Reliable deposition of induced transmission filters with a single metal layer

The sensitivity of an induced transmission filter (ITF) design to deposition errors is analyzed for the case of a single metal layer ITF. Theoretical knowledge of the least and most sensitive layers within the ITF design improves deposition reliability when using broadband optical monitoring of only the dielectric part of such metal-dielectric filters. Linearly variable ITFs have been successfully fabricated using this developed approach for error compensation.     

Realistische Modellierung der NIR/VIS/UV‐optischen Konstanten dünner optischer Schichten im Rahmen des Oszillatormodells

Modelling the NIR/VIS/UV optical constants of thin solid films: An oscillator model approach Based on a multioscillator approach, we demonstrate the determination of optical constants of different optical coating materials. The advanced LCalc‐software allows calculating the dielectric function as well as refractive index and extinction coefficient through a fit of transmittance and reflectance spectra measured at one or several angles of incidence. Sufficiently accurate spectrophotometric measurements are carried out by means of self‐developed VN‐ The thus obtained optical constants are automatically Kramers‐Kronig‐consistent and in reasonable correspondence to various kind of side information available about the coatings. This is demonstrated for dielectric oxide coatings as well as for one transparent conductive oxide (ITO) and a metal layer (aluminium). In application to reproducibility experiments, the method allows estimating process‐inherent stochastic variations in optical constants, which represent themselves an essential input for advanced computational manufacturing runs for design optimization prior to deposition.     

R.F. sputtering system for the preparation of multilayer optical filters

Thin film multilayer optical filters are usually prepared by vacuum evaporation of successive layers. The deposition of thin films by sputtering has many advantages over the vacuum evaporation technique and hence it is employed for the fabrication of better quality optical filters. However, the filters may be more time consuming to prepare if a single-target sputtering system is used because two different materials are required for alternate layers. For the preparation of multilayer optical filters, a special r.f. sputtering jig arrangement with two target holders is fabricated. Using this the successive layers can be deposited in one pumpdown. A simple coupling arrangement used to match the r.f. generator output impedance to the load is explained. With all the sputtering parameters such as the pressure, the temperature and the power maintained constant except the time, control of the thickness of the multilayers is achieved. A calibration chart of sputtering time versus thickness of the materials to be deposited is prepared for TiO₂ and SiO₂ for the above purpose. Using this calibration chart, the deposition time of different layers of any optical filters based on these dielectric materials can be fixed to obtain optical filters of acceptable quality and reproducibility.     

Artificial dielectric films on crystalline quartz

The optical properties of the layers formed when partially oxidized tin was evaporated in a vacuum are reported in this paper. After deposition of the films onto a quartz substrate, measurements of the IR reflectance, the dispersion curves of surface polaritons and the conductivity indicated that the film was a dielectric with a high refractive index. The dependence of the properties of such films on their deposition conditions was investigated. The influence of the films on the reflectance in the crystalline quartz restrahlen band was also studied.     

Design and plasma deposition of dispersion-corrected multiband rugate filters

Inverse Fourier transform method has been commonly used for designing complex inhomogeneous optical coatings. Since it assumes dispersion-free optical constants, introducing real optical materials induces shifts in the position of reflectance bands in multiband inhomogeneous minus (rugate) filters. We propose a simple method for considering optical dispersion in the synthesis of multiband rugate filter designs. Model filters designed with this method were fabricated on glass and polycarbonate substrates by plasma-enhanced chemical vapor deposition of silicon oxynitrides and SiO2/TiO2 mixtures with precisely controlled composition gradients.     

Application of in situ ellipsometry in the fabrication of thin-film optical coatings on semiconductors

Thin-film interference filters, suitable for use on GaAs- and InP-based lasers, have been fabricated by use of the electron-cyclotron resonance plasma-enhanced chemical vapor deposition technique. Multilayer film structures composed of silicon oxynitride material have been deposited at low temperatures with an in situ rotating compensator ellipsometer for monitoring the index of refraction and thickness of the deposited layers. Individual layers with an index of refraction from 3.3 to 1.46 at 633 nm have been produced with a run-to-run reproducibility of 0.005 and a thickness control of 10 A. Several filter designs have been implemented, including high-reflection filters, one- and two-layer anitreflection filters, and narrow-band high-reflection filters. It is shown that an accurate measurement of the filter optical properties during deposition is possible and that controlled reflectance spectra can be obtained.     

Optical properties of gold island films—a spectroscopic ellipsometry study

Metal island films of noble metals are obtained by deposition on glass substrates during the first stage of evaporation process when supported metal nanoparticles are formed. These films show unique optical properties, owing to the localized surface plasmon resonance of free electrons in metal nanoparticles. In the present work we study the optical properties of gold metal island films deposited on glass substrates with different mass thicknesses at different substrate temperatures. The optical characterization is performed by spectroscopic ellipsometry at different angles of incidence and transmittance measurements at normal incidence in the same point of the sample. Fitting of the ellipsometric data allows determining the effective optical constants and thickness of the island film. A multiple oscillator approach was used to successfully represent the dispersion of the effective optical constants of the films.     

Layer-by-layer design method for multilayers with barrier layers: application to Si/Mo multilayers for extreme-ultraviolet lithography

A previous layer-by-layer multilayer design method [J. Opt. Soc. Am. A 19, 385 (2002)] is completed by adding the possibility of alternating layers with fixed thicknesses along with layers whose thicknesses are optimized for the largest possible reflectance at a desired wavelength. The previous algorithm did not allow for layers with fixed thicknesses. The current formalism is particularly suited for a multilayer design in which barrier layers of given thicknesses are used to prevent diffusion and/or reaction between the multilayer constituents. The design method is also useful both when intermixing zones develop at multilayer interfaces and when capping layers are used. The algorithm allows the design of multilayers with complex barrier layers with any number of layers of any optical constants. The optimization can be performed either for normal incidence or for nonnormal incidence with either s- or p-polarized radiation. The completed method provides a fast and accurate procedure for multilayer optimization regardless of the number of different materials used in the multilayer. The optimum layer thickness is determined by means of functions suitable for implementation in a computer code. The performance of the current algorithm is exemplified through the design of Si/Mo multilayers with intermixing layers or with barrier layers that are optimized for the largest reflectance at 13.4 nm. The use of specific barrier layers on each multilayer interface is also discussed.     

Tolerances For Layer Thicknesses in Dielectric Multilayer Coatings and Interference Filters

A theory is developed for dielectric multilayer coatings in which the layers depart from calculated thickness. The theory is applied to alternating systems of quarter wave layers of ZnS and MgF₂. The effects of thickness errors are: (1) A shift of the wavelength at which maximum reflectance occurs; and (2) a change in phase shift upon reflection. The magnitude of these effects, and also their dependence on various parameters, are determined. Statistical tolerances for layer thicknesses are computed for given tolerances on the multilayer performance. The accuracy required for producing dielectric interference filters is up to about 40 times higher than the accuracy sufficient for the production of dielectric mirrors and beam splitters. Various techniques of experimentally controlling film thicknesses, and their accuracies, are discussed. The production of mirrors and beam splitters deviating from theoretical maximum reflectance by only 1 percent seems to be possible with Dufour’s simple single photocell method of monitoring film thicknesses. With more precise methods, such as those developed by Giacomo and Jacquinot, or Traub, the production of interference filters appears to be possible to within plus or minus one half their half widths.     

Optical filters with prescribed optical thickness and refined refractive indices

We propose to refine the refractive index of the layers composing optical filters while keeping their optical thicknesses constant. Using this technique, one can optimize filters made of quarter-wave layers using conventional optimization techniques, while preserving the possibility to use turning-point monitoring during their fabrication. Application of this method to the design of a dual narrowband filter and a tilted edge filter demonstrates its effectiveness.     

Design und Herstellung selektiver Dünnschichtabsorber auf Silberinselbasis. Design and fabrication of selective multilayer absorber based on silver island films

The combination of a metal island film with a dielectric multilayer represents a novel approach for preparation of spectrally selective absorbers. Metal island films show exceptional optical properties caused by the optical excitation of surface plasmon modes. The plasmon resonance frequency depends on the size and shape of the islands and is influenced by the deposition parameters. The first type of samples represents a silver island film in an ultra thin Al₂O₃ film. We analyzed these samples by means of spectrophotometry. The recorded spectra allow the calculation of the optical constants of the silver island films. These show a maximum absorptance up to 40 %. Finally, we incorporated ultrathin metal‐dielectric‐composite films on a silver/alumina basis into multilayer stacks to design tailored spectrally selective absorber coatings. The stack absorptance comes close to 100 %.     

Design and manufacture of metal/dielectric long-wavelength cutoff filters

Thin films of high reflecting metal, such as Ag, have a high reflectance in the long-wavelength region. When they are combined with dielectric layers, it is possible, through thin film interference effects, to induce transmission in certain shorter wavelength regions. Thus, they are useful components for the design of long-wavelength cutoff filters with a broad rejection region. In this paper, metal/dielectric multilayer designs based on this principle are numerically investigated. Three designs with different cutoff wavelengths and with very broad transmission regions in the visible or near-IR spectral ranges are presented. An excellent rejection on the long-wavelength side extends beyond 20 μm. Experimental results for one of the designs produced in our magnetron sputtering system are given.     

General approach to reliable characterization of thin metal films

Optical constants of thin metal films are strongly dependent on deposition conditions, growth mode, and thickness. We propose a universal characterization approach that allows reliable determination of thin metal film optical constants as functions of wavelength and thickness. We apply this approach to determination of refractive index dispersion of silver island films embedded between silica layers.     

Au thin films deposited on SnO2:In and glass: Substrate effects on the optical and electrical properties

We report on a detailed study on the optical and electrical properties of Au films made by sputter deposition onto glass substrates with and without transparent and electrically conducting layers of SnO₂:In. The Au films had thicknesses up to 10.7 nm and hence spanned the range for thin film growth from discrete islands, via large scale coalescence and formation of a meandering conducting network, to the formation of a more or less “holey” film. Scanning electron microscopy and atomic force microscopy demonstrated that the SnO₂:In films were considerably rougher than the glass itself, and this roughness influenced the Au film formation so that large scale coalescence set in at a somewhat larger thickness for films on SnO₂:In than on glass. Measurements of spectral optical transmittance and reflectance and of electrical resistance gave a fully consistent picture that could be reconciled with impeded Au film formation on the SnO₂:In layer; this led to pronounced “plateaus” in the near infrared optical spectra for Au films on SnO₂:In and a concomitant change from such two-layer films having a lower resistance than the single gold film at thicknesses below large scale coalescence to the opposite behavior for larger film thicknesses. Our work highlights the importance of the substrate roughness for transparent conductors comprising coinage metal films backed by wide band gap transparent conducting oxides.     

Preservation of far-UV aluminum reflectance by means of overcoating with C60 films

Thin films of C(60) were investigated as protective coatings of Al films to preserve their far-UV (FUV) reflectance by inhibition or retardation of their oxidation. Two methods were used for the overcoating of Al films with approximately one monolayer of C(60): (1) deposition of a multilayer film followed by temperature desorption of all but one monolayer and (2) direct deposition of approximately one-monolayer film. We exposed both types of sample to controlled doses of molecular oxygen and water vapor and measured their FUV reflectance before and after exposure to evaluate the achieved protection on the Al films. The whole process of sample preparation, reflectance measurement, sample heating, and oxidation was made without breaking vacuum. Results show that a C(60) monolayer protected Al from oxidation to some extent, although FUV reflectance of unprotected Al films was never exceeded. FUV optical constants of C(60) films and the FUV reflectance of the C(60) film as deposited and as a function of exposure to O(2) were also measured.     

Optical characterization of double layers containing epitaxial ZnSe and ZnTe films

In this paper results of the optical characterization of double layers consisting of ZnTe and ZnSe thin films prepared by molecular beam epitaxy onto GaAs single crystal substrates are presented. For this optical characterization the optical method based on combining variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry is used in the multi-sample modification applied within the spectral region 230–850?nm. Using this method the spectral dependences of the optical constants of the upper ZnTe thin films are determined within the spectral region mentioned above. Spectral dependences of the optical constants of the lower ZnSe thin films were determined within the spectral region 450–850?nm. Boundary roughness of these double layers and overlayers is respected. RMS values of the heights of the irregularities of the boundaries and thicknesses and optical constants of the overlayers are determined by means of the combined optical method as well. The uppermost boundaries of the double layers are, moreover, analysed using atomic force microscopy because of verification of the RMS values of these boundaries obtained by the optical method. The spectral dependences of the optical constants of the upper ZnTe films and lower ZnSe films determined in this paper are compared with those presented for ZnTe single layers and ZnSe single layers in the literature.     

Design and fabrication of a novel reflection filter

Reflection filters are useful in optical communication, display, and other systems. A novel reflection filter is designed and fabricated. Analytical design formulas have been put forward and show good agreement with the measured maximum reflectance as well as with the bandwidth at the central wavelength. The effective admittance and distribution of the electrical field intensity are also calculated to analyze the properties of the filter. This novel filter with high peak reflectance, narrow bandwidth, and deep cutoff, is simple to design, easy to fabricate and convenient to integrate, compared with the conventional dielectric multilayer reflection filters.     

Ion-beam etching for the precise manufacture of optical coatings

We propose using ion-beam etching as an additional tool for the accurate control of the thickness of thin films during the manufacture of sensitive optical multilayer coatings. We use a dual ion-beam sputtering system in the deposition and etch modes. In the deposition mode both the assist and sputtering ion beams are used to produce dense films at deposition rates in the range of 0.1-0.3 nm/s. In the etch mode, only the assist ion beam is used to remove material at a rate of less than 0.1 nm/s. A very high precision in the layer thicknesses can be obtained by alternating between deposition and etch modes. We observed that etching did not significantly affect the surface quality and the uniformity of the coatings. We introduced etching into our current manufacturing process and demonstrated its potential for the fabrication of several optical multilayer systems with performances that are very sensitive to the thickness of their layers.     

Variable refractive index optical coatings

The discrete and restricted values of refractive index of the bulk optical materials at present available are a serious limitation on the usefulness of these materials for optical coatings. This limitation can be overcome by utilizing the atom-by-atom condensation feature of the growth of vapour-deposited thin films, which allows the homogeneous mixing of different materials irrespective of their solubility restrictions. We have used this feature of co-deposition of different materials to form mixed optical materials of variable refractive index, the variation being determined by the composition of the source material. Measurements of the optical constants of these films, prepared by co-evaporation of mixtures of ZnS and MgF₂ of various compositions, have been made. The refractive index of the mixed films is found to be in good agreement with the values predicted on the basis of the Lorentz-Lorentz theory. In addition, the optical equivalence of alternate layers of ZnS and MgF₂ with step thicknesses ranging from 5 to 250 Å has been studied. For step thicknesses less than 100 Å, the optical properties of the composite films are equivalent to those for the homogeneously mixed films. For larger step thicknesses, considerable and complicated interference effects are observed. Thus, variable refractive index composite films can be prepared by (a) co-deposition and (b) deposition of alternate discrete layers of different materials as long as the step thickness does not exceed about 100 Å. Furthermore, these techniques of obtaining optical films of mixed materials can be extended to any combination of materials and therefore they open up a new field in materials technology.     

On-line reoptimization of filter designs for multivariate optical elements

An automated method for producing multivariate optical element (MOE) interference filters that are robust to errors in the reactive magnetron sputtering process is described. Reactive magnetron sputtering produces films of excellent thickness and uniformity. However, small changes in the thickness of individual layers can have severe adverse effects on the predictive ability of the MOE. Adaptive reoptimization of the filter design during the deposition process can maintain the predictive ability of the final filter by changing the thickness of the undeposited layers to compensate for the errors in deposition. The merit function used, the standard error of calibration, is fundamentally different from the standard spectrum matching. This new merit function allows large changes in the transmission spectrum of the filter to maintain performance.