van der Waals Epitaxial Growth of Atomically Thin 2D Metals on Dangling‐Bond‐Free WSe2 and WS2

2D metals have attracted considerable recent attention for their special physical properties, such as charge density waves, magnetism, and superconductivity. However, despite some recent efforts, the synthesis of ultrathin 2D metals nanosheets down to monolayer thickness remains a significant challenge. Herein, by using atomically flat 2D WSe₂ or WS₂ as the growth substrate, the synthesis of atomically thin 2D metallic MTe₂ (M = V, Nb, Ta) single crystals with the thickness down to the monolayer regime and the creation of atomically thin MTe₂/WSe₂ (WS₂) vertical heterojunctions is reported. Comparison with the growth on the SiO₂/Si substrate under the same conditions reveals that the utilization of the dangling‐bond‐free WSe₂ or WS₂ as the van der Waals epitaxy substrates is crucial for the successful realization of atomically thin MTe₂ (M = V, Nb, Ta) nanosheets. It is further shown that the epitaxial grown 2D metals can function as van der Waals contacts for 2D semiconductors with little interface damage and improved electronic performance. This study defines a robust van der Waals epitaxy pathway to ultrathin 2D metals, which is essential for fundamental studies and potential technological applications of this new class of materials at the 2D limit.     

Role of Molecular Sieves in the CVD Synthesis of Large‐Area 2D MoTe2

The synthesis of high‐quality 2D MoTe₂ with a desired phase on SiO₂/Si substrate is crucial to its diverse applications. A side reaction of Te with the substrate Si leading to SiTe and Si₂Te₃ tends to happen during growth, resulting in the failure to obtain MoTe₂. It has been found that molecular sieves can adsorb the silicon telluride byproducts and eliminate the influence of the side reaction during the chemical vapor deposition synthesis of MoTe₂. With the help of molecular sieves, few‐layer 1T′ MoTe₂ can be grown from the MoO_x precursor. Pure 1T′ MoTe₂ and 2H MoTe₂ regions in centimeter‐sized areas synthesized on the same piece of SiO₂/Si substrate can be obtained by using an overlapped geometry. The strategy provides a new method to controllably synthesize MoTe₂ with desired phases and can be generalizable to the synthesis of other tellurium‐based layered materials.     

Controlled Layer Thinning and p‐Type Doping of WSe2 by Vapor XeF2

This report presents a simple and efficient method of layer thinning and p‐type doping of WSe₂ with vapor XeF₂. With this approach, the surface roughness of thinned WSe₂ can be controlled to below 0.7 nm at an etched depth of 100 nm. By selecting appropriate vapor XeF₂ exposure times, 23‐layer and 109‐layer WSe₂ can be thinned down to monolayer and bilayer, respectively. In addition, the etching rate of WSe₂ exhibits a significant dependence on vapor XeF₂ exposure pressure and thus can be tuned easily for thinning or patterning applications. From Raman, photoluminescence, X‐ray photoelectron spectroscopy (XPS), and electrical characterization, a p‐doping effect of WSe₂ induced by vapor XeF₂ treatment is evident. Based on the surface composition analysis with XPS, the causes of the p‐doping effect can be attributed to the presence of substoichiometric WO_x (x < 3) overlayer, trapped reaction product of WF₆, and nonstoichiometric WSe_x (x > 2). Furthermore, the p‐doping level can be controlled by varying XeF₂ exposure time. The thinning and p‐doping of WSe₂ with vapor XeF₂ have the advantages of easy scale‐up, high etching selectivity, excellent controllability, and compatibility with conventional complementary metal‐oxide‐semiconductor fabrication processes, which is promising for applications of building WSe₂ devices with versatile functionalities.     

Self‐Aligned and Scalable Growth of Monolayer WSe2–MoS2 Lateral Heterojunctions

2D layered heterostructures have attracted intensive interests due to their unique optical, transport, and interfacial properties. The laterally stitched heterojunction based on dissimilar 2D transition metal dichalcogenides forms an intrinsic p–n junction without the necessity of applying an external voltage. However, no scalable processes are reported to construct the devices with such lateral heterostructures. Here, a scalable strategy, two‐step and location‐selective chemical vapor deposition, is reported to synthesize self‐aligned WSe₂–MoS₂ monolayer lateral heterojunction arrays and demonstrates their light‐emitting devices. The proposed fabrication process enables the growth of high‐quality interfaces and the first successful observation of electroluminescence at the WSe₂–MoS₂ lateral heterojunction. The electroluminescence study has confirmed the type‐I alignment at the interface rather than commonly believed type‐II alignment. This self‐aligned growth process paves the way for constructing various 2D lateral heterostructures in a scalable manner, practically important for integrated 2D circuit applications.     

Phase Equilibria of BaO-R2O3-CuO z Systems (R = Y and Lanthanides) under CO2-free Conditions

For applications ranging from phase equilibria to the processing of second-generation high T _c superconductor-coated-conductors, phase diagrams constructed under carbonate-free conditions are needed. Subsolidus phase equilibria of BaO-R₂O₃-CuO _z (R = Ho) have been investigated at (810°C), 21 kPa (875°C) and 0.1 MPa (850 and 930°C) by applying controlled atmosphere methods to minimize the presence of carbonate and CO₂ and H₂O contamination. Under carbonate-free conditions, most of these phase diagrams are different from those reported in the literature. In this paper, we also review and compare the phase diagrams of ten BaO-R₂O₃-CuO _z systems (R = Nd, Sm, Eu, Gd, Dy, Y, Ho, Er, Tm and Yb) that were previously determined in this laboratory under Among these diagrams, a distinct trend of phase formation and tie-line relationships is observed.