GaAs m.a.o.s.f.e.t. memory transistor

A new non-volatile memory device is reported. This device is a GaAs m.o.s.f.e.t. with charge storage in the gate in which is a double oxide structure of aluminium oxide and GaAs native oxide, both oxides are grown anodically. The fabrication of the device is described and the results of initial measurements on the charging and charge retention properties are presented.     

Microwave capability of 1.5 ?m-gate GaAs m.o.s.f.e.t.

1.5 ?m-gate GaAs m.o.s.f.e.t.s have been fabricated by anodic oxidation, and the microwave capability has been examined. The maximum oscillation frequency fmax is 22 GHz and the noise figure is 6.1 dB at 8 GHz. The results are comparable to those of GaAs m.e.s.f.e.t.s.     

Optical Effects on the Static and Dynamic Characteristics of a GaAs MESFET (Short Paper)

In this paper, we describe the effect of light on the S-parameters of a GaAs MESFET. The photon energy is greater than the gap bandwidth of the semiconductor. The photoconductive and photovoltaic dc phenomena in the channel and in the depletion layer are theoretically analyzed with a unidimensional model to describe the light effect on the dc transconductance g/sub m/. The comparison between the dc transconductance, without and under illumination, and the theoretical model shows a very close agreement.     

Enhancement-mode GaAs m.o.s.f.e.t. on semi-insulating substrate using a self-aligned gate technique

A self-aligned gate notched channel GaAs m.o.s.f.e.t. structure on semi-insulating substrate is presented. Device operation is mainly in enhancement mode. The transconductance is comparable to enhancement-mode m.e.s.f.e.t.s, j.f.e.t.s and s.i.g.f.e.t.s; however, the output-current capability is essentially increased.     

Circuit model for the GaAs m.e.s.f.e.t. valid to 12 GHz

A new equivalent circuit is given for the GaAs m.e.s.f.e.t., which includes resistive loss in the feed back elements. The circuit values are given for several 1 ?m-gate GaAs m.e.s.f.e.t.s. A method for fitting s12 to the measured data is described. Finally, the gain and stability factor of several GaAs m.e.s.f.e.t.s. are extrapolated to 24 GHz from the present model.     

GaAs/AlGaAs 非对称耦合双量子阱界面混合效应光荧光谱研究

用分子束外延系统生 长了GaAs/AlGaAs非对称耦合双量子阱(ACDQW),用组合注入的方法,在同一块衬底上获得了不 同注入离子和不同注入剂量的耦合量子阱单元,没有经过快速热退火过程,在常温下测量了不 同单元的显微光荧光谱,发现子带间跃迁能量最大变化范围接近100meV,组合注入所导致的能 量移动要大于单独注入导致的能量移动.     

GaAs m.e.s.f.e.t. prepared by organometallic chemical vapour deposition

GaAs m.e.s.f.e.t.s with gate dimensions of 1.5 ?m × 300 ?m were fabricated in the epitaxial layers grown by organometallic chemical vapour deposition (o.m.c.v.d.) technique. The average saturation velocity in the channel was deduced to be 1.3 × 107 cm/s and is equal to that of epitaxial layers grown by AsCl3 chemical vapour deposition (c.v.d.). The velocity degraded region was confined to within about 350 ? of the interface. A gain of 10 dB and a noise figure of 3 dB with an associated gain of 5.5 dB at 8 GHz were measured.     

Direct modulation of d.h. GaAlAs lasers with GaAs m.e.s.f.e.t.s

GaAs m.e.s.f.e.t.s are used to directly modulate d.h. GaAlAs lasers with a 200 Mbit/s pseudorandom, return-to-zero bit stream. The detected light pulses have 100% modulation depth, no significant intersymbol interference, 40 mW of peak power and risetimes and falltimes of 240 ps for a halfpower width of 280 ps.     

超晶格(Al_xGa_(1-x)As)_m/(GaAs)_m(110)的电子能带结构

采用紧束缚的重整化方法计算了超晶格(Al_xGa_1 xAs)_m/(GaAs)_m(110)的电子能带结构(1≤m≤10)。讨论了电子能带结构随超晶格层厚m及合金组分x的变化情况。计算结果表明,对于不同的合金组分x,超晶格可以处在三个不同区域:A区,直接能隙结构,Ⅰ-型超晶格;B区,间接能隙结构,Ⅰ-型超晶格;C区,间接能隙结构,Ⅱ—型超晶格。     

Saturation and Polarization Characteristics of 1.56 μm Optical Probe Pulses in a LTG-GaAs Photoconductive Antenna Terahertz Detector

The characteristics of low temperature-grown GaAs photoconductive antenna (PCA) terahertz detectors probed by 1.56 μm laser pulses are investigated. The influence of TM and TE polarized probe, as well as the saturation characteristics are studied for 2 μm- and 5 μm-gap PCA’s. Different polarization characteristics at low probe powers and at the saturation regimes were observed. Results are explained in terms of the polarization-dependent photocarrier distribution at the PCA gap arising from tight focusing. This work also demonstrates using a 1.56 μm probe for a GaAs PCA to achieve ~60 dB SNR; matching its performance characteristics for above-bandgap probes.     

Photomodulated transmittance of GaBiAs layers grown on (0 0 1) and (3 1 1)B GaAs substrates

In this work, photomodulated transmittance (PT) has been applied to investigate the energy gap of GaBiAs layers grown on (0 0 1) and (3 1 1)B GaAs substrates. In PT spectra, a clear resonance has been observed below the GaAs edge. This resonance has been attributed to the energy gap-related absorption in GaBiAs. The energy and broadening of PT resonances have been determined using a standard approach in electromodulation spectroscopy. It has been found that the crystallographic orientation of GaAs substrate influences on the incorporation of Bi atoms into GaAs and quality of GaBiAs layers. The Bi-related energy gap reduction has been determined to be ∼90 meV per percent of Bi. In addition to PT spectra, common transmittance spectra have been measured and the energy gap of GaBiAs has been determined from the square of the absorption coefficient α² around the band-gap edge. It has been found that the tail of density of states is significant for GaBiAs and influences the accuracy of energy gap determination from the α² plot. In the case of PT spectra, the energy gap is determined unambiguously since this technique is directly sensitive to singularities in the density of states.     

High efficiency all‐GaAs solar cell

The reduction of surface recombination in GaAs solar cells is known to be a major concern for photovoltaic cells designers. A common technique used to reduce this effect is to cover the GaAs surface with a wide band gap window layer, therefore the creation of a heterojunction. To avoid a heterojunction with its inconveniences; interface surface states, poor photon absorption in addition to the technological exigencies, one can use an all‐GaAs solar cell. In this type of structure, a thin highly doped layer is created at the surface known as a front surface field (FSF). The main role of an FSF layer is to reduce the effect of front surface recombination and the enhancement of light‐generated free carriers' collection. This is achieved by the drastic reduction of the effective recombination at the emitter upper boundary. In this work, a simple analytical model is used to simulate the influence of the FSF layer on GaAs solar cell parameters; photocurrent, open circuit voltage and energy conversion efficiency. The effects of the FSF layer doping density and its thickness on the cell performance are discussed by using computed results. Copyright © 2010 John Wiley & Sons, Ltd.     

New structure of enhancement-mode GaAs microwave m.o.s.f.e.t.

This letter proposes a new feasible device structure of an enhancement-mode GaAs deep-depletion m.o.s.f.e.t. as an attractive alternative to the junction-gate f.e.t.s and describes its microwave properties. The device has been fabricated on a high-resistance epitaxial n?-layer by simple readily available technology without requiring the sophisticated control of the channel thickness needed for the conventional junction-gate f.e.t.s. The 'normally-off nature of the device can be explained on the basis of the substrate space-charge region extending over then?-layer. The microwave performance of the device can be favourably compared with that of currently achievable junction-gate normally-off f.e.t.s. Unilateral gain drops to zero at a frequency slightly above 7 GHz.     

A dc and microwave comparison of GaAs MESFET's on GaAs and Si substrates

In order to assess GaAs on Si technology, we have made a performance comparison of GaAs MESFET's grown and fabricated on Si and GaAs substrates under identical conditions and report the first microwave results. The GaAs MESFET's on Si with 1.2-µm gate length (290-µm width) exhibited transconductances (gm) of 180 mS/mm with good saturation and pinchoff whereas their counterparts on GaAs substrates exhibited gmof 170 mS/mm. A current gain cut-off frequency of 13.5 GHz was obtained, which compares with 12.9 GHz observed in similar-geometry GaAs MESFET's on GaAs substrates. The other circuit parameters determined from S-parameter measurements up to 18 GHz showed that whether the substrate is Si or GaAs does not seem to make a difference. Additionally, the microwave performance of these devices was about the same as that obtained in devices with identical geometry fabricated at Tektronix on GaAs substrates. The side-gating effect has also been measured in both types of devices with less than 10-percent decrease in drain current when 5 V is applied to a pad situated 5 µm away from the source. The magnitude of the sidegating effect was identical to within experimental determination for all side-gate biases in the studied range of 0 to -5 V. The light sensitivity of this effect was also very small with a change in drain current of less that 1 percent between dark and light conditions for a side gate bias of -5 V and a spacing of 5 µm. Carrier saturation velocity depth profiles showed that for both MESFET's on GaAs and Si substrates, the velocity was constant at 1.5 × 10⁷cm/s to within 100-150 Å of the active layer-buffer layer interface.     

Impact ionization and light emission in AlGaAs/GaAs HEMT's

Impact ionization and light emission phenomena have been studied in AlGaAs/GaAs HEMTs biased at high drain voltages by measuring the gate excess current due to holes generated by impact ionization and by analyzing the energy distribution of the light emitted from devices in the 1.1-3.1 eV energy range. The emitted spectra in this energy range can be divided into three energy regions: (i) around 1.4 eV light emission is dominated by band-to-band recombination between cold electrons and holes in GaAs; (ii) in the energy range from 1.5 to 2.6 eV energy distribution of the emitted photons is approximately Maxwellian; and (iii) beyond 2.6 eV the spectra are markedly distorted due to light absorption in the n⁺ GaAs cap layer. The integrated intensity of photons with energies larger than 1.7 eV is proportional to the product of the drain and gate currents. This suggests recombination of channel electrons with holes generated by impact ionization as the dominant emission mechanism of visible light     

GaAs双光子诱导光吸收对调Q激光器脉冲的影响

研究了利用GaAs的双光子诱导吸收实现调Q激光脉冲展宽的原理,分析了GaAs的光吸收特性,建立了激光器速率方程并给出了数值解。在实验上,将GaAs薄片放入一电光调QNdYAG激光器谐振腔中,同理论预测一样,激光输出脉冲的能量、峰值功率都低于常规调Q激光脉冲,同时脉冲宽度得到了展宽。     

High-speed 1 ?m GaAs m.e.s.f.e.t.

By minimising parasitic series resistances, a GaAs m.e.s.f.e.t. with 1 ?m gate length was fabricated, possessing the highest known r.f. power gain, measured up to 18 GHz, for GaAs m.e.s.f.e.t.s.     

可调能隙的光电器件结构——(AlAs)_ (n_l)/(GaAs)_(m_l)渐变周期超晶格

本文提出了一种具有渐变周期的(AlAs)_(nl)/(GaAs)_(ml)(1=1,2,…)超晶格,并采用递归方法计算了这种渐变周期超晶格的电子结构.其特点是带隙E_g在空间随(n_(?),m_(?))渐变.例如,对(AlAs)_4/(GaAs)_4(AlAs)_4、/(GaAs)_5/(AlAs)_4/(GaAs)_6/(AlAs)_4/(GaAs)_7结构,带隙由短周期一端的1.93eV变到长周期一端的1.78eV.同时导、价带边得到不同的调制,因而提高了电子与空穴电离率比值,有可能应用到作光电探测材料.     

U.H.F. low-noise GaAs m.e.s.f.e.t. amplifier for colour t.v. broadcasting translator

Low-noise amplifiers for u.h.f. colour t.v. broadcasting translator use have been successfully developed by using 1 ?m gate GaAs m.e.s.f.e.t.s. The obtained performances revealed that a GaAs m.e.s.f.e.t. has low-noise and low intermodulation distortion characteristics, even in the 500?800 MHz frequency range, compared with a Si bipolar transistor.     

液晶盒厚度的反射光谱拟合法测量

介绍了一种测量液晶盒厚度的新型光学方法——反射光谱拟合法。理论上,液晶盒的反射光谱呈正弦曲线,且曲线取极值时对应入射光波长大小值取决于所用液晶盒的厚度。反之亦然,当得知液晶空盒的反射光谱时,可以根据曲线取极值时入射光波长的值来获得待测液晶盒的厚度。软件用来搜索与实验测试数据相互吻合的液晶盒厚度。该技术以白光作为液晶盒的前端光源,且白光入射角为0°。结果表明,该方法测量范围5 ～30μm,测量重复误差0 .1μm以下。实验中,光纤光谱仪用来测试反射光谱,并通过USB接口将其传输到计算机。该方法的优点是它可以在0 .1 s内测试液晶盒表面任意点处的厚度,有较强的使用价值。