΩ µm^?1 in the trunk and branch part, respectively, and an ultrafast optical response shorter than tens of millisecond. Moreover, a lower conductivity change rate per unit temperature of the PSD (1.625 × 10^?9 A V^?1 K^?1) than that of commercial Si‐based PSDs (≈6.67 × 10^?7 A V^?1 K^?1) reveals outstanding low‐temperature performance. Finally, the multichannel nanostructure based PSD with nanoscale resolution is applied to high‐accuracy quadrant photodetectors.     

3D Solar‐Blind Ga2O3 Photodetector Array Realized Via Origami Method

A 3D solar‐blind photodetector array is realized from amorphous Ga₂O₃ films grown on polyethylene terephthalate substrates via an origami route. The photodetector cells exhibit a dark current of 0.17 nA, and the peak responsivity is about 8.9 A W^?1 at 250 nm with a quantum efficiency of 4450%. The photodetector shows a distinct cut‐off wavelength at 268 nm with a solar‐blind ratio of more than two orders of magnitude (photocurrent ratio between 250 nm/300 nm). The photodetector cells reveal excellent electrical stability after thousands of bending cycles. All the photodetector cells of the 3D photodetector array have a highly consistent performance. In addition, the device can execute the functions of capturing a real‐time light trajectory and identifying multipoint light spatial distribution, which cannot be achieved in all the previously reported 2D solar‐blind photodetectors. The results suggest new pathways to fabricate 3D photodetectors from conventional semiconductor films, which may find potential applications in optical positioning, tracking, imaging and communications, etc.     

All‐Layered 2D Optoelectronics: A High‐Performance UV–vis–NIR Broadband SnSe Photodetector with Bi2Te3 Topological Insulator Electrodes

Nanoelectronics is in urgent demand of exceptional device architecture with ultrathin thickness below 10 nm and dangling‐bond‐free surface to break through current physical bottleneck and achieve new record of integration level. The advance in 2D van der Waals materials endows scientists with new accessibility. This study reports an all‐layered 2D Bi₂Te₃‐SnSe‐Bi₂Te₃ photodetector, and the broadband photoresponse of the device from ultraviolet (370 nm) to near‐infrared (808 nm) is demonstrated. In addition, the optimized responsivity reaches 5.5 A W^?1, with the corresponding eternal quantum efficiency of 1833% and detectivity of 6 × 10¹⁰ cm Hz^1/2 W^?1. These figures‐of‐merits are among the best values of the reported all‐layered 2D photodetectors, which are several orders of magnitude higher than those of the previous SnSe photodetectors. The superior device performance is attributed to the synergy of highly conductive surface state of Bi₂Te₃ topological insulator, perfect band alignment between Bi₂Te₃ and SnSe as well as small interface potential fluctuation. Meanwhile, the all‐layered 2D device is further constructed onto flexible mica substrate and its photoresponse is maintained roughly unchanged upon 60 bending cycles. The findings represent a fundamental scenario for advancement of the next generation high performance and high integration level flexible optoelectronics.     

Salt‐Assisted Growth of P‐type Cu9S5 Nanoflakes for P‐N Heterojunction Photodetectors with High Responsivity

P‐n junctions based on two dimensional (2D) van der Waals (vdW) heterostructure are one of the most promising alternatives in next‐generation electronics and optoelectronics. By choosing different 2D transition metal dichalcogenides (TMDCs), the p‐n junctions have tailored energy band alignments and exhibit superior performance as photodetectors. The p‐n diodes working at reverse bias commonly have high detectivity due to suppressed dark current but suffer from low responsivity resulting from small quantum efficiency. Greater build‐in electric field in the depletion layer can improve the quantum efficiency by reducing recombination of charge carriers. Herein, Cu₉S₅, a novel p‐type semiconductor with direct bandgap and high optical absorption coefficient, is synthesized by salt‐assisted chemical vapor deposition (CVD) method. The high density of holes in Cu₉S₅ endows the constructed p‐n junction, Cu₉S₅/MoS₂, with strong build‐in electric field according to Anderson heterojunction model. Consequently, the Cu₉S₅/MoS₂ p‐n heterojunction has low dark current at reverse bias and high photoresponse under illumination due to the efficient charge separation. The Cu₉S₅/MoS₂ photodetector exhibits good photodetectivity of 1.6 × 10¹² Jones and photoresponsivity of 76 A W^?1 under illumination. This study demonstrates Cu₉S₅ as a promising p‐type semiconductor for high‐performance p‐n heterojunction diodes.     

Edge‐Enriched Ultrathin MoS2 Embedded Yolk‐Shell TiO2 with Boosted Charge Transfer for Superior Photocatalytic H2 Evolution

Exploring TiO₂‐photocatalysts for sunlight conversion has high demand in artificial photosynthesis. In this work, edge‐enriched ultrathin molybdenum disulfide (MoS₂) flakes are uniformly embedded into the bulk of yolk‐shell TiO₂ as a cocatalyst to accelerate photogenerated‐electron transfer from the bulk to the surface of TiO₂. The as‐formed MoS₂/TiO₂ (0.14 wt%) hybrids exhibit a high hydrogen evolution rate (HER) of 2443 µmol g^?1 h^?1, about 1000% and 470% of that of pristine TiO₂ (247 µmol g^?1 h^?1) and bulk MoS₂ decorated TiO₂ (513 µmol g^?1 h^?1). Such a greatly enhanced HER is attributed to the exposed catalytic edges of the ultrathin MoS₂ flakes with a robust chemical linkage (Ti? S bond), providing rapid charge transfer channels between TiO₂ and MoS₂. The catalytic stability is promoted by the antiaggregation of the highly dispersed MoS₂ flakes in the bulk of yolk‐shell TiO₂. The exponential fitted decay kinetics of time‐resolved photoluminescence (ns‐PL) spectra illustrates that embedding ultrathin MoS₂ flakes in TiO₂ effectively decreases the average lifetime of PL in the MoS₂/TiO₂ hybrids (τ_ave = 4.55 ns), faster than that of pristine TiO₂ (≈7.17 ns) and the bulk MoS₂/TiO₂ (≈6.13 ns), allowing a superior charge separation and charge trapping process for reducing water.